Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes
Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/2014
06/18/2014EP2742166A1 Adjustable mask
06/18/2014DE112011105618T5 Oxidfilm-Niederschlagsverfahren und Oxidfilm-Niederschlagsvorrichtung Oxide film deposition method and oxide film deposition apparatus
06/18/2014DE102012112550A1 Verfahren zur Metallisierung eines Werkstücks sowie ein Schichtaufbau aus einem Werkstück und einer Metallschicht A process for the metallization of a workpiece as well as a layer structure of a workpiece and a metal layer
06/18/2014DE102010020074B4 Zerspanwerkzeug und Verfahren zum Zerspanen gehärteter Werkstoffe Cutting tool and method for machining of hardened materials
06/18/2014CN203659907U 一种pecvd石英管锁扣保护罩 One kind pecvd quartz tube lock shield
06/18/2014CN203653698U 一种真空反应设备 A vacuum response equipment
06/18/2014CN203653697U 一种pecvd系统 One kind pecvd system
06/18/2014CN203653696U 软基材双面镀膜装置 Soft-sided coating device substrate
06/18/2014CN203653695U Pecvd镀膜装置 Pecvd coating device
06/18/2014CN203653694U Pecvd镀膜装置的电极结构 Electrode structure Pecvd coating device
06/18/2014CN203653693U 化学气相沉积设备的工件装卡工具 Workpiece chucking tools chemical vapor deposition equipment
06/18/2014CN203653692U 一种微波等离子体化学气相沉积装置 A microwave plasma chemical vapor deposition apparatus
06/18/2014CN203653691U 一种微波等离子体化学气相沉积装置 A microwave plasma chemical vapor deposition apparatus
06/18/2014CN203653690U 喷淋头 Sprinkler
06/18/2014CN203653689U 进气装置 Intake device
06/18/2014CN203653688U 一种mocvd设备尾气管路结构 One kind of equipment exhaust pipe structure mocvd
06/18/2014CN103875077A Insulating film and production method for same
06/18/2014CN103874783A Method and apparatus for depositing atomic layers on a substrate
06/18/2014CN103874782A Diamond-like carbon
06/18/2014CN103874781A Cobalt-film-forming method, cobalt-film-forming material, and novel compound
06/18/2014CN103874780A Drill having a coating
06/18/2014CN103874705A Raw material for chemical vapor deposition which comprises organic platinum compound, and chemical vapor deposition method using said raw material for chemical vapor deposition
06/18/2014CN103871866A Thin film forming method and thin film forming apparatus
06/18/2014CN103871819A Large-size chamber for forming HJT of high uniformity
06/18/2014CN103866297A Film formation device, substrate processing device, and film formation method
06/18/2014CN103866296A Plasma processing equipment and lower electrode mechanism of the equipment
06/18/2014CN103866295A Apparatus used for reaction chamber substrate heating and transmission
06/18/2014CN103866294A Film coating gas charging device
06/18/2014CN103866293A Atomic layer deposition device
06/18/2014CN103866292A Atomic layer deposition device
06/18/2014CN103866291A Corrosion-resistant pneumatic spray head and manufacture method thereof
06/18/2014CN103866290A PECVD device, method for preparing irregular surface film by adopting PECVD device and application of PECVD device
06/18/2014CN103866289A Preparation method for P-N co-doped zinc oxide film
06/18/2014CN103866288A Reaction unit and method for atom layer film deposition
06/18/2014CN103866287A Atomic layer deposition apparatus
06/18/2014CN103866286A Component used inside semiconductor substrate reaction chamber and manufacturing method thereof
06/18/2014CN103866285A Method for preparing thin film by utilizing atomic layer deposition
06/18/2014CN103866284A Preparation method of zinc oxide thin film
06/18/2014CN103866283A LPCVD system and technology thereof
06/18/2014CN103866282A PECVD apparatus
06/18/2014CN103866281A Plasma enhanced chemical vapor deposition equipment
06/18/2014CN103866280A Method for preparing donor-acceptor codoped zinc oxide film through atomic layer deposition
06/18/2014CN103866279A Method for preparing N-As-codoped zinc oxide film through atomic layer deposition
06/18/2014CN103866278A Method for increasing number of atomic layer deposition precursors
06/18/2014CN103866277A Method for preparing double-acceptor co-doped zinc oxide thin film through atomic layer deposition
06/18/2014CN103866276A Method for preparing co-doped zinc oxide thin film through atomic layer deposition
06/18/2014CN103866275A Preparation method for co-doped zinc oxide film through atomic layer deposition
06/18/2014CN103866274A Special device used for preparing wafer upper cladding
06/18/2014CN103866273A Method for preparing N-Zr-codoped zinc oxide film through atomic layer deposition
06/18/2014CN103866272A Method for improving P-type stability of zinc oxide film
06/18/2014CN103866271A Preparation method for donor-acceptor co-doping of zinc oxide thin film
06/18/2014CN103866270A Preparation method for Te-N co-doping of zinc oxide thin film
06/18/2014CN103866269A Method for preparing Te-N co-doped zinc oxide thin film through atomic layer deposition
06/18/2014CN103866268A Preparation method of donor-acceptor co-doped zinc oxide thin film based on nitrogen
06/18/2014CN103866267A Preparation method for N-Zr co-doping of zinc oxide thin film
06/18/2014CN103866266A Method for preparing low surface roughness zinc oxide film
06/18/2014CN103866265A Nitrogen-based preparation method for double-acceptor co-doped zinc oxide film
06/18/2014CN103866264A Phosphorus-doped zinc oxide film preparation method
06/18/2014CN103866263A Preparation method of zinc nitride thin film
06/18/2014CN103866262A Preparation method of stainless steel surface silanization treatment membrane
06/18/2014CN103866261A Deposition apparatus, method for forming thin film and method for manufacturing organic light emitting display apparatus
06/18/2014CN103866260A Coating method, coating device and coating generation system
06/18/2014CN103864008A Technological method for controlling deposition morphology of thin film by silicon chip serving as mask
06/18/2014CN102953050B Large-diameter sprayer of MOCVD (metal organic chemical vapor deposition) reactor
06/18/2014CN102725438B Deposition device
06/18/2014CN102650053B Manufacturing method for CVD (Chemical Vapor Deposition) diamond/diamond-like composite coating tool with complex shape
06/18/2014CN102644064B Evaporator based on heat conduction oil evaporation mechanism
06/18/2014CN101959795B Thin film of metal silicon compound and process for producing the thin film of metal silicon compound
06/18/2014CN101849042B Apparatus for delivering precursor gases to an epitaxial growth substrate
06/17/2014US8755680 Edge ring for a thermal processing chamber
06/17/2014US8753988 Starting material for use in forming silicon oxide film and method for forming silicon oxide film using same
06/17/2014US8753718 Method for the deposition of a ruthenium-containing film
06/17/2014US8753717 Film forming method and film forming apparatus
06/17/2014US8753716 Method of depositing material using a deposition reactor
06/17/2014US8753710 Coating method
06/17/2014US8753475 Plasma processing apparatus
06/17/2014US8753474 Method and apparatus for high efficiency gas dissociation in inductive couple plasma reactor
06/17/2014US8753449 Enhancement in UV curing efficiency using oxygen-doped purge for ultra low-K dielectric film
06/17/2014US8753448 Apparatus and method for manufacturing compound semiconductor, and compound semiconductor manufactured thereby
06/17/2014US8753447 Heat shield for heater in semiconductor processing apparatus
06/17/2014US8752503 Plasma processing device, plasma processing method, and plasma surface processing method
06/17/2014US8752502 Device for stabilization and visual monitoring of an elongated metallic strip in a transport direction along a predetermined transport path
06/17/2014CA2568449C Duplex gas phase coating
06/12/2014WO2014088302A1 Plasma chemical vapour deposition device
06/12/2014WO2014088108A1 Ruthenium complex and method for producing same, and method for producing ruthenium-containing thin film
06/12/2014WO2014088026A1 Substrate treatment device, substrate treatment method, semiconductor-device manufacturing method, and control program
06/12/2014WO2014087920A1 Film formation apparatus
06/12/2014WO2014087592A1 Feedstock gasification and supply device
06/12/2014WO2014086250A1 Graphite carrying plate for led epitaxial wafer process
06/12/2014US20140162132 Positive electrode active material and manufacturing method thereof, positive electrode, battery, battery pack, electronic device, electric vehicle, power storage device, and power system
06/12/2014US20140161990 Anti-Glare Glass/Substrate Via Novel Specific Combinations of Dry and Wet Processes
06/12/2014US20140161978 METHOD AND APPARATUS FOR FORMING C/SiC FUNCTIONALLY GRADED COATING
06/12/2014US20140161977 Synthesis and Characterization of First Row Transition Metal Complexes Containing alpha-keto Hydrazonate Ligands as Potential Precursors for Use in Metal Film Deposition
06/12/2014US20140161966 Monomer vaporizing device and method of controlling the same
06/12/2014US20140161706 Method and apparatus of forming metal compound film, and electronic product
06/12/2014US20140160650 Systems and methods for applying protective coatings to internal surfaces of fully assembled electronic devices
06/12/2014US20140158792 Temperature controlled showerhead
06/12/2014US20140158580 Alkoxysilylamine compounds and applications thereof
06/12/2014US20140158295 Erosion Resistant Wellbore Screen and Associated Methods of Manufacture
06/12/2014US20140158049 Process kit shield for plasma enhanced processing chamber
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