Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
08/1995
08/23/1995CN2205832Y Large area controllable arc evaporation source
08/23/1995CN1029568C Large-current multi-arc spots controlled vacuum electric arc evaporation source
08/22/1995US5444259 Plasma processing apparatus
08/22/1995US5443915 Biaxially oriented polypropylene metallized white film for cold seal applications
08/22/1995US5443685 Surface treating substrate by applying erodible material and exposing to radiation to cause energy variations that result in angular tapers; etching
08/17/1995WO1995021948A1 Hollow containers with inert or impermeable inner surface through plasma-assisted deposition of a primarily inorganic substance
08/17/1995DE4404607A1 Method of structured electrolytic deposition of materials
08/17/1995DE4401718C1 Method and appts. for treatment of workpieces in a vacuum atmosphere
08/16/1995EP0667383A2 Multi-source reactive deposition process for the preparation of blue light emitting phosphor layers for AC TFEL devices
08/16/1995EP0666934A1 Plasma-assisted reactive electron-jet vaporisation process.
08/16/1995EP0666933A1 Device for plasma-supported electron beam high-rate vapour deposiition.
08/16/1995EP0514384B1 Device for treating substrates in a gas-based plasma produced by microwaves
08/16/1995CN2205392Y Ion coating machine with multiple evaporation ionizing source
08/16/1995CN1106947A Surveillance marker and method of making same
08/16/1995CN1029525C Adhesion method for cathode target of vacuum sputter system
08/15/1995US5442145 Metal core having gold covering layer and nickel underlay layer, for high strength bonding
08/15/1995US5441897 Method of fabricating high-efficiency Cu(In,Ga)(SeS)2 thin films for solar cells
08/15/1995US5441804 Magneto-optical recording medium and method for production thereof
08/15/1995US5441624 Triggered vacuum anodic arc
08/15/1995US5441623 Sputtering apparatus for making high temperature superconducting oxide films
08/15/1995US5441617 Recovery system to minimize waste of depositing material
08/15/1995US5441615 Sputtering apparatus and method
08/15/1995US5441614 Method and apparatus for planar magnetron sputtering
08/15/1995US5441577 Thin film solar cell and production method therefor
08/15/1995US5441013 Method for growing continuous diamond films
08/15/1995US5441010 Evaporation material and method of preparing the same
08/10/1995WO1995021276A1 Method and apparatus for coating a substrate
08/09/1995EP0666337A1 Method and apparatus for measuring the deposition rate of opaque films
08/09/1995EP0666336A1 High melting point metallic silicide target and method for producing the same, high melting point metallic silicide film and semiconductor device
08/08/1995US5439876 Method of making artificial layered high Tc superconductors
08/08/1995US5439729 Transfer metallizing film and sheet
08/08/1995US5439575 Positioning substrate in deposition chamber, independently controlling sputtering sources of copper and indium, providing selenium evaporation source, producing alloy layer on substrate
08/08/1995US5439574 Method for successive formation of thin films
08/08/1995US5439525 Device for coating hollow workpieces by gas diffusion
08/08/1995US5439522 Device for locking a flat, preferably discoid substrate onto the substrate plate of a vacuum coating apparatus
08/08/1995US5439500 Magneto-optical alloy sputter targets
08/08/1995CA1336557C Superconducting thin film and a process for depositing the same
08/08/1995CA1336556C Superconducting thin film and a process for depositing the same
08/08/1995CA1336549C Metal and metallic alloy coating material
08/03/1995WO1995020823A1 Methods for improving semiconductor processing
08/03/1995DE4402988A1 Improving endurance of cutting, drilling and milling tools
08/03/1995DE4402471A1 Filament carrier for continuous vapour coating
08/02/1995EP0665577A1 Method and apparatus for monitoring the deposition rate of films during physical vapour deposition
08/02/1995EP0665563A1 Metallized polyester film capacitor
08/02/1995EP0665306A1 Apparatus and method for igniting plasma in a process module
08/02/1995EP0665304A1 Method of manufacturing a tube having a film on its inner peripheral surface and apparatus for manufacturing the same
08/02/1995EP0665303A1 Method of producing a microporous, gas permeable electrode structure and a microporous, gas permeable electrode structure
08/02/1995EP0665193A2 Substrate handling and processing system for flat panel displays
08/02/1995EP0664927A1 Process for making thin films by pulsed excimer laser evaporation.
08/02/1995EP0664839A1 Process and arrangement for stabilising an electron-beam vaporisation process.
08/02/1995EP0632929A4 Producing magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions.
08/02/1995EP0487656B1 Charge neutralization apparatus for ion implantation system
08/02/1995CN1106073A Preparation for applying metall through surface structurization
08/01/1995US5437931 Metallic reflective layer with multilayer stack on each surface, each having protective layer, semitransparent metal layer, color presenting layer, deposited on flexible substrate having neutral detergent release layer
08/01/1995US5437778 Slotted cylindrical hollow cathode/magnetron sputtering device
08/01/1995US5437757 Clamp ring for domed pedestal in wafer processing chamber
08/01/1995US5437729 Controlled removal of ceramic surfaces with combination of ions implantation and ultrasonic energy
08/01/1995US5437725 Device for the continuous coating of a metallic material in motion with a polymer deposition having a composition gradient
07/1995
07/27/1995WO1995020253A2 Using lasers to fabricate coatings on substrates
07/27/1995WO1995020060A1 Silicon carbide sputtering target
07/27/1995WO1995019884A1 Surface treatment of ceramic articles
07/27/1995WO1995019852A1 Surface treatment of magnetic recording heads
07/27/1995DE4443440A1 Erosion and cavitation wear protection layer
07/27/1995DE4438323C1 Recycling of used indium-tin oxide sputtering target material
07/27/1995CA2181440A1 Using lasers to fabricate coatings on substrates
07/27/1995CA2180665A1 Silicon carbide sputtering target
07/26/1995EP0664344A1 Process for barrier coating of plastic objects
07/26/1995EP0663963A1 Improvements in the method and apparatus of vacuum deposition
07/26/1995EP0547048B1 Heater for an effusion cell
07/26/1995CN2203979Y Equipment for coating by ion sputtering
07/26/1995CN1105712A Durable sputtered metal oxide coating
07/25/1995US5436204 Recrystallization method to selenization of thin-film Cu(In,Ga)Se2 for semiconductor device applications
07/25/1995US5436035 Coating a substrate surface with a permeation barrier
07/25/1995US5435965 Inserting a cylinder backing into a mold, filling a target and isostatic pressing
07/25/1995US5435900 Apparatus for application of coatings in vacuum
07/25/1995US5435826 Indium tin oxide
07/19/1995EP0663458A1 Deposition film, method of measuring shape of deposition film, method of controlling manufacturing processes, manufacturing method, shape measuring apparatus and apparatus for controlling manufacturing processes
07/19/1995EP0663457A1 System for depositing material on a substrate
07/19/1995EP0663456A1 Method of producing coated particles
07/19/1995EP0663019A1 Topographically precise thin film coating system
07/19/1995EP0662025A4 Titanium-nitride and titanium-carbide coated grinding tools and method therefor.
07/19/1995EP0527859B1 Apparatus for-plasma treatment of continuous material
07/18/1995US5434363 Multilayer printed circuits with protective layers and tantalum wires
07/18/1995US5434024 Three-dimensional plastic substrate, lithium secondary cell
07/18/1995US5434014 Magnetic recording medium and method of manufacturing same
07/18/1995US5434008 Thin gas barrier films
07/18/1995US5433974 Boron nitride
07/18/1995US5433901 Indium tin oxide with oxide sintering aid formed by slurrying and heat treatment
07/18/1995US5433836 Arc source macroparticle filter
07/18/1995US5433835 Sputtering device and target with cover to hold cooling fluid
07/18/1995US5433813 Semiconductor device manufacturing apparatus
07/18/1995US5433812 Apparatus for enhanced inductive coupling to plasmas with reduced sputter contamination
07/18/1995US5433780 Vacuum processing apparatus and exhaust system that prevents particle contamination
07/18/1995US5433258 Gettering of particles during plasma processing
07/13/1995WO1995018878A1 Flexible, corrosion-resistant coated aluminium-based strip_______
07/13/1995WO1995018637A1 Catheter having a long-lasting antimicrobial surface treatment
07/13/1995DE4412906C1 Ion-assisted vacuum coating
07/13/1995CA2180481A1 Flexible, corrosion-resistant coated aluminium-based strip_______
07/12/1995EP0662526A1 A method for enhancing aluminum nitride
07/12/1995EP0662161A1 Tool for working the surfaces of components, and a substrate material for such a tool.