Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
03/2005
03/24/2005US20050061774 Apparatus and method for non-contact shaping and smoothing of damage-free glass substrates
03/24/2005US20050061446 Plasma-assisted joining
03/24/2005US20050061442 Plasma treatment apparatus and control method thereof
03/24/2005CA2538827A1 Method and device for generating alfven waves
03/23/2005EP1517594A2 Inductive thermal plasma torch
03/23/2005EP1516688A1 Welding-type system with controller configured for automatic determination of the type of consumables
03/23/2005EP1516350A2 Plasma processor with electrode simultaneously responsive to plural frequencies
03/23/2005EP1515798A1 Process for preparing nanostructured materials of controlled surface chemistry
03/23/2005EP1406843B1 Method and apparatus for underwater decomposition of organic content of electrically conductive aqueous waste solutions
03/23/2005EP1235660B1 Plasma arc torch, plasma arc torch cathode and plasma arc torch electrode
03/23/2005EP1012113B1 Electrically assisted partial oxidation of light hydrocarbons by oxygen
03/23/2005CN2686787Y Nummerical control cutting combined spray gun device for arbitrary curve groove
03/23/2005CN1599946A Merie plasma reactor with showerhead RF electrode tuned to the plasma with arcing suppression
03/23/2005CN1598399A Microwave powered lamphead having external shutter
03/23/2005CN1597155A Method of treating waste matter using plasma electric arc technology and its device
03/22/2005US6871111 Performance evaluation method for plasma processing apparatus
03/22/2005US6870498 Generation of electromagnetic radiation
03/22/2005US6870124 Plasma-assisted joining
03/22/2005CA2357808C Electrode diffusion bonding
03/18/2005CA2475652A1 Method and apparatus for autodetection of consumables
03/17/2005WO2005025281A1 Adaptively plasma source for generating uniform plasma
03/17/2005WO2005023415A1 Dual-step process of industrial enterprise stack gas decontamination containing electron beam irradiation and treatment by gas discharge
03/17/2005US20050057137 Ion source, ion implanting device, and manufacturing method of semiconductor devices
03/17/2005US20050056622 Method and apparatus for the compensation of edge ring wear in a plasma processing chamber
03/17/2005US20050056533 Nonthermal plasma systems and methods for natural gas and heavy hydrocarbon co-conversion
03/17/2005DE10231738B4 Anpassungsvorrichtung für eine Induktions-Plasmabrennervorrichtung und Verfahren zur elektrischen Steuerung und Regelung einer Induktions-Plasmabrennervorrichtung Adaptation device for an induction plasma torch apparatus and method for the electrical control and regulation of an induction plasma torch device
03/16/2005EP1515594A2 Arrangement for plasma generation
03/16/2005EP1515362A1 Plasma processing system, plasma processing method, plasma film deposition system, and plasma film deposition method
03/16/2005EP1514845A1 Plasma synthesis of metal oxide nanoparticles
03/16/2005EP1513767A1 Plasma synthesis of hollow nanostructures
03/16/2005EP1513625A2 Method and device for treating the outer surface of a metal wire, particularly for carrying out a coating pretreatment
03/16/2005CN1596060A A dense ionization discharging nonequilibrium plasma source and method of preparing plasma
03/16/2005CN1594649A Metal ion source
03/15/2005US6867387 Device for plasma incision of matter with a specifically tuned radiofrequency electromagnetic field generator
03/15/2005US6866753 Magnetic coils for guiding a plasma produced by a vacuum arc evaporating source to the vicinity of a substrate in a film forming chamber by use of a deflection magnetic field. The vacuum arc vapor deposition apparatus further includes a coil
03/15/2005US6866747 Plasma processing apparatus
03/15/2005US6866745 Semiconductor manufacturing apparatus
03/11/2005CA2481152A1 Plasma synthesis of metal oxide nanoparticles
03/10/2005WO2005022623A1 High aspect ratio etch using modulation of rf powers of various frequencies
03/10/2005WO2004091264A3 High frequency plasma jet source and method for irradiating a surface
03/10/2005WO2004008816A3 Method and device for substrate etching with very high power inductively coupled plasma
03/10/2005WO2004003964A3 Discharge radiation source, in particular uv radiation
03/10/2005US20050051269 Vacuum enclosure; plasma discharging; supplying signals; cleaning using fluorine gas
03/10/2005US20050051268 Vacuum enclosure; adjustment confining rings; etching gas
03/09/2005EP1513378A2 Method and apparatus of coordinating operational feedback in a plasma cutter
03/09/2005EP1512913A1 Injection system for air and fuel with means to produce cold plasma
03/09/2005EP1512165A2 Plasma apparatus and method for processing a substrate
03/09/2005EP1512164A1 Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a mutli-part electrode
03/09/2005EP1511880A1 Surface treatment system and method thereof
03/09/2005EP1099360B1 Electrode for a plasma arc torch having an improved insert configuration
03/09/2005CN2684523Y Improved microwave plasma generator
03/09/2005CN1591792A Plasma etcher
03/09/2005CN1591791A Plasma processing method, plasma etching method and solid photographing element mfg method
03/08/2005US6865255 EUV, XUV, and X-ray wavelength sources created from laser plasma produced from liquid metal solutions, and nano-size particles in solutions
03/08/2005US6864486 Ion sources
03/08/2005US6863870 Plasma enhanced gas reactor
03/08/2005US6863835 Magnetic barrier for plasma in chamber exhaust
03/08/2005US6863789 Direct current sputtering; resonance network
03/08/2005US6863784 Linear drive system for use in a plasma processing system
03/08/2005US6863773 Linearly extended device for large-surface microwave treatment and for large surface plasma production
03/08/2005US6863531 Surface modification process on metal dentures, products produced thereby, and the incorporated system thereof
03/03/2005US20050048790 Plasma etching method for semiconductor device
03/03/2005US20050048209 electroconductive coatings comprising graphite and transition metal oxide catalysts, used on elements of corona generators in image forming apparatus to maintaining conductivity and preserving ability of photoreceptors to retain an image charge and allow development with toners
03/03/2005US20050045600 Gas flow pre-charge for a plasma arc torch
03/03/2005US20050045599 Method and apparatus of coordinating operational feedback in a plasma cutter
03/03/2005US20050045589 Plasma treatment of contact lens and IOL
03/03/2005US20050045475 Sputtering apparatus
03/03/2005US20050045275 Plasma treatment apparatus and surface treatment apparatus of substrate
03/03/2005US20050045103 Method and apparatus for applying material to glass
03/03/2005US20050044854 Air/fuel injection system having cold plasma generating means
03/03/2005DE19706136B4 Vorrichtung, die auf die Zündung einer Kernfussion abzielt A device aimed at the ignition of a Kernfussion
03/03/2005DE10335890A1 Plasmagenerator Plasma generator
03/03/2005DE10331807A1 Vorrichtung mit einem drehangetriebenen Drehkörper A device with a rotationally driven rotating body
03/03/2005CA2475316A1 Method and apparatus of coordinating operational feedback in a plasma cutter
03/02/2005EP1509942A2 Apparatus and methods for minimizing arcing in a plasma processing chamber
03/02/2005EP1236380B1 Plasma nozzle
03/02/2005CN2682773Y Normal pressure radio frequency low-temperature cold plasma discharge channel apparatus
03/02/2005CN2682772Y Even large-area normal pressure radio frequency cold plasma generator
03/02/2005CN1589088A Double anode heat plasma generator
03/02/2005CN1191741C Plasma source and ion injector using same
03/01/2005US6862339 EUV, XUV, and X-ray wavelength sources created from laser plasma produced from liquid metal solutions, and nano-size particles in solutions
03/01/2005US6861844 Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma
03/01/2005US6861643 Generating a highly directional and highly dense neutral particle beam from a high-density plasma by neutralizing an ion beam generated by the ion extracting portion; etching of electrical thin films; semiconductors
03/01/2005US6861642 Neutral particle beam processing apparatus
03/01/2005US6861373 Vacuum processing method and semiconductor device manufacturing method in which high-frequency powers having mutually different frequencies are applied to at least one electrode
03/01/2005US6861105 Vaporizing chromium hexacaronyl then introducing chromium formed into vapor deposition apparatus; comprises chromium metal-/oxide-/nitride-/ and/or carbide- layer
03/01/2005US6860973 Device for the regulation of a plasma impedance
02/2005
02/24/2005WO2005017937A2 Sensor array for measuring plasma characteristics in plasma processing enviroments
02/24/2005WO2005006386A3 System and method for inductive coupling of an expanding thermal plasma
02/24/2005US20050041780 X-rays emitter and X-ray apparatus and method of manufacturing an X-ray emitter
02/24/2005US20050040499 Semiconductor device, method for forming silicon oxide film, and apparatus for forming silicon oxide film
02/24/2005US20050040347 Method and device for the generation of far ultraviolet or soft x-ray radiation
02/24/2005US20050040342 Vessel for pretreatment of elementary analysis, method for analyzing elements, inductively coupled plasma torch and apparatus for elementary analysis
02/24/2005US20050040145 Plasma processing method and apparatus
02/24/2005US20050039773 Particle removal apparatus and method and plasma processing apparatus
02/24/2005US20050039441 Exhaust gas purifying apparatus
02/24/2005DE10261253B4 Düse für eine Vorrichtung zum Elektronenstrahlschweißen Nozzle for a device for electron beam welding,
02/24/2005DE10140298B4 Verfahren zum Plasmaschweißen A method for plasma welding
02/23/2005EP1509067A2 Vessel for pretreatment of elementary analysis, method for analysing elements, inductively coupled plasme torch and apparatus for elementary analysis
02/23/2005EP1508677A1 An exhaust gas purifying apparatus