Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
05/2008
05/15/2008US20080111461 Conversion of Ultra-Intense Infrared Laser Energy Into Relativistic Particles
05/15/2008US20080110486 Amorphous-crystalline tandem nanostructured solar cells
05/15/2008DE10336881B4 Hochfrequenzanregungsanordnung mit einer Begrenzungsschaltung High-frequency excitation system with a limiting circuit
05/14/2008EP1921657A2 System and Method for Generating Ions and Radicals
05/14/2008EP1920866A1 Dual-conductor welding gun
05/14/2008EP1919560A1 Apparatus for the production of electron beams and x-ray beams for interstitial and intra-operatory radiation therapy
05/14/2008CN101180699A Termination of secondary frequencies in RF power delivery
05/14/2008CN101180083A Apparatus and method for purification and disinfection of liquid, solid or gaseous substances
05/14/2008CN101179897A System and method for generating ions and radicals
05/14/2008CN101179045A Mounting device, plasma processing apparatus and plasma processing method
05/14/2008CN101179010A Process chamber having gate slit opening and closing apparatus
05/14/2008CN101179005A Exhaust air system, semi-conductor manufacturing installation for manufacturing thin film by the same and method thereof
05/14/2008CN101179000A Plasma source and uses thereof
05/14/2008CN100388430C Substrate cleaning apparatus and method
05/14/2008CN100388425C Air supply system of shower in water cold plasma
05/13/2008US7371992 Method for non-contact cleaning of a surface
05/13/2008US7371436 Method and apparatus for depositing materials with tunable optical properties and etching characteristics
05/08/2008WO2008054391A1 Method and apparatus for preventing instabilities in radio-frequency plasma processing
05/08/2008WO2008054246A1 Head for analytical gas plasmotron
05/08/2008WO2008053940A1 Plasma generating body and apparatus and method for manufacturing plasma generating body
05/08/2008WO2008052704A1 Device for forming a film by deposition from a plasma
05/08/2008WO2008009559A9 Device and method for producing and/ or confining a plasma
05/08/2008WO2007030225A3 A method of forming a tantalum-containing layer from a metalorganic precursor
05/08/2008US20080107823 Organic electro-luminescent device, manufacturing method for the same, and electronic equipment
05/08/2008US20080107822 finishing textile, paper and knitted, woven and non-woven fibers with fluorohydrocarbon Zonyl monomeric precursor to form fluoropolymer coatings; cross linking, enhance bonding to substrate; durable protective layer against abrasion from laundry, dry-cleaning, wash and wear
05/08/2008US20080107224 Method of Controlling Temperature of Nonthermal Nuclear Fusion Fuel in Nonthermal Nuclear Fusion Reaction Generating Method
05/08/2008US20080106206 Pulsed dielectric barrier discharge
05/08/2008US20080105650 Plasma processing device and plasma processing method
05/08/2008DE112006001797T5 Plasmagasverteiler mit integrierten Dosier- und Strömungsdurchgängen Plasma gas distributor with integrated metering and flow passages
05/08/2008DE102007046695A1 Plasmaschneidvorrichtung, Plasmabrenner und Kühlvorrichtung für Plasmabrenner Plasma cutter, plasma torch and cooling apparatus for plasma torch
05/08/2008DE102006052060A1 Verfahren und Anordnung zur Anregung einer Gaslaseranordnung Method and apparatus for activating a gas laser array
05/08/2008DE102006050136A1 Verfahren und Vorrichtung zur Erzeugung von positiv und/oder negativ ionisierten Gasanalyten für die Gasanalyse Method and apparatus for the generation of positive and / or negatively ionized gas analyte for gas analysis
05/07/2008EP1919264A1 Device for forming a film by deposition from a plasma
05/07/2008EP1917843A1 Method and apparatus for creating a plasma
05/07/2008EP1917842A1 Method and arrangement for generating and controlling a discharge plasma
05/07/2008CN201057678Y Hollow drum electrode vortex type air plasma generator
05/07/2008CN101176387A Generating discrete gas jets in plasma arc torch applications
05/07/2008CN101175363A Method and equipment for gas ionization treatment
05/07/2008CN101174542A Gas injection apparatus
05/07/2008CN101174098A Workpiece rotation apparatus for a plasma reactor system
05/07/2008CN101174097A Mask etch plasma reactor with variable process gas distribution
05/07/2008CN101174096A Mask etch plasma reactor with cathode providing a uniform distribution of etch rate
05/07/2008CN101172859A Method for preparing yttria parts and plasma reactor parts comprising yttria
05/06/2008US7368741 Extreme ultraviolet light source
05/06/2008US7367344 Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray heads
05/06/2008US7367281 Plasma antenna
05/02/2008WO2008050596A1 Plasma doping method and plasma doping apparatus
05/02/2008WO2008027308A3 Plasma reactor with inductive excitation of plasma and efficient removal of heat from the excitation coil
05/01/2008US20080102315 Method for manufacturing a magneto-resistance effect element, and magneto-resistance effect element
05/01/2008US20080102222 Plasma apparatus and plasma processing method
05/01/2008US20080102204 Vapor deposition of metal carbide films
05/01/2008US20080102202 Mask etch plasma reactor with variable process gas distribution
05/01/2008US20080099441 Apparatus and method for reactive atom plasma processing for material deposition
05/01/2008US20080099148 Method for fabricating plasma reactor parts
04/2008
04/30/2008EP1916877A1 Method and device for adjusting the electrical power supply of a magnetron, and installation for treatment of thermoplastic containers applying same
04/30/2008EP1262093B1 Apparatus for fixing a sheet-shaped electrode of a plasma polymerizing apparatus
04/30/2008DE10203543B4 Vorrichtung zur Erzeugung eines APG-Plasmas Device for generating a APG-plasma
04/30/2008CN101171891A A plasma spectroscopy system with a gas supply
04/30/2008CN101170865A Plasm suspending reference probe
04/30/2008CN101170054A Device and method for processing substrate and method for supplying plasma
04/30/2008CN101170052A Apparatus for controlling plasma etching process
04/30/2008CN100385620C Electrode subassembly
04/30/2008CA2604685A1 Diagnosis and calibration system for icp-ms apparatus
04/29/2008USRE40264 Multi-temperature processing
04/29/2008CA2454809C Method and apparatus for initiating welding arc using plasma jet
04/29/2008CA2453040C System for quick disconnect of torch from power and gas supply unit
04/24/2008WO2008046552A1 Device and method for producing microwave plasma with a high plasma density
04/24/2008US20080095953 can prevent impurities from being formed by inhibiting plasma from being diffused into a nozzle pipe and sustained in the nozzle pipe and improve thickness uniformity of the deposited thin film
04/24/2008US20080093347 Plasma cutter, and plasma cutter power supply system
04/24/2008US20080093346 Plasma cutting device, plasma torch, and cooling device for plasma torch
04/24/2008US20080093341 RF Plasma Reactor Having a Distribution Chamber with at Least One Grid
04/24/2008US20080092814 Systems and methods for selective deposition of graded materials on continuously fed objects
04/24/2008US20080092626 Miniaturised Separation Column With Bonding Agent for a Gas Chromatograph
04/24/2008CA2666125A1 Device and method for producing microwave plasma with a high plasma density
04/23/2008EP1912893A1 Method and reactor for producing carbon nanotubes
04/23/2008CN101167412A Interchangeable plasma nozzle interface
04/23/2008CN101165855A Substrate stage and plasma processing apparatus
04/22/2008US7361387 thin film deposition on semiconductors
04/22/2008US7361287 Method for etching structures in an etching body by means of a plasma
04/17/2008WO2008045146A1 Methods of and apparatus for accessing a process chamber using a dual zone gas injector wth improved optical access
04/17/2008WO2008044633A1 Plasma etching device and plasma etching method
04/17/2008WO2007031250A8 Plasma source
04/17/2008US20080090417 showerhead electrode assembly for processing semiconductor substrates; prevent aluminum fluoride formation; gas passages are positioned and sized such that they are misaligned at ambient temperature, concentric at high temperature; non-uniform shear stresses
04/17/2008US20080090039 PICVD coating for plastic containers
04/17/2008US20080090022 High rate, continuous deposition of high quality amorphous, nanocrystalline, microcrystalline or polycrystalline materials
04/17/2008US20080088217 Plasma generating device, method of cleaning display panel, and method of manufacturing display panel using the same
04/17/2008US20080087641 Components for a plasma processing apparatus
04/17/2008DE10327911B4 Plasma-MIG/MAG-Schweißbrenner Plasma-MIG / MAG welding torch
04/17/2008DE102006048816A1 Vorrichtung und Verfahren zur lokalen Erzeugung von Mikrowellenplasmen Apparatus and method for local production of microwave plasmas
04/17/2008DE102006048815A1 Vorrichtung und Verfahren zur Erzeugung von Mikrowellenplasmen hoher Leistung Apparatus and method for generating microwave plasmas of high performance
04/17/2008DE102006048814A1 Vorrichtung und Verfahren zur Erzeugung von Mikrowellenplasmen hoher Plasmadichte Apparatus and method for generating microwave plasmas of high density plasma
04/17/2008DE102006044906A1 Plasma burner used in the production of coatings on surfaces comprises a secondary gas stream partially flowing around a material feed to focus the material injection into the center of the plasma produced
04/17/2008DE102006043898A1 Plasma system i.e. plasma coating device, for sputtering or coating of e.g. DVD, has control circuit shifting source into idle condition lasting for time period that is allowed after each interruption, and achieves current limiting value
04/16/2008EP1912483A1 Plasma generator and film forming method employing same
04/16/2008EP1912246A2 Power supply antenna and power supply method
04/16/2008EP1606872B1 Power supply unit for a gas discharge process
04/16/2008EP1547450A4 Ion thruster grids and methods for making
04/16/2008EP1161309A4 A method for a repetitive ion beam processing with a by carbon containing ion beam
04/16/2008CN101163819A Film-forming apparatus, matching unit, and impedance control method
04/16/2008CN101163370A Plasma guiding mechanism and plasma discharging device of using the mechanism
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