| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 01/03/2013 | WO2013001778A1 Detection apparatus and detection system |
| 01/03/2013 | WO2013001719A1 Polishing head and polishing apparatus |
| 01/03/2013 | WO2013001677A1 Semiconductor device and method for manufacturing same |
| 01/03/2013 | WO2013001676A1 Thin film transistor device and method for producing thin film transistor device |
| 01/03/2013 | WO2013001580A1 Thin film transistor device and method for producing thin film transistor device |
| 01/03/2013 | WO2013001579A1 Thin film transistor device and method for producing thin film transistor device |
| 01/03/2013 | WO2013001482A1 Semiconductor stocker systems and methods. |
| 01/03/2013 | WO2013001225A1 Connecting component equipped with hollow inserts |
| 01/03/2013 | WO2013001014A1 Method for manufacturing a thick epitaxial layer of gallium nitride on a silicon or similar substrate and layer obtained using said method |
| 01/03/2013 | WO2013000636A1 Layered semiconductor substrate and method for manufacturing it |
| 01/03/2013 | WO2013000428A1 A wafer holding device using a pusher rod drawn by strings and springs |
| 01/03/2013 | WO2013000426A1 Wafer clamping device using the stretched threads and springs |
| 01/03/2013 | WO2013000423A1 Pushrod-type wafer holder apparatus using cylinder for reciprocation |
| 01/03/2013 | WO2013000420A1 Wafer-clamping device using spring clips |
| 01/03/2013 | WO2013000268A1 Semiconductor structure and manufacturing method thereof |
| 01/03/2013 | WO2013000199A1 Method for manufacturing thin film transistor matrix substrate and display panel |
| 01/03/2013 | WO2013000197A1 Semiconductor structure and manufacturing method thereof |
| 01/03/2013 | WO2013000196A1 Semiconductor structure and manufacturing method thereof |
| 01/03/2013 | WO2013000190A1 Method for integrating substitute gate of semiconductor device |
| 01/03/2013 | WO2013000188A1 Mosfet and manufacturing method therefor |
| 01/03/2013 | WO2013000187A1 Method for forming multi-gate device |
| 01/03/2013 | WO2013000026A1 Dielectric structures in solar cells |
| 01/03/2013 | WO2013000025A1 Metallisation method |
| 01/03/2013 | WO2012153232A3 Substrate‑transporting module, loading and unloading system, and method for transporting substrates in a substrate‑processing installation |
| 01/03/2013 | WO2012151229A3 3-d integration using multi stage vias |
| 01/03/2013 | WO2012149423A3 Interdigitated electrical contacts for low electronic mobility semiconductors |
| 01/03/2013 | WO2012145196A3 Methods for manufacturing high dielectric constant films |
| 01/03/2013 | WO2012142305A3 Carrier head with shims |
| 01/03/2013 | WO2012141459A3 Support unit for supporting a substrate |
| 01/03/2013 | WO2012135380A3 High performance field-effect transistors |
| 01/03/2013 | WO2012135278A3 Olefin-triggered acid amplifiers |
| 01/03/2013 | WO2012135039A3 Laser direct ablation with picosecond laser pulses at high pulse repetition frequencies |
| 01/03/2013 | WO2012134801A3 Stacked via structure for metal fuse applications |
| 01/03/2013 | WO2012134199A3 Plasma-generating apparatus and substrate-treating apparatus |
| 01/03/2013 | WO2012134105A3 Zinc oxide thin film transistor and manufacturing method thereof |
| 01/03/2013 | WO2012129051A3 Integrated metrology for wafer screening |
| 01/03/2013 | WO2012128556A3 Apparatus for measuring impurities on wafer and method of measuring impurities on wafer |
| 01/03/2013 | WO2012125651A3 Wafer level packaging of mems devices |
| 01/03/2013 | WO2012121067A8 Method for fabricating electrode structure having nanogap length, electrode structure having nanogap length obtained thereby, and nanodevice |
| 01/03/2013 | WO2012118887A3 Apparatus and process for atomic layer deposition |
| 01/03/2013 | WO2012118847A3 Solution processible hardmarks for high resolusion lithography |
| 01/03/2013 | WO2012118615A3 Method and system for design of a surface to be manufactured using charged particle beam lithography |
| 01/03/2013 | WO2012109104A3 Uniformity tuning capable esc grounding kit for rf pvd chamber |
| 01/03/2013 | WO2012106600A9 In situ vapor phase surface activation of sio2 |
| 01/03/2013 | WO2012087660A3 Semiconductor device contacts |
| 01/03/2013 | WO2012017958A9 Process for production of semiconductor device |
| 01/03/2013 | WO2011081921A3 Atomic layer etching with pulsed plasmas |
| 01/03/2013 | WO2010032978A3 Method for depositing amorphous silicon thin film by chemical vapor deposition |
| 01/03/2013 | US20130007678 Integrated circuit module and manufacturing methods and application thereof |
| 01/03/2013 | US20130006411 Methods for non lot based integrated circuit manufacturing |
| 01/03/2013 | US20130005157 Semiconductor-on-insulator substrate and structure including multiple order radio frequency harmonic supressing region |
| 01/03/2013 | US20130005156 Structure and method to obtain eot scaled dielectric stacks |
| 01/03/2013 | US20130005155 Method to enhance charge trapping |
| 01/03/2013 | US20130005154 Method of forming a dielectric layer having an ono structure using an in-situ process |
| 01/03/2013 | US20130005153 Process for Enhancing Solubility and Reaction Rates In Supercritical Fluids |
| 01/03/2013 | US20130005152 Increased deposition efficiency and higher chamber conductance with source power increase in an inductively coupled plasma (icp) chamber |
| 01/03/2013 | US20130005151 Method for forming contact holes |
| 01/03/2013 | US20130005150 Composition for forming resist underlayer film and patterning process using the same |
| 01/03/2013 | US20130005149 Chemical-mechanical planarization of substrates containing copper, ruthenium, and tantalum layers |
| 01/03/2013 | US20130005148 Method of manufacturing semiconductor device |
| 01/03/2013 | US20130005147 Method of reducing critical dimension process bias differences between narrow and wide damascene wires |
| 01/03/2013 | US20130005146 MULTILAYERED LOW k CAP WITH CONFORMAL GAP FILL AND UV STABLE COMPRESSIVE STRESS PROPERTIES |
| 01/03/2013 | US20130005145 Methods of forming a metal pattern |
| 01/03/2013 | US20130005144 Electronic device |
| 01/03/2013 | US20130005143 Method and apparatus providing air-gap insulation between adjacent conductors using nanoparticles |
| 01/03/2013 | US20130005142 Method and apparatus for forming silicon film |
| 01/03/2013 | US20130005141 Semiconductor devices and methods of manufacturing the same |
| 01/03/2013 | US20130005140 Systems and methods for controlling etch selectivity of various materials |
| 01/03/2013 | US20130005139 Techniques for manufacturing planar patterned transparent contact and/or electronic devices including same |
| 01/03/2013 | US20130005138 Local interconnect having increased misalignment tolerance |
| 01/03/2013 | US20130005137 Barrier sequence for use in copper interconnect metallization |
| 01/03/2013 | US20130005136 Methods Of Forming Metal Silicide-Comprising Material And Methods Of Forming Metal Silicide-Comprising Contacts |
| 01/03/2013 | US20130005135 Planar patterned transparent contact, devices with planar patterned transparent contacts, and/or methods of making the same |
| 01/03/2013 | US20130005134 Semiconductor device and method of manufacturing semiconductor device |
| 01/03/2013 | US20130005133 Method of manufacturing a semiconductor device |
| 01/03/2013 | US20130005132 Floating gate device with oxygen scavenging element |
| 01/03/2013 | US20130005131 Semiconductor device fabrication using gate substitution |
| 01/03/2013 | US20130005130 Semiconductor device and method for forming the same |
| 01/03/2013 | US20130005129 Structure and method to integrate embedded dram with finfet |
| 01/03/2013 | US20130005128 Metal gate fill by optimizing etch in sacrificial gate profile |
| 01/03/2013 | US20130005127 Method for manufacturing multigate device |
| 01/03/2013 | US20130005126 Application of cluster beam implantation for fabricating threshold voltage adjusted fets |
| 01/03/2013 | US20130005125 Nanoparticle positioning technique |
| 01/03/2013 | US20130005124 Method for manufacturing a metal oxide semiconductor |
| 01/03/2013 | US20130005123 Laser Annealing Method And Device |
| 01/03/2013 | US20130005122 Method for finishing a substrate of the semiconductor-on-insulator type |
| 01/03/2013 | US20130005121 Deposition Method and Method for Manufacturing Deposition Substrate |
| 01/03/2013 | US20130005119 Method for controlled removal of a semiconductor device layer from a base substrate |
| 01/03/2013 | US20130005118 Formation of iii-v materials using mocvd with chlorine cleans operations |
| 01/03/2013 | US20130005117 Process for high-pressure nitrogen annealing of metal nitrides |
| 01/03/2013 | US20130005116 Edge-exclusion spalling method for improving substrate reusability |
| 01/03/2013 | US20130005115 Methods Of Forming An Array Of Memory Cells, Methods Of Forming A Plurality Of Field Effect Transistors, Methods Of Forming Source/Drain Regions And Isolation Trenches, And Methods Of Forming A Series Of Spaced Trenches Into A Substrate |
| 01/03/2013 | US20130005114 Methods for forming isolated fin structures on bulk semiconductor material |
| 01/03/2013 | US20130005112 Method of forming phase change material layer using ge(ii) source, and method of fabricating phase change memory device |
| 01/03/2013 | US20130005111 Methods of Forming Capacitors |
| 01/03/2013 | US20130005110 Method of fabricating semiconductor device |
| 01/03/2013 | US20130005109 Method for forming a toroidal inductor in a semiconductor substrate |
| 01/03/2013 | US20130005108 SILICON GERMANIUM (SiGe) HETEROJUNCTION BIPOLAR TRANSISTOR (HBT) |
| 01/03/2013 | US20130005107 Semiconductor apparatus and manufacturing method of same |
| 01/03/2013 | US20130005106 Field effect transistor, integrated circuit element, and method for manufacturing the same |