| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 02/28/1996 | EP0698926A2 Normally off-static induction thyristor and method of manufacturing the same |
| 02/28/1996 | EP0698925A2 Bipolar transistor with floating base |
| 02/28/1996 | EP0698923A1 Semiconductor integrated circuit |
| 02/28/1996 | EP0698920A2 A method for assembling integrated circuits upon printed circuit boards |
| 02/28/1996 | EP0698919A2 Trenched DMOS transistor fabrication using seven masks |
| 02/28/1996 | EP0698918A1 A conductive noble-metal-insulator-alloy barrier layer for high-dielectric-constant material electrodes |
| 02/28/1996 | EP0698917A1 Cleaning agent and process for cleaning semiconductor wafers |
| 02/28/1996 | EP0698916A2 Method of optical lithography using phase shift masking |
| 02/28/1996 | EP0698915A1 Compartmentalized substrate processing chamber |
| 02/28/1996 | EP0698849A1 Semiconductor integrated circuit which can be tested by an LSI tester having a reduced number of pins |
| 02/28/1996 | EP0698826A1 Off axis alignment system for scanning photolithography |
| 02/28/1996 | EP0698825A1 An energy sensitive resist material and a process for device fabrication using the resist material |
| 02/28/1996 | EP0698823A1 Antireflective coating for microlithography |
| 02/28/1996 | EP0698821A1 High resolution phase edge lithography without the need for a trim mask |
| 02/28/1996 | EP0698812A2 Method for alignment of manufacturing semiconductor apparatus |
| 02/28/1996 | EP0698674A2 Chemical vapor deposition apparatus and method for exclusion of deposition and contamination from the backside and periphery of the wafers |
| 02/28/1996 | EP0698673A1 Gas-based substrate deposition protection |
| 02/28/1996 | EP0698584A2 Coated quartz glass component |
| 02/28/1996 | EP0698297A1 Electronic device with electrodes having microfeatures, and method of producing such a device |
| 02/28/1996 | EP0698296A1 Preparation of nucleated silicon surfaces |
| 02/28/1996 | EP0698295A1 A method for preventing bit line-to-bit line leakage in the access transistor region of an amg eprom |
| 02/28/1996 | EP0698292A1 A molded lead frame and method of making same |
| 02/28/1996 | EP0698291A1 Plastic encapsulated integrated circuit package and method of manufacturing the same |
| 02/28/1996 | EP0698290A1 Power semiconductor device with stress buffer layer |
| 02/28/1996 | EP0698289A1 Contact structure for vertical chip connections |
| 02/28/1996 | EP0698288A1 Process for producing vertically connected semiconductor components |
| 02/28/1996 | EP0698287A1 A method for forming a virtual-ground flash eprom array with floating gates that are self aligned to the field oxide regions of the array |
| 02/28/1996 | EP0698286A1 A virtual-ground flash eprom array with reduced cell pitch in the x direction |
| 02/28/1996 | EP0698285A1 Masking method used in salicide process |
| 02/28/1996 | EP0698284A1 Planarized trench and field oxide isolation scheme |
| 02/28/1996 | EP0698283A1 A semiconductor device having a self-aligned p-well within a p-buried-layer |
| 02/28/1996 | EP0698282A1 Method for semiconductor processing using mixtures of hf and carboxylic acid |
| 02/28/1996 | EP0698230A1 Chemically amplified photoresist |
| 02/28/1996 | EP0698223A1 Method of manufacturing a reflective display |
| 02/28/1996 | EP0698128A1 Sputter coating collimator with integral reactive gas distribution |
| 02/28/1996 | EP0606216B1 Copper-based paste containing copper aluminate for microstructural and shrinkage control of copper-filled vias |
| 02/28/1996 | EP0396660B1 Method and apparatus for sensing defects in integrated circuit elements |
| 02/28/1996 | CN1117666A Electronic components and method of manufacturing same |
| 02/28/1996 | CN1117662A Power supply voltage converting circuit of semiconductor integrated circuit |
| 02/28/1996 | CN1117655A Electroplated solder terminal |
| 02/28/1996 | CN1117654A Temporary package for bare die test and burn-in |
| 02/28/1996 | CN1117653A Method of forming a dield oxide film in a semiconductor device |
| 02/28/1996 | CN1117652A Vernier |
| 02/28/1996 | CN1117645A Semiconductor memory device |
| 02/28/1996 | CN1117599A Developer for photoresist layers |
| 02/28/1996 | CN1117441A Diffusion patterning process and screen therefor |
| 02/28/1996 | CN1117434A Surface smoothing unit |
| 02/27/1996 | US5495515 Method and apparatus for producing high-intensity X-rays or γ-rays |
| 02/27/1996 | US5495487 Testing buffer/register |
| 02/27/1996 | US5495450 Method and assembly for mounting an electronic device having an optically erasable surface |
| 02/27/1996 | US5495440 Semiconductor memory device having hierarchical bit line structure |
| 02/27/1996 | US5495439 Semiconductor memory device having SOI structure and manufacturing method thereof |
| 02/27/1996 | US5495438 Nondestructive readout-type ferroelectric memory device having twisted hysteresis |
| 02/27/1996 | US5495280 Illumination device using a pulsed laser source a Schlieren optical system, and a matrix addressable surface light modulator for producing images with undiffracted light |
| 02/27/1996 | US5495279 Method and apparatus for exposure of substrates |
| 02/27/1996 | US5495179 Carrier having interchangeable substrate used for testing of semiconductor dies |
| 02/27/1996 | US5495126 Radiators |
| 02/27/1996 | US5495124 Semiconductor device with increased breakdown voltage |
| 02/27/1996 | US5495122 Insulated-gate semiconductor field effect transistor which operates with a low gate voltage and high drain and source voltages |
| 02/27/1996 | US5495121 Semiconductor device |
| 02/27/1996 | US5495120 Semiconductor device having bipolar transistor and MOS transistor with particular concentrations |
| 02/27/1996 | US5495119 MOS thin film transistor having high breakdown voltage |
| 02/27/1996 | US5495118 Semiconductor device |
| 02/27/1996 | US5495115 Semiconductor crystalline laminate structure, forming method of the same, and semiconductor device employing the same |
| 02/27/1996 | US5494862 Method of making semiconductor wafers |
| 02/27/1996 | US5494861 Disposing aluminum nitride as susceptor on surface |
| 02/27/1996 | US5494860 Two step annealing process for decreasing contact resistance |
| 02/27/1996 | US5494859 Low dielectric constant insulation layer for integrated circuit structure and method of making same |
| 02/27/1996 | US5494858 Method for forming porous composites as a low dielectric constant layer with varying porosity distribution electronics applications |
| 02/27/1996 | US5494857 Chemical mechanical planarization of shallow trenches in semiconductor substrates |
| 02/27/1996 | US5494856 Apparatus and method for creating detachable solder connections |
| 02/27/1996 | US5494854 Enhancement in throughput and planarity during CMP using a dielectric stack containing HDP-SiO2 films |
| 02/27/1996 | US5494853 Method to solve holes in passivation by metal layout |
| 02/27/1996 | US5494852 Prestabilization of temperature and gas mixture |
| 02/27/1996 | US5494851 Semiconductor processing method of providing dopant impurity into a semiconductor substrate |
| 02/27/1996 | US5494850 Molecular beam epitaxy to grow aluminum and neodymium and erbium doped calcium fluoride on silicon substrate; annealing in reduced atmosphere of hydrogen and nitrogen at specific temperature and time |
| 02/27/1996 | US5494849 Single-etch stop process for the manufacture of silicon-on-insulator substrates |
| 02/27/1996 | US5494848 Buried contact trench process |
| 02/27/1996 | US5494846 Method of manufacturing semiconductor device |
| 02/27/1996 | US5494845 Method of fabrication of bilayer thin film resistor |
| 02/27/1996 | US5494844 Process of fabricating Bi-CMOS integrated circuit device |
| 02/27/1996 | US5494843 Method for forming MOSFET devices |
| 02/27/1996 | US5494842 Method of programming a CMOS read only memory at the second metal layer in a two-metal process |
| 02/27/1996 | US5494841 Split-polysilicon CMOS process for multi-megabit dynamic memories incorporating stacked container capacitor cells |
| 02/27/1996 | US5494840 Method for manufacturing DRAM memory cells having a thin metal oxide film on a thin metal film |
| 02/27/1996 | US5494839 Dual photo-resist process for fabricating high density DRAM |
| 02/27/1996 | US5494837 Method of forming semiconductor-on-insulator electronic devices by growing monocrystalline semiconducting regions from trench sidewalls |
| 02/27/1996 | US5494836 Process of producing heterojunction bipolar transistor with silicon-germanium base |
| 02/27/1996 | US5494835 Process for the production of a relief structure on a semiconductor material support |
| 02/27/1996 | US5494784 Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent |
| 02/27/1996 | US5494773 Positive photoresist composition comprising a novolak resin having a cycloalkylidene-bisphenol group |
| 02/27/1996 | US5494757 Blend of a piperazinylethylamidocarbonyl-containing butadiene-acrylonitrile terpolymer and a maleimide resin |
| 02/27/1996 | US5494713 Anodic oxidation, sealing pores, silicon-containing coating film by chemical vapor deposition |
| 02/27/1996 | US5494711 Method of preparing InSb thin film |
| 02/27/1996 | US5494699 Depositing multilayer of indium-tin oxide, dielectric, luminescent component and metal electrode |
| 02/27/1996 | US5494698 Teflon filled resinoid dicing blades for fabricating silicon die modules |
| 02/27/1996 | US5494697 Process for fabricating a device using an ellipsometric technique |
| 02/27/1996 | US5494526 Method for cleaning semiconductor wafers using liquified gases |
| 02/27/1996 | US5494524 Vertical heat treatment device for semiconductor |
| 02/27/1996 | US5494523 Controlling plasma particulates by contouring the plasma sheath using materials of differing RF impedances |