Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2005
04/28/2005US20050090074 Isolation techniques for reducing dark current in CMOS image sensors
04/28/2005US20050090073 MOS transistor having improved total radiation-induced leakage current
04/28/2005US20050090072 Method for reducing shallow trench isolation consumption in semiconductor devices
04/28/2005US20050090071 Fabricating semiconductor chips
04/28/2005US20050090070 Capacitor for use in an integrated circuit
04/28/2005US20050090069 Methods of forming capacitors
04/28/2005US20050090068 Method for fabricating transistor of semiconductor device
04/28/2005US20050090067 Silicide formation for a semiconductor device
04/28/2005US20050090066 Method and manufacture of thin silicon on insulator (soi) with recessed channel and devices manufactured thereby
04/28/2005US20050090065 Data writing method for mask read only memory
04/28/2005US20050090064 Partial vertical memory cell and method of fabricating the same
04/28/2005US20050090063 Landing pad for use as a contact to a conductive spacer
04/28/2005US20050090062 [method for forming nitrided tunnel oxide laye]
04/28/2005US20050090061 Use of selective oxidation to form asymmetrical oxide features during the manufacture of a semiconductor device
04/28/2005US20050090060 Method for manufacturing semiconductor device
04/28/2005US20050090059 Method for manufacturing a non-volatile memory device
04/28/2005US20050090058 Non-volatile semiconductor memory and method of making same, and semiconductor device and method of making device
04/28/2005US20050090057 Method of fabricating a flash memory cell
04/28/2005US20050090056 A method of making a magnetic tunnel junction device
04/28/2005US20050090055 Method for fabricating semiconductor device with fine patterns
04/28/2005US20050090054 Method for forming contact of semiconductor device
04/28/2005US20050090053 Memory chip with low-temperature layers in the trench capacitor
04/28/2005US20050090052 Nonvolatile semiconductor memory device having element isolating region of trench type
04/28/2005US20050090051 Method of manufacturing bipolar-complementary metal oxide semiconductor
04/28/2005US20050090049 High voltage N-LDMOS transistors having shallow trench isolation region
04/28/2005US20050090048 Method for making a semiconductor device comprising a superlattice channel vertically stepped above source and drain regions
04/28/2005US20050090047 Method of making a MOS transistor having improved total radiation-induced leakage current
04/28/2005US20050090046 Thin film transistor and method of manufacturing the same
04/28/2005US20050090045 Method for fomring a self-aligned ltps tft
04/28/2005US20050090043 Manufacturing method of ball grid array package
04/28/2005US20050090042 Integrated circuit die and an electronic assembly having a three-dimensional interconnection scheme
04/28/2005US20050090039 Method of copper/copper surface bonding using a conducting polymer for application in IC chip bonding
04/28/2005US20050090037 Method of copper/copper surface bonding using a conducting polymer for application in IC chip bonding
04/28/2005US20050090036 Ultra low dielectric constant thin film
04/28/2005US20050090035 Method for fabricating CMOS image sensor protecting low temperature oxide delamination
04/28/2005US20050090033 Method for manufacturing piezo-resonator
04/28/2005US20050090032 Method of manufacturing nitride semiconductor light emitting device
04/28/2005US20050090029 Method of manufacturing a display device
04/28/2005US20050090027 System and apparatus for using test structures inside of a chip during the fabrication of the chip
04/28/2005US20050090026 Method of manufacturing a semiconductor device
04/28/2005US20050090025 Method of manufacturing a semiconductor device
04/28/2005US20050090024 System and method for developing production nano-material
04/28/2005US20050090023 Method of forming ferroelectric memory cell
04/28/2005US20050089953 Bioarray chip reaction apparatus and its manufacture
04/28/2005US20050089800 Photoresist polymer and photoresist composition containing the same
04/28/2005US20050089797 Polymers, resist compositions and patterning process
04/28/2005US20050089796 Acrylic ester terpolymer having units of a C5-C6 cycloalkyl (meth)acrylate, a hydroxy-adamantanyl acrylate, and acrylate of cyclic lactone; high resolution, patterns with less sidewall roughness, acceptable dry etch resistance, and a good margin allowed for heat treatment temperature after exposure
04/28/2005US20050089794 Silver powder, an organic binder, a photopolymerizable monomer,a photopolymerization initiator and a lead-free glass;
04/28/2005US20050089791 Poly(3,4-alkylenedioxythiophene) as organic conductor, a water soluble polymeric photoinitiator containing two or more azide or diazonium groups, a polyacid or salt; crosslinkable
04/28/2005US20050089777 Multilayer; dielectric substrate, spacers and masking layer; etching patterns
04/28/2005US20050089776 Resist reflow measurement key and method of forming a fine pattern of a semiconductor device using the same
04/28/2005US20050089774 for imprint lithography
04/28/2005US20050089771 Halftone mask to make photoresist regions of different film thicknesses as a resist pattern
04/28/2005US20050089768 Method of creating predictive model, method of managing process steps, method of manufacturing semiconductor device, method of manufacturing photo mask, and computer program product
04/28/2005US20050089766 Method for improving uniformity and alignment accuracy of contact hole array pattern
04/28/2005US20050089761 Method for producing exposure mask, exposure mask, and method for producing semiconductor device
04/28/2005US20050089700 Laminating a plurality of unit layers, consisting of Zn, Bi or Sn single metal layer or alloy layer, by vapor deposition, plating; solder junction connects a semiconductor device; lead-free, uniformity as melting point, thickness
04/28/2005US20050089699 Cleaning and refurbishing chamber components having metal coatings
04/28/2005US20050089647 Method of manufacturing water-repelling film
04/28/2005US20050089645 Flexible member can be used to provide a uniform force to securely retain the workpiece to be positioned in a process module resulting in uniform coatings; for fluid processing (e.g. electrodeposition) of substrates e.g. semiconductor wafers
04/28/2005US20050089642 Of improved elastic modulus and hardness derived from bis(siloxy) compounds reacted with a hydrolysis catalyst and then with a condensation catalyst
04/28/2005US20050089635 Forming a wiring pattern for example by depositing a dispersion of fine metals by repeated ink jet and heating steps to form a multilayer film before processing at highest temperature; electronics, electrooptics e.g. liquid crystal displays, plasma displays
04/28/2005US20050089634 Method for depositing metallic nitride series thin film
04/28/2005US20050089632 Producing bismuth-containing ferroelectric or superconducting films by the Atomic Layer Deposition where a silylamido ligand is used as a source material for the bismuth; e.g. tris(bis(trimethylsilyl)amido)bismuth(III)
04/28/2005US20050089628 Comprises tabular holding jig having holding holes with side walls comprising elastic material, extending from surface, wherein electronics are inserted, with flat plate covering holding holes
04/28/2005US20050089625 Plasma etching at predetermined temperature
04/28/2005US20050089455 Gas-using facility including portable dry scrubber system and/or over-pressure control arrangement
04/28/2005US20050089388 System and method for conveying flat panel display
04/28/2005US20050089324 Lithography equipment
04/28/2005US20050089317 Heating unit
04/28/2005US20050089283 System and method for hermetically sealing a package
04/28/2005US20050089211 Simultaneous computation of multiple points on one or multiple cut lines
04/28/2005US20050088898 Low power flash memory cell and method
04/28/2005US20050088897 Nonvolatile semiconductor memory device and control method thereof
04/28/2005US20050088889 Non-volatile memory devices having a multi-layered charge storage layer and methods of forming the same
04/28/2005US20050088886 Semiconductor integrated circuit
04/28/2005US20050088881 Semiconductor memory device driven with low voltage
04/28/2005US20050088877 Nonvolatile semiconductor memory device containing reference capacitor circuit
04/28/2005US20050088870 Semiconductor device and method for testing the same
04/28/2005US20050088801 Decoupling capacitor
04/28/2005US20050088800 Capacitor and method of producing same
04/28/2005US20050088799 Thin film capacitor, thin film capacitor array and electronic component
04/28/2005US20050088788 Magnetoresistive effect element and magnetic memory having the same
04/28/2005US20050088761 Projection optical system and projection exposure apparatus
04/28/2005US20050088722 Compositions and methods involving direct write optical lithography
04/28/2005US20050088719 Micromirror having reduced space between hinge and mirror plate of the micromirror
04/28/2005US20050088666 Electronic component mounting apparatus and electronic component mounting method
04/28/2005US20050088647 Apparatus and method of detecting the electroless deposition endpoint
04/28/2005US20050088638 Off-axis levelling in lithographic projection apparatus
04/28/2005US20050088636 Scanning exposure technique
04/28/2005US20050088635 Lithographic apparatus and device manufacturing method
04/28/2005US20050088630 Projection optical system, exposure apparatus and device fabricating method
04/28/2005US20050088609 Method of fabricating liquid crystal display device
04/28/2005US20050088595 Display device and method of manufacturing the same
04/28/2005US20050088591 Reflection type liquid crystal display device and method of manufacturing the same
04/28/2005US20050088381 Active matrix organic electroluminescence display device and method for manufacturing the same
04/28/2005US20050088314 Radio frequency data communications device
04/28/2005US20050088269 Semiconductor device
04/28/2005US20050088188 Evaluating a property of a multilayered structure
04/28/2005US20050088163 Semiconductor integrated circuit