Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2013
04/16/2013US8420419 Group-III nitride semiconductor laser device, and method for fabricating group-III nitride semiconductor laser device
04/16/2013US8420418 Light-emitting device and manufacturing method thereof
04/16/2013US8420417 Light emitting device and method of manufacture
04/16/2013US8420416 Method of manufacturing organic electroluminescent element and white light-emitting organic electroluminescent element
04/16/2013US8420415 Method for forming a light conversion material
04/16/2013US8420414 Method of manufacturing light-emitting device
04/16/2013US8420412 Method of forming a photovoltaic cell module
04/16/2013US8420411 Method for aligning wafer stack
04/16/2013US8420410 Techniques providing fiducial markers for failure analysis
04/16/2013US8420409 Method for manufacturing semiconductor device
04/16/2013US8420407 Growth method of Fe3N material
04/16/2013US8420168 Delivery device for deposition
04/16/2013US8420124 Methods for fabricating isolated micro- and nano-structures using soft or imprint lithography
04/16/2013US8419970 Silicon nitride polishing liquid and polishing method
04/16/2013US8419964 Apparatus and method for edge bevel removal of copper from silicon wafers
04/16/2013US8419959 Clamped monolithic showerhead electrode
04/16/2013US8419894 Plasma generator, plasma control method and method of producing substrate
04/16/2013US8419893 Shielded lid heater assembly
04/16/2013US8419892 Plasma process detecting sensor
04/16/2013US8419891 Semiconductor development apparatus and method using same
04/16/2013US8419888 Method and apparatus for mounting electric component
04/16/2013US8419854 Film-forming apparatus
04/16/2013US8419341 Linear vacuum robot with Z motion and articulated arm
04/16/2013US8419337 Gate valve and substrate processing system using same
04/16/2013US8419001 Method and jig for holding silicon wafer
04/16/2013US8418650 Inner electrode for barrier film formation and apparatus for film formation
04/16/2013US8418649 Composite showerhead electrode assembly for a plasma processing apparatus
04/16/2013US8418359 Method for manufacturing circuit pattern-provided substrate
04/16/2013US8418356 Method of manufacturing an embedded printed circuit board
04/11/2013WO2013052966A1 Plasma etch resistant films, articles bearing plasma etch resistant films and related methods
04/11/2013WO2013052833A2 High power semiconductor electronic components with increased reliability
04/11/2013WO2013052712A2 Selective etch of silicon by way of metastable hydrogen termination
04/11/2013WO2013052679A1 Monolithic 3-d integration using graphene
04/11/2013WO2013052509A2 Remote plasma burn-in
04/11/2013WO2013052418A1 Method for making electrical structure with air dielectric and related electrical structures
04/11/2013WO2013052384A1 Gate array architecture with multiple programmable regions
04/11/2013WO2013052364A1 Method of and apparatus for multiple channel flow ratio controller system
04/11/2013WO2013052298A1 Methods for depositing a silicon containing layer with argon gas dilution
04/11/2013WO2013052262A1 Particle control in laser processing systems
04/11/2013WO2013052236A1 Methods of processing units comprising crystalline materials, and methods of forming semiconductor-on insulator constructions
04/11/2013WO2013052215A2 Substrate containing aperture and methods of forming the same
04/11/2013WO2013052211A1 Electrochemical processor alignment system
04/11/2013WO2013052169A1 Sidewall image transfer process with multiple critical dimensions
04/11/2013WO2013052147A1 Gel having improved thermal stability
04/11/2013WO2013052145A1 In-situ hydroxylation apparatus
04/11/2013WO2013052067A1 Formation of dram capacitor among metal interconnect
04/11/2013WO2013051877A2 Vacuum processing apparatus having a means for preventing counter-pressure between chambers
04/11/2013WO2013051764A1 High load and high precision polygonal guide, and picker actuator using same
04/11/2013WO2013051735A1 Underlay film composition for imprints and method of forming pattern and pattern formation method using the same
04/11/2013WO2013051716A1 Surface inspection system for semiconductor wafer
04/11/2013WO2013051713A1 Specimen holder
04/11/2013WO2013051695A1 Positive photosensitive resin composition, method for producing cured product, method for producing resin pattern, cured product and optical member
04/11/2013WO2013051675A1 Probe unit
04/11/2013WO2013051674A1 Probe unit
04/11/2013WO2013051644A1 Insulating film and production method for same
04/11/2013WO2013051599A1 Semiconductor device and production method for same
04/11/2013WO2013051558A1 Composition for forming silicon-containing euv resist underlayer film
04/11/2013WO2013051555A1 Single-crystal silicon-carbide substrate and polishing solution
04/11/2013WO2013051515A1 Probe card and noise measuring apparatus
04/11/2013WO2013051467A1 Electron beam lithography device and lithographic method
04/11/2013WO2013051463A1 Wafer bonding method and structure of bonding part of wafer
04/11/2013WO2013051442A1 Composition for forming resist upperlayer film for lithography
04/11/2013WO2013051395A1 Bonding device and bonded substrate manufactured using same
04/11/2013WO2013051384A1 Phase shift mask, asymmetric pattern forming method, diffraction grating manufacturing method and semiconductor device manufacturing method
04/11/2013WO2013051383A1 Method for forming photoresist pattern and method for forming etching mask
04/11/2013WO2013051375A1 Dicing device, and method for manufacturing semiconductor device
04/11/2013WO2013051362A1 Semiconductor device manufacturing method
04/11/2013WO2013051355A1 Film formation apparatus, film formation method, and storage medium
04/11/2013WO2013051344A1 Silicon carbide semiconductor device and method for producing same
04/11/2013WO2013051343A1 Silicon carbide semiconductor device and method for producing same
04/11/2013WO2013051329A1 Method for manufacturing solar cell
04/11/2013WO2013051282A1 Semiconductor device manufacturing method
04/11/2013WO2013051248A1 Plasma processing apparatus
04/11/2013WO2013051247A1 Stacked type semiconductor device and printed circuit board
04/11/2013WO2013051221A1 Thin-film element, thin-film element array, and method of manufacturing thin-film element
04/11/2013WO2013051197A1 Resin coating device and resin coating method
04/11/2013WO2013051184A1 Wafer processing method
04/11/2013WO2013051183A1 Workpiece cutting method and wire saw
04/11/2013WO2013051175A1 Semiconductor integrated circuit device
04/11/2013WO2013051163A1 Gan film manufacturing method and composite substrate used in same
04/11/2013WO2013050927A1 Method of forming a crystallised silicon layer on the surface of a plurality of substrates
04/11/2013WO2013050877A1 Removing conductive material to form conductive features in a substrate
04/11/2013WO2013050805A1 Substrate turning device
04/11/2013WO2013050716A1 Multi-wafer holder
04/11/2013WO2013050707A1 Ram memory point with a transistor
04/11/2013WO2013050683A1 Double layer transfer method
04/11/2013WO2013050673A1 Device and method for inspecting semi-conductor materials
04/11/2013WO2013050556A1 Method of manufacturing a solar cell with local back contacts
04/11/2013WO2013049965A1 Dragonfly wire bonding
04/11/2013WO2013025994A3 Spin hall effect magnetic apparatus, method and applications
04/11/2013WO2013025003A3 Method for etching copper/molybdenum alloy film with increased etching capacity of etchant
04/11/2013WO2013022560A3 Memory cells
04/11/2013WO2013019064A3 Equipment for manufacturing semiconductor for epitaxial process
04/11/2013WO2013019027A3 Apparatus for fabricating ingot and method for fabricating ingot
04/11/2013WO2013015642A3 Method for growth of ingot
04/11/2013WO2013012299A3 Mask, and optical filter manufacturing apparatus comprising same
04/11/2013WO2013012246A3 Power generating apparatus using effluent gases exhausted from process chamber
04/11/2013WO2013010111A3 Nanoimprint lithography
04/11/2013WO2013009067A3 Flash memory device
04/11/2013WO2013006314A3 Metal-oxide films from small molecules for lithographic applications