| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 12/31/2009 | US20090323189 Anti-Reflection Structure Body, Method Of Producing The Same And Method Of Producing Optical Member |
| 12/31/2009 | US20090321249 Method of Hard Coating a Blade |
| 12/31/2009 | US20090321248 Low damage sputtering system and method |
| 12/31/2009 | US20090321247 IONIZED PHYSICAL VAPOR DEPOSITION (iPVD) PROCESS |
| 12/31/2009 | US20090321246 Method of fabricating and apparatus of fabricating tunnel magnetic resistive element |
| 12/31/2009 | US20090320992 methods for manufacturing stressed material and shape memory material mems devices |
| 12/31/2009 | US20090320824 Arrangement for reflection of heat radiation, process of making same and uses of same |
| 12/31/2009 | US20090320747 Take-up type vacuum filming device |
| 12/31/2009 | DE112008000544T5 Schichtabscheidevorrichtung und Schichtabscheideverfahren Film deposition and layer deposition |
| 12/31/2009 | DE102009021330A1 Verfahren zum Verringern der Oberflächenrauhigkeit einer porösen Oberfläche A method for reducing the surface roughness of a porous surface |
| 12/31/2009 | DE102008030825A1 Vorrichtung zur Reflektion von Wärmestrahlung, ein Verfahren zu ihrer Herstellung sowie deren Verwendung Apparatus for reflection of heat radiation, a process for their preparation and their use |
| 12/30/2009 | WO2009157572A1 Method for producing transparent conductive film |
| 12/30/2009 | WO2009157571A1 Transparent conductive film and method for producing same |
| 12/30/2009 | WO2009157535A1 Sputtering target for oxide semiconductor, comprising ingao3(zno) crystal phase and process for producing the sputtering target |
| 12/30/2009 | WO2009157447A1 Substrate provided with transparent conductive film, thin film photoelectric conversion device and method for manufacturing the substrate |
| 12/30/2009 | WO2009157439A1 Sputtering apparatus and sputtering method |
| 12/30/2009 | WO2009157438A1 Cathode unit and spattering device having same |
| 12/30/2009 | WO2009157341A1 Sputtering device and recording medium whereon a control program thereof is recorded |
| 12/30/2009 | WO2009157228A1 Sputtering apparatus, sputtering method and light emitting element manufacturing method |
| 12/30/2009 | WO2009157186A1 Magnetic field generating apparatus and plasma processing apparatus |
| 12/30/2009 | WO2009157179A1 Method and apparatus for manufacturing a semiconductor having a wired structure |
| 12/30/2009 | WO2009156196A1 Processing system and method of operating a processing system |
| 12/30/2009 | WO2009156121A1 Arrangement for coating tape-shaped film substrates |
| 12/30/2009 | WO2009155677A1 Piston ring for internal combustion engine |
| 12/30/2009 | WO2009112388A3 Method for depositing a film onto a substrate |
| 12/30/2009 | EP2139010A1 Transparent thin board |
| 12/30/2009 | EP2138611A1 Polycrystalline thin film and method for producing the same and oxide superconductor |
| 12/30/2009 | EP2138603A1 Plasma generation equipment rendered electrically neutral on the periphery of plasma gun |
| 12/30/2009 | EP2138602A1 Hard coating and method for forming hard coating |
| 12/30/2009 | EP2137336A2 Method and arrangement for photon ablation of a target |
| 12/30/2009 | EP2137335A1 Fine control of vaporized organic material |
| 12/30/2009 | EP2137334A1 Droplet-free coating systems manufactured by arc-evaporation method |
| 12/30/2009 | EP1161309B1 A method for a repetitive ion beam processing with a by carbon containing ion beam |
| 12/30/2009 | CN201374876Y Electronic product shell |
| 12/30/2009 | CN201374309Y Device for scanning electron microscope or ion sputtering film coating and etching in vacuum equipment |
| 12/30/2009 | CN201374049Y 触控面板结构 Touch panel structure |
| 12/30/2009 | CN201372310Y Magnetic control sputtering film plating machine for large-scale complex-curved surface work pieces |
| 12/30/2009 | CN201372309Y Dual-cooling film coating roller suspended vacuum continue winding coater |
| 12/30/2009 | CN201372308Y Vacuum thermal evaporation equipment for manufacturing thin film with flexible substrate and large area |
| 12/30/2009 | CN201371616Y Polymerized plank fingerprint-resistant film used on cellphone protection screen |
| 12/30/2009 | CN101617064A A universal method for selective area growth of organic molecules by vapor deposition |
| 12/30/2009 | CN101613855A Non-equilibrium magnetron-sputtering rare-earth graphite composite film and preparation method thereof |
| 12/30/2009 | CN101613854A Non-equilibrium magnetron-sputtering rare-earth multivariate graphite composite film and preparation method thereof |
| 12/30/2009 | CN100576503C A method of preparation of an epitaxial substrate |
| 12/30/2009 | CN100576488C Wafer clamping device |
| 12/30/2009 | CN100576416C Configurable vacuum system and method |
| 12/30/2009 | CN100575990C Method for manufacturing multilevel micro-reflector by thickness adjusting and mixing method |
| 12/30/2009 | CN100575555C Composite ferroelectric film and low-temperature preparation method thereof |
| 12/30/2009 | CN100575543C Method for depositing silicon carbide high radiation coating on cobalt based high-temperature alloy surface |
| 12/30/2009 | CN100575542C Al-Ni-La system Al-based alloy sputtering target and process for producing the same |
| 12/30/2009 | CN100575541C Method for increasing metal magnetic multilayer film coercive force |
| 12/30/2009 | CN100575540C Batch preparation of double-faced high-temperature superconducting film device |
| 12/30/2009 | CN100575539C Method for producing indium-gallium-stibium polycrystalline film with multi-component coevaporation |
| 12/30/2009 | CN100575538C Belt shape substrate coating device and its collocating method |
| 12/30/2009 | CN100575537C Method for vaporizing material at a uniform rate |
| 12/30/2009 | CN100575536C Mixtures for evaporation of lithium |
| 12/30/2009 | CN100575290C Coated object |
| 12/30/2009 | CN100575068C Solar control coating |
| 12/29/2009 | US7638200 Tantalum, aluminum, silicon, nitrogen, oxygen, tungsten components are combined in powder form and pressure consolidated under heated conditions for time sufficient to form consolidated blend having actual density of greater than 95% of theoretical density; heater layers for ink jet printers |
| 12/29/2009 | US7638173 Method for operating an in-line coating installation |
| 12/29/2009 | US7638167 vapor-phase deposition |
| 12/29/2009 | US7638112 providing a growing substrate selected from Si, SiO2, quartz, glass etc. placing substrate and reactant zinc and aluminum metal into reaction room, introducing oxygen containing gas, heating to vaporize Al and Zn metal, which then react with oxygen to form zinc aluminate nano-material on the substrate |
| 12/29/2009 | US7638022 Magnetron source for deposition on large substrates |
| 12/29/2009 | US7638020 Vertical magnetic recording medium and manufacturing method thereof |
| 12/29/2009 | US7638019 Method and device for manufacturing semiconductor or insulator-metallic laminar composite cluster |
| 12/29/2009 | CA2552445C Hard film for cutting tools, cutting tool coated with hard film, process for forming hard film, and target used to form hard film |
| 12/29/2009 | CA2551155C Hard film for cutting tools, cutting tool coated with hard film, process for forming hard film, and target used to form hard film |
| 12/29/2009 | CA2491964C Single crystalline structure material having low material absorption and fabrication method therefor |
| 12/29/2009 | CA2430941C Cesium dispensers and process for the use thereof |
| 12/24/2009 | US20090317958 Method for forming memristor material and electrode structure with memristance |
| 12/24/2009 | US20090317708 Plastic laminate film |
| 12/24/2009 | US20090317673 Current collector, fuel cell stack, and fuel cell power generation system |
| 12/24/2009 | US20090317562 Processing system and method for processing a substrate |
| 12/24/2009 | US20090316096 Multi-domain and ips liquid-crystal display using dry alignment |
| 12/24/2009 | US20090315956 Liquid ejection head and method of manufacturing the liquid ejection head |
| 12/24/2009 | US20090315001 Process for preparing ceramics, ceramics thus obtained and uses thereof, especially as a sputtering target |
| 12/24/2009 | US20090315000 Transparent conductive film, sintered body, and their production methods |
| 12/24/2009 | US20090314636 Capacitive-coupled magnetic neutral loop plasma sputtering system |
| 12/24/2009 | US20090314635 Plasma processing apparatus, plasma processing method, and organic electron device |
| 12/24/2009 | US20090314634 Electromagnetic noise suppressor, structure with electromagnetic noise suppressing function and their manufacturing methods |
| 12/24/2009 | US20090314633 Electron beam enhanced large area deposition system |
| 12/24/2009 | US20090314632 FCC-like trilayer AP2 structure for CPP GMR EM improvement |
| 12/24/2009 | US20090314631 Magnetron With Electromagnets And Permanent Magnets |
| 12/24/2009 | US20090314411 Electromagnetic noise suppressor, article with electromagnetic noise suppressing function and their manufacturing methods |
| 12/24/2009 | DE102009022620A1 Hartfilm-beschichtetes Element und Vorrichtung zum Formen Hard film-coated member and apparatus for forming |
| 12/24/2009 | DE102005030862B4 Erstbenetzungshilfsmaterial für einen Verdampferkörper, seine Verwendung zum Herrichten der Verdampferfläche eines Verdampferkörpers und ein elektrisch beheizbarer keramischer Verdampferkörper Initial wetting for an evaporator body, its use for reconstituting the evaporator surface of an evaporator body and an electrically heated ceramic vaporizer body |
| 12/24/2009 | DE102005015587B4 Verfahren und Anordnung zur Stabilisierung eines Arbeitspunktes von reaktiven, plasmagestützten Vakuumbeschichtungsprozessen Method and apparatus for stabilizing an operating point of reactive plasma-assisted vacuum coating processes |
| 12/23/2009 | WO2009155394A2 Magnetron with electromagnets and permanent magnets |
| 12/23/2009 | WO2009155208A2 Apparatus and method for uniform deposition |
| 12/23/2009 | WO2009154213A1 Magnetron sputtering method, and magnetron sputtering device |
| 12/23/2009 | WO2009154196A1 Bias sputtering apparatus |
| 12/23/2009 | WO2009154130A1 Method for manufacturing plasma display panel and film forming apparatus |
| 12/23/2009 | WO2009154009A1 Method for manufacturing magnetoresistive device, sputter film-forming chamber, apparatus for manufacturing magnetoresistive device having sputter film-forming chamber, program and storage medium |
| 12/23/2009 | WO2009154002A1 Vacuum processing apparatus, vacuum processing method, and manufacturing method of an electronic device |
| 12/23/2009 | WO2009153792A2 Light induced patterning |
| 12/23/2009 | WO2009153664A1 Method for the manufacturing of sputtering targets using an inorganic polymer |
| 12/23/2009 | WO2009117745A3 Surface preheating treatment of plastics substrate |
| 12/23/2009 | WO2009099775A4 Modified sputtering target and deposition components, methods of production and uses thereof |
| 12/23/2009 | WO2008116728A3 Wear resistant hard coating for a workpiece and method for producing the same |
| 12/23/2009 | EP2136423A1 Multilayer coating for protecting organic optic devices and manufacturing process thereof |