Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/1996
08/20/1996US5548470 Characterization, modeling, and design of an electrostatic chuck with improved wafer temperature uniformity
08/20/1996US5548224 Method and apparatus for wafer level prediction of thin oxide reliability
08/20/1996US5548223 Probe adapter for electronic device
08/20/1996US5548159 Semiconductor device
08/20/1996US5548158 Structure of bipolar transistors with improved output current-voltage characteristics
08/20/1996US5548157 Semiconductor device capable of increasing reliability
08/20/1996US5548156 Semiconductor device
08/20/1996US5548155 Bipolar type semiconductor device having small parasitic capacitance, small dimensions, and small variation in transistor characteristics
08/20/1996US5548154 Isoplanar isolated active regions
08/20/1996US5548153 Thin film transistor with means to prevent threshold variations
08/20/1996US5548152 For electrostatic charge protection
08/20/1996US5548150 Field effect transistor
08/20/1996US5548149 Varying the thickness of the surface silicon layer in a silicon-on-insulator substrate
08/20/1996US5548148 MOS channel device with counterdoping of ion implant for reduced substrate sensitivity
08/20/1996US5548147 Extended drain resurf lateral DMOS devices
08/20/1996US5548146 Nonvolatile memory device having source and drain of memory cells integrally formed with data-source lines
08/20/1996US5548144 Recessed gate field effect transistor
08/20/1996US5548143 Metal oxide semiconductor transistor and a method for manufacturing the same
08/20/1996US5548142 Solid-state imaging device capable of removing influence by false signals
08/20/1996US5548141 Bipolar transistor having a self emitter contact aligned
08/20/1996US5548140 High-Speed, low-noise millimeterwave hemt and pseudomorphic hemt
08/20/1996US5548139 Schottky gate field effect transistor
08/20/1996US5548138 Semiconductor device with reduced tunnel resistance and circuitry using the same
08/20/1996US5548137 Group II-VI compound semiconductor light emitting devices and an ohmic contact therefor
08/20/1996US5548136 Substrate with a compound semiconductor surface layer and method for preparing the same
08/20/1996US5548135 Electrostatic discharge protection for an array of macro cells
08/20/1996US5548134 Device for the protection of an integrated circuit against electrostatic discharges
08/20/1996US5548132 Thin film transistor with large grain size DRW offset region and small grain size source and drain and channel regions
08/20/1996US5548131 Light-emitting device, optical recording head utilizing said device, and optical printer utilizing said optical recording head
08/20/1996US5548129 Quantum well structure with self-aligned gate and method of making the same
08/20/1996US5548118 Hybrid integrated circuit
08/20/1996US5548091 Semiconductor chip connection components with adhesives and methods for bonding to the chip
08/20/1996US5547906 Methods for producing integrated circuit devices
08/20/1996US5547903 Method of elimination of junction punchthrough leakage via buried sidewall isolation
08/20/1996US5547902 Post hot working process for semiconductors
08/20/1996US5547901 Aluminum film as oxidation barrier
08/20/1996US5547900 Method of fabricating a self-aligned contact using a liquid-phase oxide-deposition process
08/20/1996US5547898 Method for p-doping of a light-emitting device
08/20/1996US5547897 Photo-assisted nitrogen doping of II-VI semiconductor compounds during epitaxial growth using an amine
08/20/1996US5547896 Direct etch for thin film resistor using a hard mask
08/20/1996US5547895 Method of fabricating a metal gate MOS transistor with self-aligned first conductivity type source and drain regions and second conductivity type contact regions
08/20/1996US5547894 CMOS processing with low and high-current FETs
08/20/1996US5547893 method for fabricating an embedded vertical bipolar transistor and a memory cell
08/20/1996US5547892 Process for forming stacked contacts and metal contacts on static random access memory having thin film transistors
08/20/1996US5547891 Structural modification to enhance DRAM gate oxide quality
08/20/1996US5547890 DRAM cell with a cradle-type capacitor
08/20/1996US5547889 Method of forming a semiconductor device having vertical conduction transistors and cylindrical cell gates
08/20/1996US5547888 Method for manufacturing a SRAM cell having asymmetrical LDD type MIS device
08/20/1996US5547886 Method of producing a semiconductor device
08/20/1996US5547885 Method of making asymmetric LDD transistor
08/20/1996US5547884 Method of manufacturing a semiconductor memory device having a common source region
08/20/1996US5547883 Method for fabricating thin film transistor
08/20/1996US5547882 Depositing sacrificial oxide layer on semiconductor substrate, doping with boron ions to adjust threshold voltage, then forming polysilicon gate layer on oxide,
08/20/1996US5547880 Method for forming a zener diode region and an isolation region
08/20/1996US5547813 Forming resist, forming middle layer having index of refraction adjusted to prevent mixing of resist and contrast enhancement layer, forming contrast enhancement layer, selectively developing
08/20/1996US5547812 Composition for eliminating microbridging in chemically amplified photoresists comprising a polymer blend of a poly(hydroxystyrene) and a copolymer made of hydroxystyrene and an acrylic monomer
08/20/1996US5547789 Pattern transfer mask
08/20/1996US5547788 For projecting pattern through lenses onto semiconductor wafer surface
08/20/1996US5547740 Solderable contacts for flip chip integrated circuit devices
08/20/1996US5547703 Method of forming si-o containing coatings
08/20/1996US5547642 Light ozone asher, light ashing method, and manufacturing method of semiconductor device
08/20/1996US5547539 Plasma processing apparatus and method
08/20/1996US5547537 Ceramic carrier transport for die attach equipment
08/20/1996US5547530 Method of manufacturing a ceramic substrate
08/20/1996US5547515 Method for handling or processing semiconductor wafers
08/20/1996US5547511 Electrode forming system for chip components
08/20/1996US5547415 Method and apparatus for wafer chamfer polishing
08/20/1996US5547328 Method and apparatus for transferring articles between two controlled environments
08/20/1996US5546889 Multilayer film with polytetrafluoroethylene on a substrate and oligothiophene compound or a polyphenylene vinylene
08/20/1996US5546655 Method of applying flex tape protective coating onto a flex product
08/15/1996WO1996025023A1 Method of forming a fluorinated silicon oxide layer using plasma chemical vapor deposition
08/15/1996WO1996024955A1 Magnetoresistive structure with alloy layer
08/15/1996WO1996024953A1 TRENCH FIELD EFFECT TRANSISTOR WITH REDUCED PUNCH-THROUGH SUSCEPTIBILITY AND LOW R¿DSon?
08/15/1996WO1996024952A1 Layered structure with a silicide layer, and process for producing such a layered structure
08/15/1996WO1996024951A1 Method of joining electronic components to a substrate
08/15/1996WO1996024950A1 Process for shaping connection bumps on electrically-conductive microelectronic connection components for bumpless tab bonding
08/15/1996WO1996024949A1 Heat treatment method and apparatus
08/15/1996WO1996024944A1 Methods of mechanical and electrical substrate connection
08/15/1996WO1996024888A1 Resist pattern forming method
08/15/1996WO1996024887A1 Photolithographic structure generation process
08/15/1996WO1996024839A2 Method and apparatus for predicting process characteristics of polyurethane pads
08/15/1996WO1996024819A1 Cantilever deflection sensor and use thereof
08/15/1996WO1996024466A1 Chemical-mechanical polishing of thin materials using a pulse polishing technique
08/15/1996WO1996024459A1 Method of re-melting the metal coating on a contact surface
08/15/1996WO1996016432A3 Channel or source/drain structure of mosfet and method for fabricating the same
08/15/1996WO1996011496A3 Container having a cleanable, re-usable box door liner
08/15/1996WO1996007691A3 Thermosetting resin compositions containing maleimide and/or vinyl compounds
08/15/1996CA2212765A1 Trench field effect transistor with reduced punch-through susceptibility and low rdson
08/14/1996EP0726698A2 Process for selective application of solder to circuit packages
08/14/1996EP0726621A2 Anisotropically conductive composite medium and devices interconnected thereby
08/14/1996EP0726604A2 MIS device and method of manufacturing the same
08/14/1996EP0726602A2 Insulated gate semiconductor device
08/14/1996EP0726601A1 Semiconductor memory device having peripheral circuit and interface circuit fabricated on bulk region out of silicon-on-insulator region for memory cells
08/14/1996EP0726600A2 Method of forming a structure for DRAM and structure formed thereby
08/14/1996EP0726599A2 Method of manufacturing semiconductor device having multilayer wiring structure, with improved version of step of forming interlayer dielectric layer
08/14/1996EP0726598A1 Moulding apparatus with compensation element
08/14/1996EP0726597A2 Direct etch for thin film resistor using a hard mask
08/14/1996EP0726596A2 Plasma etching method
08/14/1996EP0726595A2 Method for etching compound solid state material
08/14/1996EP0726594A2 Semiconductor device and method of manufacturing the same
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