| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 01/16/2008 | CN101107090A Electroprocessing profile control |
| 01/16/2008 | CN101106897A High-speed picker applying multi-header turning tower structure |
| 01/16/2008 | CN101106173A Method of forming a phase change material layer and a phase change memory device so formed |
| 01/16/2008 | CN101106169A LED encapsulation structure and its making method |
| 01/16/2008 | CN101106161A Underlay material for GaN epitaxial growth and its making method |
| 01/16/2008 | CN101106160A Vertical gate semiconductor device and method for manufacturing the same |
| 01/16/2008 | CN101106159A Multi-grid electric crystal and its making method |
| 01/16/2008 | CN101106158A Germanium silicon heterogeneous crystal transistor with elevated external base area and its making technology |
| 01/16/2008 | CN101106156A Organic light emitting diode display and method for manufacturing thereof |
| 01/16/2008 | CN101106153A Field effect transistor, organic thin-film transistor and manufacturing method of organic transistor |
| 01/16/2008 | CN101106151A Phase change memory with diode unit selective connection and its making method |
| 01/16/2008 | CN101106146A MOS solid-state image pickup device and manufacturing method thereof |
| 01/16/2008 | CN101106145A Image sensor and its making method |
| 01/16/2008 | CN101106144A An image sensor and method for forming semiconductor part |
| 01/16/2008 | CN101106142A Display substrate, method of manufacturing thereof and display apparatus having the same |
| 01/16/2008 | CN101106141A Semiconductor-on-insulator (SOI) structure and its making method |
| 01/16/2008 | CN101106140A Non-volatile memory devices including dummy word lines and related structures and methods |
| 01/16/2008 | CN101106139A Nonvolatile memory having raised source and drain regions |
| 01/16/2008 | CN101106138A Nonvolatile memory array having modified channel region interface |
| 01/16/2008 | CN101106136A Nonvolatile memory unit IC and its making method |
| 01/16/2008 | CN101106133A Memory part, its making method and operation method |
| 01/16/2008 | CN101106131A Semiconductor structure and its forming method |
| 01/16/2008 | CN101106130A Power system inhibit method and device and structure therefor |
| 01/16/2008 | CN101106125A Composite assembly that incorporates multiple devices that use different wavelengths of light and method for making the composite assembly |
| 01/16/2008 | CN101106124A Direct insertion LED and its making method |
| 01/16/2008 | CN101106123A Wafer and semiconductor device testing method |
| 01/16/2008 | CN101106122A Buried bitline with reduced resistance |
| 01/16/2008 | CN101106121A Wiring substrate, semiconductor device, and method of manufacturing the same |
| 01/16/2008 | CN101106116A Semiconductor device and method of producing the same |
| 01/16/2008 | CN101106115A Semiconductor device and method for manufacturing the same |
| 01/16/2008 | CN101106114A Chip structure and its forming method |
| 01/16/2008 | CN101106113A IC device package and its assembling method |
| 01/16/2008 | CN101106112A Packaging structure of electronic part, and its packaging method |
| 01/16/2008 | CN101106111A IC device package and its mounting method |
| 01/16/2008 | CN101106110A Making method for flash memory separation grid |
| 01/16/2008 | CN101106109A Making method for memory separation grid |
| 01/16/2008 | CN101106108A Transistor and memory cell array and methods of making the same |
| 01/16/2008 | CN101106107A Making method of CMOS part |
| 01/16/2008 | CN101106106A Making method for semiconductor part |
| 01/16/2008 | CN101106105A Making and detection method of silicon base LCD chip base plate |
| 01/16/2008 | CN101106104A Making method for memory capacitor |
| 01/16/2008 | CN101106103A Manufacturing method of light-emitting element |
| 01/16/2008 | CN101106102A Compliant conductive interconnects |
| 01/16/2008 | CN101106101A Single inlay structure and dual inlay structure and their open hole forming method |
| 01/16/2008 | CN101106100A Method for reducing contact resistance in high depth ratio self alignment etching |
| 01/16/2008 | CN101106099A Method for using oxide coated layer to improve channel filling equality |
| 01/16/2008 | CN101106098A Ball filling device and method |
| 01/16/2008 | CN101106097A Semiconductor part with protective compound layer and its making method |
| 01/16/2008 | CN101106096A Method for forming conduction protruding block and its structure |
| 01/16/2008 | CN101106095A Making method of solder protruding block |
| 01/16/2008 | CN101106094A Built-in wafer encapsulation structure and its making process |
| 01/16/2008 | CN101106093A Making method for base plate welding cover layer and its structure |
| 01/16/2008 | CN101106092A Making method for IV-VI semiconductor single crystal film and the heterogeneous structure |
| 01/16/2008 | CN101106091A Semiconductor part and its making method |
| 01/16/2008 | CN101106090A An IMP method for effectively reducing high-voltage LDNMOS cut-off current and avoiding dual peak feature and its application |
| 01/16/2008 | CN101106089A A compensation injection method for effectively reducing LDNMOS cut-off current and avoiding dual peak feature and its application |
| 01/16/2008 | CN101106088A Making method for silicide damaged by low plasma inducing growth |
| 01/16/2008 | CN101106087A Technique method for forming local metal silicide |
| 01/16/2008 | CN101106086A Plasma etching method and computer-readable storage medium |
| 01/16/2008 | CN101106085A Method of manufacturing semiconductor device |
| 01/16/2008 | CN101106084A A new method for making low dielectric constant layer and its application |
| 01/16/2008 | CN101106083A Processing method for silicon sheet surface |
| 01/16/2008 | CN101106082A Method for the simultaneous double-side grinding of a plurality of semiconductor wafers, and semiconductor wafer having outstanding flatness |
| 01/16/2008 | CN101106081A Method of producing group iii nitride substrate wafers and group iii nitride substrate wafers |
| 01/16/2008 | CN101106080A Method of heating semiconductor wafer |
| 01/16/2008 | CN101106079A A growth method of silicon germanium material |
| 01/16/2008 | CN101106078A Method for forming nano single crystal silicon and making method of non volatile semiconductor memory |
| 01/16/2008 | CN101106077A Method to improve metal defects in semiconductor device fabrication |
| 01/16/2008 | CN101106076A A novel metal-insulation layer-metal capacitance and its making method |
| 01/16/2008 | CN101106075A Film formation apparatus for semiconductor process and method for using the same |
| 01/16/2008 | CN101106074A Plasma etch reactor |
| 01/16/2008 | CN101106073A Heat treatment for stabilizing a gluing interface |
| 01/16/2008 | CN101106072A Direct water-repellent gluing method of two substrates used in electronics, optics or optoelectronics |
| 01/16/2008 | CN101106071A Apparatus and method for treating substrate |
| 01/16/2008 | CN101106070A Process gas introducing mechanism and plasma processing device |
| 01/16/2008 | CN101106069A Method for extending use life of reaction cavity in plasma etching system |
| 01/16/2008 | CN101106068A Method for making semiconductor material form mutual built-in pattern |
| 01/16/2008 | CN101106067A Separation method for semiconductor part and silicon underlay |
| 01/16/2008 | CN101106066A Making method for semiconductor part removing residual polyester in etching |
| 01/16/2008 | CN101105641A Correction of off-axis translation of optical elements in an optical zoom assembly |
| 01/16/2008 | CN101105640A Lithographic apparatus and device manufacturing method |
| 01/16/2008 | CN101105638A Reflective loop system producing incoherent radiation |
| 01/16/2008 | CN101105634A Mask protection film removing device and its method |
| 01/16/2008 | CN101105633A Optical approximate correction method and its photomask pattern |
| 01/16/2008 | CN101105623A Method for manufacturing inclined line at light mask |
| 01/16/2008 | CN101105591A Air-float type machine station touch alarming device |
| 01/16/2008 | CN101105543A Microlens device and its making method |
| 01/16/2008 | CN101105516A Device and method for testing semiconductor packages |
| 01/16/2008 | CN101105504A 探针卡装置 Probe card device |
| 01/16/2008 | CN101105468A Porous anode alumina humidity sensor and its preparing process |
| 01/16/2008 | CN101104948A Crystalline thin film and process for manufacturing thereof, and element, circuit and device employing crystalline thin film |
| 01/16/2008 | CN101104548A Low-resistance P-type tin dioxide thin film material doped with indium and aluminum and preparation method thereof |
| 01/16/2008 | CN101104252A Polishing pad and chemical and mechanical polishing method |
| 01/16/2008 | CN101104247A Chemical and mechanical grinding method |
| 01/16/2008 | CN100362672C Single crystal gan substrate, method of growing same and method of producing same |
| 01/16/2008 | CN100362669C Photothyristor device, bidirectional photothyristor device and electronic apparatus |
| 01/16/2008 | CN100362667C Semiconductor element and its producing method |
| 01/16/2008 | CN100362666C Packaging structure of optical sensing chip and producing method thereof |
| 01/16/2008 | CN100362664C Non-volatile memory location and producing method thereof |
| 01/16/2008 | CN100362663C Integration of two memory types |