| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 08/26/2004 | US20040164306 Method and apparatus for manufacturing display panel |
| 08/26/2004 | US20040164304 Insulated gate planar integrated power device with co-integrated schottky diode and process |
| 08/26/2004 | US20040164303 Contact between element to be driven and thin film transistor for supplying power to element to be driven |
| 08/26/2004 | US20040164302 Thin film integrated circuit device IC label, container comprising the thin film integrated circuit, manufacturing method of the thin film integrated circuit device, manufacturing method of the container, and management method of product having the container |
| 08/26/2004 | US20040164301 Display Apparatus |
| 08/26/2004 | US20040164300 Semiconductor device and method of manufacturing the same |
| 08/26/2004 | US20040164299 Reflective type thin film transistor display device and methods for fabricating the same |
| 08/26/2004 | US20040164298 Semiconductor structure, semiconductor device, and method and apparatus for manufacturing the same |
| 08/26/2004 | US20040164297 Display device |
| 08/26/2004 | US20040164296 first n-channel TFT having a source wiring and a terminal portion made of the same material as the gate electrode; low power consumption is realized even when screen size is increased, |
| 08/26/2004 | US20040164295 A replacement for probe cards includes contacter provides conductive pathways from the IC contact pads to a second surface where a corresponding set of contact pads provide access to test systems and/or other devices. |
| 08/26/2004 | US20040164293 Method of making barrier layers |
| 08/26/2004 | US20040164253 Vibration control of an object |
| 08/26/2004 | US20040164245 Scanning electron microscope with measurement function |
| 08/26/2004 | US20040164244 Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same |
| 08/26/2004 | US20040164243 Shape measurement method and apparatus |
| 08/26/2004 | US20040164230 Active-matrix substrate and electromagnetic wave detector |
| 08/26/2004 | US20040164227 Solid-state imaging device and method of manufacturing the same |
| 08/26/2004 | US20040164225 System and method for reducing trapped charge effects in a CMOS photodetector |
| 08/26/2004 | US20040164129 Bonding tool with polymer coating |
| 08/26/2004 | US20040164128 Bump formation method and wire bonding method |
| 08/26/2004 | US20040164127 Wire bonding method |
| 08/26/2004 | US20040164089 Method and apparatus for delivering precursors to a plurality of epitaxial reactor sites |
| 08/26/2004 | US20040164061 Finishing machine using laser beam |
| 08/26/2004 | US20040164050 Method of etching ferroelectric devices |
| 08/26/2004 | US20040164035 LCD glass cassette |
| 08/26/2004 | US20040163988 Flexible substrate storage equipment and flexible substrate storing method |
| 08/26/2004 | US20040163963 Filter divides internal housing volume; fluid flow to second chamber is higher speed than to first chamber; flows are blended in second chamber; rotates at controlled speed |
| 08/26/2004 | US20040163951 Magnetron sputtering apparatus |
| 08/26/2004 | US20040163950 Planar plating apparatus |
| 08/26/2004 | US20040163948 Plating apparatus and method of managing plating liquid composition |
| 08/26/2004 | US20040163947 Substrate plating apparatus |
| 08/26/2004 | US20040163946 Pad assembly for electrochemical mechanical processing |
| 08/26/2004 | US20040163844 Flexible wiring board, an intermediate product of a flexible wiring board, and a multi-layer flexible wiring board |
| 08/26/2004 | US20040163767 Plasma producing device |
| 08/26/2004 | US20040163766 Charged particle source and operation thereof |
| 08/26/2004 | US20040163765 Plasma reactor for manufacturing electronic components |
| 08/26/2004 | US20040163764 Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor |
| 08/26/2004 | US20040163762 Plasma treating device and substrate mounting table |
| 08/26/2004 | US20040163761 Directed gas injection apparatus for semiconductor processing |
| 08/26/2004 | US20040163758 Patterning solution deposited thin films with self-assembled monolayers |
| 08/26/2004 | US20040163720 Exhaust valve for semiconductor manufacturing process |
| 08/26/2004 | US20040163683 Substrate processing apparatus for drying substrate |
| 08/26/2004 | US20040163682 Method and apparatus for megasonic cleaning of patterned substrates |
| 08/26/2004 | US20040163681 mixing an aqueous solution including sulfuric acid and hydrofluoric acid with a hydrogen peroxide solution to produce a cleaning solution |
| 08/26/2004 | US20040163670 Apparatus and method for collecting impurities on a semiconductor wafer |
| 08/26/2004 | US20040163668 aqueous sulfuric acid solution diluted by deionized water is applied onto a substrate; mega-sonic energy applied to induce reaction between the diluted aqueous sulfuric acid solution and the contaminants |
| 08/26/2004 | US20040163601 Plasma processing apparatus |
| 08/26/2004 | US20040163599 Film deposition system and method of fabricating semiconductor device employing the film deposition system |
| 08/26/2004 | US20040163597 Apparatus for fabricating semiconductor devices, heating arrangement, shower head arrangement, method of reducing thermal disturbance during fabrication of a semiconductor device, and method of exchanging heat during fabrication of a semiconductor device |
| 08/26/2004 | US20040163591 Coating agent, plasma-resistant component having coating film formed by the coating agent, plasma processing device provided with the plasma-resistant component |
| 08/26/2004 | US20040163585 Method for manufacturing polycrystalline silicon thin film and thin film transistor fabricated using polycrystalline silicon thin film manufactured by the manufacturing |
| 08/26/2004 | US20040163563 Imprint lithography template having a mold to compensate for material changes of an underlying liquid |
| 08/26/2004 | US20040163539 Method and apparatus for reducing particle contamination |
| 08/26/2004 | US20040163482 Apparatus and method for inspecting film carrier tape for mounting electronic component |
| 08/26/2004 | US20040163475 Sensor having membrane and method for manufacturing the same |
| 08/26/2004 | US20040163324 better polishing selectivity to polysilicon than to oxide films |
| 08/26/2004 | US20040163252 Contact carriers (tiles) for populating larger substrates with spring contacts |
| 08/26/2004 | US20040163246 Electronic device manufacturing method |
| 08/26/2004 | US20040163244 Method of manufacturing and mounting electronic devices to limit the effects of parasitics |
| 08/26/2004 | US20040163240 Manufacturing process of a stacked semiconductor device and corresponding device |
| 08/26/2004 | US20040163233 Methods of forming electrical connections within ferroelectric devices |
| 08/26/2004 | DE4438518B4 Halbleiterbauelement mit vergrabener Bitleitung und Verfahren zu seiner Herstellung A semiconductor device having a buried bit line and process for its preparation |
| 08/26/2004 | DE4331798B4 Verfahren zur Herstellung von mikromechanischen Bauelementen A process for preparing micromechanical components |
| 08/26/2004 | DE19959346B4 Verfahren zum Herstellen eines eine Mikrostruktur aufweisenden Festkörpers A method of manufacturing a microstructure having a solid |
| 08/26/2004 | DE19653632B4 Verfahren zur Herstellung eines Silizium-auf-Isolator-Substrats A method for producing a silicon-on-insulator substrate |
| 08/26/2004 | DE19637285B4 Halbleiterbauelement und Verfahren zum Zusammenbau hiervon Semiconductor device and method thereof for assembly |
| 08/26/2004 | DE10392145T5 Extremultraviolett-Lichtquellenvorrichtung Extreme ultraviolet light source device |
| 08/26/2004 | DE10360454A1 Organische Elektrolumineszenz-Anzeigevorrichtung mit aktiver Matrix und Verfahren zu deren Herstellung The organic electroluminescence display device of the active matrix and methods for their preparation |
| 08/26/2004 | DE10340848A1 Herstellungsverfahren für eine Halbleitereinrichtung Manufacturing method of a semiconductor device |
| 08/26/2004 | DE10338291A1 Verfahren zum Herstellen einer Halbleitervorrichtung A method of manufacturing a semiconductor device |
| 08/26/2004 | DE10337262A1 Fotomaske, Verfahren zum Herstellen einer elektronischen Vorrichtung, Verfahren zum Herstellen einer Fotomaske Photomask, method for manufacturing an electronic device, method of manufacturing a photomask |
| 08/26/2004 | DE10332797A1 Herstellungsverfahren für eine elektronische Einrichtung mit einem Ablöseschritt zum Entfernen der Resistmaske, die bei einem Schritt des Ätzens eines Substrats verwendet wird Manufacturing method for an electronic device with a release step for removing the resist mask, which is used in a step of etching a substrate |
| 08/26/2004 | DE10323728A1 Verfahren zur Verbesserung der Gleichmäßigkeit einer Fotolackschicht A method for improving the uniformity of a photoresist layer |
| 08/26/2004 | DE10320579A1 Semiconductor wafer having an upper side, semiconductor chip positions with integrated circuits for first chips, central and edge regions and an equalizing layer useful in semiconductor technology |
| 08/26/2004 | DE10320337A1 Semiconductor wafer manufacture for flip-chip contacts, by applying second solder paste of lower melting point to form extensions to lands formed by first solder paste |
| 08/26/2004 | DE10320160A1 Production of semiconductor bodies for e.g. optoelectronic components comprises forming a mask layer on the substrate or on an initial layer having windows to the substrate, back-etching, and further processing |
| 08/26/2004 | DE10320090A1 Electronic assembly, especially a circuit board, has conducting tracks between components made from carbonized plastic and or agglomerated nano-particles mounted on a plastic substrate |
| 08/26/2004 | DE10306668A1 Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Plasmas Arrangement for the generation of intense short-wave radiation based on a plasma |
| 08/26/2004 | DE10306076A1 Quantenpunkt aus elektrisch leitendem Kohlenstoff, Verfahren zur Herstellung und Anwendung Quantum point of electrically conducting carbon, process for the preparation and application |
| 08/26/2004 | DE10305411A1 A microelectromechanical arrangement with at least one layer on a substrate, especially a thermoelectric layer on a substrate useful for thermoelectric generators or Peltier effect elements |
| 08/26/2004 | DE10305365A1 Substrate connection contacting method e.g. for transistor in GSM or UMTS mobile telephone etc., by etching recesses to expose conductive material filling contact hole and connection surface, and applying further conductive material |
| 08/26/2004 | DE10304103A1 Process for preparation of Al filled contact holes in a wafer using a vacuum coating useful in semiconductor technology giving quick and cost effective preparation of Al-filled contact holes in a semiconductor wafer |
| 08/26/2004 | DE10303588B3 Verfahren zur vertikalen Montage von Halbleiterbauelementen A process for the vertical mounting of semiconductor devices |
| 08/26/2004 | DE10301291B3 Inserting structures into a substrate used in VLSI technology comprises applying a photo-sensitive layer on an uppermost layer, forming structures on the photo-sensitive layer |
| 08/26/2004 | DE10297177T5 Graben-FET mit selbstausgerichteter Source und selbstausgerichtetem Kontakt Trench FET with self-aligned source and contact selbstausgerichtetem |
| 08/26/2004 | DE10296955T5 Halbleitervorrichtung bzw. Halbleiterbauelement und Herstellungsverfahren dafür A semiconductor device or semiconductor device and manufacturing method thereof |
| 08/26/2004 | DE10260817B3 Scratch or blemish monitoring electronic equipment for use during manufacture of semiconductor wafers calculates parameters relating to position of scratch |
| 08/26/2004 | DE10258093B3 Anordnung zum Schutz von 3-dimensionalen Kontaktstrukturen auf Wafern Arrangement for the protection of the 3-dimensional contact structures on wafers |
| 08/26/2004 | DE10245671B4 Herstellungsverfahren für eine Halbleiterstruktur durch selektives isotropes Ätzen einer Siliziumdioxidschicht auf einer Siliziumnitridschicht Manufacturing method of a semiconductor structure by the selective isotropic etching of a silicon dioxide layer on a silicon nitride layer |
| 08/26/2004 | DE10239311B4 Justagehorde und Verfahren zur Justierung einer Hubeinrichtung in einer Bestückungseinheit für Waferhorden Justagehorde and procedures for calibration of a lifting device in a mounting unit for wafer racks |
| 08/26/2004 | DE10235020B4 Vorrichtung und Verfahren zum Ätzen großflächiger Halbleiterscheiben Apparatus and method for etching large-surface semiconductor wafers |
| 08/26/2004 | DE10234943B4 Bearbeitungsvorrichtung für Wafer und Verfahren zu ihrer Bearbeitung Wafer processing apparatus for and methods of processing |
| 08/26/2004 | DE10221646B4 Verfahren zur Verbindung von Schaltungseinrichtungen und entsprechender Verbund von Schaltungseinrichtungen A method for connection of circuit devices and the appropriate compound of circuit devices |
| 08/26/2004 | DE102004006537A1 Durch ein Siliziumkarbidsubstrat gebildete Halbleitervorrichtung und Verfahren zur Herstellung derselben Silicon carbide substrate formed by a semiconductor device and method of manufacturing the same |
| 08/26/2004 | DE102004006028A1 Halbleitervorrichtung mit Grabenkondensatoren und Verfahren zum Herstellen der Grabenkondensatoren A semiconductor device comprising grave capacitors and method of making the capacitors grave |
| 08/26/2004 | DE102004005883A1 Verfahren und Vorrichtung für eine aufgebrachte hermetische Abdichtung für ein digitales Röntgenstrahlpaneel Method and apparatus for a hermetic seal applied for a digital Röntgenstrahlpaneel |
| 08/26/2004 | DE102004005697A1 Widerstandsfähige Via-Struktur und zugehöriges Herstellungsverfahren Durable via structure and manufacturing method thereof |
| 08/26/2004 | DE10140761B4 Wafer-Handhabungsvorrichtung Wafer handling apparatus |
| 08/26/2004 | DE10130916B4 Verfahren zum anisotropen Strukturieren von Materialien A method for anisotropic structuring of materials |