Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
06/1995
06/27/1995US5428240 Source/drain structural configuration for MOSFET integrated circuit devices
06/27/1995US5428239 Semiconductor device having retrograde well and diffusion-type well
06/27/1995US5428238 Semiconductor memory cell having information storage transistor and switching transistor
06/27/1995US5428237 Semiconductor device having an insulated gate transistor
06/27/1995US5428234 Semiconductor device
06/27/1995US5428232 Field effect transistor apparatus
06/27/1995US5428231 Solid-state image device including charge-coupled devices having improved electrode structure
06/27/1995US5428229 Pressure contact type MOS semiconductor device and fabrication method of the same
06/27/1995US5428224 Field effect transistor
06/27/1995US5428203 Electron beam exposing apparatus with a stencil mask kept at a constant temperature
06/27/1995US5427985 Amorphous, hydrogenated carbon as an insulator in device fabrication
06/27/1995US5427984 Method of making a cooling package for a semiconductor chip
06/27/1995US5427983 Depositing adhesion metal layer over etched molybdenum mask, overlays a metallic cushion layer and uppermost gold protective layer spreads over edges to cover exposed edges
06/27/1995US5427982 Method for fabricating a semiconductor device
06/27/1995US5427981 Process for fabricating metal plus using metal silicide film
06/27/1995US5427980 Method of making a contact of a semiconductor memory device
06/27/1995US5427977 Porous regions are formed on silicon or silicon carbide semiconductor layer by anodic oxidation of hydrofluoric acid, this layer is immersed in pure water, applying ultrasound waves, separate bubbles from surface of porous region
06/27/1995US5427976 Method of producing a semiconductor on insulating substrate, and a method of forming a transistor thereon
06/27/1995US5427975 Method of micromachining an integrated sensor on the surface of a silicon wafer
06/27/1995US5427974 Depositing titanium/titanium nitride layer over polysilicon electrode and then tungsten layer; etching to form residual islands
06/27/1995US5427973 Method for production of SOI transistor device having a storage cell
06/27/1995US5427972 Method of making a sidewall contact
06/27/1995US5427971 Method for fabrication of semiconductor elements
06/27/1995US5427970 Masking semiconductor substrate with silicon nitride, forming tunnel oxide, doping, oxidation, mask removal, depositing patterned polysilicon floating gate, dielectric layer, and polysilicon control gate
06/27/1995US5427967 Technique for making memory cells in a way which suppresses electrically conductive stringers
06/27/1995US5427966 Process for fabricating a semiconductor device having floating gate and control gate electrodes
06/27/1995US5427964 Insulated gate field effect transistor and method for fabricating
06/27/1995US5427963 Method of making a MOS device with drain side channel implant
06/27/1995US5427962 Method of making a thin film transistor
06/27/1995US5427938 Method of manufacturing a resin-sealed semiconductor device
06/27/1995US5427878 Semiconductor wafer processing with across-wafer critical dimension monitoring using optical endpoint detection
06/27/1995US5427876 Transparent substrate with light shielding region formed on top major surface, main phase shifting region, auxiliary phase shifting region on periphery; accuracy
06/27/1995US5427862 Photocurable polyimide coated glass fiber
06/27/1995US5427824 CVD apparatus
06/27/1995US5427820 A dispenser has an inner core wall enclosing a conduit for dispensing liquid and an outer annular wall enclosing a chamber for circulation of coolant to heat exchange
06/27/1995US5427670 Device for the treatment of substrates at low temperature
06/27/1995US5427669 Thin film DC plasma processing system
06/27/1995US5427659 Process for the manufacture of devices
06/27/1995US5427649 A simplified process of forming photoresist pattern by oxidizing the silylated layer to form an etching mask
06/27/1995US5427648 Method of forming porous silicon
06/27/1995US5427644 Method of manufacturing semiconductor wafer and system therefor
06/27/1995US5427641 Method of forming a mounting structure on a tape carrier
06/27/1995US5427638 Polishing surface, cleaning, ion bombarding with oxygen and fluorine ions
06/27/1995US5427630 A silicon or silicon-germanium alloy crystal growth inhibitor comprising an oxide of rare earth metal
06/27/1995US5427622 Method for uniform cleaning of wafers using megasonic energy
06/27/1995US5427621 Cleaning the interior surface of vapor depositing chemical reactor by sudden change in magnetic flux density of magnetic field
06/27/1995US5427620 Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment
06/27/1995US5427536 Socket for tab testing
06/27/1995US5427301 Ultrasonic flip chip process and apparatus
06/27/1995US5427055 Method for controlling roughness on surface of monocrystal
06/27/1995US5427054 Vapor deposition by decomposing hydrocarbon, oxygen and hydrogen source and/or boron source for doping
06/27/1995US5427052 Method and apparatus for production of extremely thin SOI film substrate
06/27/1995US5426944 Expanding electronic semiconductor grade chemical through an orifice in a condenser; withdrawing portion of vapor phase; concentrating impurities in liquid phase
06/27/1995US5426865 Vacuum creating method and apparatus
06/27/1995US5426849 Method of producing a polyimide multilayer wiring board
06/27/1995CA2059476C Electrically erasable phase change memory
06/27/1995CA1336061C High-oxygen-content silicon monocrystal substrate for semiconductor devices and production method therefor
06/27/1995CA1336057C Formation of microstructures with removal of liquid by freezing and sublimation
06/25/1995CA2139008A1 Output buffer circuit, input buffer circuit and bi-directional buffer circuit for plural voltage systems
06/22/1995WO1995017019A1 Buffer structure between silicon carbide and gallium nitride and resulting semiconductor devices
06/22/1995WO1995017017A1 Electric bonding process on porous silicon
06/22/1995WO1995017010A1 An increased-density flash eprom that requires less area to form the metal bit line-to-drain contacts
06/22/1995WO1995017009A1 Semiconductor device
06/22/1995WO1995017008A1 Semiconductor device
06/22/1995WO1995017006A1 A method of planarizing a dielectric layer of an integrated circuit
06/22/1995WO1995017005A1 Method for fabricating self-assembling microstructures
06/22/1995WO1995017004A1 Semiconductor wafer transport container
06/22/1995WO1995016998A1 Anisotropic, electrically conductive adhesive film
06/22/1995WO1995016924A1 Device for testing the connection between an output of a means which outputs a fixed logic value and the input of a circuit
06/22/1995WO1995016923A1 Separate iddq-testing of signal path and bias path in an ic
06/22/1995WO1995016804A1 Gas diffuser plate assembly and rf electrode
06/22/1995WO1995016800A1 Apparatus for heating or cooling wafers
06/22/1995WO1995016797A1 Molybdenum-tungsten material for wiring, molybdenum-tungsten target for wiring, process for producing the same, and molybdenum-tungsten wiring thin film
06/22/1995WO1995012003A3 Method and apparatus for sputtering magnetic target materials
06/22/1995DE4445796A1 Semiconductor device contg. MOSFET
06/22/1995DE4444618A1 Halbleiterlaser Semiconductor laser
06/22/1995DE4418207C1 Thermal sensor or actuator in semiconductor material
06/22/1995DE4415955A1 Lightly doped drain MOS transistor prodn.
06/22/1995DE4406849A1 Prodn. of MOS transistor with tin silicide film
06/22/1995DE4400034C1 Semiconductor, esp. DRAM cell structure, prodn. process
06/22/1995DE4342901A1 Suction tweezer head for silicon wafers in semiconductor manufacture
06/22/1995CA2177605A1 Gas diffuser plate assembly and rf electrode
06/21/1995EP0658941A2 Field effect transistor
06/21/1995EP0658940A1 Semiconductor element controlled by field effect
06/21/1995EP0658939A2 Voltage-driven thyristor and method of manufacturing the same
06/21/1995EP0658938A1 An integrated circuit comprising an EPROM cell and a MOS transistor
06/21/1995EP0658936A2 Multilayer semiconductor device
06/21/1995EP0658931A1 Process of making thin and thick metallic layers
06/21/1995EP0658930A2 Varying the thickness of the surface silicon layer in a silicon-on-insulator substrate
06/21/1995EP0658929A1 Process for delaminating organic resin from board and process for manufacturating organic resin multi-layer wiring board
06/21/1995EP0658928A1 Method of plasma etching silicon dioxide, selectively to silicon nitride and polysilicon
06/21/1995EP0658927A1 Process for forming a parallel pipe-shaped cavity for receiving a component in a support plate
06/21/1995EP0658926A1 Method of producing a semiconductor device comprising a contact layer between the silicon substrate and a wiring layer
06/21/1995EP0658925A1 Ultrasonic jet semiconductor wafer cleaning apparatus
06/21/1995EP0658923A1 Wafer cleaning tank
06/21/1995EP0658917A2 Fine-processing apparatus using low-energy neutral particle beam
06/21/1995EP0658905A2 Electronic memory circuit
06/21/1995EP0658904A2 Semiconductor integrated circuit device
06/21/1995EP0658811A1 Illumination device for a microlithographic projection exposure apparatus
06/21/1995EP0658810A1 Illumination device for an optical system with a reticle masking system
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