Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
01/2010
01/28/2010US20100018765 Electromagnetic wave shielding material and production process of the same
01/28/2010US20100018464 Dlc coating system and process and apparatus for making coating system
01/28/2010US20100018250 Decorative Article Having a White Coating
01/28/2010DE112008000604T5 Steuereinrichtung einer Bedampfungsvorrichtung und Steuerverfahren einer Bedampfungsvorrichtung Controller of a sputtering apparatus and control method of an evaporating apparatus
01/28/2010DE10314929B4 Körper mit einer Beschichtung in R-3c Struktur, Verfahren und Vorrichtung zur PVD-Beschichtung Body with a coating in R-3c structure, method and device for PVD coating
01/28/2010DE102008034991A1 Verfahren zur Herstellung eines Schichtsystems auf einem Substrat, sowie Schichtsystem A method for producing a layer system on a substrate, as well as layer system
01/28/2010DE102008034960A1 Method for coating a substrate with a transparent metal-oxide layer by magnetron sputtering, comprises moving the substrate in a coating chamber on tube cathode, whose mantle surface comprises sputterable target materials
01/28/2010DE102008033904A1 Antriebsendblock für eine Magnetronanordnung mit einem rotierenden Target Drive end block for a magnetron with a rotating target
01/28/2010DE102006046312B4 Solarzellen mit stabilem, transparentem und leitfähigem Schichtsystem Solar cells with a stable, transparent and conductive layer system
01/28/2010DE102006009160B4 Anordnung für die Separation von Partikeln aus einem Plasma Arrangement for the separation of particles from a plasma
01/28/2010DE102005027382B4 Verdampferschiffchen für eine Vorrichtung zum Beschichten von Substraten Evaporation boat for a device for coating substrates
01/28/2010DE102004059876B4 Verwendung eines Sputtertargets aus einer Silberlegierung sowie Glassubstrat mit Wärmedämmschicht Using a sputtering target made of a silver alloy, as well as glass substrate with thermal barrier coating
01/27/2010EP2148240A1 Transparent electrode
01/27/2010EP2147452A2 Treatment system for flat substrates
01/27/2010EP2147132A1 A coated cutting tool and a method of making thereof
01/27/2010EP2147129A1 Process for making contained layers
01/27/2010EP2002027B1 Ternary aluminum alloy films and targets
01/27/2010EP1885658B1 Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s)
01/27/2010EP1313134B1 Semiconductor polysilicon component and method of manufacture thereof
01/27/2010CN201390781Y Continuous vacuum plasma evaporation metal composite material production line
01/27/2010CN201390780Y Microwave vacuum metal coating device
01/27/2010CN101636522A Vacuum coating apparatus
01/27/2010CN101636521A Magnetron sputtering apparatus
01/27/2010CN101636520A Plasma generation equipment rendered electrically neutral on the periphery of plasma gun
01/27/2010CN101636519A Arc evaporation source
01/27/2010CN101636518A Vapor deposition material and optical thin film obtained from the same
01/27/2010CN101634012A Ion beam assisting magnetic control sputtering deposition device and method for surface protection
01/27/2010CN101634011A Magnetic control sputtering device and method for uniformly coating film on outer surface of workpiece
01/27/2010CN101634010A Polycrystalline magnesium oxide material, its manufacturing method and manufacturing method for magnesium oxide membrane
01/27/2010CN100585868C Semiconductor device and method for manufacturing the same
01/27/2010CN100585795C Chamber isolation valve RF grounding
01/27/2010CN100585773C Dispensing system for alkali metals capable of releasing a high quantity of metals
01/27/2010CN100585752C Amorphous transparent conductive film, amorphous transparent electrode substrate, process for producing the same and color filter for liquid crystal display
01/27/2010CN100585704C Magnetic recording media and production method therefor
01/27/2010CN100585007C Automobile wheel hub surface vacuum coating treatment technique
01/27/2010CN100584996C Thin diamond film coating method and cemented carbide member coated with diamond thin film
01/27/2010CN100584995C Sputtering target, method for producing sputtering target, sputtering apparatus, and liquid-jet head
01/27/2010CN100584994C Method for preparing (TiAlZr)N ultra-hard coating by employing multiple arc ion plating
01/27/2010CN100584993C Hard film and hard film-coated tool
01/27/2010CN100584992C Foodware with multilayer stick resistant ceramic coating and method of making
01/27/2010CN100584991C Composite multi-mode plasma surface processing device
01/27/2010CN100584751C Method of horizontally growing carbon nanotubes and device having the same
01/26/2010US7652774 Interferometric endpoint determination in a substrate etching process
01/26/2010US7652341 Semiconductor apparatus having a semicondutor element with a high dielectric constant film
01/26/2010US7651732 Magnesium-titanium solid solution alloys
01/26/2010US7651730 Method and apparatus for forming silicon oxide film
01/26/2010US7651722 Shortening a cycle time of forming an organic layer of the display and suppressing wasteful consumption of organic materials used for forming the layer.
01/26/2010US7651658 regeneration or purification of sheets made from tantalum, tantalum and/or alloys used as sputtering targets
01/26/2010US7651594 Silicon oxide or silicon oxynitride layers on substrates; high barrier property and better transparency; used as a wrapping material for foods, drugs, a packaging material for electronic devices
01/21/2010WO2010008636A1 Sputtering system and method including an arc detection system
01/21/2010WO2010008439A1 Plasma vapor deposition system and method for making multi-junction silicon thin film solar cell modules and panels
01/21/2010WO2010008020A1 Vapor deposition material for the production of strontium /calcium composite oxide films
01/21/2010WO2010007989A1 Sintered complex oxide, method for producing sintered complex oxide, sputtering target and method for producing thin film
01/21/2010WO2010007981A1 Film-forming apparatus and powder evaporation apparatus
01/21/2010WO2010007980A1 Alloys for soft magnetic film layers in vertical magnetic recording media, sputtering target materials and manufacturing method therefore
01/21/2010WO2010007958A1 Coated member
01/21/2010WO2010007661A1 Hard coating and hard coating furnished tool
01/21/2010WO2010007660A1 Hard coating and hard coating furnished tool
01/21/2010WO2010006664A1 Metal-coated polyolefin fibres for wovens and nonwovens
01/21/2010WO2010006641A1 Device for electrostatically coating a work piece
01/21/2010WO2010006562A1 Method of protection of silver and copper surfaces against corrosion
01/21/2010WO2009145492A3 Fabrication process for a thick film by magnetron sputtering
01/21/2010WO2009145462A3 Substrate for metal printed circuit board and method for manufacturing the substrate
01/21/2010WO2009145461A3 Substrate for ceramic printed circuit board and method for manufacturing the substrate
01/21/2010WO2009132822A3 Device and method for pretreating and coating bodies
01/21/2010WO2009129537A3 Magnetic microstructures for magnetic resonance imaging
01/21/2010WO2009129115A3 Cylindrical magnetron
01/21/2010US20100016029 Backlight for mobile phone and method of manufacturing the same
01/21/2010US20100015790 TiC AS A THERMALLY STABLE p-METAL CARBIDE ON HIGH k SiO2 GATE STACKS
01/21/2010US20100015558 Laser Marking
01/21/2010US20100015473 Multi-layer coating
01/21/2010US20100015356 In-line film forming apparatus and manufacturing method of magnetic recording medium
01/21/2010US20100014151 Protective coating for metalhydride based devices
01/21/2010US20100013387 Organic el device and an organic el device producing method
01/21/2010US20100013385 Display device, apparatus for producing display device, and method for producing display device
01/21/2010US20100013096 Cu-Mn Alloy Sputtering Target and Semiconductor Wiring
01/21/2010US20100012935 Cu alloy wiring film, tft element for flat-panel display using the cu alloy wiring film, and cu alloy sputtering target for depositing the cu alloy wiring film
01/21/2010US20100012576 Nanoporous carbonaceous membranes and related methods
01/21/2010US20100012489 End-block for a magnetron device with a rotatable target, and vacuum coating apparatus
01/21/2010US20100012488 Sputter target assembly having a low-temperature high-strength bond
01/21/2010US20100012487 Drive end-block for a rotatable magnetron
01/21/2010US20100012483 drills; wear resistance; delays disintegration and diffusion of chromium nitrogen portion in aluminum chromiun nitrogen coating at high temperature; system comprises six cathodic arc sources, two TiSi targets associated with two of cathodic arc sources, four AlCrX targets associated with four arc sources
01/21/2010US20100012482 Sputtering system and method including an arc detection
01/21/2010US20100012481 Deposition system having improved material utilization
01/21/2010US20100012480 Method for controlling radial distribution of plasma ion density and ion energy at a workpiece surface by multi-frequency rf impedance tuning
01/21/2010US20100012477 Modification of carbon fibers by means of electromagnetic wave irradiation
01/21/2010US20100012349 Polycrystalline thin film, method for producing the same and oxide superconductor
01/21/2010US20100012185 Method for the Manufacture of a Solar Cell and the Resulting Solar Cell
01/21/2010US20100012035 Vacuum vapor processing apparatus
01/21/2010US20100012031 Method and apparatus for optically characterizing the doping of a substrate
01/21/2010US20100011550 Controlled corrosion processes utilizing one atmosphere glow discharge plasma (OAGDP) in the manufacture of lead acid batteries
01/21/2010DE20321779U1 Durchleuchtbares Thermoplastteil mit galvanisch veredelter Oberfläche Radioscopy thermoplastic part with galvanically finished surface
01/21/2010DE19912707B4 Behandlungsanlage für flache Substrate Treatment plant for flat substrates
01/21/2010DE102009027476A1 Innenkammerelement-Temperatursteuerverfahren, kammerinternes Element, Substratanbringtisch und Plasmabearbeitungsvorrichtungsvorrichtung, die selbigen enthält Inner chamber element temperature control method, chamber internal element Substratanbringtisch and plasma processing apparatus apparatus including selfsame
01/21/2010DE102008033902A1 Endblock für eine Magnetronanordnung mit einem rotierenden Target und Vakuumbeschichtungsanlage End block for a magnetron with a rotating target and vacuum coating system
01/20/2010EP2146002A1 Metal-coated polyolefin fibres for wovens and nonwovens
01/20/2010EP2145976A1 Sputter target assembly having a low-temperature high-strength bond
01/20/2010EP2145975A2 Perovskite oxide, oxide composition, oxide body, piezoelectric device, and liquid discharge apparatus
01/20/2010EP1794579B1 Piezo-acoustic thin film resonator having a crystalline zinc oxide layer
01/20/2010EP1268872B2 Method for controlling reactive sputtering processes