Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/1996
10/01/1996US5561076 Single crystal silicon substrate; a silicon dioxide film on top of substrate; single crystal silicon layer on top of silicon dioxide film
10/01/1996US5561075 Multilayer; thin film transistor; dielectric; electrodes
10/01/1996US5561074 Depositing a uniform layer of amorphous silicon on an intrinsic amorphous silicon layer directly by exposing it to the gaseous phase of disilane containing diborane or silane
10/01/1996US5561073 Forming conductive layer superjacent dielectric layer on substrate, forming trench to expose dielectric layer, forming silicon dioxide layer over exposed area, filling trench with borophosphosilicate glass and silicon compound
10/01/1996US5561072 Method for producing shallow junction in surface region of semiconductor substrate using implantation of plasma ions
10/01/1996US5561071 DNA and DNA technology for the construction of networks to be used in chip construction and chip production (DNA-chips)
10/01/1996US5561010 Phase shift optical mask and method of correcting defects in optical mask
10/01/1996US5561009 Blanks for phase shift photomasks, and phase shift photomasks
10/01/1996US5561008 Process for device fabrication using projection lithography and an apparatus therefor
10/01/1996US5560870 Composition for forming an electrically conductive layer to be used in patterning
10/01/1996US5560857 Solution for cleaning silicon semiconductors and silicon oxides
10/01/1996US5560804 Etching method for silicon containing layer
10/01/1996US5560803 Plasma ashing method with oxygen pretreatment
10/01/1996US5560802 Chemical-mechanical polishing
10/01/1996US5560780 Protective coating for dielectric material on wafer support used in integrated circuit processing apparatus and method of forming same
10/01/1996US5560778 Apparatus for forming a dielectric layer
10/01/1996US5560777 Apparatus for making a semiconductor
10/01/1996US5560775 Quartz marking system
10/01/1996US5560586 Main valve
09/1996
09/26/1996WO1996029743A1 Semiconductor device of the type sealed in glass having a silver-copper bonding layer between slugs and connection conductors
09/26/1996WO1996029742A1 Improved non-destructively read ferroelectric memory cell
09/26/1996WO1996029739A1 Read-only storage cell arrangement and process for its production
09/26/1996WO1996029738A1 Integrated circuit resistor fabrication method
09/26/1996WO1996029736A1 Silicon nitride circuit substrate
09/26/1996WO1996029735A1 Semiconductor device of the type sealed in glass comprising a semiconductor body connected to slugs by means of a silver-aluminium bonding layer
09/26/1996WO1996029733A1 Self-aligned edge control in silicon on insulator
09/26/1996WO1996029732A1 Single-etch stop process for the manufacture of silicon-on-insulator wafers
09/26/1996WO1996029731A1 Semiconductor device and method of manufacturing the same
09/26/1996WO1996029730A1 Laminating method using laminating film-like organic die-bonding material, die-bonding method, laminating device, die-bonding device, semiconductor device and method for manufacturing semiconductor device
09/26/1996WO1996029729A1 Process for applying a metallisation layer on an insulator and for piercing through-holes in said insulator by means of a single mask
09/26/1996WO1996029728A1 Integrated circuits having mixed layered superlattice materials and precursor solutions for use in a process of making the same
09/26/1996WO1996029727A1 Low temperature process for fabricating layered superlattice materials and making electronic devices including same
09/26/1996WO1996029726A1 Uv radiation process for making electronic devices having low-leakage-current and low-polarization fatigue
09/26/1996WO1996029725A1 Ferroelectric dielectric for integrated circuit applications at microwave frequencies
09/26/1996WO1996029712A1 ZnO THIN-FILM VARISTORS AND METHOD OF MAKING THE SAME
09/26/1996WO1996029665A1 Synthesis shell generation and use in asic design
09/26/1996WO1996029635A2 Apparatus and method for controlling high throughput sputtering
09/26/1996WO1996029632A1 Scanning lithography system with opposing motion
09/26/1996WO1996029631A2 Magnification correction for small field scanning
09/26/1996WO1996029630A2 Scanning lithography system having double pass wynne-dyson optics
09/26/1996WO1996029629A2 Microcontact printing on surfaces and derivative articles
09/26/1996WO1996025263A3 Process for bonding a flexible substrate to a chip
09/26/1996WO1996024839A3 Method and apparatus for predicting process characteristics of polyurethane pads
09/26/1996WO1996023319A3 Wafer level prediction of thin oxide reliability
09/26/1996WO1996002320A3 Hydrogen torch
09/26/1996EP0744076A4 Magnetoresistive structure with alloy layer
09/26/1996DE19611407A1 Semiconductor hybrid circuit is encapsulated as single in-line or dual in-line package
09/26/1996DE19611377A1 Semiconductor component, e.g. high power field effect transistor
09/26/1996DE19610258A1 Integrated circuit fault location detection system using SEM semiconductor test system
09/26/1996DE19539364A1 Epitaxial structure for light-emitting gallium-phosphide diode
09/26/1996DE19510318A1 Epitaxial growth of cpd. semiconductor layers, esp. Gp=III nitride layers, on substrate
09/26/1996DE19510276A1 Electronic component handling method
09/26/1996DE19510042A1 Festwert-Speicherzellenanordnung und Verfahren zu deren Herstellung Read-only memory cell arrangement, and processes for their preparation
09/26/1996DE19510003A1 Semiconductor platelet on support precise location method
09/26/1996CA2215852A1 Scanning lithography system with opposing motion
09/26/1996CA2215052A1 Low temperature process for fabricating layered superlattice materials and making electronic devices including same
09/26/1996CA2214833A1 Integrated circuits having mixed layered superlattice materials and precursor solutions for use in a process of making the same
09/26/1996CA2214563A1 Uv radiation process for making electronic devices having low-leakage-current and low-polarization fatigue
09/25/1996EP0734079A2 Method for vapor-phase growth
09/25/1996EP0734073A2 Bipolar transistor and method for forming the same
09/25/1996EP0734072A2 Insulated gate semiconductor device and method of manufacture
09/25/1996EP0734071A2 II-VI group compound semiconductor device and method for manufacturing the same
09/25/1996EP0734070A1 Method and device for dynamically self-biasing regions of integrated circuits
09/25/1996EP0734068A2 Method for designing an electronic integrated circuit with optical inputs and outputs
09/25/1996EP0734067A2 Method of fabricating a CMOS structure having ESD protection
09/25/1996EP0734064A2 Material for forming wiring layer and wiring forming method
09/25/1996EP0734063A2 Integrated circuit micromodule obtained by continuous assembly of patterned strips
09/25/1996EP0734061A2 Hermetic sealing of integrated circuits or hybrid systems
09/25/1996EP0734060A1 DRAM capacitor storage electrode with textured surface
09/25/1996EP0734059A2 Chip sized semiconductor device and a process for making it
09/25/1996EP0734058A1 HF vapour selective etching method and apparatus
09/25/1996EP0734057A2 Apparatus for preventing the need to clean outer edges of a support platen
09/25/1996EP0734056A2 Ceramic blades for semiconductor processing apparatus
09/25/1996EP0734055A2 Anti-stick electrostatic chuck for a low pressure environment
09/25/1996EP0734054A1 Positioning apparatus and process system having the same
09/25/1996EP0734053A1 Improvements in or relating to electrostatic chucks for holding substrates in process chambers
09/25/1996EP0734052A1 Improvements in or relating to electrostatic holding systems for holding substrates in processing chambers
09/25/1996EP0734048A1 Procedure and device for coating or cleaning a substrate
09/25/1996EP0734046A2 Process and apparatus for patterning a masked metal layer in a RF plasma, comprising substrate bias amplitude modulation
09/25/1996EP0734044A2 Ion energy analyzer and electrically controlled geometric filter for same
09/25/1996EP0734026A2 Switching circuit and charge transfer device using same
09/25/1996EP0733952A1 Photoresist compositions
09/25/1996EP0733929A2 Active matrix display device
09/25/1996EP0733911A2 Recirculating charge transfer magnetic field sensor
09/25/1996EP0733727A2 Growth of silicon single crystal from melt having extraordinary eddy flows on its surface
09/25/1996EP0733725A2 Growth of silicon single crystal
09/25/1996EP0733284A1 A protected switch
09/25/1996EP0733283A1 A protected switch
09/25/1996EP0733270A1 Radiation-emitting semiconductor diode and method of manufacturing such a diode
09/25/1996EP0733269A1 Porous semiconductor material
09/25/1996EP0733268A1 Method for replacing a detection module hybridized by welding balls
09/25/1996EP0733267A1 Wafer heating chuck with dual zone backplane heating and segmented clamping member
09/25/1996EP0733130A1 Apparatus for heating or cooling wafers
09/25/1996EP0733129A1 Process for producing and adhesive bond between copper layers and ceramics
09/25/1996EP0649480A4 Semimetal-semiconductor heterostructures and multilayers.
09/25/1996CN1131897A Circuit substrate having interconnection leads and fabrication process thereof
09/25/1996CN1131823A Power integrated circuit
09/25/1996CN1131820A Resistor string with equal resistance resistors
09/25/1996CN1131819A Method of fabricating monolithic multifunction integrated circuit devices
09/25/1996CN1131818A Method for manufacturing source-drain formation for flash eeprom
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