Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2006
04/13/2006US20060075967 Magnetic-field concentration in inductively coupled plasma reactors
04/13/2006US20060075966 Apparatus and method for plasma assisted deposition
04/13/2006US20060075960 Method for the preparation of a semiconductor substrate with a non-uniform distribution of stabilized oxygen precipitates
04/13/2006US20060075957 Annealed wafer and anneald wafer manufacturing method
04/13/2006US20060075688 Polishing composition and method of polishing with the same
04/13/2006DE60203032T2 Integrierte Halbleiterschaltung A semiconductor integrated circuit
04/13/2006DE4339190B4 Halbleiter-Beschleunigungsmesser Semiconductor accelerometer
04/13/2006DE19958144B4 Programmierbare Zwischenverbindungszelle zum wahlweisen Verbinden von Schaltkreisknoten in einem integrierten Schaltkreis und Anordnung programmierbarer Zwischenverbindungszellen Programmable interconnect cell for selectively connecting circuit nodes in an integrated circuit and array of programmable interconnect cells
04/13/2006DE19957034B4 Verfahren zur Behandlung von Oberflächen von Substraten und Vorrichtung A process for the surface treatment of substrates and device
04/13/2006DE19955537B4 Verfahren zur Herstellung eines Trägerelementes für einen IC-Baustein A process for producing a support element for an IC module
04/13/2006DE19951317B4 Dichtmechanismus zum Abdichten einer Vakkumkammer Sealing mechanism for sealing a Vakkumkammer
04/13/2006DE19925670B4 Verfahren zum Herstellen von elektronischen Keramikbauteilen A method of manufacturing ceramic electronic components
04/13/2006DE19922802B4 Verfahren zur Herstellung eines vertikal doppelt diffundierter MOSFETS A method for producing a vertical double diffused MOSFETS
04/13/2006DE19914718B4 Verfahren zum gleichzeitigen Herstellen einer Mehrzahl von Leuchtdiodenelementen mit integrierten Kontakten A method for simultaneously producing a plurality of light emitting diodes elements with built-in contacts
04/13/2006DE19739684B4 Verfahren zur Herstellung von Chipstapeln Process for the preparation of chip stacks
04/13/2006DE19719181B4 Programmierbare Sicherungsschaltung und Verwendung derselben Programmable fuse circuit and using the same
04/13/2006DE19615005B4 Gehäuse zur Aufnahme elektronischer Bauelemente und zugehöriges Herstellungsverfahren Housing for accommodating electronic components and associated production method
04/13/2006DE19600780B4 Verfahren zum Kontaktieren von Bereichen mit verschiedener Dotierung in einem Halbleiterbauelement und Halbleiterbauelement Method of contacting of regions of different doping within a semiconductor device and semiconductor device
04/13/2006DE19525745B4 Verfahren zur Bildung eines Abdeckungsmusters A method for forming a resist pattern
04/13/2006DE19503964B4 Datenausgabepuffer einer Halbleitervorrichtung Data output buffer of a semiconductor device
04/13/2006DE112004001023T5 Strukturierung eines magnetischen Tunnelübergangs unter Verwendung von SiC oder SiN Structuring a magnetic tunnel junction using SiC or SiN
04/13/2006DE10355728B4 Verbinden von Halbleiterscheiben gleichen Durchmessers zum Erhalt einer gebondeten Scheibenanordnung Joining of semiconductor wafers of the same diameter to obtain a bonded disk assembly
04/13/2006DE10314152B4 Herstellung von dielektrischen Zwischenschichtfilmen mit einem niedrigen K-Wert unter Verwendung von Si-haltigen Resists Production of interlayer dielectric films with a low K value using Si-containing resist
04/13/2006DE10297714T5 Prüfgerät für elektronische Bauelemente An electronic component tester
04/13/2006DE10211922B4 Waferuntersuchungssystem zur Untersuchung von Halbleiterwafern Wafer inspection system for the study of semiconductor wafers
04/13/2006DE102005042096A1 Polierzusammensetzung und Polierverfahren unter Verwendung derselben Polishing composition and polishing method using the same
04/13/2006DE102004063578A1 Fabrication of dual gate electrodes for metal oxide semiconductor field effect transistor devices, involves depositing thin layer with high dielectric constant or pure oxide layer on one region and thick oxide layer on the other region
04/13/2006DE102004060692A1 Verfahren zum Bilden einer dielektrischen Schicht in einem Halbleiterbauelement A method of forming a dielectric layer in a semiconductor device
04/13/2006DE102004059281B3 Thermode device for contacting first semiconductor building blocks and substrate has elongated base body and removable heater on movable guide member
04/13/2006DE102004058877A1 Semiconductor chip comprises a front section with a semiconductor functional element, and a rear section
04/13/2006DE102004048745A1 Bit conducting structure of DRAM comprises a number of parallel bit conductors in a storage element, which a arranged on different levels
04/13/2006DE102004048626B3 Oxidationsverfahren von Siliziumscheiben zur Reduzierung von mechanischen Spannungen Oxidation method of silicon wafers to reduce mechanical stresses
04/13/2006DE102004048607A1 Halbleiterbauelement Semiconductor device
04/13/2006DE102004048201A1 Schicht zwischen Grenzflächen unterschiedlicher Komponenten in Halbleiterbauteilen, sowie Verfahren zu deren Herstellung Layer between interfaces of different components in semiconductor devices, as well as processes for their preparation
04/13/2006DE102004047749A1 Halbleiterbauteil sowie dafür geeignetes Herstellungsverfahren Semiconductor device and manufacturing method suitable therefor
04/13/2006DE102004047660A1 Bauteil mit integrierter Kapazitätsstruktur Component with integrated capacitance structure
04/13/2006DE102004047630A1 Verfahren zur Herstellung eines CBRAM-Halbleiterspeichers A method for producing a semiconductor memory CBRAM
04/13/2006DE102004047510A1 Halbleiterbauteil mit in Kunststoffgehäusemasse eingebetteten Halbleiterbauteilkomponenten Semiconductor device having embedded in plastic housing compound semiconductor device components
04/13/2006DE102004047307A1 Wafer`s structured sample upper surface testing method for Dynamic RAM production, involves finding distance of surface area from flying time of ions from surface to verification device, and receiving result indicating surface portion
04/13/2006DE102004046699A1 Contact surfaces e.g. cooling unit, connecting device, has contact surfaces connected by solidifying liquid e.g. melted solder, such that section of one of two surface edges exhibits structuring in area of edges
04/13/2006DE102004046174A1 Integrierter BiCMOS-Halbleiterschaltkreis Integrated BiCMOS semiconductor circuit
04/13/2006DE102004028851B4 Verfahren und Vorrichtung zum Vermessen eines Oberflächenprofils einer Probe Method and apparatus for measuring a surface profile of a sample
04/13/2006DE102004024661B4 Trench transistor manufacturing method, by back-forming layer in upper trench region, and semiconductor material on side walls of trench before forming new semiconductor material on side walls
04/13/2006DE10160174B4 Chemisch/mechanische Polieraufschlämmung und chemisch/mechanischer Polierprozeß und Seichtgraben-Isolationsprozeß unter Verwendung des Polierprozesses Chemical / mechanical polishing slurry and chemical / mechanical polishing process and shallow trench isolation process using the polishing process
04/13/2006DE10142340B4 Feldeffekttransistor mit einem Kontakt zu einem seiner Dotiergebiete und Verfahren zu seiner Herstellung Field effect transistor having a contact to one of its doping regions and process for its preparation
04/13/2006DE10065896B4 Elektronisches Bauteil mit Abschirmung und Verfahren zu seiner Herstellung Electronic component with screen and method for its preparation
04/13/2006DE10062199B4 Substratprozessvorrichtung und Verfahren zum Prozessieren eines Wafers Substrate processing apparatus and method for processing a wafer
04/13/2006DE10052484B4 Zappingschaltung und Zappingverfahren Zapping Zapping circuit and method
04/13/2006DE10042661B4 Verfahren und Vorrichtungen für die Montage von Halbleiterchips Methods and devices for the mounting of semiconductor chips
04/13/2006DE10036867B4 Substrat-Bearbeitungsverfahren und -vorrichtung Substrate processing method and apparatus
04/12/2006EP1646091A2 Etching liquid composition
04/12/2006EP1646084A1 A method in the fabrication of an integrated injection logic circuit
04/12/2006EP1646083A1 Alternative dual damascene patterning approach
04/12/2006EP1646082A1 Storage box for wafer shipping box
04/12/2006EP1646081A1 Packaging method and system of electric component
04/12/2006EP1646080A1 Etching of structures with high topography
04/12/2006EP1646079A1 Device and method for surface treatment such as plasma treatment
04/12/2006EP1646078A1 Epitaxial growth process
04/12/2006EP1646077A1 Nitride semiconductor element and method for manufacturing thereof
04/12/2006EP1646076A1 Manufacturing method of a thin film transistor array panel
04/12/2006EP1646073A1 Illuminating method, exposing method, and device for therefor
04/12/2006EP1646072A2 Capacitor structure
04/12/2006EP1645606A1 Metal CMP slurry compositions that favor mechanical removal of metal oxides with reduced susceptibility to micro-scratching
04/12/2006EP1645342A1 Method and apparatus for controlled transient cavitation
04/12/2006EP1644988A2 High-density finfet integration scheme
04/12/2006EP1644984A1 Semiconductor device including band-engineered superlattice
04/12/2006EP1644983A1 Semiconductor device including mosfet having band-engineered superlattice
04/12/2006EP1644982A1 Method for making semiconductor device including band-engineered superlattice
04/12/2006EP1644981A2 Semiconductor device including band-engineered superlattice
04/12/2006EP1644977A2 Method for forming a high-voltage / high-power die package
04/12/2006EP1644974A2 Pecvd silicon-rich oxide layer for reduced uv charging in an eeprom
04/12/2006EP1644973A2 Bipolar transistor and method of making same
04/12/2006EP1644971A1 Precursor solution, method of preparation thereof and use thereof
04/12/2006EP1644969A1 Method for implantation through an irregular surface
04/12/2006EP1644968A2 Method of forming freestanding semiconductor layer
04/12/2006EP1644967A2 Substrate assembly for stressed systems
04/12/2006EP1644965A2 Automated process and apparatus for planarization of topographical surfaces
04/12/2006EP1644962A2 Substrate support having dynamic temperature control
04/12/2006EP1644960A1 Device and method for wet treating disc-like substrates
04/12/2006EP1644959A1 Device for storing and/or transporting plate-shaped substrates in the manufacture of electronic components
04/12/2006EP1644954A2 Method for anisotropically etching a recess in a silicon substrate and use of a plasma etching system
04/12/2006EP1644953A2 Filling vias with thick film paste using contact printing
04/12/2006EP1644874A1 Flexible semiconductor device and identification label
04/12/2006EP1644862A2 Non-oriented optical character recognition of a wafer mark
04/12/2006EP1644783A1 Semiconductor device with high-breakdown-voltage regulator
04/12/2006EP1644776A2 Methods of removing photoresist from substrates
04/12/2006EP1644557A1 Electrochemical processing cell
04/12/2006EP1644426A1 Positive photoresist composition and method of forming resist pattern
04/12/2006EP1570363A4 Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection
04/12/2006EP1502335A4 Automatic gas control system for a gas discharge laser
04/12/2006EP1479025A4 Methods and apparatus for semiconductor testing
04/12/2006EP1476903B1 A method of calibrating and using a semiconductor processing system
04/12/2006EP1461296A4 Recycle for supercritical carbon dioxide
04/12/2006EP1364392B1 Method of manufacturing optical devices and related improvements
04/12/2006EP1285221B1 In-situ mirror characterization
04/12/2006EP1204853A4 Inorganic permeation layer for micro-electric device
04/12/2006EP1141128B1 A composition containing a cross-linkable matrix precursor and a poragen, and a porous matrix prepared therefrom
04/12/2006EP1075187A4 Method and apparatus for controlling the radial temperature gradient of a wafer while ramping the wafer temperature
04/12/2006EP1064674B1 A method of manufacturing an electronic device comprising two layers of organic-containing material
04/12/2006EP1046958B1 Use of a composition for bottom reflection preventive film