| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 05/12/2005 | US20050098254 Method and apparatus for determining processing size of bonding material |
| 05/12/2005 | US20050098234 Element fabrication substrate |
| 05/12/2005 | US20050098218 Wafer container |
| 05/12/2005 | US20050098195 Apparatus process and method for mounting and treating a substrate |
| 05/12/2005 | US20050098194 Semiconductor wafer immersion systems and treatments using modulated acoustic energy |
| 05/12/2005 | US20050098120 Susceptor device |
| 05/12/2005 | US20050098116 Matching unit for semiconductor plasma processing apparatus |
| 05/12/2005 | US20050098115 Atmospheric substrate processing apparatus for depositing multiple layers on a substrate |
| 05/12/2005 | US20050098112 Apparatus for producing metal oxide |
| 05/12/2005 | US20050098111 Apparatus for single-wafer-processing type CVD |
| 05/12/2005 | US20050098109 Precoat film forming method, idling method of film forming device, loading table structure, film forming device and film forming method |
| 05/12/2005 | US20050098107 Thermal processing system with cross-flow liner |
| 05/12/2005 | US20050098094 Semiconductor device having partially insulated field effect transistor (PiFET) and method of fabricating the same |
| 05/12/2005 | US20050098093 Method of fabricating an epitaxial silicon-germanium layer and an integrated semiconductor device comprising an epitaxial arsenic in-situ doped silicon-germanium layer |
| 05/12/2005 | US20050098092 Epitaxial silicon wafer with intrinsic gettering and a method for the preparation thereof |
| 05/12/2005 | US20050098091 Etch selectivity enhancement for tunable etch resistant anti-reflective layer |
| 05/12/2005 | US20050097988 Generating an aerosol including a nickel metal precursor and moving the droplets through a heating zone to form nickel particles; while in the aerosol stream forming a coating on the particles, the coating comprising a material is different than the nickel-containing material; flat panel displays |
| 05/12/2005 | US20050097825 For polishing semiconductor wafers comprising tantalum barrier material in presence of dielectric and interconnect metal; comprises triazole and/or tetrazole compounds as promoters |
| 05/12/2005 | US20050097771 Method and apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer |
| 05/12/2005 | US20050097769 Loadlock |
| 05/12/2005 | US20050097736 Heating boat of substrates, then positioning with integrated circuit containing adhesive; flip chips |
| 05/12/2005 | US20050097730 Semiconductor manufacturing apparatus |
| 05/12/2005 | US20050097729 Apparatus for mounting semiconductor chips |
| 05/12/2005 | US20050097728 Contact start detecting apparatus for mounting process apparatus, and mounting process apparatus provided with the same |
| 05/12/2005 | US20050097725 Method for fabricating giant magnetoresistive (GMR) devices |
| 05/12/2005 | US20050097716 Method of manufacturing piezoelectric device and ferroelectric device, droplet ejection head, and electronic equipment |
| 05/12/2005 | DE4320033B4 Verfahren zur Bildung eines Metallmusters bei der Herstellung einer Halbleitereinrichtung A method of forming a metal pattern in the manufacture of a semiconductor device |
| 05/12/2005 | DE19853805B4 Elektrisch leitfähige, thermoplastische und hitzeaktivierbare Klebstofffolie und deren Verwendung Electrically conductive, thermoplastic and heat-activatable adhesive film and the use thereof |
| 05/12/2005 | DE19843160B4 Halbleitervorrichtung mit Grabentrennung und Verfahren zu dessen Herstellung mittels Vorplanarisierung A semiconductor device comprising grave separation and method for its production by means of Vorplanarisierung |
| 05/12/2005 | DE19747105B4 Bauelement mit gestapelten Halbleiterchips Device with stacked semiconductor chips |
| 05/12/2005 | DE10392492T5 Durch Algorithmus dynamisierte Referenzprogrammierung By programming algorithm dynamized reference |
| 05/12/2005 | DE10392377T5 Auf Waferniveau beschichtete stiftartige Kontakthöcker aus Kupfer Coated wafer-level pin-like bumps made of copper |
| 05/12/2005 | DE10392359T5 Drain aktivierter/deaktivierter AC-gekoppelter Bandpass HF-Schalter Drain enabled / disabled AC-coupled bandpass RF Switches |
| 05/12/2005 | DE10392314T5 Hartmaskenerweiterung für Speicherwortleitung Hard mask expansion for word line |
| 05/12/2005 | DE10392306T5 Kontaktstruktur mit Siliziumtastkontaktgeber Contact structure with Siliziumtastkontaktgeber |
| 05/12/2005 | DE10357777B3 Verfahren zum Betrieb eines Speicherzellenfeldes A method of operating a memory cell array |
| 05/12/2005 | DE10324606B4 Herstellungsverfahren für Speicherzellen mit Kragenisolationsschichten Manufacturing process for memory cells with collar insulating layers |
| 05/12/2005 | DE10297694T5 Feldeffekttransistor mit einer lateralen Verarmungs-Struktur Field effect transistor with a lateral depletion mode structure |
| 05/12/2005 | CA2543100A1 Single mask via method and device |
| 05/12/2005 | CA2542146A1 High capacitance electrode and methods of producing same |
| 05/11/2005 | EP1530244A2 Current-jump-control circuit including abrupt metal-insulator phase transition device |
| 05/11/2005 | EP1530237A2 Nonvolatile semiconductor memory |
| 05/11/2005 | EP1530236A2 Semiconductor device with multi-layered wiring arrangement including reinforcing patterns, and production method for manufacturing such semiconductor device |
| 05/11/2005 | EP1530234A2 Heat sinkable power device package |
| 05/11/2005 | EP1530233A2 Semiconductor device and method of manufacturing the same |
| 05/11/2005 | EP1530232A2 Process solutions containing surfactants used as post-chemical mechanical planarization treatment |
| 05/11/2005 | EP1530230A2 Helical resonator type plasma processing apparatus |
| 05/11/2005 | EP1530226A2 Inductor and method for manufacturing the same |
| 05/11/2005 | EP1530090A1 Lithographic apparatus and device manufacturing method |
| 05/11/2005 | EP1530089A1 Lithographic apparatus and device manufacturing method |
| 05/11/2005 | EP1530088A1 Lithographic apparatus and device manufacturing method |
| 05/11/2005 | EP1530087A2 Illumination optical system and exposure apparatus |
| 05/11/2005 | EP1530084A1 A method for performing transmission tuning of a mask pattern to improve process latitude |
| 05/11/2005 | EP1530083A2 OPC based on decomposition into eigen-functions |
| 05/11/2005 | EP1530056A2 Method of testing of a silicon-on-insulator wafer |
| 05/11/2005 | EP1530053A1 Conductance-voltage (GV) based method for determining leakage current in dielectrics |
| 05/11/2005 | EP1530051A1 Probe sheet |
| 05/11/2005 | EP1530050A2 Arch type probe |
| 05/11/2005 | EP1529855A2 Diffusion system |
| 05/11/2005 | EP1529854A1 Cleaning gas mixture for an apparatus and cleaning method |
| 05/11/2005 | EP1529812A1 Polyimide based compositions useful as electronic substrates, derived in part from (micro-powder) fluoropolymer, and methods and compositions relating thereto |
| 05/11/2005 | EP1529753A2 Fabrication of ultrathin form factor mems microphones and microspeakers |
| 05/11/2005 | EP1529598A1 Chemical mechanical polishing pad |
| 05/11/2005 | EP1529419A1 An electronic product, a body and a method of manufacturing |
| 05/11/2005 | EP1529317A2 Organic electronic devices |
| 05/11/2005 | EP1529312A1 Method of creating a high performance organic semiconductor device |
| 05/11/2005 | EP1529310A2 Porous low-k dielectric interconnect structures |
| 05/11/2005 | EP1529309A1 Laser machinining |
| 05/11/2005 | EP1529308A1 Method and compositions for hardening photoresist in etching processes |
| 05/11/2005 | EP1529305A2 Method and device for substrate etching with very high power inductively coupled plasma |
| 05/11/2005 | EP1529290A2 Memories and memory circuits |
| 05/11/2005 | EP1529246A1 Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device |
| 05/11/2005 | EP1529245A1 Arrangement for the production of photomasks |
| 05/11/2005 | EP1529193A2 Method for controlling a recess etch process |
| 05/11/2005 | EP1529126A2 Electrolytic copper plating solutions |
| 05/11/2005 | EP1529125A2 Method and apparatus for providing gas to a processing chamber |
| 05/11/2005 | EP1529013A2 Etch stop control for mems device formation |
| 05/11/2005 | EP1528945A2 Catheter securement device |
| 05/11/2005 | EP1320442B1 Arrangement for polishing disk-like objects |
| 05/11/2005 | EP1256006A4 Non-invasive electrical measurement of semiconductor wafers |
| 05/11/2005 | EP1186585B1 Gas for plasma reaction and method for production thereof |
| 05/11/2005 | EP1185475A4 Cassette buffering within a minienvironment |
| 05/11/2005 | EP1163080B1 Filling device and method for filling balls in the apertures of a ball-receiving element |
| 05/11/2005 | EP1123423A4 High rate silicon deposition method at low pressures |
| 05/11/2005 | EP0914617B1 Process for testing a product and equipment for carrying out the process |
| 05/11/2005 | EP0859672B1 Process for brush cleaning |
| 05/11/2005 | CN2699481Y Micro-linewidth metallic silicide structure |
| 05/11/2005 | CN2699472Y A slice arranging device of lead frame |
| 05/11/2005 | CN2699337Y Light screen master film capable of preventing electron beam deviation caused by electric charge effect |
| 05/11/2005 | CN1615587A Integrated circuit and battery powered electronic device |
| 05/11/2005 | CN1615549A Organic semiconductor device and method |
| 05/11/2005 | CN1615548A Non-volatile semiconductor memory cell and method for producing the same |
| 05/11/2005 | CN1615547A Non-volatile two-transistor semiconductor memory cell and method for producing the same |
| 05/11/2005 | CN1615545A Method and apparatus for controlling die attach fillet height to reduce die shear stress |
| 05/11/2005 | CN1615544A Electrode structure for use in an integrated circuit |
| 05/11/2005 | CN1615543A Method of bonding and transferring a material to form a semiconductor device |
| 05/11/2005 | CN1615542A Method of arranging micro spheres with liquid, micro sphere arranging device, and semiconductor device |
| 05/11/2005 | CN1615541A Method of creating high-quality relaxed SiGe-on-insulator for strained SiCMOS applications |
| 05/11/2005 | CN1615540A Formation of high-mobility silicon-germanium structures by low-energy plasma enhanced chemical vapor deposition |
| 05/11/2005 | CN1615539A Substrate inspecting device, coating/developing device and substrate inspecting method |