Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
03/2010
03/11/2010WO2010026955A1 Substrate holding member, substrate processing apparatus, and substrate processing method
03/11/2010WO2010026887A1 Film-forming method and oil repellent base
03/11/2010WO2010026860A1 Sputter device
03/11/2010WO2010026853A1 Black coating film, process for producing same, black light-shielding plate, and diaphragm plate, diaphragm for light quantity control, shutter, and heat-resistant light-shielding tape each comprising the black light-shielding plate
03/11/2010WO2010026772A1 Substrate cooling method and semiconductor manufacturing method
03/11/2010WO2010026725A1 Magnetoresistive element, method for manufacturing same, and storage medium used in the manufacturing method
03/11/2010WO2010026092A2 Wear and corrosion resistant layered composite
03/11/2010WO2009144492A3 Physical vapour deposition process
03/11/2010WO2009143254A3 Thin film batteries and methods for manufacturing same
03/11/2010WO2009143142A3 Apparatus and method of vapor coating in an electronic device
03/11/2010WO2009100792A3 Antimicrobial provision of titanium and titanium alloys with silver
03/11/2010US20100062285 Magnetic recording medium and method of manufacturing the same
03/11/2010US20100062257 Hob cutter with a coating and method for coating hob cutter
03/11/2010US20100062245 Substrate which is equipped with a stack having thermal properties
03/11/2010US20100062175 Method for Manufacturing an Optical Waveguide Layer
03/11/2010US20100061864 Coating optimizatioh process using a coupon and component comprising a coupon
03/11/2010US20100060109 Nanotubes, nanorods and nanowires having piezoelectric and/or pyroelectric properties and devices manufactured therefrom
03/11/2010US20100059476 Method for manufacturing a magnetic storage medium
03/11/2010US20100059369 Plasma generating apparatus rendered electrically neutral on the periphery of plasma gun
03/11/2010US20100059368 Magnetron sputtering apparatus
03/11/2010US20100059367 Sputter-coating apparatus
03/11/2010US20100059366 Textured chamber surface
03/11/2010US20100059365 Process for manufacturing a mask having submillimetric openings for producing a submillimetric grid, and submillimetric grid
03/11/2010US20100059364 Fabrication method for organic electroluminescent display with reflection-reducing properties
03/11/2010US20100059363 Surface treatment of alumina films
03/11/2010US20100059362 Techniques for manufacturing solar cells
03/11/2010US20100059147 metal working; producing bonded and monolithic copper and copper alloy targets; uniform grain size of from 1 micron to 50 microns; total amount of alloying elements of at least 100 ppm and less than 10% by weight; high strength; for fabrication of integrated circuits
03/11/2010US20100059115 Coated Substrates and Semiconductor Devices Including the Substrates
03/11/2010US20100058827 Sputtering Target and Manufacturing Method Thereof
03/11/2010DE112008000702T5 Magnetron-Sputter-Vorrichtung A magnetron sputtering apparatus
03/11/2010DE102008046673A1 Verbundkörper Composite body
03/11/2010DE102008046443A1 Sputtering target comprises a carrier body, and a sputtering material, which is fixed by a connection layer on the carrier body, where the connection layer consists of inorganic oxide and/or silicate as main component of its binder phase
03/11/2010DE102008045982A1 Functionalizing surfaces comprises activating surface to form reactive groups on surface, depositing crosslinkable component e.g. oxirane by e.g. polyaddition and chemically bonding to reactive groups of surface, followed by crosslinking
03/10/2010EP2161351A1 Substrate processing apparatus and method of manufacturing a device
03/10/2010EP2161350A1 Method for depositing of barrier layers on a plastic substrate as well as coating device therefor and a layer system
03/10/2010CN101668877A Method and apparatus for thermally converting metallic precursor layers into semiconducting layers, and also solar module
03/10/2010CN101668876A Apparatuses and methods for cryogenic cooling in thermal surface treatment processes
03/10/2010CN101667529A Mask for thin film deposition and method of manufacturing OLED using the same
03/10/2010CN101665917A Cadmium zinc oxygen alloy film and preparing method thereof
03/10/2010CN101665916A Method for preparing sputtering target of phase-change material
03/10/2010CN101665915A Method for preparing bismuth ferric film material
03/10/2010CN101665914A Manufacturing process for one-dimensional nano-structure and apparatus thereof
03/10/2010CN101665913A Processing device used for vacuum coating
03/10/2010CN101665912A Lanthanum titanate evaporation material
03/10/2010CN101665911A Method for preparing giant magnetoresistance films by vacuum vapor deposition method
03/10/2010CN101665910A Method for cleaning SiO* substrate used in alloy films made by vacuum evaporation
03/10/2010CN101665909A Method for preparing target material
03/10/2010CN101665908A Process for forming a ferroelectric film, ferroelectric film, ferroelectric device, and liquid discharge apparatus
03/10/2010CN101665907A Process for forming a ferroelectric film, ferroelectric film, ferroelectric device, and liquid discharge apparatus
03/10/2010CN101665906A Silicon-aluminum mixture evaporation material
03/10/2010CN101665905A Aluminum-induced low temperature preparation method of large grain size polysilicon film
03/10/2010CN101665904A Aluminum-containing diamond-like carbon film and method for preparing same
03/10/2010CN101665903A Mask assembly and film coating equipment
03/10/2010CN101665902A Nickel ordered porous array film and preparation method thereof
03/10/2010CN100593584C Method for preparing ZnO nano-rod array under non-catalyst and non-carbon condition
03/10/2010CN100593583C Method for preparing electronic high temperature superconductor lanthanum-cerium-copper oxide films
03/09/2010US7675174 Method and structure of a thick metal layer using multiple deposition chambers
03/09/2010US7674497 Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device
03/09/2010US7674446 Hafnium silicide target for forming gate oxide film, and method for preparation thereof
03/09/2010US7674399 Electroluminescent material and electroluminescent element using the same
03/09/2010US7674360 Mechanism for varying the spacing between sputter magnetron and target
03/09/2010US7674357 Transparent electroconductive film and process for producing same
03/09/2010US7673541 depositing an oxide coating prior to heat treatment of the blade material and heat treating under conditions selected to enhance the color of the coating.
03/05/2010CA2675805A1 Hob cutter with a coating and method for coating a hob cutter
03/04/2010WO2010024713A1 Crucible for evaporating aluminium in the molecular beam epitaxy process
03/04/2010WO2010024411A1 Method for forming compound epitaxial layer, compound epitaxial layer, semiconductor laminate structure, and semiconductor light emitting device
03/04/2010WO2010024370A1 Film with metal film
03/04/2010WO2010024187A1 Continuous film forming apparatus
03/04/2010WO2010024131A1 Film-forming apparatus and method for producing substrate for oxide thin film formation
03/04/2010WO2010024034A1 Sputtering target and oxide semiconductor thin film formed therefrom
03/04/2010WO2010024018A1 Degasification method for polymer film substrate and degasification apparatus
03/04/2010WO2010023970A1 Radiation image conversion panel and method for producing the same
03/04/2010WO2010023952A1 Magnetron sputter cathode, and filming apparatus
03/04/2010WO2010023878A1 Thin film-forming sputtering device
03/04/2010WO2010023853A2 Manufacturing method for glass substrate with thin film
03/04/2010WO2010023833A1 Magnetoresistive element, method for manufacturing same, and storage medium used in the manufacturing method
03/04/2010WO2010023423A1 Apparatus and method for deposition of material to form a coating
03/04/2010WO2010023345A1 Sheet with platinum metallic bronze coating, method for obtaining same and applications thereof
03/04/2010WO2010023174A1 Method for depositing a material
03/04/2010WO2010023109A1 Coating chamber with a moveable shield
03/04/2010WO2009140518A3 Microwave-assisted rotatable pvd
03/04/2010WO2009133076A3 Sputter target
03/04/2010US20100058500 Nanostructure on a probe tip
03/04/2010US20100055816 Light Emitting Device Manufacturing Apparatus and Method
03/04/2010US20100055810 Mask for thin film deposition and method of manufacturing oled using the same
03/04/2010US20100055620 Nanostructure fabrication
03/04/2010US20100055573 Thin film buried anode battery
03/04/2010US20100055562 Nanowire layer adhesion on a substrate
03/04/2010US20100055539 Fuel cell separator and method for producing the same
03/04/2010US20100055533 Barrier coatings for interconnects; related devices, and methods of forming
03/04/2010US20100055503 Magnetic thin film and method for forming the film, and magnetic thin film-applied device
03/04/2010US20100055499 Method to synthesize ordered magnetic alloys at low temperature
03/04/2010US20100055375 Optical recording medium, sputtering target, and method for manufacturing the same
03/04/2010US20100053845 Composite membrane for a capacitor
03/04/2010US20100053817 Coated magnetic head and methods for fabrication thereof
03/04/2010US20100053611 Ultra-high Density Diffraction Grating
03/04/2010US20100052525 Organic electroluminescence element and method of manufacturing the same
03/04/2010US20100052176 Semiconductor device and manufacturing method thereof
03/04/2010US20100051454 Magnetron sputtering electrode, and sputtering apparatus proided with magnetron sputtering electrode
03/04/2010US20100051453 Process for making dense mixed metal Si3N4 targets