Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2010
04/01/2010US20100078192 Transparent conductive film, sintered body target for transparent conductive film fabrication, and transparent conductive base material and display device using the same
04/01/2010US20100078065 Multilayered body comprising an electroconductive polymer layer and method for the production thereof
04/01/2010DE10327897B4 Verfahren zur Herstellung glatter Indium-Zinn-Oxidschichten auf Substraten, sowie Substratbeschichtung aus Indium-Zinn-Oxid und organische Leuchtdiode A process for producing smooth indium tin oxide layers on substrates, and substrate coating of indium tin oxide, and organic light emitting diode
04/01/2010DE102009022607A9 Elektromagnetisch durchlässige, glänzende Harzprodukte und Verfahren zu deren Herstellung Electromagnetically permeable, glossy resin products and processes for their preparation
04/01/2010DE102008059794B3 Verfahren und Vorrichtung zur Umkehr der Beschickung von Sputter-Beschichtungsanlagen in Reinräumen, sowie Computerprogramm zur Durchführung des Verfahrens und maschinenlesbarer Träger mit dem Programmcode Method and device for reversing the charge of sputter coating systems in clean rooms, and computer program for carrying out the method and machine-readable carrier with the program code
04/01/2010DE102008048586A1 Insight device for vacuum plant, comprises a disk movably arranged in a process chamber on interior side directly before a sight glass in an adjustable defined distance, where bristles of resilient materials are directed on the disk
04/01/2010DE102008042237A1 Metallische Beschichtung Metallic coating
03/2010
03/31/2010EP2169707A1 Sintered silicon wafer
03/31/2010EP2169092A2 Substrate with antimicrobial properties
03/31/2010EP2168933A1 Oxide sinter, process for producing the same, target, and transparent conductive film and transparent conductive substrate both obtained from the target
03/31/2010EP2168739A1 Method for producing nanoparticles for ferrofluids by electron-beam evaporation and condensation in vacuum, a ferrofluid producing method and a ferrofluid produced according to said method
03/31/2010EP2168702A1 Cutting tool
03/31/2010EP2167997A1 Optical article coated with an antireflection coating comprising a sublayer partially formed under ion assistance and manufacturing process
03/31/2010EP2167701A1 Method for providing a crystalline germanium layer on a substrate
03/31/2010EP2167700A1 Method for producing pvd coatings
03/31/2010EP2167699A1 Method for masking cooling holes and device for using in a masking process for masking cooling holes
03/31/2010EP2167245A2 Plasma deposition apparatus
03/31/2010EP1600526B1 Sputtering target and process for producing the same
03/31/2010CN101689614A Sealing technique and hermetically sealed device
03/31/2010CN101689592A III nitride semiconductor light emitting element, method for manufacturing the iii nitride semiconductor light emitting element, and lamp
03/31/2010CN101689569A Method for producing a metal rear contact of a semiconductor element, particularly a solar cell
03/31/2010CN101689467A Charge transport materials for luminescent applications
03/31/2010CN101688314A A coated cutting tool and a method of making thereof
03/31/2010CN101688296A Vacuum processing system and substrate transfer method
03/31/2010CN101688295A Electrostatic chuck with separated electrodes
03/31/2010CN101688294A Filming device
03/31/2010CN101688293A Tubular sputtering target
03/31/2010CN101688292A Low-refractive index film, method for forming the low-refractive index film, and antireflection film
03/31/2010CN101688291A Cooling shield for substrate processing chamber
03/31/2010CN101688290A Vacuum evaporation apparatus for solid materials
03/31/2010CN101688289A Flexible circuit board material and method for producing the same
03/31/2010CN101688288A Amorphous composite oxide film, crystalline composite oxide film, process for producing amorphous composite oxide film, process for producing crystalline composite oxide film, and composite oxide sint
03/31/2010CN101688287A Process for making contained layers
03/31/2010CN101688286A Thin film semiconductor material produced through reactive sputtering of zinc target using nitrogen gases
03/31/2010CN101687708A Composite oxide sinter, process for producing amorphous composite oxide film, amorphous composite oxide film, process for producing crystalline composite oxide film, and crystalline composite oxide fi
03/31/2010CN101685848A Organic el device manufacturing apparatus and method, film-forming apparatus and method
03/31/2010CN101685830A Novel perovskite manganese-base oxide film material and preparation method thereof
03/31/2010CN101684546A Soft substrate film coating fixture
03/31/2010CN101684545A Method for preparing nano silicon by pulsed laser deposition
03/31/2010CN101684544A Sputtering target for optical media, method of manufacturing same, optical medium, and method of manufacturing same
03/31/2010CN101684543A Method for manufacturing target
03/31/2010CN100596312C Magnetron sputtering device
03/30/2010US7687909 Metal / metal nitride barrier layer for semiconductor device applications
03/30/2010US7686985 Gallium oxide-zinc oxide sputtering target, method of forming transparent conductive film, and transparent conductive film
03/30/2010US7686928 Pressure switched dual magnetron
03/30/2010US7686926 A tantalum nitride/Ta barrier is first sputter deposited with high target power and wafer bias, argon etching is performed with even higher wafer bias. a flash step is applied with reduced target power and wafer bias; different magnetic field distributions
03/30/2010US7686925 Silicon alloy coating of insulated wire
03/30/2010US7686917 Plasma processing system and apparatus and a sample processing method
03/30/2010CA2483342C Coated articles having a protective coating and cathode targets for making the coated articles
03/30/2010CA2441490C Method for vapor phase aluminiding of a gas turbine blade partially masked with a masking enclosure
03/30/2010CA2429150C Cold antireflection layer deposition process
03/25/2010WO2010033799A1 Coatings for cutting implements
03/25/2010WO2010032817A1 Method for forming protective film on plasma display panel bases, and device for forming said protective film
03/25/2010WO2010032547A1 Method and apparatus for forming polymerized film
03/25/2010WO2010032542A1 Electrically conductive transparent zinc oxide film, and method for producing same
03/25/2010WO2010032530A1 Thin film structural body and method for manufacturing the same
03/25/2010WO2010032504A1 Radiation image conversion panel and method for producing the same
03/25/2010WO2010032459A1 Film formation method, film formation device,piezoelectric film, piezoelectric device and liquid discharge device
03/25/2010WO2010032432A1 Sintered body containing yttrium oxide, and sputtering target
03/25/2010WO2010032422A1 Oxide sintered body and sputtering target
03/25/2010WO2010002572A3 Layered coating and method for forming the same
03/25/2010WO2009155394A3 Magnetron with electromagnets and permanent magnets
03/25/2010WO2009090098A3 Method and apparatus for producing a solar cell
03/25/2010US20100075176 Process for producing electrical conductor
03/25/2010US20100075172 Process for producing a corrosion-protected and high-gloss substrate
03/25/2010US20100075157 Scratch-and etch-resistant coated glass article, and method of making same
03/25/2010US20100075099 Sputtering target for optical media, method of manufacturing same, optical medium, and method of manufacturing same
03/25/2010US20100075082 Barrier film and laminated material, container for wrapping and image display medium using the same, and manufacturing method for barrier film
03/25/2010US20100075037 Deposition Systems, ALD Systems, CVD Systems, Deposition Methods, ALD Methods and CVD Methods
03/25/2010US20100075036 Deposition apparatus and method for manufacturing film by using deposition apparatus
03/25/2010US20100075021 Method, apparatus and program for filling liquid material
03/25/2010US20100074577 Hybrid optical switch apparatus
03/25/2010US20100072465 Barium copper sulfur fluoride transparent conductive thin films and bulk material
03/25/2010US20100072396 Concurrent monitoring of a plurality of samples by an array of biosensing elements
03/25/2010US20100072061 Sputtering apparatus for forming thin film
03/25/2010US20100072058 Process for surface treating plastic substrate
03/25/2010US20100072057 Process for forming a ceramic oxide material with a pyrochlore structure having a high dielectric constant and implementation of this process for applications in microelectronics
03/25/2010US20100072056 Substrate holders for uniform reactive sputtering
03/25/2010US20100071840 Laminate having chromatic color and metallic luster, and process for producing the same
03/25/2010US20100071828 Method of producing multilayer structure
03/25/2010DE19646700B4 Vakuumbehandlungskammer, Vakuum-Zerstäubungsverfahren und Magnetronanordnung Vacuum processing chamber, vacuum magnetron sputtering and
03/25/2010DE112008000669T5 Dampfabscheidungsquelle, Dampfabscheidungsvorrichtung, Filmbildungsverfahren Vapor deposition source, the vapor deposition device, the film forming method
03/25/2010DE102008037387A1 Verfahren sowie Vorrichtung zum Abscheiden lateral strukturierter Schichten mittels einer magnetisch auf einem Substrathalter gehaltenen Schattenmaske A method and apparatus for depositing laterally structured layers by means of a shadow mask magnetically held on a substrate holder
03/25/2010DE102008030678B3 Conveying e.g. sheets of architectural glass or photovoltaic cells through vacuum coating plant, periodically corrects their relative positions
03/25/2010DE102007008674B4 Verfahren und Vorrichtung zur langzeitstabilen Beschichtung flächiger Substrate Method and device for long-term stable coating flat substrates
03/25/2010DE102006003279B4 Sputtertarget mit hochschmelzender Phase Sputtering target with high melting phase
03/25/2010CA2736807A1 Coating for cutting implements
03/24/2010EP2166128A1 Method for producing metal oxide coatings by means of spark nebulisation
03/24/2010EP2166127A1 Electron beam vapor deposition apparatus and method
03/24/2010EP2165987A2 Substrate with antimicrobial properties
03/24/2010EP2165003A1 Pdv method and pdv device for producing low friction, wear resistant, functional coatings, and coatings produced therewith
03/24/2010EP2165002A1 Coated diamond
03/24/2010CN201427991Y Louver type throttle valve capable of adjusting angles
03/24/2010CN201427990Y Novel hot cathodic arc device
03/24/2010CN101681781A Ion sources and methods of operating an electromagnet of an ion source
03/24/2010CN101681712A R-fe-b sintered magnet provided on its surface with vapor deposition coating of aluminum or its alloy and process for producing the same
03/24/2010CN101681069A Transparent electrode
03/24/2010CN101680109A Apparatus and method for manufacturing compound semiconductor single crystal
03/24/2010CN101680083A Film conveying device and winding-type vacuum film-forming method
03/24/2010CN101680082A Sputtering target having increased life and sputtering uniformity
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