Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/1996
04/02/1996US5504032 Micromechanical accelerometer and method of manufacture thereof
04/02/1996US5504031 Elevated source/drain with solid phase diffused source/drain extension for deep sub-micron mosfets
04/02/1996US5504030 Process for fabricating high-density mask ROM devices
04/02/1996US5504029 Method of producing semiconductor integrated circuit device having memory cell and peripheral circuit MISFETs
04/02/1996US5504028 Method of forming a dynamic random memory device
04/02/1996US5504027 Method for fabricating semiconductor memory devices
04/02/1996US5504024 Method for fabricating MOS transistors
04/02/1996US5504023 Method for fabricating semiconductor devices with localized pocket implantation
04/02/1996US5504022 Method of making a semiconductor memory device having a floating gate
04/02/1996US5504021 Method of fabricating thin O/N/O stacked dielectric for high-density DRAMs
04/02/1996US5504020 Method for fabricating thin film transistor
04/02/1996US5504019 Method for fabricating a thin film semiconductor
04/02/1996US5504018 Process of fabricating bipolar transistor having epitaxially grown base layer without deterioration of transistor characteristics
04/02/1996US5504016 Method of manufacturing semiconductor device structures utilizing predictive dopant-dopant interactions
04/02/1996US5503964 Comprises step of evenly hardening resist by treating it in a far-ultraviolet-ray irradiation process and a baking process before injecting a high dose of ions
04/02/1996US5503961 Applying photosensitive polyimide precursor on substrate, exposing, inhibiting photosensitivity, applying second layer of precursor, exposing, developing
04/02/1996US5503951 Photolithographic mask for semiconductor
04/02/1996US5503950 Reflection type mask and manufacture of microdevices using the same
04/02/1996US5503901 Surface treatment method and surface treatment apparatus
04/02/1996US5503882 Plasma oxide layer is placed between substrate upper surface and tetraethyl silicate oxide to reduce stress properties; spin-on-glass layer; capping layer to minimize water absorption
04/02/1996US5503878 Forming metal thin film on oxide film, masking, etching with plasma formed from mixture of fluorine containing gas and oxygen
04/02/1996US5503875 Film forming method wherein a partial pressure of a reaction byproduct in a processing container is reduced temporarily
04/02/1996US5503777 Thixotropic conductive paste
04/02/1996US5503731 Second pair of electrodes to collect impurities; applying voltage so that at least one wiring line receives voltage for a different period of time than the others
04/02/1996US5503708 Method of and apparatus for removing an organic film
04/02/1996US5503678 Vertical low pressure CVD apparatus with an adjustable nozzle
04/02/1996US5503676 Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber
04/02/1996US5503657 Process for the separation of a gaseous hydride or a mixture of gaseous hydrides with the aid of a membrane
04/02/1996US5503321 For bonding a conductor lead to a pad by ultrasonic vibrations
04/02/1996US5503286 Depositing adhesive metallic layer overlying insulator, depositing chromium copper alloy layer, depositing solder bondable metallic layer, forming solder, etching using solder as mask, selectively etching adhesion layer
04/02/1996US5503173 Wafer cleaning tank
04/02/1996US5503171 Substrates-washing apparatus
04/02/1996US5503122 Engine components including ceramic-metal composites
04/02/1996US5503105 Deposition method for compound semiconductor forming semiconductor device
04/02/1996US5503103 Method and apparatus for producing crystalline layers
04/02/1996US5503016 Transducer assembly
04/02/1996US5502953 Method for transporting/storing a wafer in a wafer carrier
04/02/1996US5502899 Staging apparatus
04/02/1996US5502890 Process for determining the position and coplanarity of the leads of components
04/02/1996CA2058672C Semiconductor device for improving high-frequency characteristics and avoiding chip cracking
03/1996
03/31/1996CA2254329A1 Process for manufacturing semiconductor device and semiconductor wafer
03/28/1996WO1996009746A1 Compliant interface for a semiconductor chip
03/28/1996WO1996009745A1 Microelectronic bonding with lead motion
03/28/1996WO1996009648A1 Semiconductor structures with advantageous high-frequency properties and process for producing them
03/28/1996WO1996009647A1 Process for contacting an electronic component on a substrate
03/28/1996WO1996009646A1 Polymer stud grid array
03/28/1996WO1996009644A1 Container for ic trays, and base plate for mounting the container
03/28/1996WO1996009641A1 Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber
03/28/1996WO1996009571A1 Protective mask for pellicle
03/28/1996WO1996009167A1 Process and device for adjusting and connecting several vertically stacked wafers
03/28/1996WO1996009128A1 Selective removal of material by irradiation
03/28/1996DE4433930A1 Illumination element with flexible contact pins
03/28/1996DE4433846A1 Verfahren zur Herstellung einer vertikalen integrierten Schaltungsstruktur A process for producing a vertical integrated circuit structure
03/28/1996DE4433330A1 Halbleiterstrukturen mit vorteilhaften Hochfrequenzeigenschaften sowie Verfahren zur Herstelung derartiger Halbleiterstrukturen Semiconductor structures with advantageous high-frequency characteristics, and methods for Herstelung such semiconductor structures
03/28/1996DE19535783A1 Lateral semiconductor and operational arrangement
03/28/1996DE19535779A1 Verfahren zur Bildung von Kontaktlöchern in einem Halbleiterelement A method of forming contact holes in a semiconductor element
03/28/1996DE19535282A1 Connecting electronic component to substrate with several contact faces
03/28/1996DE19535140A1 Lateral MOSFET with high withstand voltage
03/28/1996DE19515154A1 Sensing head measurement handling device for integrated circuit testing
03/28/1996CA2200199A1 Selective removal of material by irridiation
03/27/1996EP0703631A1 Light-emitting semiconductor device using group III nitride compound
03/27/1996EP0703630A2 Semiconductor light emitting device
03/27/1996EP0703629A2 Vertical power field effect transistor
03/27/1996EP0703628A2 Enhanced mobility MOSFET device and method
03/27/1996EP0703626A2 Resonant tunneling structure and fabrication methods
03/27/1996EP0703625A2 Deep trench DRAM process on SOI for low leakage DRAM cell
03/27/1996EP0703623A1 Method of fabrication of a vertical integrated circuit structure
03/27/1996EP0703622A2 Electrostatic discharge protection circuits for mixed voltage interface and multi-rail disconnected power grid applications
03/27/1996EP0703619A1 Method for fabricating a three dimensional integrated circuit for a higher system gain achievement
03/27/1996EP0703618A1 Method for fabricating a three dimensional integrated circuit
03/27/1996EP0703615A1 Tape carrier for increasing the number of terminals between the tape carrier and a substrate
03/27/1996EP0703614A2 Flip-clip with heat-conducting layer
03/27/1996EP0703611A1 Method for insulating metal leads using a low dielectric constant material, and structures formed therewith
03/27/1996EP0703610A1 Method of forming interconnection structures in a semiconductor device, using insulators made of porous dielectric materials, and structures thereby formed
03/27/1996EP0703609A1 Process of manufacturing a structure having a thin semiconductor layer on a substrate
03/27/1996EP0703608A1 Method for forming buried oxide layers within silicon wafers
03/27/1996EP0703607A2 Bipolar transistor and method for manufacturing the same
03/27/1996EP0703606A2 Process to avoid the redeposition of etching products in the surface of wafers during the back-etching of tungsten in the fabrication of high-density integrated circuits
03/27/1996EP0703605A2 Method for etching semiconductor, method for fabricating semiconductor device, method for fabricating semiconductor laser, and semiconductor laser
03/27/1996EP0703604A1 Apparatus for the controlled cooling of chemical tanks
03/27/1996EP0703598A1 Electrode between sputtering target and workpiece
03/27/1996EP0703597A1 Microwave energized ion source for ion implantation
03/27/1996EP0703423A1 Step elevator for transporting workpieces in a vertical direction within an oven or furnace
03/27/1996EP0702852A1 Manufacture of electronic devices comprising thin-film transistors
03/27/1996EP0702851A1 Laterally graded emitter for bipolar transistor
03/27/1996EP0702849A1 Flexcell gate array
03/27/1996EP0702848A1 Method of eliminating poly end cap rounding effect
03/27/1996EP0702843A1 Method for high energy implantation using a low or medium current implanter, and devices therefor
03/27/1996EP0702806A1 Method of photolithographically metallizing at least the inside of holes arranged in accordance with a pattern in a plate of an electrically insulating material
03/27/1996EP0702797A1 Integrated circuit probing apparatus including a capacitor bypass structure
03/27/1996EP0702775A1 Apparatus for thermal treatment of thin film wafer
03/27/1996EP0624263B1 Method for the dry development of a silicon-containing lacquer film sensitive to uv and/or electron-beam radiation
03/27/1996EP0581914B1 Reference voltage generator for dynamic random access memory
03/27/1996EP0482051B1 Laser machining
03/27/1996CN1119348A Transistor and method for fabricating the same
03/27/1996CN1119347A Semiconductor device and method for fabricating the same
03/27/1996CN1119346A Semiconductor device and method for fabricating the same
03/27/1996CN1119345A Semiconductor device and method for fabricating the same
03/27/1996CN1119344A Semiconductor integrated circuit
03/27/1996CN1119343A Method for producing semiconductor device