| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 03/05/2013 | US8389301 Non-uniform switching based non-volatile magnetic based memory |
| 03/05/2013 | US8389300 Controlling ferroelectricity in dielectric films by process induced uniaxial strain |
| 03/05/2013 | US8389212 Method for the electronic analysis of a sample oligonucleotide sequence |
| 03/05/2013 | US8389204 Method for producing comb-shaped electrode |
| 03/05/2013 | US8389202 Polymer, radiation-sensitive composition, monomer, and method of producing compound |
| 03/05/2013 | US8389184 Reflective mask blank and method of manufacturing a reflective mask |
| 03/05/2013 | US8389068 Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation |
| 03/05/2013 | US8388799 Composition for forming polishing layer of chemical mechanical polishing pad, chemical mechanical polishing pad and chemical mechanical polishing method |
| 03/05/2013 | US8388758 Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid |
| 03/05/2013 | US8388755 Thermalization of gaseous precursors in CVD reactors |
| 03/05/2013 | US8388409 Substrate polishing apparatus |
| 03/05/2013 | US8388398 Method of manufacturing substrate and organic emitting display device having the substrate |
| 03/05/2013 | US8388394 Method of repairing organic EL display |
| 03/05/2013 | US8387902 Recycling method and recycling apparatus of slurry for use in wafer polishing |
| 03/05/2013 | US8387799 Wafer container with purgeable supporting module |
| 03/05/2013 | US8387612 Self-contained heating unit and drug-supply unit employing same |
| 03/05/2013 | US8387563 Combinatorial process system |
| 03/05/2013 | US8387562 Plasma processor and plasma processing method |
| 03/05/2013 | US8387560 Plasma processing unit |
| 03/05/2013 | US8387559 Semiconductor manufacturing plant |
| 03/05/2013 | US8387238 Processes and structures for IC fabrication |
| 02/28/2013 | WO2013028988A1 Wafer structure for electronic integrated circuit manufacturing |
| 02/28/2013 | WO2013028986A1 Wafer structure for electronic integrated circuit manufacturing |
| 02/28/2013 | WO2013028983A1 Wafer structure for electronic integrated circuit manufacturing |
| 02/28/2013 | WO2013028976A1 Wafer structure for electronic integrated circuit manufacturing |
| 02/28/2013 | WO2013028973A1 Wafer structure for electronic integrated circuit manufacturing |
| 02/28/2013 | WO2013028826A2 Barrier guided growth of microstructured and nanostructured graphene and graphite |
| 02/28/2013 | WO2013028802A1 Formulation for acidic wet chemical etching of silicon wafers |
| 02/28/2013 | WO2013028716A1 Borate esters, boron-comprising dopants, and methods of fabricating boron-comprising dopants |
| 02/28/2013 | WO2013028693A2 Capacitors, apparatus including a capacitor and methods for forming a capacitor |
| 02/28/2013 | WO2013028685A2 Semiconductor device structures including vertical transistor devices, arrays of vertical transistor devices, and methods of fabrication |
| 02/28/2013 | WO2013028641A1 Reduced consumption stand alone rinse tool having self-contained closed-loop fluid circuit, and method of rinsing substrates using the same |
| 02/28/2013 | WO2013028598A1 Anode battery materials and methods of making the same |
| 02/28/2013 | WO2013028542A2 System and method for detecting air in a fluid |
| 02/28/2013 | WO2013028473A1 Method of forming a conductive image on a non-conductive surface |
| 02/28/2013 | WO2013028389A1 Optical detection of metal layer clearance |
| 02/28/2013 | WO2013028376A2 Resistive ram device having improved switching characteristics |
| 02/28/2013 | WO2013028358A1 A method of making a split gate non-volatile floating gate memory cell having a separate erase gate, and a memory cell made thereby |
| 02/28/2013 | WO2013028313A1 High efficiency plasma source |
| 02/28/2013 | WO2013028253A1 Semiconductor nanocrystals and methods |
| 02/28/2013 | WO2013027995A2 Process of surface treatment for wafer |
| 02/28/2013 | WO2013027968A2 Apparatus for fabricating ingot, method for providing material, and method for fabricating ingot |
| 02/28/2013 | WO2013027900A1 Heterodyne interference lithography apparatus, and method for forming micro-patterns, wafer, and semiconductor device using the apparatus |
| 02/28/2013 | WO2013027832A1 Method for manufacturing semiconductor device, block stacked body, and sequential stacked body |
| 02/28/2013 | WO2013027828A1 Noncontact conveyance device |
| 02/28/2013 | WO2013027762A1 Method for manufacturing semiconductor wafer |
| 02/28/2013 | WO2013027739A1 Deterioration diagnostic circuit and deterioration diagnostic method |
| 02/28/2013 | WO2013027738A1 Circuit operation analysis method, circuit operation analysis device and circuit operation analysis program |
| 02/28/2013 | WO2013027722A1 Semiconductor device |
| 02/28/2013 | WO2013027716A1 Organic thin film transistor |
| 02/28/2013 | WO2013027712A1 Rectifying device, transistor, and rectifying method |
| 02/28/2013 | WO2013027702A1 Wire saw |
| 02/28/2013 | WO2013027653A1 Pattern forming method |
| 02/28/2013 | WO2013027605A1 Conveyance mechanism |
| 02/28/2013 | WO2013027585A1 Plasma processing method |
| 02/28/2013 | WO2013027584A1 Vacuum processing device and vacuum processing method |
| 02/28/2013 | WO2013027549A1 Semiconductor device manufacturing method, substrate processing method, substrate processing apparatus, and recording medium |
| 02/28/2013 | WO2013027521A1 Active light-sensitive or radiation-sensitive resin composition, active light-sensitive or radiation-sensitive film using active light-sensitive or radiation-sensitive resin composition, and pattern forming method |
| 02/28/2013 | WO2013027512A1 Semiconductor device |
| 02/28/2013 | WO2013027502A1 Method for manufacturing silicon carbide semiconductor device |
| 02/28/2013 | WO2013027471A1 Semiconductor device |
| 02/28/2013 | WO2013027470A1 Plasma processor, microwave introduction device, and plasma processing method |
| 02/28/2013 | WO2013027453A1 Method for estimating shape before shrink, and cd-sem apparatus |
| 02/28/2013 | WO2013027412A1 Reflective mask and method for manufacturing same |
| 02/28/2013 | WO2013027406A1 Magnetoresistive effect element manufacturing method and magnetoresistive effect film working method |
| 02/28/2013 | WO2013027405A1 Spatial light modulating element and exposure equipment |
| 02/28/2013 | WO2013027400A1 Method for manufacturing spatial light modulation element, spatial light modulation element, spatial light modulator and exposure apparatus |
| 02/28/2013 | WO2013027391A1 In-ga-sn based oxide sintered compact |
| 02/28/2013 | WO2013027361A1 Silicon carbide semiconductor device and method for manufacturing same |
| 02/28/2013 | WO2013027354A1 Bonded body, power semiconductor device and method for manufacturing bonded body and power semiconductor device |
| 02/28/2013 | WO2013027274A1 Semiconductor device |
| 02/28/2013 | WO2013027153A1 Method and device for wet treatment of plate-like articles |
| 02/28/2013 | WO2013027102A1 Deposition system having acces gates and related method |
| 02/28/2013 | WO2013027098A1 Deposition systems including a precursor gas furnace within a reaction chamber, and related methods |
| 02/28/2013 | WO2013026861A1 Method for the characterisation of at least one layer of material comprising semiconductor nanocrystals |
| 02/28/2013 | WO2013026858A1 A method for growing iii-v materials on a non iii-v material substrate comprising steps improving dislocation fault density of a finished material structure suitable for use in semiconductor manufacturing and semiconductor applications |
| 02/28/2013 | WO2013026710A1 Device for the surface treatment of substrates |
| 02/28/2013 | WO2013026395A1 Array substrate and manufacturing method thereof |
| 02/28/2013 | WO2013026382A1 Oxide tft array substrate, manufacturing method therefor, and electronic device |
| 02/28/2013 | WO2013026375A1 Thin film transistor array substrate and its manufacturing method and an electronic device |
| 02/28/2013 | WO2013026368A1 Interference exposure device and method |
| 02/28/2013 | WO2013026365A1 Shot blasting material used for silicon substrate surface treatment and method for preparing silicon substrate |
| 02/28/2013 | WO2013026363A1 Isolation structure of high-voltage driving circuit |
| 02/28/2013 | WO2013026361A1 Step photolithography device and photolithography exposure method |
| 02/28/2013 | WO2013026360A1 Organic thin-film transistor array substrate and manufacturing method thereof, and display device |
| 02/28/2013 | WO2013026277A1 Preparation method of multilayer semiconductor substrate |
| 02/28/2013 | WO2013026248A1 Gsm mobile phone communication card, and method and device for packaging same |
| 02/28/2013 | WO2013026243A1 Semiconductor structure and manufacturing method thereof |
| 02/28/2013 | WO2013026236A1 Semiconductor device structure and manufacturing method thereof and method for manufacturing semiconductor fins |
| 02/28/2013 | WO2013026213A1 Semiconductor device structure and manufacturing method thereof |
| 02/28/2013 | WO2013026177A1 Phosphorous-comprising dopants, methods for forming phosphorous-doped regions in semiconductor substrates using such phosphorous-comprising dopants, and methods for forming such phosphorous-comprising dopants |
| 02/28/2013 | WO2013003522A3 Semiconductor substrate and method of forming |
| 02/28/2013 | WO2012178180A3 Solar cell process carrier |
| 02/28/2013 | WO2012177380A3 Interdigitated vertical native capacitor |
| 02/28/2013 | WO2012177017A3 Metal wire etchant liquid and method for manufacturing a liquid crystal display using the etchant |
| 02/28/2013 | WO2012173793A3 Wafer dicing using pulse train laser with multiple-pulse bursts and plasma etch |
| 02/28/2013 | WO2012173760A3 Laser and plasma etch wafer dicing using water-soluble die attach film |
| 02/28/2013 | WO2012173759A3 In-situ deposited mask layer for device singulation by laser scribing and plasma etch |
| 02/28/2013 | WO2012167141A3 Metal and silicon containing capping layers for interconnects |
| 02/28/2013 | WO2012166856A3 Substrate cleaning method and substrate cleaning device |