Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
04/2014
04/24/2014WO2014061769A1 Laminate, gas barrier film, and manufacturing method therefor
04/24/2014WO2014061627A1 Gas barrier film and method for manufacturing gas barrier film
04/24/2014WO2014061597A1 Method for producing gas barrier film, gas barrier film, and electronic device
04/24/2014WO2014061433A1 High temperature treatment furnace and reinforcing fiber fastening method
04/24/2014WO2014061413A1 Contamination amount measuring method for vapor phase epitaxy device, and manufacturing method for epitaxial wafer
04/24/2014WO2014060864A1 Precursors for metal organic chemical vapor deposition process (mocvd) and use thereof
04/24/2014WO2014060414A1 Coated cutting tool with patterned surface area
04/24/2014WO2014059618A1 Graphic formation via material ablation
04/24/2014US20140113457 Plasma enhanced atomic layer deposition with pulsed plasma exposure
04/24/2014US20140113453 Tungsten carbide coated metal component of a plasma reactor chamber and method of coating
04/24/2014US20140113436 Method of depositing a film and film deposition apparatus
04/24/2014US20140113146 Coated Metallic Parts and Method of Making The Same
04/24/2014US20140113084 Showerhead designs of a hot wire chemical vapor deposition (hwcvd) chamber
04/24/2014US20140113074 Method for synthesis of large area thin films
04/24/2014US20140112824 Deposition Of Films Comprising Aluminum Alloys With High Aluminum Content
04/24/2014US20140112739 Substrate processing apparatus, purging apparatus, method of manufacturing semiconductor device, and recording medium
04/24/2014US20140109832 Deposition apparatus
04/24/2014US20140109831 Vapor deposition method and vapor deposition apparatus
04/24/2014US20140109829 Linear evaporation source and vacuum deposition apparatus including the same
04/24/2014DE102012110131A1 Verbundmaterial für ein pharmazeutisches Packmittel, Verfahren zu dessen Herstellung und Verwendung des Verbundmaterials A composite material for a pharmaceutical packaging material, process for its preparation and use of the composite material
04/24/2014DE102012110125A1 Vorrichtung zum Behandeln von Substraten mit einer auswechselbaren Deckenplatte sowie Verfahren zum Auswechseln einer derartigen Deckenplatte An apparatus for treating substrates with a replaceable ceiling plate as well as methods for replacement of such a ceiling plate
04/23/2014EP2722416A1 Coated cemented carbide cutting tool with patterned surface area
04/23/2014EP2722413A1 A method of manufacturing a multilayer semiconductor element, and a semiconductor element manufactured as such
04/23/2014EP2721353A1 Solar selective absorber based on double nitride composite material and process for its preparation
04/23/2014EP2721196A1 Germanium containing coating for inner surfaces of cylinder liners
04/23/2014EP2721193A1 Method and device for manufacturing a barrier layer on a flexible substrate
04/23/2014EP2721192A1 Method for the plasma treatment of workpieces and workpiece with a gas barrier layer
04/23/2014EP2721191A2 Chemical vapor infiltration apparatus and process
04/23/2014CN203559128U Heating device of flowing flexible substrate under vacuum environment
04/23/2014CN203559127U Concentric-ring multiple-gas-independent-channel spray structure
04/23/2014CN203559126U Four-region multiple-gas-independent-channel spray structure
04/23/2014CN203559125U Spraying structure of vortex-shaped line-type multi-gas independent channel
04/23/2014CN203559124U Spray structure with criss-cross groove type multi-gas independent channels
04/23/2014CN203559123U Spraying structure of wave-type multi-gas independent channel
04/23/2014CN203559122U Spraying structure for interlaced hole type multi-gas independent channel
04/23/2014CN203559121U Device for depositing diamond film on inner hole of micropore wiredrawing mould
04/23/2014CN103748972A Projected plasma source
04/23/2014CN103748971A Dual phase cleaning chambers and assemblies comprising the same
04/23/2014CN103748668A Apparatus, method and program for manufacturing nitride film
04/23/2014CN103748265A Grain boundary engineered alpha-alumina coated cutting tool
04/23/2014CN103748264A Method for producing a coating on an extrusion die
04/23/2014CN103748263A Deposition system having access gates and related method
04/23/2014CN103748262A Direct liquid injection for halide vapor phase epitaxy systems and methods
04/23/2014CN103748261A Product having traceability displayed thereon and method for displaying traceability of product
04/23/2014CN103748260A Methods of dechucking and system thereof
04/23/2014CN103748255A Protection of edge exclusion mask shielding
04/23/2014CN103746005A Dual-layer SiN antireflection film and preparing method thereof
04/23/2014CN103741121A Double-sided coating device for soft base material
04/23/2014CN103741120A Electrode structure of PECVD (Plasma Enhanced Chemical Vapor Deposition) coating film device
04/23/2014CN103741119A Niobium and vanadium organometallic precursors for thin film deposition
04/23/2014CN103741118A Preparation method of colorful silver product
04/23/2014CN103741117A Cutting tool coating for low-speed and heavy-duty turning steel and stainless steel
04/23/2014CN103741116A Diamond net and application of diamond net in separating oil-water mixture and transferring liquid drops
04/23/2014CN103741115A Preparation process of automobile aluminum wheel hub blade with diamond film coating
04/23/2014CN103741114A Preparation method of milling cutter with diamond coating for processing pure titanium porcelain teeth and zirconium dioxide false teeth
04/23/2014CN103741113A Preparation method of nano carbon fiber film
04/23/2014CN103741112A Microwave plasma device for preparing large-area solar battery piece silicon film
04/23/2014CN102677020B Bilayer coating device of crystalline silicon solar cell
04/23/2014CN102666915B CVD apparatus with electrode
04/23/2014CN102428028B Support cone for silicon seed bars
04/23/2014CN102353696B Method for manufacture and coating of nanostructured components
04/23/2014CN102260859B Method of producing coated member
04/23/2014CN102108498B Chemical vapor deposition (CVD) equipment
04/23/2014CN102101371B Method for bonding objects
04/22/2014US8703638 Process for production and use of carbonitride mixture particles or oxycarbonitride mixture particles
04/22/2014US8703586 Apparatus for forming deposited film and method for forming deposited film
04/22/2014US8703250 Method for manufacturing a porous synthetic diamond material
04/22/2014US8703248 Polycrystalline silicon reactor
04/22/2014US8703245 Coated cutting tool, cutting member or wear part
04/22/2014US8703237 Methods of forming a material layer and methods of fabricating a memory device
04/22/2014US8702903 Thermally conductive sheet and substrate mounting device including same
04/22/2014US8702867 Gas distribution plate and substrate treating apparatus including the same
04/22/2014US8702866 Showerhead electrode assembly with gas flow modification for extended electrode life
04/22/2014US8701593 Gas supply system, substrate processing apparatus and gas supply method
04/17/2014WO2014059227A2 Coating apparatus
04/17/2014WO2014059226A1 Chemical vapor deposition of wear resistant coatings onto piston ring running face, side face, and inner diameter in one coating run
04/17/2014WO2014059012A1 Process for the internal coating of hollow bodies
04/17/2014WO2014058290A1 Coating having solar control properties for a substrate, and method and system for depositing said coating on the substrate
04/17/2014WO2014057836A1 Film-forming apparatus
04/17/2014WO2014057005A1 Method for the surface treatment of coatings of hard carbon that are formed on substrates
04/17/2014WO2014056968A1 Apparatus and method for applying surface coatings
04/17/2014WO2013181521A9 Source reagent-based delivery of fluid with high material flux for batch deposition
04/17/2014US20140106571 Biasing system for a plasma processing apparatus
04/17/2014US20140106478 Slit valve unit and film forming apparatus having the same
04/17/2014US20140106088 Method for obtaining a substrate provided with a coating
04/17/2014US20140106083 Tungsten growth modulation by controlling surface composition
04/17/2014US20140106071 Group 5 cyclopentadienyl transition metal-containing precursors for deposition of group 5 transition metal-cointaining films
04/17/2014US20140106070 VAPOR DEPOSITION OF LiF THIN FILMS
04/17/2014US20140106062 Method of monitoring photoactive organic molecules in-situ during gas-phase deposition of the photoactive organic molecules
04/17/2014US20140102605 Layered reactive particles with controlled geometries, energies, and reactivities, and methods for making the same
04/17/2014US20140102599 Chemical vapor deposition of wear resistant coatings onto piston ring running face, side face, and inner diameter in one coating run
04/17/2014US20140102371 Compact organic vapor jet printing print head
04/17/2014US20140102368 Gas isolation chamber and plasma deposition apparatus thereof
04/17/2014US20140102367 Plasma processing device
04/17/2014US20140102365 Nitrogen-Containing Ligands And Their Use In Atomic Layer Deposition Methods
04/17/2014US20140102364 Coating apparatus
04/17/2014DE102012109830A1 Load lock chamber of a vacuum treatment system useful for treating substrates in continuous process, comprises chamber wall-forming chamber container interconnected to a chamber lid which is intended for substrate transport
04/17/2014DE102012109112A1 Manufacturing semiconductor component, comprises e.g. providing three-dimensional substrate body with first closed substrate surface, applying film-forming starting material on body, and forming layer sequence having semiconductor material
04/16/2014EP2720518A2 Plasma-generating source comprising a belt-type magnet, and thin-film deposition system using same
04/16/2014EP2719795A1 Zinc oxide precursor and method of depositing zinc oxide-based thin film using the same
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