Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
03/2010
03/24/2010CN101680081A Sputtering target, oxide semiconductor film and semiconductor device
03/24/2010CN101680080A Method for coating a substrate and metal alloy vacuum deposition facility
03/24/2010CN101680079A Method for forming transparent conductive film
03/24/2010CN101680078A Chromium nitride coating film by ion plating, process for producing the same, and piston ring for internal combustion engine
03/24/2010CN101680077A Film forming apparatus
03/24/2010CN101680076A coated diamond
03/24/2010CN101680075A Wear resistant hard coating for a workpiece and method for producing the same
03/24/2010CN101680055A Production of fine grain micro-alloyed niobium sheet via ingot metallurgy
03/24/2010CN101679124A Oxide sinter, process for producing the same, target, and transparent conductive film and transparent conductive substrate both obtained from the target
03/24/2010CN101679036A Semiconductor thin film, semiconductor thin film manufacturing method and semiconductor element
03/24/2010CN101678467A Surface-coated cutting tool
03/24/2010CN101678466A Surface-coated cutting tool
03/24/2010CN101677056A Carrying device and method for monitoring deposition machine
03/24/2010CN101677014A Alloy electrode material for resistor type random access memory and preparation technology thereof
03/24/2010CN101676436A Surface treatment method
03/24/2010CN101676431A Method for titanizing inner wall of new reactor in production of titanium sponge
03/24/2010CN100595951C Double polar plates for fuel battery and method for making surface carbon chromium thin film
03/24/2010CN100595901C Static chuck plate
03/24/2010CN100595847C Electrically conducting transparent film and its preparing process
03/24/2010CN100595364C Method for making sliding part and said sliding part
03/24/2010CN100595320C Vacuum coating method and system
03/24/2010CN100595319C ZnO:Bi photoemissive thin film and preparation thereof
03/24/2010CN100595318C Method for preparing transparent conductive film and electrode
03/24/2010CN100595317C Method for producing film, and, film
03/23/2010US7682710 consists of titanium oxide, ytterbium oxide, and gadolinium oxide and/or dysprosium oxide; for eyeglasses, lenses, cameras
03/23/2010US7682670 Method for controlling the volume of a molecular beam
03/23/2010US7682496 Apparatus for depositing seed layers
03/23/2010US7682495 Oscillating magnet in sputtering system
03/23/2010US7681518 Parylene coated components for artificial sphincters
03/23/2010CA2431084C Multiple source deposition process
03/18/2010WO2010030866A1 Plasma deposition with non-conductive layer
03/18/2010WO2010030419A1 Films containing an infused oxygenated gas and methods for their preparation
03/18/2010WO2010030045A1 Method for modifying a transparent electrode film
03/18/2010WO2010029702A1 Method for manufacturing magnetoresistive element, and storage medium used in the manufacturing method
03/18/2010WO2010029701A1 Magnetoresistive element, method for manufacturing same, and storage medium used in the manufacturing method
03/18/2010WO2010028778A1 Sanitary object
03/18/2010WO2009155208A3 Apparatus and method for uniform deposition
03/18/2010WO2009138062A3 Protective layer and method for applying a protective layer
03/18/2010US20100068561 Permeation protection for pressurized hydrogen storage tank
03/18/2010US20100068529 Films containing an infused oxygenated as and methods for their preparation
03/18/2010US20100068528 Laminate and laminate production apparatus
03/18/2010US20100068509 Media having improved surface smoothness and methods for making the same
03/18/2010US20100068508 Apparatus and method for monitoring wear of components
03/18/2010US20100068501 Method for producing large-diameter 3d carbon nano-onion structures at room temperature
03/18/2010US20100068444 Data storage containing carbon and metal layers
03/18/2010US20100068417 Electron beam vapor deposition apparatus and method
03/18/2010US20100067847 Tunable optofluidic device and method of its fabrication
03/18/2010US20100067107 Screen and method of manufacturing screen
03/18/2010US20100066991 Passivation of Multi-Layer Mirror for Extreme Ultraviolet Lithography
03/18/2010US20100066788 Perovskite-type oxide film, piezoelectric thin-film device and liquid ejecting device using perovskite-type oxide film, as well as production process and evaluation method for perovskite-type oxide film
03/18/2010US20100065847 Al alloy film for display device,display device, and sputtering target
03/18/2010US20100065425 Silver alloy sputtering target and process for producing the same
03/18/2010US20100065424 Zinc-oxide-based target
03/18/2010US20100065418 Reactive magnetron sputtering for the large-scale deposition of chalcopyrite absorber layers for thin layer solar cells
03/18/2010US20100065417 Methods for forming superconducting conductors
03/18/2010US20100064918 Gravure printing roll with cushion layer and method of producing the same
03/17/2010EP2163663A2 Coater platter homing tool
03/17/2010EP2163662A1 Tubular sputtering target
03/17/2010EP2163661A1 Hob tool with a coating and method for recoating a hob tool
03/17/2010EP2163660A1 Method for producing an optical waveguide layer
03/17/2010EP2163380A1 Barrier laminate, gas barrier film, and device using the same
03/17/2010EP2162899A1 Multitarget sputter source and method for the deposition of multi-layers
03/17/2010EP2162649A2 Piston ring with chromium nitride coating for internal combustion engines
03/17/2010EP2162563A1 Temperature-resistant tco layer, production method therefor and use thereof
03/17/2010EP2162562A2 Transparent planar material for architectural purposes
03/17/2010CN201424503Y Multi-functional magnetic control sputtering continuous coating machine
03/17/2010CN201424502Y Rotating and sputtering arc-column target device
03/17/2010CN201424501Y Cathodal device of electric arc target
03/17/2010CN101675183A multilayer nitride-containing coatings
03/17/2010CN101675179A Method for eliminating defects from semiconductor materials
03/17/2010CN101675178A Substrate processing apparatus and substrate processing method
03/17/2010CN101674342A Casing and display component of mobile communication terminal and manufacturing method thereof
03/17/2010CN101673818A Lithium ion battery cathode and preparation method thereof
03/17/2010CN101673705A Preparation method of thin film of diffusion impervious layer
03/17/2010CN101672934A Coating device
03/17/2010CN101672454A Heat reflection plate structure
03/17/2010CN101672319A Cooling shaft
03/17/2010CN101671846A Method for reducing stress of cubic boron nitride thin film
03/17/2010CN101671812A Heat treatment method of Ti-Al-N coating on hard alloy substrate
03/17/2010CN101671811A Method for preparing high-load tribology DLC membrane on surface of titanium
03/17/2010CN101671810A Method for connecting target and rear panel through fusion welding
03/17/2010CN101671809A Coating device
03/17/2010CN101671808A Method for preparing ultralow elasticity modulus high-wearing feature shell microstructural membrane on surface of titanium
03/17/2010CN101670743A Bicolor basal plate and method for preparing same
03/17/2010CN100594257C Apparatus and method for partial implantation using wide beam
03/17/2010CN100594256C Product line for producing AR film
03/17/2010CN100594255C Method and device for preparing rare earth doped gallium nitride light-emitting film
03/17/2010CN100594254C Film preparation device and observation method for film growth
03/17/2010CN100594253C Amorphous carbon film
03/16/2010US7678715 Low wet etch rate silicon nitride film
03/16/2010US7678448 an inorganic thin film comprising a silicon oxide film formed on one or both surfaces of the base material selected from polyester, polylamide, polyolefin and biodegradable resin such as polylactic acid and starch; electron spin resonance; adjusting radical density of the Pb center of SiO2 film
03/16/2010US7678248 Circulated cooled target
03/16/2010US7678241 Two types of film forming mechanisms in the same chamber so the second electrode thin film formed without taking out the substrate from the chamber after the first electrode thin film is formed; prevents contaminationby inert gas absorption; electrical properties; antipeeling agents
03/16/2010US7678240 Method for controlling plasma density or the distribution thereof
03/16/2010US7678239 Sliding anode magnetron sputtering source
03/16/2010US7678198 Vertical-offset coater
03/16/2010US7678196 System and method for treating substrates
03/16/2010US7676904 Method of manufacturing high sensitivity spin valve designs with ion beam treatment
03/11/2010WO2010028268A1 Coated substrates and semiconductor devices including the substrates
03/11/2010WO2010027292A1 Substrate carrier for molecular-beam epitaxy
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