Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2013
03/07/2013WO2013031944A1 Piezoelectric device
03/07/2013WO2013031901A1 Method and device for inspecting spatial light modulator, and exposure method and device
03/07/2013WO2013031887A1 Optical substrate and semiconductor light-emitting element
03/07/2013WO2013031878A1 Polymerizable monomer, polymer, resist using same, and pattern forming method therefor
03/07/2013WO2013031868A1 Compound semiconductor device and method for manufacturing same
03/07/2013WO2013031863A1 Reflective mask blank, method for manufacturing reflective mask blank and method for quality control for reflective mask blank
03/07/2013WO2013031823A1 Active matrix substrate and liquid crystal display panel
03/07/2013WO2013031820A1 Organic thin film transistor insulating layer material
03/07/2013WO2013031780A1 Method for plasma etching and plasma etching device
03/07/2013WO2013031751A1 Conductive paste, electrode for semiconductor devices, semiconductor device, and method for manufacturing semiconductor device
03/07/2013WO2013031736A1 Negative photosensitive resin composition, partition wall, black matrix and optical element
03/07/2013WO2013031710A1 Adhesive sheet for immobilizing imprint mold, imprint device, and imprint method
03/07/2013WO2013031692A1 Polishing pad
03/07/2013WO2013031686A1 Negative active-light-sensitive or radiation-sensitive resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photomask
03/07/2013WO2013031632A1 Exposure light adjustment device
03/07/2013WO2013031596A1 Plate shaped body for temperature measurement and temperature measuring apparatus provided with same
03/07/2013WO2013031554A1 Etching liquid composition and etching method
03/07/2013WO2013031482A1 Power supply apparatus for generating plasma, method for setting parameter for generating plasma
03/07/2013WO2013031480A1 Semiconductor device manufacturing method and bonding method
03/07/2013WO2013031460A1 Resin mold bonding method and roll-to-roll continuous mold composition using same
03/07/2013WO2013031430A1 Heat treatment device
03/07/2013WO2013031390A1 Liquid-treatment device and liquid-treatment method
03/07/2013WO2013031235A1 Aligning method, exposure method, device manufacturing method, and method for manufacturing flat panel display
03/07/2013WO2013031230A1 Method for manufacturing display panel
03/07/2013WO2013031223A1 Substrate treatment device, substrate treatment method, light exposure method, light exposure device, method for manufacturing device, and method for manufacturing flat panel display
03/07/2013WO2013031222A1 Object transportation device, object processing device, exposure device, method for producing flat panel display, method for producing device, method for transporting object, and method for exchanging object
03/07/2013WO2013031221A1 Mobile device, exposure device, method for producing flat panel display, and method for producing device
03/07/2013WO2013031212A1 Bidirectional element, bidirectional element circuit, and power converting apparatus
03/07/2013WO2013031202A1 Metal joining device
03/07/2013WO2013031198A1 Method for manufacturing thin-film-formation substrate, method for manufacturing thin-film-element substrate, thin-film substrate, and thin-film-element substrate
03/07/2013WO2013031196A1 Method of manufacturing tape-like pattern medium
03/07/2013WO2013031172A1 SiC SEMICONDUCTOR ELEMENT AND MANUFACTURING METHOD THEREOF
03/07/2013WO2013031146A1 High-frequency module and method for inspecting high-frequency module
03/07/2013WO2013031142A1 Film forming method and storage medium
03/07/2013WO2013031111A1 Silicon wafer polishing method and abrasive
03/07/2013WO2013031090A1 Silicon wafer polishing method and polishing device
03/07/2013WO2013031084A1 Ozone gas generation treatment device, silicon oxide film formation method, and silicon single crystal wafer evaluation method
03/07/2013WO2013031049A1 Liquid-application device and liquid-application method
03/07/2013WO2013031048A1 Liquid-application device and liquid-application method
03/07/2013WO2013030982A1 Drying holder for solar cell and method for producing solar cell
03/07/2013WO2013030968A1 Rectangular, aluminum-, gold-, palladium- or platinum-coated copper ribbon for semiconducter element
03/07/2013WO2013030959A1 Plasma film forming apparatus and plasma film forming method
03/07/2013WO2013030953A1 Antenna for plasma processing apparatus, and plasma processing apparatus using antenna
03/07/2013WO2013030943A1 Semiconductor device
03/07/2013WO2013030922A1 Glass composition for semiconductor junction protection, process for producing semiconductor device, and semiconductor device
03/07/2013WO2013030885A1 Thin-film-formation-substrate manufacturing method and thin-film substrate
03/07/2013WO2013030865A1 Thin film transistor array fabrication method, thin film transistor array, and display device
03/07/2013WO2013030763A1 Seebeck/peltier thermoelectric conversion device having phonon confinement layers of crystalline semiconductor containing angstrom-sized organic groups as semiconductor atoms substituents within the crystal lattice and fabrication process
03/07/2013WO2013030625A1 Integrated circuit device and method of identifying a presence of a broken connection within an external signal path
03/07/2013WO2013030624A1 Integrated circuit package
03/07/2013WO2013030190A1 Wafer holder and temperature conditioning arrangement and method of manufacturing a wafer
03/07/2013WO2013030109A1 Device and system for processing flat substrates
03/07/2013WO2013030088A1 Device and method for coating a substrate
03/07/2013WO2013029852A1 Method for bonding semiconductor components
03/07/2013WO2013029714A1 A method of generating a hole or recess or well in an electrically insulating or semiconducting substrate
03/07/2013WO2013029713A1 A method of generating a high quality hole or recess or well in a substrate
03/07/2013WO2013029656A1 Method for permanently bonding wafers by a connecting layer by means of solid-state diffusion or phase transformation
03/07/2013WO2013029564A1 Three-dimensional recorded memory
03/07/2013WO2013029345A1 Touch pane land manufacturing method thereof
03/07/2013WO2013029318A1 Semiconductor structure and manufacturing method thereof
03/07/2013WO2013029314A1 Semiconductor device and manufacturing method thereof
03/07/2013WO2013029311A1 Semiconductor device and manufacturing method thereof
03/07/2013WO2013029310A1 Semiconductor device and manufacturing method thereof
03/07/2013WO2013029308A1 Semiconductor device and manufacturing method thereof
03/07/2013WO2013029210A1 Method for manufacturing dummy gate in gate-last process
03/07/2013WO2013029118A1 Patterning method
03/07/2013WO2013009505A3 Methods of manufacturing thin film transistor devices
03/07/2013WO2013009087A3 Non-contact thin plate transfer device
03/07/2013WO2013007229A9 Monolithic integrated semiconductor structure
03/07/2013WO2012176106A3 Method and apparatus for inspection of light emitting semiconductor devices using photoluminescence imaging
03/07/2013WO2012173380A3 Three-dimensional flash memory using fringing effect and method for manufacturing same
03/07/2013WO2012170339A3 Signal routing using through-substrate vias
03/07/2013WO2012168902A3 Method to trace conductive tracks
03/07/2013WO2012166528A3 Refillable ampoule with purge capability
03/07/2013WO2012166483A3 Apparatuses including stair-step structures and methods of forming the same
03/07/2013WO2012123741A3 Oxide removal from semiconductor surfaces
03/07/2013WO2012121921A3 Reduced pattern loading using silicon oxide multi-layers
03/07/2013US20130060374 Segregating wafer carrier types in semiconductor storage devices
03/07/2013US20130059451 Method of manufacturing semiconductor device and substrate processing apparataus
03/07/2013US20130059450 Etch process for 3d flash structures
03/07/2013US20130059449 Gas cluster ion beam etch profile control using beam divergence
03/07/2013US20130059448 Pulsed Plasma Chamber in Dual Chamber Configuration
03/07/2013US20130059447 Method and apparatus for reduction of voltage potential spike during dechucking
03/07/2013US20130059446 Gas cluster ion beam etching process for achieving target etch process metrics for multiple materials
03/07/2013US20130059445 GAS CLUSTER ION BEAM ETCHING PROCESS FOR Si-CONTAINING and Ge-CONTAINING MATERIALS
03/07/2013US20130059444 Gas cluster ion beam etching process for metal-containing materials
03/07/2013US20130059443 Reduction of etch microloading for through silicon vias
03/07/2013US20130059442 Method for adjusting trench depth of substrate
03/07/2013US20130059441 Method for fabricating a semiconductor structure
03/07/2013US20130059440 Selective suppression of dry-etch rate of materials containing both silicon and nitrogen
03/07/2013US20130059439 Cmp polishing liquid, method for polishing substrate, and electronic component
03/07/2013US20130059438 Method for forming pattern and mask pattern, and method for manufacturing semiconductor device
03/07/2013US20130059437 Method for manufacturing semiconductor device
03/07/2013US20130059436 Device fabrication
03/07/2013US20130059435 Method of Manufacturing Dummy Gates in Gate Last Process
03/07/2013US20130059434 Method for manufacturing electrodes and wires in gate last process
03/07/2013US20130059433 Methods and compositions for doping silicon substrates with molecular monolayers
03/07/2013US20130059432 Nonvolatile memory device and method of manufacturing the same
03/07/2013US20130059431 Device and method for substrate processing
03/07/2013US20130059430 High Throughput Multi-Wafer Epitaxial Reactor
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