| Patents for H05H 1 - Generating plasma; Handling plasma (22,647) |
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| 03/19/2008 | CN101145508A Plasma processing device and method |
| 03/19/2008 | CN101145507A Plasma processing device |
| 03/19/2008 | CN101145498A Gas injection device |
| 03/18/2008 | CA2464955C Process and synthesizer for molecular engineering and synthesis of materials |
| 03/13/2008 | WO2008029854A1 Apparatus and method for dry etching |
| 03/13/2008 | WO2008029416A1 A metal nanowire based device for obtaining gas discharge in air at low voltage less than 100v at atmospheric pressure. |
| 03/13/2008 | WO2007047203A3 One touch connection and disconnection method and apparatus |
| 03/13/2008 | US20080063813 High-throughput hdp-cvd processes for advanced gapfill applications |
| 03/13/2008 | US20080063812 Method for Manufacturing an Optical Preform |
| 03/13/2008 | US20080063811 Fluorosilane, polysiloxane, carrier gas, plasma ignition gas in atmosphere pressure plasma; adjusts the surface energy of the substrate; produce hydrophobic, lipophobic, hydrophobic or lipophobic surface characteristics; no vacuum equipment, low cost, short process time |
| 03/13/2008 | US20080063810 In-situ process state monitoring of chamber |
| 03/13/2008 | US20080063577 In situ sterilization and decontamination system using a non-thermal plasma discharge |
| 03/13/2008 | US20080063576 stably generates jet at atmospheric pressure with low electric power; surface treatment, cutting, etching, film deposition; High-resolution microanalysis; High-resolution microanalysis with a "micro total analysis" using a VHF-driven inductively-coupled microplasma source |
| 03/13/2008 | US20080063133 Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma |
| 03/13/2008 | US20080061702 Apparatus and method to generate plasma |
| 03/13/2008 | US20080061041 Plasma treatment apparatus and plasma treatment method |
| 03/13/2008 | US20080061035 Plasma generator, substrate treating apparatus including the same and substrate treating method |
| 03/13/2008 | DE202007016863U1 Anordnung zur Regelung von HIPIMS/HPPMS-Plasmen Arrangement for the control of HIPIMS / HPPMS plasmas |
| 03/12/2008 | EP1898444A1 Plasma etching chamber |
| 03/12/2008 | EP1896367A2 Apparatus for measuring a set of electrical characteristics in a plasma |
| 03/12/2008 | CN201033281Y Low-temperature plasma body device for processing volatility organic matter |
| 03/12/2008 | CN101140859A Etching apparatus and etching method using the same |
| 03/12/2008 | CN100375584C Inductive thermal plasma torch |
| 03/12/2008 | CN100375247C Plasma processing method and plasma processing device |
| 03/12/2008 | CN100375246C Plasma processing apparatus |
| 03/12/2008 | CN100375245C On-wafer monitoring system |
| 03/12/2008 | CN100375244C Plasma treatment device and plasma treatment method |
| 03/12/2008 | CN100375238C Exposure apparatus and device fabrication method using the same |
| 03/12/2008 | CN100374616C Plasma treating device with protective tube |
| 03/11/2008 | US7341761 Methods for producing low-k CDO films |
| 03/06/2008 | WO2008027158A2 Source material collection unit for a laser produced plasma euv light source |
| 03/06/2008 | WO2008026712A1 Plasma generating method, organic material film etching method, negative ion generating method and oxidizing or nitriding treatment method |
| 03/06/2008 | WO2007149761A3 Methods to improve the in-film defectivity of pecvd amorphous carbon films |
| 03/06/2008 | US20080057260 Encapsulation For An Organic Electronic Component, Its Production Process And Its Use |
| 03/06/2008 | US20080057222 radio frequency electrode is disposed opposite to the opposing electrode in a vacuum chamber; device for applying a pulsed voltage to generate plasma with a smaller ion energy range; reactive ion etching; plasma etching silicon oxide film and silicon nitride film |
| 03/06/2008 | US20080057221 lab-ambient controlled transfer module that is coupled to one or more wet substrate processing modules; enables controlled processing of substrate in either first, second or third ambient environments, as well as during associated transitions; avoiding unnecessary exposure to an uncontrolled ambient |
| 03/06/2008 | US20080057220 Silicon photovoltaic cell junction formed from thin film doping source |
| 03/06/2008 | US20080057218 Method and apparatus to help promote contact of gas with vaporized material |
| 03/06/2008 | US20080054813 Plasma lamp with conductive material positioned relative to rf feed |
| 03/06/2008 | US20080054795 Organic El Light Emitting Element, Manufacturing Method Thereof, and Display Device |
| 03/05/2008 | EP1895818A1 Plasma spraying device and a method for introducing a liquid precursor into a plasma gas system |
| 03/05/2008 | EP1895286A1 Liquid introducing plasma system |
| 03/05/2008 | EP1894450A2 Generating discrete gas jets in plasma arc torch applications |
| 03/05/2008 | EP1894449A2 Method for treating plasma under continuous atmospheric pressure of work pieces, in particular, material plates or strips |
| 03/05/2008 | EP1177112A4 Remote plasma generator |
| 03/05/2008 | CN201030286Y Low-temperature plasma industrial waste gas treatment apparatus |
| 03/05/2008 | CN101138282A Method of operating a flow-through plasma device |
| 03/05/2008 | CN101137269A Plasma processing apparatus of substrate and plasma processing method thereof |
| 03/05/2008 | CN101137268A Plasma processing apparatus of substrate and plasma processing method thereof |
| 03/05/2008 | CN101137267A Plasma generation apparatus and workpiece processing apparatus using the same |
| 03/05/2008 | CN101137266A Gas injection apparatus |
| 03/05/2008 | CN101136321A Plasma apparatus with device for reducing polymer deposition on a substrate and method for reducing polymer deposition |
| 03/05/2008 | CN101136279A Jigger coupling coil and jigger coupling plasma device |
| 03/05/2008 | CN100373994C Soft X ray light source of laser plasma for liquid microflow jetting target |
| 03/05/2008 | CN100373540C Bottom electrode assembly for semiconductor device |
| 03/05/2008 | CN100373539C Plasma processing apparatus |
| 03/05/2008 | CN100372971C Switched uniformity control |
| 03/04/2008 | US7339656 Method and apparatus for measuring electron density of plasma and plasma processing apparatus |
| 03/04/2008 | US7339181 High flux, high energy photon source |
| 03/04/2008 | US7338577 Inductively coupled plasma processing apparatus having internal linear antenna for large area processing |
| 03/04/2008 | US7338576 Plasma processing device |
| 02/29/2008 | CA2591017A1 Plasma spraying device and a method for introducing a liquid precursor into a plasma gas stream |
| 02/28/2008 | WO2008024960A1 Contoured shield orifice for a plasma arc torch |
| 02/28/2008 | WO2008024392A2 Inductive plasma source with high coupling efficiency |
| 02/28/2008 | WO2008023523A1 Method of forming thin film by microplasma processing and apparatus for the same |
| 02/28/2008 | US20080050537 Inductive plasma source with high coupling efficiency |
| 02/28/2008 | US20080050536 Vacuum Processing Chamber for Very Large Area Substrates |
| 02/28/2008 | US20080048565 Method for Generating a Cold Plasma for Sterilizing a Gaseous Medium and Device Therefor |
| 02/28/2008 | US20080048133 Source material collection unit for a laser produced plasma EUV light source |
| 02/28/2008 | DE102006037144A1 ECR-Plasmaquelle ECR plasma source |
| 02/27/2008 | EP1893004A1 Contoured shield orifice for a plasma arc torch |
| 02/27/2008 | EP1891842A2 Plasma cutting device with pneumatic striking |
| 02/27/2008 | EP1891841A2 Method for plasma chemical surface modification |
| 02/27/2008 | EP1891407A2 Boost devices and methods of using them |
| 02/27/2008 | EP1198821B1 Plasma etching chamber |
| 02/27/2008 | CN101133688A Microwave plasma processing device |
| 02/27/2008 | CN101131547A Apparatus and method for treating substrates |
| 02/27/2008 | CN100372075C Inductive coupling plasma device |
| 02/26/2008 | US7335341 Stacks are formed by applying a band of a kinetic spray electroconductive material, comprises copper, copper alloy, nickel, nickel alloy, aluminum, aluminum alloy, stainless steel, and mixtures; without the need for glues or other adhesives |
| 02/26/2008 | US7335278 Plasma processing apparatus and plasma processing method |
| 02/21/2008 | WO2008020662A1 Antenna of plasma processing apparatus |
| 02/21/2008 | WO2008019661A2 Plasma torch head, plasma torch shaft and plasma torch |
| 02/21/2008 | WO2007117797A3 Method of forming a metal carbide or metal carbonitride film having improved adhesion |
| 02/21/2008 | US20080044830 Three-Dimensional Nanostructured and Microstructured Supports |
| 02/21/2008 | US20080044595 Method for semiconductor processing |
| 02/21/2008 | US20080044594 Stress reduction of sioc low k film by addition of alkylenes to omcts based processes |
| 02/21/2008 | US20080044593 Method of forming a material layer |
| 02/21/2008 | US20080044321 Power supply unit for generating plasma and plasma apparatus including the same |
| 02/21/2008 | US20080043895 Electromagnetic radiation-initiated plasma reactor |
| 02/20/2008 | EP1888803A1 Apparatus for gas-dynamic applying coatings an method of coating |
| 02/20/2008 | CN201025071Y Plasm generator and plasm air engine |
| 02/20/2008 | CN101129100A Atmospheric-pressure plasma jet |
| 02/20/2008 | CN101128084A Plasma generation device, plasma control method, and substrate manufacturing method |
| 02/20/2008 | CN101128083A Plasma generation device, plasma control method, and substrate manufacturing method |
| 02/20/2008 | CN101127413A Microwave resonance cavity |
| 02/20/2008 | CN101127305A Plasma generation device, plasma control method, and substrate manufacturing method |
| 02/19/2008 | US7333317 Portable ionizer |
| 02/19/2008 | US7332039 Plasma processing apparatus and method thereof |
| 02/19/2008 | US7331307 Thermally sprayed member, electrode and plasma processing apparatus using the electrode |
| 02/14/2008 | WO2008018159A1 Microwave line plasma generation system with two power supply |