Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2006
03/02/2006US20060046471 Methods for forming vias of varying lateral dimensions and semiconductor components and assemblies including same
03/02/2006US20060046470 Apparatus and plasma ashing process for increasing photoresist removal rate
03/02/2006US20060046469 Method for manufacturing a semiconductor device
03/02/2006US20060046468 Through-substrate interconnect fabrication methods and resulting structures and assemblies
03/02/2006US20060046467 Organic solvents having ozone dissolved therein for semiconductor processing utilizing sacrificial materials
03/02/2006US20060046466 Semiconductor device and method for forming a metal line in the semiconductor device
03/02/2006US20060046465 Method for manufacturing a semiconductor device
03/02/2006US20060046464 Wiring substrate and semiconductor device using the same
03/02/2006US20060046463 Method of forming vias in semiconductor substrates without damaging active regions thereof and resulting structures
03/02/2006US20060046462 Circuitized substrate, method of making same and information handling system using same
03/02/2006US20060046461 Method for creating electrically conductive elements for semiconductor device structures using laser ablation processes and methods of fabricating semiconductor device assemblies
03/02/2006US20060046460 Method of fabricating poly-crystal ito film and polycrystal ito electrode
03/02/2006US20060046459 Method of forming a layer comprising epitaxial silicon and a field effect transistor
03/02/2006US20060046458 Ohmic contact for nitride-based semiconductor device
03/02/2006US20060046457 Method of manufacturing semiconductor device
03/02/2006US20060046456 Damascene process using different kinds of metals
03/02/2006US20060046455 Method of manufacturing electrical parts
03/02/2006US20060046454 Method for filling electrically different features
03/02/2006US20060046453 Method for filling electrically different features
03/02/2006US20060046452 N-gate transistor
03/02/2006US20060046451 Methods of forming transistor gates; and methods of forming programmable read-only memory constructions
03/02/2006US20060046450 Semiconductor processing components and semiconductor processing utilizing same
03/02/2006US20060046449 Metal gate structure for mos devices
03/02/2006US20060046448 Facilitating removal of sacrificial layers via implantation to form replacement metal gates
03/02/2006US20060046447 Method for coating semiconductor surface, process for production of semiconductor particles using said method, and optical element using said semiconductor particles
03/02/2006US20060046446 Semiconductor device and manufacturing method thereof, and gate electrode and manufacturing method thereof
03/02/2006US20060046445 Method of forming a conductive line for a semiconductor device using a carbon nanotube and semiconductor device manufactured using the method
03/02/2006US20060046444 Method of forming a memory cell
03/02/2006US20060046443 Method of forming a layer comprising epitaxial silicon
03/02/2006US20060046442 Method of forming epitaxial silicon-comprising material and a method of forming a vertical transistor
03/02/2006US20060046441 Method of monitoring selectivity of selective film growth method, and semiconductor device fabrication method
03/02/2006US20060046440 Methods of forming layers comprising epitaxial silicon
03/02/2006US20060046439 Method of manufacturing a semiconductor device and a semiconductor device obtained by means of said method
03/02/2006US20060046438 Wafer reinforcement structure and methods of fabrication
03/02/2006US20060046437 Method for forming individual semi-conductor devices
03/02/2006US20060046436 Manufacturing method of stack-type semiconductor device
03/02/2006US20060046435 Laser beam processing apparatus for processing semiconductor wafer in production of semiconductor devices, laser beam processing method executed therein, and such semiconductor wafer processed thereby
03/02/2006US20060046434 Method for reducing lead precipitation during wafer processing
03/02/2006US20060046433 Thinning semiconductor wafers
03/02/2006US20060046432 Method of forming through-wafer interconnects for vertical wafer level packaging
03/02/2006US20060046431 Layered semiconductor wafer with low warp and bow, and process for producing it
03/02/2006US20060046430 Batch process and device for forming spacer structures for packaging optical reflection devices
03/02/2006US20060046429 Laser based method and device for forming spacer structures for packaging optical reflection devices
03/02/2006US20060046428 Trench sidewall passivation for lateral rie in a selective silicon-on-insulator process flow
03/02/2006US20060046427 Gap-fill depositions introducing hydroxyl-containing precursors in the formation of silicon containing dielectric materials
03/02/2006US20060046426 Methods of forming trench isolation in the fabrication of integrated circuitry, methods of fabricating memory circuitry, integrated circuitry and memory integrated circuitry
03/02/2006US20060046425 Methods of forming trench isolation in the fabrication of integrated circuitry, methods of fabricating memory circuitry, integrated circuitry and memory integrated circuitry
03/02/2006US20060046424 Methods of forming semiconductor constructions
03/02/2006US20060046423 Trench wall in the ground and method for the production thereof
03/02/2006US20060046422 Methods for increasing photo alignment margins
03/02/2006US20060046421 Method for manufacturing semiconductor device
03/02/2006US20060046420 Methods of forming a plurality of capacitors
03/02/2006US20060046419 Double-sided container capacitors using a sacrificial layer
03/02/2006US20060046418 Method of adjusting resistors post silicide process
03/02/2006US20060046417 Metal foil for capacitor, solid electrolytic capactor using the foil and production methods of the foil and the capacitor
03/02/2006US20060046416 Method for manufacturing a semiconductor device
03/02/2006US20060046415 Semiconductor device and manufacturing method for the same
03/02/2006US20060046414 Method for producing a thermoelement
03/02/2006US20060046413 Substrate processing apparatus and substrate processing method
03/02/2006US20060046412 Method and system for sequential processing in a two-compartment chamber
03/02/2006US20060046411 Heterojunction bipolar transistor and manufacturing method thereof
03/02/2006US20060046410 Method to improve the coupling ratio of top gate to floating gate in flash
03/02/2006US20060046409 Semiconductor device and method of producing the same
03/02/2006US20060046408 Semiconductor integrated device
03/02/2006US20060046407 DRAM cells with vertical transistors
03/02/2006US20060046406 Programming, erasing, and reading structure for an NVM cell
03/02/2006US20060046405 Semiconductor device
03/02/2006US20060046404 Method for implanting a cell channel ion of semiconductor device
03/02/2006US20060046403 Method of forming separated charge-holding regions in a semiconductor device
03/02/2006US20060046402 Flash cell structures and methods of formation
03/02/2006US20060046400 Method of forming a semiconductor structure comprising transistor elements with differently stressed channel regions
03/02/2006US20060046399 Forming abrupt source drain metal gate transistors
03/02/2006US20060046398 Low resistance peripheral local interconnect contacts with selective wet strip of titanium
03/02/2006US20060046397 Method for manufacturing trench MOSFET
03/02/2006US20060046396 Wafer holding mechanism
03/02/2006US20060046395 Forming a vertical transistor
03/02/2006US20060046394 Forming a vertical transistor
03/02/2006US20060046393 Semiconductor device and method for manufacturing the same
03/02/2006US20060046392 Methods of forming vertical transistor structures
03/02/2006US20060046391 Vertical wrap-around-gate field-effect-transistor for high density, low voltage logic and memory array
03/02/2006US20060046390 Dual-bit non-volatile memory cell and method of making the same
03/02/2006US20060046389 Manufacturing process and structure of integrated circuit
03/02/2006US20060046388 Nonvolatile semiconductor device and method of fabricating the same
03/02/2006US20060046387 Flash memory devices having an alternately arrayed inter-gate dielectric layer and methods of fabricating the same
03/02/2006US20060046386 Method of manufacturing a flash memory device
03/02/2006US20060046385 Manufacturing method of semiconductor device
03/02/2006US20060046384 Methods of fabricating non-volatile memory devices including nanocrystals
03/02/2006US20060046383 Method for forming a nanocrystal floating gate for a flash memory device
03/02/2006US20060046382 Method of forming a capacitor for a semiconductor device
03/02/2006US20060046381 Methods of forming capacitor structures, methods of forming threshold voltage implant regions, and methods of implanting dopant into channel regions
03/02/2006US20060046380 Integrated circuit capacitors having composite dielectric layers therein containing crystallization inhibiting regions and methods of forming same
03/02/2006US20060046379 Fabricating memory components (PCRAMS) including memory cells based on a layer that changes phase state
03/02/2006US20060046378 Methods of fabricating MIM capacitor employing metal nitride layer as lower electrode
03/02/2006US20060046377 Thin-film capacitor including an opening therein and a manufacturing method thereof
03/02/2006US20060046376 Rotating gripper wafer flipper
03/02/2006US20060046375 ISFETs fabrication method
03/02/2006US20060046374 Conducting line terminal structure for display device
03/02/2006US20060046373 Method for fabricating a semiconductor device
03/02/2006US20060046372 Method of fabricating semiconductor a device
03/02/2006US20060046371 Methods of forming gate electrodes in semiconductor devices