Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2013
04/04/2013WO2013048693A1 Structure having monolithic heterogeneous integration of compound semiconductors with elemental semiconductor
04/04/2013WO2013048685A1 Methods of forming through-substrate vias
04/04/2013WO2013048620A1 Reconstituted wafer package with high voltage discrete active dice and integrated field plate for high temperature leakage current stability
04/04/2013WO2013048524A1 Source/drain contacts for non-planar transistors
04/04/2013WO2013048516A1 Capping dielectric structure for transistor gates
04/04/2013WO2013048513A1 Non-planar transitor fin fabrication
04/04/2013WO2013048501A1 Interlayer communications for 3d integrated circuit stack
04/04/2013WO2013048496A1 Method for handling very thin device wafers
04/04/2013WO2013048473A1 Fluxing-encapsulant material for microelectronic packages assembled via thermal compression bonding process
04/04/2013WO2013048455A1 Non-planar transistors and methods of fabrication thereof
04/04/2013WO2013048449A1 Tungsten gates for non-planar transistors
04/04/2013WO2013048417A1 Electropositive metal containing layers for semiconductor applications
04/04/2013WO2013048415A1 Low temperature thin wafer backside vacuum process with backgrinding tape
04/04/2013WO2013048376A1 Circuit that selects eproms individually and in parallel
04/04/2013WO2013048270A1 Method for forming palladium silicide nanowires
04/04/2013WO2013048016A2 Substrate supporting unit and substrate processing device, and method for producing substrate supporting unit
04/04/2013WO2013048013A1 Non-contact type plasma ashing apparatus
04/04/2013WO2013047916A1 Camera
04/04/2013WO2013047905A1 Nanoimprinting method and resist composition employed in the nanoimprinting method
04/04/2013WO2013047902A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern
04/04/2013WO2013047895A1 Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, manufacturing method of semiconductor device, semiconductor device and production method of resin
04/04/2013WO2013047852A1 Wafer for use in solar cells, manufacturing method of wafer for use in solar cells, solar cell manufacturing method and solar cell module manufacturing method
04/04/2013WO2013047851A1 Nanoimprinting method, nanoimprinting apparatus for executing the nanoimprinting method, and method for producing patterned substrates
04/04/2013WO2013047753A1 Molding device, molding method, imprinting mold, and imprinting method using imprinting mold
04/04/2013WO2013047737A1 Conveyance device
04/04/2013WO2013047734A1 Polishing composition
04/04/2013WO2013047733A1 Polishing composition
04/04/2013WO2013047724A1 Chip resistor and electronic equipment having resistance circuit network
04/04/2013WO2013047712A1 Nanoimprinting mold, method for producing the nanoimprinting mold, nanoimprinting method using the nanoimprinting mold, and method for producing patterned substrates
04/04/2013WO2013047694A1 METHOD FOR MANUFACTURING MICROCRYSTALLINE Si-TFT SUBSTRATE AND SEMICONDUCTOR DEVICE
04/04/2013WO2013047678A1 Method for manufacturing fine particles
04/04/2013WO2013047674A1 Dicing sheet with protective film forming layer and chip fabrication method
04/04/2013WO2013047648A1 Electrostatic chuck
04/04/2013WO2013047647A1 Alternating current drive electrostatic chuck
04/04/2013WO2013047631A1 Semiconductor device
04/04/2013WO2013047629A1 Semiconductor device
04/04/2013WO2013047575A1 Upper electrode, plasma processing device, and method for controlling electric field intensity distribution
04/04/2013WO2013047555A1 Electrostatic chuck device
04/04/2013WO2013047531A1 Plasma etching method and method for manufacturing semiconductor device
04/04/2013WO2013047519A1 Drive device and substrate processing system
04/04/2013WO2013047516A1 Diarylamine novolac resin
04/04/2013WO2013047506A1 Nitride semiconductor fabrication device material washing method and nitride semiconductor fabrication device material washing device
04/04/2013WO2013047464A1 Etching method and device
04/04/2013WO2013047396A1 Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device
04/04/2013WO2013047375A1 Method for producing semiconductor device and semiconductor device
04/04/2013WO2013047361A1 Method for producing substrate having buffer layer structure for growing nitride semiconductor layer
04/04/2013WO2013047330A1 Joint
04/04/2013WO2013047323A1 Method for producing semiconductor device and semiconductor device
04/04/2013WO2013047320A1 Substrate treatment device, method for manufacturing semiconductor device, and recording medium
04/04/2013WO2013047259A1 Nanoimprinting apparatus, nanoimprinting method, distortion imparting device and distortion imparting method
04/04/2013WO2013047213A1 Non-volatile resistance network aggregate and non-volatile logic gate having enhanced fault tolerance using same
04/04/2013WO2013047199A1 Sputtering target and manufacturing method therefor
04/04/2013WO2013047195A1 Mold blank, master mold, copy mold, and method for manufacturing mold blank
04/04/2013WO2013047136A1 Curable composition for imprint, pattern forming method, and pattern
04/04/2013WO2013047127A1 Substrate processing system, and indication method for substrate processing system
04/04/2013WO2013047117A1 Photoresist composition, method for forming resist pattern, and polymer
04/04/2013WO2013047106A1 Resin having fluorene structure and underlayer film-forming material for lithography
04/04/2013WO2013047095A1 Wiring structure for display device
04/04/2013WO2013047092A1 Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device
04/04/2013WO2013047091A1 Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device
04/04/2013WO2013047085A1 Semiconductor device and method for producing semiconductor device
04/04/2013WO2013047072A1 Composition for forming overcoat film for immersion exposure and method for resist pattern formation
04/04/2013WO2013047044A1 Composition for forming film for liquid-immersion exposure, polymer, compound, and method for forming resist pattern
04/04/2013WO2013047000A1 Microwave radiating mechanism, surface wave plasma source, and surface wave plasma processing device
04/04/2013WO2013046992A1 Method for three-dimensionally mounting chip
04/04/2013WO2013046991A1 Three-dimensional mounting device
04/04/2013WO2013046977A1 Silicon carbide semiconductor device fabrication method
04/04/2013WO2013046943A1 Nitride semiconductor device and method for manufacturing same
04/04/2013WO2013046923A1 Fluororesin molded article
04/04/2013WO2013046863A1 Semiconductor device and method for manufacturing same
04/04/2013WO2013046848A1 Defect observation method and defect observation device
04/04/2013WO2013046843A1 Charged particle beam apparatus that performs image classification assistance
04/04/2013WO2013046836A1 Defect inspection method and defect inspection device
04/04/2013WO2013046802A1 Bonding device
04/04/2013WO2013046680A1 Circuit device
04/04/2013WO2013046642A1 Deposit removal method
04/04/2013WO2013046641A1 Reflective mask blank, reflective mask, and methods for manufacturing reflective mask blank and reflective mask
04/04/2013WO2013046640A1 Plasma processing apparatus and plasma processing method
04/04/2013WO2013046627A1 Mask blank for reflection-type exposure, and mask for reflection-type exposure
04/04/2013WO2013046606A1 Thin film transistor and image display apparatus
04/04/2013WO2013046578A1 Semiconductor device
04/04/2013WO2013046552A1 Transport system
04/04/2013WO2013046547A1 Organic thin film transistor
04/04/2013WO2013046537A1 Semiconductor device provided with vertical semiconductor element
04/04/2013WO2013046525A1 Method for calculating warping of bonded soi wafer and method for manufacturing bonded soi wafer
04/04/2013WO2013046517A1 Vaporizer
04/04/2013WO2013046439A1 Semiconductor device
04/04/2013WO2013046420A1 Semiconductor drive circuit and power conversion apparatus using same
04/04/2013WO2013046378A1 Igbt and manufacturing method therefor
04/04/2013WO2013046377A1 Semiconductor device and method for manufacturing same
04/04/2013WO2013046286A1 Plasma film forming apparatus
04/04/2013WO2013046267A1 Semiconductor element and method of manufacturing same
04/04/2013WO2013046157A1 Nickel bis diazabutadiene precursors, their synthesis, and their use for nickel containing film depositions
04/04/2013WO2013046050A2 Dry cleaning method for recovering etch process condition
04/04/2013WO2013045985A1 Methods of transferring layers of material in 3d integration processes and related structures and devices
04/04/2013WO2013045780A1 Contactless user interface having organic semiconductor components
04/04/2013WO2013045779A1 Contactless user interface
04/04/2013WO2013045767A1 Method for decreasing an excess carrier induced degradation in a silicon substrate
04/04/2013WO2013045369A1 Component, and method for producing said component using a pressure-free sintering process by applying heat and ultrasound
04/04/2013WO2013045367A2 Electronic assembly comprising substrate basic material having high thermal stability
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