Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/1995
11/08/1995EP0519949B1 Platinum or palladium/cobalt multilayer on a zinc oxide or indium oxide layer for magneto-optical recording
11/08/1995CN1111388A Ferroelectric thin films and their preparation
11/08/1995CN1111217A Heat-treatment convertible coated glass and method of converting same
11/07/1995US5464710 Enhancement of optically variable images
11/07/1995US5464683 Hafnium oxynitride and silicon dioxide multilayer; windows
11/07/1995US5464674 Multilayer recording element with protective coatings over oxide layer
11/07/1995US5464661 Spray deposition a primer layer, basecoats layer, film polymer using liquid CO2 as a carrier and a solvent
11/07/1995US5464520 Silicide targets for sputtering and method of manufacturing the same
11/07/1995US5464518 Cylindrical magnetron shield structure
11/02/1995WO1995029505A1 Method and device for ion implantation
11/02/1995WO1995029272A1 Rectangular vacuum-arc plasma source
11/02/1995WO1995029271A1 Slide member and method of its production
11/02/1995WO1995029044A1 Amorphous diamond coating of blades
11/02/1995EP0679731A1 Material for sputtering target
11/02/1995EP0679730A1 Shield configuration for vacuum chamber
11/02/1995EP0679729A1 Process for preventing tarnishing of products
11/02/1995EP0679706A1 Metallized polyimide film containing a hydrocarbyl tin compound
11/02/1995DE4440521C1 Vorrichtung zum Beschichten von Substraten mit einem Materialdampf im Unterdruck oder Vakuum Apparatus for coating substrates with a material vapor in the vacuum or vacuum
11/02/1995CA2188799A1 Rectangular vacuum-arc plasma source
11/01/1995CN1111033A Vacuum treating apparatus
11/01/1995CN1110994A Sputtertarget for production of transparent conducting layer through cathode sputter
10/1995
10/31/1995US5462812 Fluorinated silicon nitride films
10/31/1995US5462809 Magnetic particles suspended in non-magnetic matrix having specified particle size
10/31/1995US5462776 Energizing fullerene molecule by passage over a hot filament causing fragmentation and ionization by electron attachment or emission, depositing on diamond substrate causing thicknes of diamond or diamond-like film on substrate surface
10/31/1995US5462771 Method of manufacturing electromagnetic wave shielding plastic molding
10/31/1995US5462602 Apparatus for continuous reactive metal deposition in vacuum with web looping over upper and lower rollers
10/31/1995CA1337483C Low emissivity film for high temperature processing
10/26/1995WO1995028508A1 Process and device for ion-supported vacuum coating
10/26/1995DE4441117C1 Verfahren zur Beschichtung von Substraten und Vorrichtung zur Durchführung des Verfahrens A process for coating substrates and apparatus for carrying out the method
10/26/1995DE4413378A1 Appts. for coating substrate with material
10/25/1995EP0678596A1 Metallic body with vapor-deposited treatment layer(s) and adhesion-promoting layer
10/25/1995EP0678591A1 Process for the production of an indium-tin oxide target
10/25/1995EP0678590A1 Anti-fretting coating
10/25/1995CN1110832A Vacuum plasma processing apparatus
10/25/1995CN1110632A Procedure for depositing thin layer on surface of plastic matrix
10/24/1995US5461203 Electronic package including lower water content polyimide film
10/24/1995US5460853 System and method for multilayer film production on tape substrate
10/24/1995US5460793 Silicide targets for sputtering and method of manufacturing the same
10/24/1995US5460708 Semiconductor processing system
10/24/1995US5460707 Etching or coating method and a plant therefor
10/24/1995US5460704 Method of depositing ferrite film
10/24/1995US5460703 Low thermal expansion clamping mechanism
10/23/1995CA2147334A1 Metallic body with vapor-deposited treatment layer(s) and adhesion-promoting layer
10/19/1995WO1995027996A1 Method for high energy implantation using a low or medium current implanter, and devices therefor
10/19/1995WO1995027806A1 Process to produce diamond films
10/19/1995WO1995027570A1 Selective plasma deposition
10/19/1995DE4413045A1 Sputter coating with non-metal films
10/19/1995CA2185217A1 Process to produce diamond films
10/18/1995EP0677595A1 Device for the vacuum-plasma treatment of articles
10/18/1995EP0677594A1 Metallized films and capacitors containing the same
10/18/1995EP0677593A1 Transparent conductive film, transparent conductive base material, and conductive material
10/18/1995EP0535019B1 Process and device for coating substrate material
10/18/1995CN1030090C Method for preparation of alloy microcrystalline coating
10/17/1995US5459326 Method for surface treatment with extra-low-speed ion beam
10/17/1995US5458985 Plastic substrate with minute pattern
10/17/1995US5458977 Electroluminescence device containing a thin film electrode
10/17/1995US5458928 Method of forming metal material film with controlled color characteristic
10/17/1995US5458759 Magnetron sputtering cathode apparatus
10/17/1995US5458754 Coating, electric arc
10/17/1995US5458753 Transparent conductive film consisting of zinc oxide and gallium
10/17/1995US5458697 Highly purified metal material and sputtering target using the same
10/17/1995US5458686 Pulsed laser passive filter deposition system
10/17/1995US5457896 Vacuum processing apparatus and operating method therefor
10/12/1995WO1995026935A1 Coating of substrates
10/12/1995WO1995026852A1 Process and device for coating a non-solderable surface with a solderable metallised layer
10/12/1995WO1995025827A3 Apparatus for coating substrates
10/12/1995CA2187231A1 Coating of substrates
10/11/1995EP0676791A1 Magnetron sputter source and the use thereof
10/11/1995EP0676772A1 X-ray windows
10/11/1995EP0676660A1 Optical compensator for improved gray scale performance in liquid crystal display
10/11/1995CN1029995C Wear-resistant coating for titanium-base material
10/10/1995US5456978 Reduced noise; sputtering a chromium sublayer containing carbon, oxygen or nitrogen interposed between substrate and chromium underlayer, and sputtered carbon, protective overcoat
10/10/1995US5456815 Having crystalline orientation, the content ratio determinated by an x-ray diffraction; uniformity distribution
10/10/1995US5456768 Polishing surface with abrasive grains of specified particle size to form work-strained layer, heat treating in atmosphere low in oxygen to form film mainly of chromium oxide with specified thickness and surface roughness
10/10/1995US5456756 Holding apparatus, a metal deposition system, and a wafer processing method which preserve topographical marks on a semiconductor wafer
10/05/1995WO1995026566A1 Sputtering target erosion profile control for collimated deposition
10/05/1995WO1995026547A2 Magneto-resistive device, and magnetic head comprising such a device
10/05/1995WO1995026426A1 Method and apparatus for coating inside surface of nuclear fuel rod cladding tubes
10/05/1995WO1995026425A1 An ion-assisted deposition process including reactive source gassification
10/05/1995DE19503178A1 Producing solderable metallising layer on non-solderable surface
10/05/1995CA2186505A1 Sputtering target erosion profile control for collimated deposition
10/04/1995EP0675524A1 Semiconductor wafer process chamber with susceptor back coating
10/04/1995EP0675211A1 Process for preparing high crystallinity oxide thin film
10/04/1995EP0675157A1 Primer for adhering conductive films to acrylic or polycarbonate substrates
10/04/1995EP0675078A2 Protective film material and magnetic head comprising a protective film made of the material
10/04/1995EP0674805A1 Process for carrying out stable low pressure discharge processes.
10/04/1995EP0674804A1 Metal vapour deposition unit.
10/04/1995CN1109628A Fe-M-C magentic film and method of producing the same
10/04/1995CN1109513A Multiple-gun dynamic mixing injection technology and its device
10/04/1995CN1109512A Vacuum sputtering apparatus
10/03/1995US5455197 Control of the crystal orientation dependent properties of a film deposited on a semiconductor wafer
10/03/1995US5455082 Reduced pressure processing system and reduced pressure processing method
10/03/1995US5455081 Introducing a starting material gas comprising hydrocarbon into Hall accelerator ion source, forming an ion beam; good adhesion to iron containing substrates
10/03/1995US5455061 Placing an electroconductive grid over the indicator layer, vapor depositing the indicator layer through the grid, analyzing
10/03/1995US5454920 Sputtering method and apparatus for optimum saturation magnetostriction
10/03/1995US5454919 Depositing different materials on a substrate
10/03/1995US5454886 Using radiation
10/03/1995US5454847 Vapor deposition method for depositing a film of fluorine-containing glass on a substrate
09/1995
09/30/1995CA2145712A1 Process for preparing high crystallinity oxide thin film
09/28/1995WO1995025828A1 Apparatus for coating substrates
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