Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2006
03/02/2006WO2006022856A2 DUV LASER ANNEALING AND STABILIZATION OF SiCOH FILMS
03/02/2006WO2006022836A1 Apparatus and methods for constructing antennas using wire bonds as radiating elements
03/02/2006WO2006022780A2 Method for fabricating crystalline silicon
03/02/2006WO2006022597A2 Supply mechanism for the chuck of an integrated circuit dicing device
03/02/2006WO2006022425A1 Apparatus for measuring electrical characteristics of semiconductor
03/02/2006WO2006022423A1 Germanium-adding source for compound semiconductor, production method of compound semiconductor using the same and compound semiconductor
03/02/2006WO2006022403A1 Passivation film, semiconductor device, and organic electroluminescent element
03/02/2006WO2006022387A1 Semiconductor device and module using the same
03/02/2006WO2006022334A1 Method for manufacturing semiconductor device
03/02/2006WO2006022328A1 Film forming equipment and film forming method
03/02/2006WO2006022319A1 Plasma film-forming method and apparatus therefor
03/02/2006WO2006022303A1 Vertical heat treatment apparatus and method for using the same
03/02/2006WO2006022287A1 Semiconductor device for surge protection
03/02/2006WO2006022282A1 Silicon carbide single crystal wafer and method for manufacturing the same
03/02/2006WO2006022245A1 Method for producing compound semiconductor epitaxial substrate having pn junction
03/02/2006WO2006022232A1 Drying furnace for coating film
03/02/2006WO2006022200A1 Stage apparatus and exposure apparatus
03/02/2006WO2006022197A1 Memory cell and magnetic random access memory
03/02/2006WO2006022196A1 Semiconductor device and its manufacturing method
03/02/2006WO2006022195A1 Method for purifying material comprising organic semiconductor, method for purifying material comprising pentacene, semiconductor device, and method for fabricating the semiconductor device
03/02/2006WO2006022179A1 Cluster-free amorphous silicon film, process for producing the same and apparatus therefor
03/02/2006WO2006022176A1 Organic silane compound, process for producing the compound, and organic thin film comprising the compound
03/02/2006WO2006022175A1 Semiconductor device and method for manufacturing the same
03/02/2006WO2006022169A1 Wireless chip and manufacturing method thereof
03/02/2006WO2006022152A1 Driving circuit board, method for manufacturing the same, liquid crystal display panel and liquid crystal display device
03/02/2006WO2006022133A1 Electroless plating apparatus
03/02/2006WO2006022128A1 Quartz jig and semiconductor manufacturing equipment
03/02/2006WO2006022127A1 Method for manufacturing silicon epitaxial wafer
03/02/2006WO2006021927A1 Hot source cleaning system
03/02/2006WO2006021907A1 Semiconductor device and method of manufacturing such a semiconductor device
03/02/2006WO2006021906A1 Semiconductor device and method of manufacturing such a semiconductor device
03/02/2006WO2005122270A3 Gated field effect devices and methods of forming a gated field effect device
03/02/2006WO2005121843A8 Transmissive element
03/02/2006WO2005119778A3 Field effect transistor
03/02/2006WO2005104314A3 Method for production of electronic and optoelectronic circuits
03/02/2006WO2005104188A3 Polymer dielectrics for memory element array interconnect
03/02/2006WO2005099312A3 Triarylamine compounds for use as charge transport materials
03/02/2006WO2005096403A3 Organic photoelectric conversion element utilizing an inorganic buffer layer placed between an electrode and the active material
03/02/2006WO2005094316A3 Low optical overlap mode (loom) waveguiding system and method of making same
03/02/2006WO2005071739A3 Plasma-excited chemical vapor deposition method, silicon/oxygen/nitrogen-containing material and layered assembly
03/02/2006WO2005065144A3 Planarization method of manufacturing a superjunction device
03/02/2006WO2005065143A3 Isotopically pure silicon-on-insulator wafers and method of making same
03/02/2006WO2005064649A3 Exhaust conditioning system for semiconductor reactor
03/02/2006WO2005050705A3 Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon
03/02/2006WO2005048313A3 Methods and systems for handling workpieces in a vacuum-based semiconductor handling system
03/02/2006WO2005045934A3 Method and device for connecting chips
03/02/2006WO2005045899A3 Low temperature deposition of silicone nitride
03/02/2006WO2005029183A3 Method and apparatus for protecting a reticle used in chip production from contamination
03/02/2006US20060047860 Flash memory device with a plurality of protocols and a method for controlling the flash memory device
03/02/2006US20060046523 Facilitating removal of sacrificial layers to form replacement metal gates
03/02/2006US20060046522 Atomic layer deposited lanthanum aluminum oxide dielectric layer
03/02/2006US20060046521 Deposition methods using heteroleptic precursors
03/02/2006US20060046520 Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursors
03/02/2006US20060046519 Method of forming fluorine-doped low-dielectric-constant insulating film
03/02/2006US20060046518 Method of increasing deposition rate of silicon dioxide on a catalyst
03/02/2006US20060046517 Methods for forming an enriched metal oxide surface for use in a semiconductor device
03/02/2006US20060046516 Repair of carbon depletion in low-k dielectric films
03/02/2006US20060046515 Micelle-containing composition, thin film thereof, and method for producing the thin film
03/02/2006US20060046514 Thermal treatment of nitrided oxide to improve negative bias thermal instability
03/02/2006US20060046513 Selective etching of oxides to metal nitrides and metal oxides
03/02/2006US20060046512 Manufacturing method of semiconductor device
03/02/2006US20060046511 Porous substrate and its manufacturing method, and gan semiconductor multilayer substrate and its manufacturing method
03/02/2006US20060046510 Method of forming an oxide film, an oxide film, a component and an electronic apparatus
03/02/2006US20060046509 Method of forming a phase change memory device having a small area of contact
03/02/2006US20060046508 Silicon oxide gapfill deposition using liquid precursors
03/02/2006US20060046507 Method to stabilize carbon in Si1-x-yGexCy layers
03/02/2006US20060046506 Soft de-chucking sequence
03/02/2006US20060046505 Ruthenium gate for a lanthanide oxide dielectric layer
03/02/2006US20060046504 Metal oxide structure containing Titanium oxide and production method and use thereof
03/02/2006US20060046503 Material for electronic device and process for producing the same
03/02/2006US20060046502 Deposition of hard-mask with minimized hillocks and bubbles
03/02/2006US20060046501 Screening of electroless nickel/immersion gold-plated substrates with black pad defect
03/02/2006US20060046500 Method of cleaning semiconductor substrate, and method of manufacturing semiconductor device and semiconductor substrate processing apparatus for use in the same
03/02/2006US20060046499 Apparatus for use in thinning a semiconductor workpiece
03/02/2006US20060046498 Method for patterning sub-lithographic features in semiconductor manufacturing
03/02/2006US20060046497 Manufacturing method
03/02/2006US20060046496 Method and apparatus for etching material layers with high uniformity of a lateral etch rate across a substrate
03/02/2006US20060046495 Technique for enhancing the fill capabilities in an electrochemical deposition process by edge rounding of trenches
03/02/2006US20060046494 Method for fabricating semiconductor device
03/02/2006US20060046493 Semiconductor device and fabrication process thereof
03/02/2006US20060046492 Methods and forming structures, structures and apparatuses for forming structures
03/02/2006US20060046491 CMP polishing method and method for manufacturing semiconductor device
03/02/2006US20060046490 Chemical-mechanical planarization composition having benzenesulfonic acid and per-compound oxidizing agents, and associated method for use
03/02/2006US20060046489 Semiconductor memory device and method for fabricating the same
03/02/2006US20060046488 Germanium-on-insulator fabrication utilizing wafer bonding
03/02/2006US20060046487 Method of manufacturing a semiconductor device, and a semiconductor substrate
03/02/2006US20060046486 Method of manufacturing microlens, microlens, microlens array, electro-optical device, and electronic apparatus
03/02/2006US20060046485 Anodizing a metal core opened through a masking process, oxidation layers insulate portions of circuit pattern from each other; electroplating portions provided between the oxidation layers with copper or filling conductive paste between; fine circuit pattern is achieved
03/02/2006US20060046484 Method for integrated circuit fabrication using pitch multiplication
03/02/2006US20060046483 Critical dimension control for integrated circuits
03/02/2006US20060046482 Semiconductor processing using energized hydrogen gas and in combination with wet cleaning
03/02/2006US20060046481 Manufacturing methods and electroless plating apparatus for manufacturing wiring circuit boards
03/02/2006US20060046480 Nanostructures, nanogrooves, and nanowires
03/02/2006US20060046479 Adhesion improvement for low k dielectrics to conductive materials
03/02/2006US20060046478 Method for forming tungsten nitride film
03/02/2006US20060046477 Plasma processing, deposition, and ALD methods
03/02/2006US20060046476 Method for manufacturing semiconductor device
03/02/2006US20060046475 Sloped vias in a substrate, spring-like deflecting contacts, and methods of making
03/02/2006US20060046474 Forming method of stacking structure and manufacturing method of electron source and image display apparatus using such method
03/02/2006US20060046472 Barrier layer, IC via, and IC line forming methods