Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2005
08/23/2005US6933607 Semiconductor device with bumps on electrode pads oriented in given direction
08/23/2005US6933606 Semiconductor device whose semiconductor chip has chamfered backside surface edges and method of manufacturing the same
08/23/2005US6933605 Semiconductor package
08/23/2005US6933604 Semiconductor device, semiconductor module and hard disk
08/23/2005US6933603 Multi-substrate layer semiconductor packages and method for making same
08/23/2005US6933600 Substrate for semiconductor package
08/23/2005US6933594 Leadless plastic chip carrier with etch back pad singulation
08/23/2005US6933592 Substrate structure capable of reducing package singular stress
08/23/2005US6933590 Semiconductor device comprising plurality of semiconductor areas having the same top surface and different film thicknesses and manufacturing method for the same
08/23/2005US6933589 Method of making a semiconductor transistor
08/23/2005US6933586 Porous low-k dielectric interconnects with improved adhesion produced by partial burnout of surface porogens
08/23/2005US6933581 Semiconductor chip, terahertz electromagnetic-wave device, and method of manufacturing these
08/23/2005US6933580 Semiconductor structure with substantially etched oxynitride defects protruding therefrom
08/23/2005US6933579 Semiconductor solid phase epitaxy damage control method and integrated circuit produced thereby
08/23/2005US6933578 Semiconductor storage device
08/23/2005US6933577 High performance FET with laterally thin extension
08/23/2005US6933576 Semiconductor device including a predetermined film formed at a border between dielectric films
08/23/2005US6933575 Semiconductor device and its manufacturing method
08/23/2005US6933573 Electrostatic discharge protection circuit of non-gated diode and fabrication method thereof
08/23/2005US6933572 Field-shielded SOI-MOS structure free from floating body effect, and method of fabrication therefor
08/23/2005US6933571 Thin film transistors, liquid crystal display device and electronic apparatus using the same
08/23/2005US6933569 Soi mosfet
08/23/2005US6933568 Deposition method of insulating layers having low dielectric constant of semiconductor device, a thin film transistor substrate using the same and a method of manufacturing the same
08/23/2005US6933566 Method of forming lattice-matched structure on silicon and structure formed thereby
08/23/2005US6933565 Semiconductor device and method of manufacturing the same
08/23/2005US6933564 Semiconductor integrated circuit device and method of manufacturing the same
08/23/2005US6933561 Semiconductor device and method of manufacturing the same
08/23/2005US6933560 Power devices and methods for manufacturing the same
08/23/2005US6933559 LDMOS with guard ring (of same type as drain) surrounding the drain
08/23/2005US6933558 Flash memory device
08/23/2005US6933557 Fowler-Nordheim block alterable EEPROM memory cell
08/23/2005US6933556 Semiconductor memory with gate at least partially located in recess defined in vertically oriented semiconductor layer
08/23/2005US6933554 Recessed tunnel oxide profile for improved reliability in NAND devices
08/23/2005US6933553 Field effect transistor using vanadium dioxide layer as channel material and method of manufacturing the field effect transistor
08/23/2005US6933552 High surface area capacitors and intermediate storage poly structures formed during fabrication thereof
08/23/2005US6933549 Barrier material
08/23/2005US6933545 Hetero-bipolar transistor having the base interconnection provided on the normal mesa surface of the collector mesa
08/23/2005US6933542 Field-effect transistor, and integrated circuit device and switching circuit using the same
08/23/2005US6933536 Method for fabricating fiducials for passive alignment of opto-electronic devices
08/23/2005US6933531 Heat sink material and method of manufacturing the heat sink material
08/23/2005US6933530 Process for direct integration of a thin-film silicon p-n junction diode with a magnetic tunnel junction
08/23/2005US6933529 Active matrix type organic light emitting diode device and thin film transistor thereof
08/23/2005US6933527 Semiconductor device and semiconductor device production system
08/23/2005US6933526 CMOS thin film transistor
08/23/2005US6933525 Display device and manufacturing method of the same
08/23/2005US6933523 Semiconductor alignment aid
08/23/2005US6933515 Laser-produced plasma EUV light source with isolated plasma
08/23/2005US6933511 Ion implanting apparatus
08/23/2005US6933510 Radiation source, lithographic apparatus, and device manufacturing method
08/23/2005US6933507 Controlling the characteristics of implanter ion-beams
08/23/2005US6933495 3-grid neutral beam source used for etching semiconductor device
08/23/2005US6933464 Laser-driven cleaning using reactive gases
08/23/2005US6933360 Causing a Grignard reaction of an organometallic silane compound to form a carbon-bridged silane oligomer, removing by-product, mixing intermediate with solvent, water and a catalyst for hydrolysis and condensation to form polysilicate
08/23/2005US6933254 Plasma-resistant articles and production method thereof
08/23/2005US6933250 Process for manufacturing a semiconductor device
08/23/2005US6933249 Method of fabricating semiconductor device
08/23/2005US6933248 Method for transistor gate dielectric layer with uniform nitrogen concentration
08/23/2005US6933247 Method for forming a minute pattern and method for manufacturing a semiconductor device using the same
08/23/2005US6933246 Dielectric film
08/23/2005US6933245 Method of forming a thin film with a low hydrogen content on a semiconductor device
08/23/2005US6933244 Method of fabrication for III-V semiconductor surface passivation
08/23/2005US6933243 High selectivity and residue free process for metal on thin dielectric gate etch application
08/23/2005US6933242 Plasma etching
08/23/2005US6933241 Method for forming pattern of stacked film
08/23/2005US6933240 Method for patterning a layer of silicon, and method for fabricating an integrated semiconductor circuit
08/23/2005US6933239 Method for removing conductive residue
08/23/2005US6933238 Method for manufacturing semiconductor device
08/23/2005US6933237 Substrate etch method and device
08/23/2005US6933236 Method for forming pattern using argon fluoride photolithography
08/23/2005US6933235 Method for removing contaminants on a substrate
08/23/2005US6933234 Method for manufacturing semiconductor device and polishing apparatus
08/23/2005US6933232 Method of reducing oxidation of metal structures by selectively implanting ions through a mask positioned above and not in contact with the substrate
08/23/2005US6933231 Methods of forming conductive interconnects, and methods of depositing nickel
08/23/2005US6933230 Method for making interconnects and diffusion barriers in integrated circuits
08/23/2005US6933229 Method of manufacturing semiconductor device featuring formation of conductive plugs
08/23/2005US6933228 Method of manufacturing of contact plug in a contact hole on a silicon substrate
08/23/2005US6933227 Semiconductor device and method of forming the same
08/23/2005US6933226 Method of forming a metal gate in a semiconductor device
08/23/2005US6933225 Graded thin films
08/23/2005US6933224 Method of fabricating integrated circuitry
08/23/2005US6933223 Ultra-low loop wire bonding
08/23/2005US6933222 Microcircuit fabrication and interconnection
08/23/2005US6933221 Method for underfilling semiconductor components using no flow underfill
08/23/2005US6933219 Tightly spaced gate formation through damascene process
08/23/2005US6933218 Low temperature nitridation of amorphous high-K metal-oxide in inter-gates insulator stack
08/23/2005US6933217 Method for forming a ROM coding in a semiconductor device
08/23/2005US6933216 Fine particle film forming apparatus and method and semiconductor device and manufacturing method for the same
08/23/2005US6933215 Process for doping a semiconductor body
08/23/2005US6933214 Method of manufacturing flash memories of semiconductor devices
08/23/2005US6933213 Method for fabricating group III-V compound semiconductor substrate
08/23/2005US6933212 Apparatus and method for dicing semiconductor wafers
08/23/2005US6933211 Semiconductor device whose semiconductor chip has chamfered backside surface edges and method of manufacturing the same
08/23/2005US6933210 Method of manufacturing semiconductor device, integrated circuit, electro-optical device, and electronic apparatus
08/23/2005US6933209 Stacking memory chips using flat lead-frame with breakaway insertion pins and pin-to-pin bridges
08/23/2005US6933208 Method of forming wiring, and method of arranging devices and method of manufacturing image display system by using the same
08/23/2005US6933206 Trench isolation employing a high aspect ratio trench
08/23/2005US6933205 Integrated circuit device and method of manufacturing the same
08/23/2005US6933204 Method for improved alignment of magnetic tunnel junction elements
08/23/2005US6933203 Methods for improving well to well isolation
08/23/2005US6933202 Method for integrating SiGe NPN and vertical PNP devices on a substrate and related structure
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