Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
12/2008
12/11/2008US20080304131 Electrochromic devices and fabrication methods
12/11/2008US20080302761 Plasma processing system and use thereof
12/11/2008US20080302652 Particle Reduction Through Gas and Plasma Source Control
12/10/2008EP2001044A2 Plasma generating apparatus and plasma generating method
12/10/2008EP2000562A2 Electrode and vacuum processing apparatus
12/10/2008CN101322225A Plasma processing apparatus
12/10/2008CN101321889A Sheet plasma film-forming device
12/10/2008CN101321614A Method for surface treatment of composite material structure by using atmospheric plasma beam
12/10/2008CN101321427A DC magnetic filtering cathode vacuum arc plasma source
12/10/2008CN101320765A Photoelectric conversion device and manufacturing method
12/10/2008CN101320680A Anti-arc protection device and its assembling method
12/10/2008CN101320679A Plasma processing system
12/10/2008CN101320675A Plasma processing device, electrode temperature adjusting device and method
12/10/2008CN101318186A Refurbishment of a coated chamber component
12/10/2008CN100442430C Plasma processor with electrode simultaneously responsive to plural frequencies
12/10/2008CN100442429C Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a mutli-part electrode
12/10/2008CN100442427C Cathode anode micro cavity electrode plasma device structure using one-dimensional nanometer material
12/10/2008CN100441870C Vacuum pumping circuit and machine for treating containers equipped with same
12/10/2008CN100441732C Plasma-assisted reinforced coating
12/09/2008US7462569 Method of manufacturing semiconductor device
12/09/2008US7462380 Film forming method employing sub-electrodes aligned toward target
12/09/2008US7462379 Exposing substrate to reactive plasma generated by supplying power of 1 W/cm2 or more at a voltage exceeding 100 kHz using electrode with dielectric layer having a void volume of 10% or less formed by thermally spraying ceramic sealed with an organic compound hardened by sol-gel reaction; antireflection
12/09/2008US7462378 Method for coating metals
12/09/2008US7462335 Optical monitoring and control system and method for plasma reactors
12/09/2008US7462293 Method and apparatus for measuring electron density of plasma and plasma processing apparatus
12/09/2008CA2484435C Temperature indicating consumable
12/04/2008WO2008147689A1 Boron nitride and boron nitride-derived materials deposition method
12/04/2008WO2008146918A1 Methods for manufacturing and reclaiming electrode for plasma processing apparatus
12/04/2008WO2008024392A3 Inductive plasma source with high coupling efficiency
12/04/2008US20080299363 Method for Preparation of a Lithographic Printing Plate and to a Lithographic Printing Plate Produced by the Method
12/04/2008US20080299337 Method for the formation of surfaces on the inside of medical devices
12/04/2008US20080296799 Methods and Devices for the Production of Solid Filaments in a Vacuum Chamber
12/04/2008US20080296580 Silicon oxide film, production method therefor and semiconductor device having gate insulation film using the same
12/04/2008US20080296268 Plasma generator and workpiece processing apparatus using the same
12/04/2008US20080296143 Plasma Systems with Magnetic Filter Devices to Alter Film Deposition/Etching Characteristics
12/04/2008US20080295965 Plasma processing apparatus
12/04/2008DE19628949B4 Vorrichtung zur Erzeugung von Plasma A device for generating plasma
12/04/2008DE10257147B4 Leistungsversorgungsvorrichtung zum Erzeugen von Hochfrequenzleistung für eine Plasmaerzeugungsvorrichtung The power supply apparatus for generating high-frequency power to a plasma generating device
12/03/2008EP1997358A1 Device for plasma treatment at atmospheric pressure
12/03/2008EP0938740B1 Particle controlling method and plasma processing chamber
12/03/2008CN201160337Y Apparatus for transmitting plasma
12/03/2008CN101316946A Plasma treatment device
12/03/2008CN101316474A Plasma generation device
12/03/2008CN101316473A Apparatus and method for treating substrate using plasma
12/03/2008CN101315880A Gas distribution device and plasma processing apparatus adopting the same
12/03/2008CN101315877A Substrate processing sytstem and apparatus
12/03/2008CN101315875A Plasma generator and workpiece processing apparatus using the same
12/03/2008CN101315814A Vacuum feed port ceramic sealing structure of ion-turbulent resonance heating antenna
12/03/2008CN100441066C Plasma excitation system
12/03/2008CN100441065C Plasma processor appts. and method, and antenna
12/03/2008CN100440448C Plasma processing device and plasma generating method
12/03/2008CN100440427C Plasma processing chamber
12/03/2008CN100440419C Faraday shields and plasma wafer processing
12/03/2008CN100439237C Inductively coupled plasma reactor for producing nano-powder
12/02/2008US7459707 Exposure apparatus, light source apparatus and device fabrication
12/02/2008US7459654 Controlled fusion in a field reversed configuration and direct energy conversion
12/02/2008US7459594 Contacting the matter and oxidant at 600-1000 degrees C. with a strong catalytic ceramic refractory melting over 1250 degrees C. containing dispersed nickel that changes between oxidation states depending on temperature or oxygen activity to form a mixture H2 and CO, and including methane and ethylene
12/02/2008US7459188 Ion-assisted plasma enhanced deposition on the surface of solar cells using properly biased system of special electrodes; exact control of the feed gas mixture (plasma comprising C+, H+, N+, Ar+ ions); ion energy controlled by passing flow of ions through an accelerating electrode and a grid.
12/02/2008US7459187 Uniform thickness achieved by rotating the rotor around the axis almost perpendicular to the base material-conveying direction in the state where it faces, via a narrow gap; gas is dragged into gap by rotation of the rotor and blown out onto the base material surface.
11/2008
11/27/2008WO2008143088A1 Plasma-processing device and method of manufacturing adhesion-preventing member
11/27/2008WO2008141809A1 Method and device for the combined treatment of a surface with plasma and with electromagnetic radiation
11/27/2008WO2008021878A3 Method for treating a hydrophilic surface
11/27/2008US20080293248 Method of forming amorphous carbon film and method of manufacturing semiconductor device using the same
11/27/2008US20080292811 Chamber idle process for improved repeatability of films
11/27/2008DE202008004128U1 Geschlitzte Elektrode und Plasmaapparatur, die dieselbe verwendet Slotted electrode and plasma apparatus that uses the same
11/27/2008DE102007024090A1 Device for plasma treatment of surfaces, has electrical generator and multiple plasma producers, where plasma producers are connected or disconnected together at individual output voltage of generators
11/26/2008EP1995458A1 Spacecraft thruster
11/26/2008EP1995173A1 Plasma flow control actuator system and method
11/26/2008EP1994981A1 Method of producing activated water
11/26/2008EP1994808A1 Transferred-arc plasma torch
11/26/2008EP1994807A1 Apparatus for producing a plasma jet
11/26/2008EP1269511B1 Plasma reactor with overhead rf electrode tuned to the plasma
11/26/2008CN201154290Y Rotary discharging non-thermal plasma cleaning equipment for waste organic gas
11/26/2008CN101313471A Inductively-coupled RF power source
11/26/2008CN101313390A Microwave introduction device
11/26/2008CN101312799A Apparatus and method for clean, rapidly solidified alloys
11/26/2008CN101312144A Chuck assembly and high density plasma device possessing the assembly
11/26/2008CN101312122A Workpiece processing apparatus
11/26/2008CN100438718C Adaptively plasma source for generating uniform plasma
11/26/2008CN100437931C Electric liquid chamber and method of processing substrate in the chamber
11/26/2008CN100437901C Particle sticking prevention apparatus and plasma processing apparatus
11/26/2008CN100437897C Method and apparatus for controlling the volume of a plasma
11/26/2008CN100437896C Plasma processing apparatus and plasma processing method
11/26/2008CN100437885C Highly efficient compact capacitance coupled plasma reactor/generator and method
11/26/2008CN100437883C Plasma surface treatment method and device for carrying out said method
11/26/2008CN100436763C Plasma-assisted engine exhausting process
11/26/2008CN100436024C Vented shield system for a plasma arc torch
11/26/2008CN100436023C Plasma cutting method and apparatus thereof
11/25/2008US7455893 Staggered in-situ deposition and etching of a dielectric layer for HDP-CVD
11/25/2008US7455892 Method and apparatus for forming a coating
11/25/2008US7455824 Amorphous carbon, amorphous-carbon coated member, and process for forming amorphous carbon film
11/20/2008WO2008140501A2 Ring plasma jet method and apparatus for making an optical fiber preform
11/20/2008WO2008138915A1 Enhancing gas-phase reaction in a plasma using high intensity and high power ultrasonic acoustic waves
11/20/2008WO2008138901A1 Enhancing plasma surface modification using high intensity and high power ultrasonic acoustic waves
11/20/2008WO2008138504A1 Plasma source
11/20/2008WO2008138117A1 A gas reformulation system comprising means to optimize the effectiveness of gas conversion
11/20/2008WO2008138028A2 Supercell communications and energy generator
11/20/2008WO2008048249A3 Scalable flat-panel nano-particle mems/nems thruster
11/20/2008US20080286493 Transparent hard coats for optical elements
11/20/2008US20080286492 Apparatus and method for depositing multiple coating materials in a common plasma coating zone
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