Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
11/2007
11/15/2007WO2007129520A1 Apparatus and method for generating atmospheric-pressure plasma
11/15/2007WO2007106611A9 Rf plasma-enhanced deposition of fluorinated films
11/15/2007WO2007086973A3 High temperature reactor for the production of nanophase wc/co powder
11/15/2007US20070264444 Particle-measuring system and particle-measuring method
11/15/2007US20070264442 Method for making bio-degradable paper board
11/15/2007US20070264441 Plasma Processing Apparatus and Plasma Processing Method
11/15/2007US20070263759 Plasma antenna generator and method of using same
11/15/2007US20070263758 Deuteride/hydride catalyzed condensation energy production
11/15/2007US20070262723 Plasma Processing Apparatus Control Method for Plasma Processing Apparatus and Evaluation Method for Plasma Processing Apparatus
11/15/2007US20070262052 Film removal method and apparatus
11/15/2007DE102006062710A1 Plasmaquelle Plasma source
11/14/2007EP1095401B1 Method for anisotropic plasma etching of semiconductors
11/14/2007CN200976707Y Scaling channel structure based atmosphere pressure discharging cold plasma generators and array
11/14/2007CN200976340Y T-type RF plasma emitting set
11/14/2007CN100349261C Method and device for plasma CVD
11/14/2007CN100349053C Film forming method, photoelectric device and electronic machine
11/14/2007CN100348480C Fullerene-containing carbon, production method and device
11/13/2007US7295653 Apparatus, system, and method for optical pulse gain enhancement for high-finesse external cavity
11/13/2007US7294283 Penning discharge plasma source
11/13/2007CA2270072C Device for supplying voltage to a plasma producer
11/08/2007WO2007125851A1 Method for etching of silicon
11/08/2007WO2007125618A1 Aurora generation system and aurora generation method
11/08/2007WO2007062311A3 Laser treatment of metal
11/08/2007US20070259184 Method of mounting objects for chemical vapour deposition
11/08/2007US20070259173 Method for the manufacture of a coating
11/08/2007US20070259129 Controlled zone microwave plasma system
11/08/2007US20070259128 Method for controlled density growth of carbon nanotubes
11/08/2007US20070259127 Method for densifying sol-gel films to form microlens structures
11/08/2007US20070259110 Plasma, uv and ion/neutral assisted ald or cvd in a batch tool
11/08/2007US20070257743 Method for testing plasma reactor multi-frequency impedance match networks
11/08/2007DE102006020290A1 Plasma source, has metal block that is electrically connected with anode and by insulator opposite to housing, where block has coupling device for electrical connection with high frequency generator
11/07/2007CN101068449A Bi-directional filtered arc plasma source
11/07/2007CN100348078C Ecr等离子体源和ecr等离子体装置 Ecr plasma source and ecr plasma device
11/07/2007CN100348077C Plasma treatment device and substrate surface treatment device
11/06/2007US7292191 Tunable plasma frequency devices
11/06/2007US7291853 Discharge produced plasma EUV light source
11/06/2007US7291804 Plasma-spraying device
11/06/2007US7291360 Chemical vapor deposition plasma process using plural ion shower grids
11/06/2007US7290929 Mounting system for an X-ray tube
11/01/2007WO2007124032A2 Dual plasma beam sources and method
11/01/2007WO2007123347A1 Plasma processing system and a method of controlling the same
11/01/2007WO2007079127B1 Plasma torch for making synthetic silica
11/01/2007US20070254379 polydimethylsiloxane upper plates; fluoresence; polymerase chain reactions
11/01/2007US20070254113 Plasma processing apparatus having an evacuating arrangement to evacuate gas from gas-introducing part of a process chamber
11/01/2007US20070254112 Apparatus and method for high utilization of process chambers of a cluster system through staggered plasma cleaning
11/01/2007US20070252580 Probe for Measuring Characteristics of an Excitation Current of a Plasma, and Associated Plasma Reactor
11/01/2007US20070252529 Capacitively Coupled Rf-Plasma Reactor
10/2007
10/31/2007EP1849550A2 Method for cutting plasma
10/31/2007EP1849337A2 Automatic gas control for a plasma arc torch
10/31/2007EP1506071A4 Plasma arc torch electrode
10/31/2007EP1305813A4 Plasma focus light source with active and buffer gas control
10/31/2007DE102006020291A1 Plasma source, has process gas supplying device formed as metallic block, in which gas channel with two channel areas runs, where channel areas flow under angle of specific degrees to one another
10/31/2007DE102006019664A1 Kaltplasma-Handgerät zur Plasma-Behandlung von Oberflächen Cold plasma handset for plasma treatment of surfaces
10/31/2007CN200969335Y Plasma source
10/31/2007CN101066000A Plasma nozzle array for providing uniform scalable microwave plasma generation
10/31/2007CN101064987A Plasma processing apparatus and apparatus for supplying RF power
10/31/2007CN101064986A Inductively coupled plasma reactor with multiple magnetic cores
10/31/2007CN101064238A Plasma reactor apparatus with independent capacitive and toroidal plasma sources
10/30/2007US7289866 Plasma processing method and apparatus
10/30/2007US7288942 Plasma potential measuring method and apparatus, and plasma potential measuring probe
10/30/2007US7288293 Applying pasma; activation surfaces
10/30/2007US7288292 PECVD of a cyclic siloxane, organic molecules, tetramethylorthosilicate (TMOS), tetraethylorthosilicate (TEOS), vinyltriethoxysilane, allyltrimethoxysilane, vinyltrimethoxysilane, allyltriethoxysilane, phenyltriethoxysilane orphenyltrimethoxysilane; improved elastic modulus and hardness.
10/30/2007US7288284 Cleaning chamber using a chlorine containing etchant to remove silicon residues from chamber; providing a seasoning film comprises silicon carbide on interior surfaces chamber by introducing precursor gases comprising trimethylsilane and carbon dioxide
10/30/2007US7288204 Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG)
10/30/2007US7288173 Ion beam processing system and ion beam processing method
10/25/2007WO2007120994A2 Methods and apparatus for selective pre-coating of a plasma processing chamber
10/25/2007WO2007101982B1 Plasma confinement
10/25/2007US20070248768 Coated Substrates and Methods for Their Preparation
10/25/2007US20070248767 Method of self-cleaning of carbon-based film
10/25/2007DE102006018858A1 Verfahren zum Plasmaschneiden Method for plasma cutting
10/24/2007EP1572409A4 Apparatus and methods for connecting a plasma arc torch lead to a power supply
10/24/2007CN101060074A Apparatus and method for radio frequency decoupling and bias voltage control in a plasma reactor
10/24/2007CN101060060A An electrodeless RF induction coupled plasma dischargable atomic source
10/24/2007CN100345257C 等离子体处理装置 Plasma processing apparatus
10/23/2007US7286644 Systems, methods and devices for x-ray device focal spot control
10/23/2007US7285307 Ionomer membranes with polymeric backings; screen printing, stencil printing; gas distribution layers
10/23/2007CA2377872C Anode electrode for plasmatron structure
10/23/2007CA2285173C Arc-plasma method for welding metals
10/23/2007CA2280479C A closed electron drift plasma thruster adapted to high thermal loads
10/18/2007WO2007117122A1 Compound plasma source and method for dissociating gases using the same
10/18/2007WO2007116225A1 Hydrogen production
10/18/2007US20070243386 Process for preparation of multi-thin layered structure
10/18/2007US20070243338 Plasma deposition apparatus and method for making solar cells
10/18/2007US20070243335 Comprises a nonmetallic component and a metallic component, the metallic component having an amorphous, a nanocrystalline or amorphous metallic alloy;protective coatings; powder coatings; corrosion resistance; wear resistance toughness; oxidation resistance
10/18/2007US20070241688 Plasma lamp with conductive material positioned relative to rf feed
10/17/2007EP1845758A2 Plasma torch
10/17/2007EP1844635A1 Atmospheric-pressure plasma jet
10/17/2007EP1844175A1 A thermal spraying method and device
10/17/2007EP1843863A2 Method and apparatus for cleaning and surface conditioning objects with plasma
10/17/2007EP1023819A4 System for plasma ignition by fast voltage rise
10/17/2007CN101056495A RF plasma supply device
10/17/2007CN101056494A Plasma torch
10/17/2007CN101056493A Low-temperature plasma diagnosis device
10/17/2007CN100343943C Inductively-coupled plasma processing system
10/16/2007US7282454 Switched uniformity control
10/16/2007US7282244 Replaceable plate expanded thermal plasma apparatus and method
10/16/2007US7282132 Film of zinc oxide electrochemically deposited from an aqueous solution is subjected to heat treatment at a temperature equal to or higher than 150 degrees C. and equal to or lower than 400 degrees C. in a nitrogen or inert gas atmosphere that contains oxygen, thereby obtaining a zinc oxide film
10/16/2007US7281492 System and method for generating a discharge in gases
10/16/2007US7281491 Dielectric-coated electrode, plasma discharge treatment apparatus and method for forming thin film
10/16/2007US7281478 Assembled cathode and plasma igniter with such cathode