| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 06/04/2014 | CN103834933A Laser photoinduced chemical vapor reaction device for preparing alpha-SiO film by using laser |
| 06/04/2014 | CN103834932A low pressure chemical vapor deposition (LPCVD) processing equipment |
| 06/04/2014 | CN103834931A Equipment for carrying out chemical vapor deposition process |
| 06/04/2014 | CN103834930A Clamp and process used for coating inner bore with diamond film |
| 06/04/2014 | CN103834929A Carbide coating containing hafnium and preparation method of carbide coating |
| 06/04/2014 | CN103834928A Body coated with hard material |
| 06/04/2014 | CN102569509B Carbon plate conveying assembly and disassembly platform of feeding and discharging systems of plate-type plasma enhanced chemical vapor deposition (PECVD) device |
| 06/04/2014 | CN102560416B Method for growing carbon-containing thin film on wafer |
| 06/04/2014 | CN102560413B Diamond-like carbon and production method thereof |
| 06/04/2014 | CN102422445B Epitaxial wafer for light emitting diode |
| 06/04/2014 | CN102358940B Method for depositing anti-corrosion diamond-like film on object substrate |
| 06/04/2014 | CN102163530B Plasma processing apparatus |
| 06/04/2014 | CN102011105B Process for depositing silica at low pressure |
| 06/03/2014 | US8742337 Ion source with surface coating |
| 06/03/2014 | US8742153 Ruthenium complex mixture, method of producing the same, composition for film formation, ruthenium-containing film, and method of producing the same |
| 06/03/2014 | US8741800 Hydrothermal performance of catalyst supports |
| 06/03/2014 | US8741779 Plasma processing apparatus and plasma processing method |
| 06/03/2014 | US8741428 Surface-coated cutting tool and manufacturing method thereof |
| 06/03/2014 | US8741386 Atomic layer deposition of quaternary chalcogenides |
| 06/03/2014 | US8741385 Thermalization of gaseous precursors in CVD reactors |
| 06/03/2014 | US8741098 Table for use in plasma processing system and plasma processing system |
| 06/03/2014 | US8741097 Plasma processing apparatus and plasma processing method |
| 06/03/2014 | US8741096 Apparatus for semiconductor processing |
| 06/03/2014 | US8741095 Plasma processing apparatus, plasma processing method, and computer readable storage medium |
| 06/03/2014 | US8741065 Substrate processing apparatus |
| 06/03/2014 | US8741064 Heat treatment method and heat treatment apparatus |
| 06/03/2014 | US8741063 Substrate processing apparatus and method of manufacturing semiconductor device |
| 06/03/2014 | US8741062 Apparatus and methods for deposition reactors |
| 06/03/2014 | US8739732 Plasma treatment container internal member, and plasma treatment apparatus having the plasma treatment container internal member |
| 06/03/2014 | CA2607202C High colour diamond layer |
| 05/30/2014 | WO2014081654A1 Fixed cutter drill bit cutter elements including hard cutting tables made from cvd synthetic diamonds |
| 05/30/2014 | WO2014081638A1 Hydrophobic encapsulation material with alternating layers |
| 05/30/2014 | WO2014081604A1 Polycrystalline silicon thick films for photovoltaic devices or the like, and methods of making same |
| 05/30/2014 | WO2014081030A1 Method for forming thin film |
| 05/30/2014 | WO2014080936A1 Method for processing transparent conductive film |
| 05/30/2014 | WO2014080785A1 Method for manufacturing semiconductor device, substrate processing device, and recording medium |
| 05/30/2014 | WO2014080601A1 Plasma cvd device |
| 05/30/2014 | WO2014080566A1 Semiconductor manufacturing apparatus, semiconductor device, and semiconductor device manufacturing method |
| 05/30/2014 | WO2014080080A1 Method for fabricating a passivation film on a crystalline silicon surface |
| 05/30/2014 | WO2014080067A1 Substrate loading in an ald reactor |
| 05/29/2014 | US20140147751 Silicon-carbon Composite Anode Material for Lithium Ion Batteries and A Preparation Method Thereof |
| 05/29/2014 | US20140147591 Film deposition method, storage medium, and film deposition apparatus |
| 05/29/2014 | US20140147590 Method for producing a coating on an extrusion die |
| 05/29/2014 | US20140147589 Method of reducing tungsten film roughness and resistivity |
| 05/29/2014 | US20140144681 Adhesive metal nitride on glass and related methods |
| 05/29/2014 | US20140144383 Vacuum deposition apparatus |
| 05/29/2014 | US20140144382 Plasma apparatus |
| 05/29/2014 | US20140144380 Gas supply pipes and chemical vapor deposition apparatus |
| 05/29/2014 | US20140144377 Substrate and mask attachment clamp device |
| 05/28/2014 | EP2735630A1 Sic epitaxial wafer and method for producing same, and device for producing sic epitaxial wafer |
| 05/28/2014 | EP2735625A1 A device for manufacturing a film used for a solar cell |
| 05/28/2014 | EP2735624A1 Metal with diamond-like carbon film, and method for forming diamond-like carbon film |
| 05/28/2014 | EP2735544A2 A reactor designed for chemical vapor deposition method and method of producing elemental boron and advanced ceramic powders with this reactor |
| 05/28/2014 | EP2735367A2 Photocatalyst material producing method and photocatalyst material producing apparatus |
| 05/28/2014 | EP2734533A2 Heteroleptic pyrrolecarbaldimine precursors |
| 05/28/2014 | DE102012111484A1 Vorrichtung und Verfahren zum Bearbeiten streifenförmiger Substrate Apparatus and method for processing strip-shaped substrates |
| 05/28/2014 | DE102012111338A1 Coating a disk-shaped substrate, comprises arranging a disk-shaped substrate in substrate holder of carrier, and introducing the carrier with the substrate into a coating apparatus, where front side of substrate is coated by apparatus |
| 05/28/2014 | DE10083665B3 Kombination einer Zylinderlaufbuchse und eines Kolbenringes in einer Brennkraftmaschine Combination of a cylinder liner and a piston ring in an internal combustion engine |
| 05/28/2014 | CN203613262U 浮动电位阳极辉光发射装置 Floating potential of the anode glow emitting device |
| 05/28/2014 | CN203613261U 一种机械式自转mocvd副衬托盘 A mechanical rotation mocvd vice foil tray |
| 05/28/2014 | CN203613260U 解离装置及具有该解离装置的钨金属化学气相沉积设备 Dissociation means having a tungsten metal and chemical vapor deposition apparatus of the dissociated device |
| 05/28/2014 | CN103827701A 包括具有稳定组成的氮氧化物覆盖层的euv反射镜、euv光刻设备和操作方法 Includes a cover layer having a nitrogen oxides consisting of a stable euv mirror, euv lithographic apparatus and method of operation |
| 05/28/2014 | CN103827350A 混合金属氧化物阻挡膜和用于制备混合金属氧化物阻挡膜的原子层沉积方法 Atomic layer deposition process mixed metal oxides for the preparation of the barrier film and the mixed metal oxide barrier film, |
| 05/28/2014 | CN103827030A 通过化学气相沉积生产硅的反应器和方法 The production of silicon by chemical vapor deposition reactor and method |
| 05/28/2014 | CN103826781A 被覆切削工具 Coated cutting tool |
| 05/28/2014 | CN103824795A 一种石墨舟预处理替代片及石墨舟预处理方法 Graphite and graphite sheet boat boat pretreatment alternative pretreatment method |
| 05/28/2014 | CN103820792A 一种锌合金的表面处理方法 A method of surface treatment of zinc alloy |
| 05/28/2014 | CN103820772A 去除pecvd装置的电荷的系统及其控制方法 Charge removing pecvd apparatus system and control method |
| 05/28/2014 | CN103820771A 一种制备GaAs薄膜材料的方法 A method for preparing a GaAs thin film materials |
| 05/28/2014 | CN103820770A 具有多个子反应器结构的金属有机化学气相沉积设备 Metal organic chemical vapor deposition apparatus having a plurality of sub-reactor configuration |
| 05/28/2014 | CN103820769A 一种反应腔室和mocvd设备 As a reaction chamber and mocvd equipment |
| 05/28/2014 | CN103820768A 4H-SiC衬底上同质快速外延生长4H-SiC外延层的方法 Homogeneous on a 4H-SiC substrate rapid epitaxial growth of 4H-SiC epitaxial layer method |
| 05/28/2014 | CN103820767A 一种改善多晶硅薄膜质量的前处理工艺 A method for improving the quality of polysilicon thin pre-treatment process |
| 05/28/2014 | CN102796993B Cvd设备和该cvd设备的控制方法 Cvd apparatus and method for controlling the cvd equipment |
| 05/28/2014 | CN102796992B 反应腔装置及具有其的基片处理设备 Apparatus having a reaction chamber and a substrate processing apparatus thereof |
| 05/28/2014 | CN102485937B 薄膜图案的沉积装置与方法 Apparatus and method for depositing thin film pattern |
| 05/28/2014 | CN102344460B 使用脒基金属的原子层沉积 Using atomic layer deposition amidine base metal |
| 05/28/2014 | CN102119238B 沉积含过渡金属的膜的方法 Depositing a transition metal-containing film |
| 05/28/2014 | CN102046841B 用于电子器件或其他物品上的涂层中的混合层 Electronic devices or coatings on other articles used in the mixed layer |
| 05/28/2014 | CN101896638B 基于钛、锆和铪前体形成高k介电膜的方法及其在半导体制造中的用途 Method based on titanium, zirconium and hafnium precursor to form a high k dielectric films and their use in semiconductor manufacturing |
| 05/27/2014 | US8735716 Solar cell and method for fabricating the same |
| 05/27/2014 | US8734957 Metal plating using seed film |
| 05/27/2014 | US8734914 Film formation method and method for manufacturing light-emitting device |
| 05/27/2014 | US8734913 Formation method of coating |
| 05/27/2014 | US8734903 Process for forming a silica coating on a glass substrate |
| 05/27/2014 | US8734902 Precursors and methods for the atomic layer deposition of manganese |
| 05/27/2014 | US8734901 Film deposition method and apparatus |
| 05/27/2014 | US8733282 Plasma processing apparatus |
| 05/27/2014 | US8733281 Plasma processing apparatus |
| 05/27/2014 | US8733280 Showerhead for processing chamber |
| 05/27/2014 | US8733279 PECVD process chamber backing plate reinforcement |
| 05/27/2014 | CA2560834C Tailored and uniform coatings in microchannel apparatus |
| 05/22/2014 | WO2014078393A1 Capacitively coupled plasma equipment with uniform plasma density |
| 05/22/2014 | WO2014078313A1 Nanoparticle implantation in medical devices |
| 05/22/2014 | WO2014077563A1 Vapour-deposition device having mobile vapour-deposition source |
| 05/22/2014 | WO2014077209A1 Semiconductor device and method for manufacturing same |
| 05/22/2014 | WO2014077089A1 Metal alkoxide compound, thin film-forming starting material, method for producing thin film, and alcohol compound |
| 05/22/2014 | WO2014077073A1 Method for producing thin film containing molybdenum, thin film-forming starting material, and molybdenum imide compound |
| 05/22/2014 | WO2014077039A1 Method for manufacturing silicon carbide semiconductor device |
| 05/22/2014 | WO2014076945A1 Production method for semiconductor epitaxial wafer, semiconductor epitaxial wafer, and production method for solid-state imaging element |