Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/1996
03/12/1996US5498890 Semiconductor device having a multi-layered dielectric structure and manufacturing method thereof
03/12/1996US5498889 Semiconductor device having increased capacitance and method for making the same
03/12/1996US5498888 Semiconductor device and method for processing multiple input signals
03/12/1996US5498887 Output circuit device for a charge transfer element having tripartite diffusion layer
03/12/1996US5498886 Circuit module redundancy architecture
03/12/1996US5498878 Method and apparatus for detecting positional deviation by using diffraction gratings with a compensation delay determining unit
03/12/1996US5498877 Method of manufacturing semiconductor device using measurement mark pattern
03/12/1996US5498874 Defect detecting apparatus and method
03/12/1996US5498850 Semiconductor electrical heater and method for making same
03/12/1996US5498769 Method for thermally treating resist film and forming undercut pattern
03/12/1996US5498768 Process for forming multilayer wiring
03/12/1996US5498765 Positive photoresist composition containing photoacid generator and use thereof
03/12/1996US5498595 Intermetallics on substrates with superconductor layers and oxygen ions in plasma followed by heat treatment
03/12/1996US5498578 Blanket
03/12/1996US5498577 Method for fabricating thin oxides for a semiconductor technology
03/12/1996US5498574 Process of fabricating semiconductor device having flattening stage for inter-level insulating layer without deterioration of device characteristics
03/12/1996US5498573 Titanium, molybdenum, and aluminum; scan line side walls may be etched
03/12/1996US5498572 Contactors
03/12/1996US5498571 Method of manufacturing a semiconductor device having reliable multi-layered wiring
03/12/1996US5498570 Method of reducing overetch during the formation of a semiconductor device
03/12/1996US5498569 Platinum or palladium silicide
03/12/1996US5498568 Method of producing a compound semiconductor crystal layer with a steep heterointerface
03/12/1996US5498567 Method for manufacturing a laterally limited, single-crystal region on a substrate and the employment thereof for the manufacture of an MOS transistor and a bipolar transistor
03/12/1996US5498566 Isolation region structure of semiconductor device and method for fabricating the same
03/12/1996US5498565 Method of forming trench isolation having polishing step and method of manufacturing semiconductor device
03/12/1996US5498564 Structure and method for reducing parasitic leakage in a memory array with merged isolation and node trench construction
03/12/1996US5498563 Method of manufacturing a static random access memory device including a coupling capacitor between a pair of storage nodes
03/12/1996US5498562 Semiconductor processing methods of forming stacked capacitors
03/12/1996US5498561 Thin films
03/12/1996US5498560 Process for forming an electrically programmable read-only memory cell
03/12/1996US5498559 Method of making a nonvolatile memory device with five transistors
03/12/1996US5498558 Integrated circuit structure having floating electrode with discontinuous phase of metal silicide formed on a surface thereof and process for making same
03/12/1996US5498557 Method of making SRAM to improve interface state density utilizing PMOS TFT
03/12/1996US5498556 Metal-oxide-semiconductor field-effect transistor and its method of fabrication
03/12/1996US5498555 Method of making LDD with polysilicon and dielectric spacers
03/12/1996US5498554 Method of making extended drain resurf lateral DMOS devices
03/12/1996US5498553 Method of making a metal gate high voltage integrated circuit
03/12/1996US5498506 Positive-acting radiation-sensitive mixture and recording material produced therewith
03/12/1996US5498500 Overlay measurement mark and method of measuring an overlay error between multi patterns in a semiconductor device using the measurement mark
03/12/1996US5498497 Glass with mask and chromium pattern, photoresists layers
03/12/1996US5498449 Photoresist film coating method
03/12/1996US5498325 Soluble and insoluble conductors
03/12/1996US5498313 Symmetrical etching ring with gas control
03/12/1996US5498312 Method for anisotropic plasma etching of substrates
03/12/1996US5498308 Plasma asher with microwave trap
03/12/1996US5498294 Apparatus and method for washing substrates
03/12/1996US5498293 Cleaning wafer substrates of metal contamination while maintaining wafer smoothness
03/12/1996US5498292 Heating device used for a gas phase growing mechanism or heat treatment mechanism
03/12/1996US5498290 Confinement of secondary electrons in plasma ion processing
03/12/1996US5498289 Apparatus for applying narrow metal electrode
03/12/1996US5498199 Wafer polishing method and apparatus
03/12/1996US5498196 Computer controlled apparatus for polishing a surface of a thin material
03/12/1996US5498118 Apparatus for and method of carrying a substrate
03/12/1996US5497938 Tape with solder forms and methods for transferring solder to chip assemblies
03/12/1996US5497681 Method for making an IC lead-frame punch
03/12/1996US5497546 Method for mounting lead terminals to circuit board
03/12/1996US5497545 Method of making electrical connections in the manufacture of wiring sheet assemblies
03/07/1996WO1996007300A2 Manufacture of electronic devices comprising thin-film circuitry
03/07/1996WO1996007203A1 Method of fabrication of an integrated circuit chip containing eeprom and capacitor
03/07/1996WO1996007202A1 Methods and systems for monitoring and controlling layer formation using p-polarized reflectance spectroscopy
03/07/1996WO1996007201A1 Device for positioning ic
03/07/1996WO1996007200A1 Process for manufacture of mos gated device with reduced mask count
03/07/1996WO1996007199A2 Quartz glass jig for the heat treatment of silicon wafers and method and device for producing same
03/07/1996WO1996007071A1 Rapid thermal processing apparatus and method
03/07/1996WO1996006694A1 Surface modification processing of flat panel device substrates
03/07/1996WO1996006693A1 Photo reactive cleaning of critical surfaces in cd manufacturing
03/07/1996WO1996006692A1 Cleaning of printed circuit boards
03/07/1996DE4432564C1 Verfahren zur Herstellung eines dotierten Gebietes in einem monokristallinen Halbleitersubstrat A method for producing a doped region in a monocrystalline semiconductor substrate
03/07/1996DE4431605A1 Chipkartenmodul für kontaktlose Chipkarten und Verfahren zu seiner Herstellung Smart card module for contactless smart cards and process for its preparation
03/07/1996DE19532761A1 Verfahren zum Herstellen einer Halbleiterschicht, Verfahren zum Herstellen eines Halbleiterlasers und Halbleiterlaser A method for fabricating a semiconductor layer, A method of manufacturing a semiconductor laser and semiconductor laser
03/07/1996DE19532621A1 Semiconductor device for esp. field effect transistor
03/07/1996DE19532363A1 Semiconductor device mfr. for FET with characteristic adjustment
03/07/1996DE19531975A1 Integrierte Mikrowellenschaltung und Verfahren zum Herstellen der integrierten Mikrowellenschaltung Microwave integrated circuit and method of manufacturing the microwave integrated circuit
03/07/1996DE19531615A1 Belastete Quantumwell-Struktur Loaded quantum well structure
03/06/1996EP0700146A1 Voltage multiplier with linear stabilized output voltage
03/06/1996EP0700141A1 Temperature detector on an integrated circuit
03/06/1996EP0700098A1 Self-aligned buried channel/junction stacked gate flash memory cell
03/06/1996EP0700097A1 A self-aligned buried channel/junction stacked gate flash memory cell
03/06/1996EP0700096A2 SOI-field effect transistor und method for making the same
03/06/1996EP0700093A1 Semiconductor device and method of manufacturing the same
03/06/1996EP0700091A2 Integrated compact capacitor-resistor/inductor configuration
03/06/1996EP0700090A1 Semiconductor integrated circuit comprising a current mirror circuit
03/06/1996EP0700089A1 A device for protection against electrostatic discharges on the I/O terminals of a MOS integrated circuit
03/06/1996EP0700088A2 Semiconductor device and comprising two semiconductor substrates
03/06/1996EP0700087A2 Semiconductor device and method of manufacturing the same
03/06/1996EP0700086A2 Integrated circuit package with improved heat dissipation
03/06/1996EP0700082A2 Monolithically integrated circuits having dielectrically isolated, electrically controlled optical devices and process for fabricating the same
03/06/1996EP0700081A2 Method of fabricating semiconductor device comprising an integrated circuit with self-aligned silicide regions
03/06/1996EP0700080A2 Method of producing self-aligned contacts on semiconductor devices and self-aligned contact structure
03/06/1996EP0700079A2 State induction thyristor and fabrication process thereof
03/06/1996EP0700078A1 Support members for semiconductor wafers in a processing environment
03/06/1996EP0700077A2 Method of cleaning a semiconductor wafer
03/06/1996EP0700076A1 Loading device for semiconductor treatment installations
03/06/1996EP0700075A2 Device for transferring a transport object between two end positions
03/06/1996EP0699998A1 Semiconductor integrated circuit
03/06/1996EP0699931A1 Passive alignment and packaging of optoelectronic components to optical waveguides using flip-chip bonding technology
03/06/1996EP0699913A2 Interface apparatus for automatic test equipment
03/06/1996EP0699912A2 An apparatus, method, and wafer used for testing integrated circuits formed on a product wafer
03/06/1996EP0699783A2 A method of liquid phase epitaxial growth and apparatus therefor
03/06/1996EP0699782A1 High speed electrochemical metal removal technique for planarization of DLM structure using neutral salt electrolytes
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