Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/1996
03/27/1996CN1119342A Electronic package with multilevel connections
03/27/1996CN1119341A Getterer for multi-layer wafers and method for making same
03/27/1996CN1119340A Method for forming resist patterns
03/27/1996CN1119339A In situ monitoring technique and apparatus for chemical/mechanical planarization endpoint detection
03/27/1996CN1119338A Structure for alignment of an ion source aperture with a predetermind ion beam path
03/27/1996CN1031446C Making method for multi-layer electronic circuit
03/27/1996CN1031436C Manufacturing method of semiconductor device
03/27/1996CA2159028A1 Microwave energized ion source for ion implantation
03/26/1996US5502681 Column start signal generation circuit for memory device
03/26/1996US5502679 Electrically erasable nonvolatile memory having discharging circuits
03/26/1996US5502675 Semiconductor memory device having a multi-bit input/output configuration which is capable of correcting a bit failure
03/26/1996US5502673 Non-volatile register system utilizing thin-film floating-gate amorphous transistors
03/26/1996US5502669 Electrically erasable and programmable read only memory device having selectively erasable sectors
03/26/1996US5502649 Method and apparatus for determining power supply wirings of a semiconductor device
03/26/1996US5502643 Method of and an apparatus for setting up parameters which are used to manufacture a semiconductor device
03/26/1996US5502621 Mirrored pin assignment for two sided multi-chip layout
03/26/1996US5502581 Hologram manufacturing method and apparatus
03/26/1996US5502431 Integrated circuit device
03/26/1996US5502407 Low-power-dissipation CMOS circuits
03/26/1996US5502404 Gate array cell with predefined connection patterns
03/26/1996US5502399 Power semiconductor device with a gate withstand-voltage test terminal
03/26/1996US5502398 Semiconductor device burn-in apparatus
03/26/1996US5502355 Plasma processing apparatus for producing high density plasma
03/26/1996US5502337 Semiconductor device structure including multiple interconnection layers with interlayer insulating films
03/26/1996US5502336 Semiconductor device and manufacturing method thereof
03/26/1996US5502335 Semiconductor device with wiring layer
03/26/1996US5502334 Electroconductive adhesive, semiconductors
03/26/1996US5502333 Semiconductor stack structures and fabrication/sparing methods utilizing programmable spare circuit
03/26/1996US5502332 Semiconductor device having a belt cover film
03/26/1996US5502331 Semiconductor substrate containing bulk micro-defect
03/26/1996US5502330 Stacked barrier-diffusion source and etch stop for double polysilicon BJT with patterned base link
03/26/1996US5502327 Semiconductor device
03/26/1996US5502326 Semiconductor device provided having a programmable element with a high-conductivity buried contact region
03/26/1996US5502324 Semiconductor memory device
03/26/1996US5502321 Flash memory having inclined channel
03/26/1996US5502320 Dynamic random access memory (DRAM) semiconductor device
03/26/1996US5502316 Wafer bonding of light emitting diode layers
03/26/1996US5502313 Exposure apparatus and method having a measuring unit for measuring distances between a mask surface and a projection optical system
03/26/1996US5502306 Electron beam inspection system and method
03/26/1996US5502278 Encased electronic circuit with chip on a grid zone of conductive contacts
03/26/1996US5502227 Liquid indium source
03/26/1996US5502010 Method for heat treating a semiconductor substrate to reduce defects
03/26/1996US5502009 Method for fabricating gate oxide layers of different thicknesses
03/26/1996US5502008 Method for forming metal plug and/or wiring metal layer
03/26/1996US5502007 Method of forming flat surface of insulator film of semiconductor device
03/26/1996US5502006 Chemical vapor deposition from tetraethyl silicate and ozone
03/26/1996US5502005 Production method of semiconductor device having a wiring layer containing gold
03/26/1996US5502004 Method for manufacturing a semiconductor device with heat treated diffusion layers
03/26/1996US5502003 Depositing tungsten layer before forming nickel electrode; heat treatment; preventing reciprocal diffusion
03/26/1996US5502002 Polyimide passivation of GaAs microwave monolithic integrated circuit flip-chip
03/26/1996US5502001 Method of forming light beam and method of fabricating semiconductor integrated circuits
03/26/1996US5502000 Method of forming a antifuse structure with increased breakdown at edges
03/26/1996US5501999 Process for formation of capacitor for DRAM cell
03/26/1996US5501998 Method for fabricating dynamic random access memory cells having vertical sidewall stacked storage capacitors
03/26/1996US5501997 Process of fabricating semiconductor devices having lightly-doped drain
03/26/1996US5501996 Method of manufacture of high coupling ratio single polysilicon floating gate EPROM or EEPROM cell
03/26/1996US5501995 Method for manufacturing a gate electrode of a MOS transistor
03/26/1996US5501994 Extended drain resurf lateral DMOS devices
03/26/1996US5501993 Method of constructing CMOS vertically modulated wells (VMW) by clustered MeV BILLI (buried implanted layer for lateral isolation) implantation
03/26/1996US5501992 Miniaturization, self-alignment, exceeding limits of photolithographic techniques
03/26/1996US5501991 Keeping base contact regions small, forming emitter region first
03/26/1996US5501989 Method of making semiconductor device/circuit having at least partially crystallized semiconductor layer
03/26/1996US5501941 Polymers for microelectronics from hexafluoroisopropylidenebis phthalic acid, polymethylphenylenediamines and benzophenone tetracarboxylic acids
03/26/1996US5501936 Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound
03/26/1996US5501926 Dichromatic photomask and a method for its fabrication
03/26/1996US5501893 Plasma polymerizing temporary etch stop
03/26/1996US5501870 Method and apparatus for hydrophobic treatment
03/26/1996US5501787 Immersion scanning system for fabricating porous silicon films
03/26/1996US5501786 Method of making the compound CuInSe2
03/26/1996US5501784 Process for producing microstructure metallic elements
03/26/1996US5501767 Method for gettering noble metals from mineral acid solution
03/26/1996US5501755 Large area multi-electrode radiation detector substrate
03/26/1996US5501739 Apparatus and method for forming thin film
03/26/1996US5501588 Mold for a semiconductor package
03/26/1996US5501587 Molding machine for semiconductor package
03/26/1996US5501569 For a semiconductor processing machine
03/26/1996US5501568 Wafer aligning apparatus
03/26/1996US5501565 Device for storing thin plate-form parts
03/26/1996US5501564 System for the storage and transportation of flat objects such as extra-flat boxes and its portable rack
03/26/1996US5501388 Wire bonding apparatus
03/26/1996US5501350 Forming photoresist layer on a copper layer black-oxide treated by alkaline oxidizer and finely surface roughened by acid treatment
03/26/1996US5501174 Maintaining substrate at certain temperture and pressure conditions while aluminum is deposited by vacuum evaporation
03/26/1996US5501104 Method of measuring the depth of full-cut dicing grooves by using an ultrasonic detector and a dicing apparatus for carrying out the same
03/26/1996US5501005 Mounting device of electronic components and a mounting method
03/26/1996US5501004 Outer-lead bonding apparatus and method therefor
03/26/1996CA1338178C Positive and negative working radiation sensitive mixtures and production of relief patterns
03/26/1996CA1338177C Radiation sensitive mixture and production of relief patterns
03/21/1996WO1996008844A1 Self-aligned field-effect transistor for high frequency applications
03/21/1996WO1996008843A1 Integrated circuit structure with an active microwave element and at least one passive element
03/21/1996WO1996008840A1 A flash eprom transistor array and method for manufacturing the same
03/21/1996WO1996008839A1 Method of producing a doped region in a monocrystalline semiconductor substrate
03/21/1996WO1996008838A1 Apparatus and method for clampling a substrate
03/21/1996WO1996008821A1 Flash eprom integrated circuit architecture
03/21/1996WO1996008751A1 Photolithographic method of producing structural features
03/21/1996WO1996008750A1 Photolithographic method of producing structural features
03/21/1996WO1996008749A2 Method of producing a three-dimensional component or group of components
03/21/1996WO1996008337A1 Method of applying solder to connection surfaces, and method of producing a solder alloy
03/21/1996DE4443608C1 Plasma reactor for integrated circuit fabrication
03/21/1996DE4433343A1 Verfahren und Vorrichtung zum Justieren und Verbinden von mehreren übereinander angeordneten Scheiben Method and apparatus for aligning and connecting a plurality of superposed discs
03/21/1996DE4433121A1 Modulation-doped FET
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