Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
06/1996
06/13/1996DE19539961C1 Method for thermal evaporation of electrically conductive materials
06/13/1996DE19516233C1 Vaporiser boat used in PVD techniques
06/13/1996DE19515172C1 Depositing coloured layers onto substrates
06/13/1996CA2206109A1 Sputtering apparatus having an on board service module
06/12/1996EP0716441A2 Substrate holding device and manufacturing method therefor
06/12/1996EP0716161A1 Apparatus for coating of optical substrate
06/12/1996EP0716160A1 Geometries and configurations for magnetron sputtering apparatus
06/12/1996EP0716159A1 Brazable articles
06/12/1996EP0666933B1 Device for plasma-supported electron beam high-rate vapour deposition
06/12/1996CN2228916Y Magneto-controlled sputtering - multi-arc multifunction vacuum plating apparatus
06/11/1996US5525805 Pulsed ion beam source
06/11/1996US5525420 Method for increasing the service life of tools and a wear protection-coated tool
06/11/1996US5525380 Method of making a device for converting infrared radiation
06/11/1996US5525369 Cooling and tensioning a composite of metal and polymeric material while depositing a metal from vapor phase
06/11/1996US5525199 Low pressure reactive magnetron sputtering apparatus and method
06/11/1996US5525158 Thin film deposition apparatus
06/06/1996WO1996017369A1 Process of metallizing phosphor screens
06/06/1996WO1996017225A2 Highly sensitive optical fiber cavity coating removal detection
06/06/1996WO1996017171A2 Getter pump module and system
06/06/1996WO1996017114A1 PROCESS FOR FORMING A FILM, ESPECIALLY OF LiNbO3, AND A COMPONENT CONTAINING SUCH A FILM
06/06/1996WO1996017101A1 A PROCESS FOR IN-SITU DEPOSITION OF A Ti/TiN BARRIER METAL STACK
06/06/1996CA2485918A1 Getter pump module and system
06/06/1996CA2206264A1 Getter pump module and system
06/05/1996EP0715336A2 Method and apparatus for planar magnetron sputtering
06/05/1996EP0715335A1 System for processing a workpiece in a plasma
06/05/1996EP0714997A1 Process for manufacturing layers of diamond doped with boron
06/05/1996EP0714996A1 A method for minimising thermal gradients in an object
06/05/1996EP0714454A1 Masking means and cleaning techniques for surfaces of substrates
06/05/1996DE4442885A1 Verfahren zur Bildung einer Schicht, insbesondere aus LiNbO¶3¶ sowie eine solche Schicht enthaltendes Bauelement A method for forming a layer, in particular of LiNbO¶3¶ and such a layer containing component
06/05/1996DE4442733A1 Evaporator for vacuum vapour coating strip e.g. with zinc@
06/05/1996DE19544123A1 Process for plasma coating articles
06/04/1996US5523955 System for characterizing AC properties of a processing plasma
06/04/1996US5523652 Microwave energized ion source for ion implantation
06/04/1996US5523166 High density tantalum, aluminum, silicon, titanium, barium, strontium, zirconium, yttrium, and/or hafnium oxide coating;defect-free, microelectronics
06/04/1996US5522976 Target comprising high melting inorganic compound interpenetrating support layer of metal foam or felt; large area, efficiency
06/04/1996US5522955 Process and apparatus for producing thin lithium coatings on electrically conductive foil for use in solid state rechargeable electrochemical cells
06/04/1996US5522535 Methods and structural combinations providing for backing plate reuse in sputter target/backing plate assemblies
05/1996
05/30/1996WO1996016531A1 An apparatus for generation of a linear arc discharge for plasma processing
05/30/1996WO1996016198A1 Apparatus for the relative vacuum deposition of a material on bulk parts
05/30/1996WO1996016197A1 Process for coating substrates and a device for carrying out said process
05/30/1996WO1996016196A2 Laser deposition of coatings
05/30/1996WO1996009622A3 Apparatus and method for sputtering carbon
05/29/1996EP0714122A1 Method for forming nitrogen-doped group ii-vi compound semiconductor film
05/29/1996EP0458991B1 Process for forming epitaxial film
05/29/1996EP0442939B1 Improved magnetron sputtering cathode
05/29/1996CN1123341A Gaseous ion film-plating method and device thereof
05/29/1996CN1123340A Surface treatment for precision metallic coupling moving parts
05/28/1996US5520966 Embedding ions such as molybdenum which alloy with the aluminum of the honeycomb
05/28/1996US5520851 Indium tin oxide on a substrate for radiation transparent multilayer element
05/28/1996US5520785 Annealing
05/28/1996US5520784 Ultrasonic enhancement of aluminum step coverage and apparatus
05/28/1996US5520664 Applying nonleaching metal
05/28/1996US5520501 Wafer holding apparatus
05/28/1996US5520142 Decompression container
05/28/1996US5520002 High speed pump for a processing vacuum chamber
05/23/1996WO1996015544A1 Device for coating substrates using a vapour phase material in a reduced pressure or vacuum environment
05/23/1996WO1996015284A1 Method of producing reactive element modified-aluminide diffusion coatings
05/23/1996WO1996015283A1 Method of bonding targets to backing plate member
05/23/1996WO1996014957A1 Backing plate reuse in sputter target/backing
05/23/1996WO1996014956A1 Bonding of targets to backing plate members
05/22/1996EP0713242A2 Device for suppressing arcing in cathode sputtering installations
05/22/1996EP0712942A1 Filmed substrate, and method and apparatus for producing the same
05/22/1996EP0712940A1 Durable thermal barrier coating
05/22/1996EP0712818A2 Article for use under high vacuum at high temperature
05/22/1996CN1122843A Coating of chromium and nitrogen having good wear resistance properties
05/22/1996CN1031837C Alternating electric field vacuum ion sedimentation and equipment thereof
05/21/1996US5519566 Method of manufacturing ferroelectric bismuth layered oxides
05/21/1996US5518967 Process for producing a semiconductor device capable of planarizing a metal film surface thereon
05/21/1996US5518807 Porous oxiding fluoropolymer, oxidizable metal layer
05/21/1996US5518780 Method of making hard, transparent amorphous hydrogenated boron nitride films
05/21/1996US5518771 Method and apparatus for subjecting a workpiece to elevated pressure
05/21/1996US5518599 Cross flow metalizing of compact discs
05/21/1996US5518597 Cathodic arc coating apparatus and method
05/21/1996US5518596 Procedure and apparatus for improving a plasma accelerator plating apparatus used for diamond plating
05/21/1996US5518594 Windows for automobiles and buildings, energy efficient, sputtering apparatus
05/21/1996US5518593 Shield configuration for vacuum chamber
05/21/1996US5518592 Seal cartridge for a rotatable magnetron
05/21/1996US5518548 Deposition barrier
05/21/1996US5518536 Alkaline earth metal-heptane dionate compounds
05/21/1996US5518432 Electroluminescence; manganese doped zinc sulfide
05/17/1996WO1996014653A2 Method and apparatus for reducing arcing in plasma processing chambers
05/17/1996WO1996014448A1 Method for depositing a hard protective coating
05/15/1996EP0711817A2 Water-repellent thin films and methods for the preparation thereof
05/15/1996EP0628090B1 A coated article
05/15/1996DE19514251C1 Sodium sensitive film field-effect sensor construction
05/15/1996CN2227136Y Convenient washing basin
05/14/1996US5516732 Wafer processing machine vacuum front end method and apparatus
05/14/1996US5516725 Contact alloy having capacity when in combination with a substrate compound to exist as a two phase binary equilibrium reciprocal system; sputtering; annealing
05/14/1996US5516555 Evaporation method for forming a gas barrier film having an organosilicon dispersed discontinuously in an inorganic matrix
05/14/1996US5516403 Reversing orientation of sputtering screen to avoid contamination
05/09/1996WO1996013688A1 Antireflection coating for a temperature sensitive substrate
05/09/1996WO1996013620A1 In situ getter pump system and method
05/09/1996DE4439924A1 Carbon@ cladding layer for electrostatic spraying
05/09/1996DE4439920A1 Depositing material on a substrate in a chamber by sublimation
05/09/1996DE4439841A1 Thin film with fine, even microstructure for ultrafiltration or catalytic membranes
05/09/1996DE19515882C1 Vacuum coating of disc-shaped substrates
05/09/1996DE19504088C1 Thin layer electrode for determining concentration of metal ions in solution
05/08/1996EP0710992A1 Superconducting metal oxide film and method of preparing same
05/08/1996EP0710977A1 Surface treatment method and system
05/08/1996EP0710830A2 In-process film thickness monitoring system