Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
04/2008
04/16/2008CN101162689A Focus ring and plasma processing apparatus
04/16/2008CN101162685A Apparatus and method to improve uniformity and reduce local effect of process chamber
04/16/2008CN100382660C RF plasma generation and temperature control system and method, plasma chemical vapor deposition system
04/16/2008CN100382276C Substrate mounting table, substrate processing apparatus and substrate processing method
04/16/2008CN100382239C Method for electrically discharging substrate, substrate processing apparatus and program
04/10/2008US20080085368 Precisedly timed preheating in discrete, repeated cycles synchronized to deposition step; such as bonding tungsten carbide cobalt to stainless steel parts
04/10/2008US20080083609 Oxygen conditioning of plasma vessels
04/10/2008US20080083425 Method for Non-Contact Cleaning of a Surface
04/10/2008DE202007016830U1 Kraftstoffsparvorrichtung Fuel saving device
04/10/2008DE102006047047A1 Plasma generator for spectroscopic gas analysis, has optical units provided for guiding and decoupling light emitted by plasma, and carrier substrate consisting of translucent material, where optical units are integrated into substrate
04/10/2008DE102006043900A1 Plasma arrangement i.e. plasma-lamination device, for laminating e.g. DVD, has control circuit actuating switching unit during occurrence of electric arc or breakdown over outlet and current flow remains over unit during and after actuation
04/10/2008DE102004048611B4 Verfahren zum Verbinden von Bauteilen The method for joining components
04/09/2008EP1363859A4 Apparatus and method for atmospheric pressure reactive atom plasma processing for shaping of damage free surfaces
04/09/2008EP1035757B1 Substrate electrode plasma generator and substance/material processing method
04/09/2008CN101160014A Plasma processing apparatus and method for correcting variable impedance device
04/09/2008CN101159228A Processing gas supplying mechanism, supplying method and gas processing unit
04/09/2008CN100380605C Plasma processing apparatus and method, and electrode plate for plasma processing apparatus
04/09/2008CN100380592C Thin film forming apparatus and thin film forming method and thin film forming system
04/09/2008CN100379893C Matching box, vacuum device using the same and vacuum processing method
04/09/2008CN100379693C Vitrification furnace and method with dual heating means
04/08/2008US7354631 Chemical vapor deposition apparatus and methods
04/08/2008US7354630 Use of oxygen-containing gases in fabrication of granular perpendicular magnetic recording media
04/03/2008WO2008038886A1 Plasma arc torch and scrubber using the same
04/03/2008WO2008038700A1 Radially enlarged type plasma generating apparatus
04/03/2008WO2008038467A1 Integrated intermediate electrode and pressure gradient type plasma gun
04/03/2008WO2008037514A1 Rotating wire spraying device and a method for coating a surface of a workpiece
04/03/2008WO2007146508A3 High volume production of nanostructured materials
04/03/2008WO2007142166A3 Atmospheric pressure plasma generating method, plasma processing method and component mounting method using same, and device using these methods
04/03/2008WO2007136843A3 Processing cellulosic material utilizing atmospheric-pressure plasma
04/03/2008US20080081130 Exposing a substrate to a plasma of a hydrocarbon gas and a silicon-containing gas; exhausting unreacted precursor gas and byproducts; introducing oxygen to the effluent and forming a plasma
04/03/2008US20080081129 Method for Treating a Polymer Material, Device for Implementing this Method and Use of this Device for Treating Hollow Bodies
04/03/2008US20080081128 Film-forming system, film-forming method, insulating film, dielectric film, piezoelectric film, ferroelectric film, piezoelectric element and liquid discharge system
04/03/2008US20080081126 Applying a first working voltage to an electrode in the deposition chamber dissociating a reactant mixture by a plasma generated in the deposition chamber; removing undesired electrical charge by applying a second working voltage of a second polarity to the electrode
04/03/2008US20080081125 Method for manufacturing cover lay of printed circuit board
04/03/2008US20080081113 Nitrogen profile engineering in nitrided high dielectric constant films
04/03/2008US20080079783 Piezoelectric film, process of manufacturing the same and piezoelectric element
04/02/2008EP1906105A2 A fan forced electric unit that incorporates a low power cold plasma generator and method of making the same
04/02/2008EP1905286A2 Plasma-generating device, plasma surgical device and use of plasma surgical device
04/02/2008EP1905285A2 Plasma-generating device, plasma surgical device and use of a plasma surgical device
04/02/2008EP1905284A2 Plasma-generating device, plasma surgical device, use of a plasma-generating device and method of generating a plasma
04/02/2008EP1905057A2 Arrays of microcavity plasma devices with dielectric encapsulated electrodes
04/02/2008EP1651791A4 Shielded ceramic thermal spray coatings
04/02/2008EP1366508A4 Apparatus and method for atmospheric pressure reactive atom plasma processing for surface modification
04/02/2008CN101156505A Apparatus and process for generating, accelerating and propagating beams of electrons and plasma
04/02/2008CN101156504A Plasma coating device and method
04/02/2008CN101156503A Plasma processing method and system
04/02/2008CN101156314A Microwave generating apparatus and microwave generating method
04/02/2008CN101155463A Microwave plasma processing device, dielectric window manufacturing method and microwave plasma processing method
04/02/2008CN101155462A Microwave plasma processing device, its manufacturing and using method, integral groove forming part
04/02/2008CN101155461A System for generating plasma body
04/02/2008CN101155460A Frequency monitoring to detect plasma process abnormality
04/02/2008CN100378924C Plasma etching reactor
04/02/2008CN100378923C Magnetron plasma processing apparatus
04/01/2008USRE40195 Large area plasma source
04/01/2008USH2212 Method and apparatus for producing an ion-ion plasma continuous in time
03/2008
03/27/2008WO2008035678A1 Plasma cleaning process and plasma cvd method
03/27/2008US20080075888 Reduction of hillocks prior to dielectric barrier deposition in cu damascene
03/27/2008US20080075887 Electronic Device and Method for Manufacturing the Same
03/27/2008US20080075855 Carbiding, nitriding or metallization; vapor deposition of carbides, carbonitrides, nitrides or metal silicon nitrides or carbides from organometallic compounds in presence of adhesion promoter; forming copper film
03/27/2008US20080075834 provides methods and apparatus for controlling ion dosage in real time during plasma processes. In one embodiment, ion dosages may be controlled using in-situ measurement of the plasma from a mass distribution sensor combined with in-situ measurement from an RF probe.
03/27/2008US20080075640 Capable of preventing a generation of micro arc
03/27/2008US20080073202 Interference patterning; sliding short circuits
03/27/2008US20080072707 Methods and apparatus for spray forming, atomization and heat transfer
03/27/2008US20080072574 Plasma reactor
03/27/2008US20080072413 Indirectly heated cathode clamp system and method
03/27/2008CA2828176A1 Ignition device, internal combustion engine, ignition plug, plasma apparatus, exhaust gas decomposition apparatus, ozone generation/sterilization/disinfection apparatus, and deodorization apparatus
03/26/2008EP1902599A2 Device for producing an atmospheric pressure plasma
03/26/2008EP0938741B1 Vacuum plasma processor having coil with intermediate portion coupling lower magnetic flux density to plasma than center and peripheral portions of the coil
03/26/2008CN201042104Y Arc leading circuit for novel plasm cutter
03/26/2008CN101151663A Magnetic recording medium, its manufacturing method, and surface treatment device
03/26/2008CN101150910A Device with adjustable electrode and method for adjusting adjustable electrode
03/26/2008CN101150909A Plasm restraint device
03/26/2008CN101150044A Focus ring and plasma processing apparatus
03/26/2008CN101150039A Gas injection device
03/26/2008CN100377624C Radio-frequency starting control method for etching apparatus
03/25/2008US7348582 Light source apparatus and exposure apparatus having the same
03/25/2008US7348042 Plasma vapor deposition; integrated circuits
03/25/2008US7347979 Gas processing method and gas processing apparatus utilizing oxidation catalyst and low-temperature plasma
03/20/2008WO2008033901A2 Arc voltage estimation systems and methods using an average voltage value or controlling a process parameter in a thermal processing system
03/20/2008WO2008033772A1 Wearable autonomous material processing system
03/20/2008WO2008032523A1 Pressure gradient plasma gun
03/20/2008WO2008032489A1 Structure for attaching plasma gun to chamber
03/20/2008WO2008031321A1 Inductive coupling coil and inductive coupling plasma apparatus thereof
03/20/2008WO2008031320A1 Inductive coupling coil and inductive coupling plasma apparatus thereof
03/20/2008WO2008031132A1 Water vapour plasma burner and method of wear detection and process control in the case of such a water vapour plasma burner
03/20/2008US20080070050 Metallized polymeric films
03/20/2008US20080069287 Controlled fusion in a field reversed configuration and direct energy conversion
03/20/2008US20080067147 Processing apparatus and processing method
03/20/2008CA2662233A1 Wearable autonomous material processing system
03/20/2008CA2661849A1 Water vapor plasma torch, and wear-detection and process-control method to be used with such a water-vapor plasma torch
03/19/2008EP1761705B1 Vacuum pumping circuit and machine for treating containers equipped with same
03/19/2008EP1574117A4 Plasma arc torch quick disconnect
03/19/2008EP1421596A4 Capacitive discharge plasma ion source
03/19/2008CN201039577Y Transport arc device for plasm generator
03/19/2008CN201039576Y A guiding wind ring for plasm generator
03/19/2008CN101147431A Device for gaseous plasma sterilization
03/19/2008CN101146741A Process for producing amorphous carbon film
03/19/2008CN101146639A Dual-conductor welding gun
03/19/2008CN101146398A Plasma processing device and electrode structure thereof
03/19/2008CN101146397A Processing system and palsm generation device
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