Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2008
07/02/2008CN101211963A Organic light emitting display and fabricating method thereof
07/02/2008CN101211962A Organic luminescence display apparatus with two side displaying different content and its manufacturing method
07/02/2008CN101211961A Three-dimensional stereo display organic electroluminescent display device and its display process
07/02/2008CN101211960A Organic electroluminescent display device and method of manufacture
07/02/2008CN101211959A Phase-change memory and fabrication method thereof
07/02/2008CN101211957A Alternating current illuminating device and its method for making
07/02/2008CN101211956A CMOS image sensor and manufacturing method thereof
07/02/2008CN101211955A Image sensor and method for manufacturing the same
07/02/2008CN101211954A CMOS image sensor and its manufacture method
07/02/2008CN101211952A CMOS image sensor and its manufacture method
07/02/2008CN101211951A Image sensor and method of fabricating the same
07/02/2008CN101211950A Image sensor and method of fabricating the same
07/02/2008CN101211949A Image sensor and method of manufactruing the same
07/02/2008CN101211948A Image sensor and method of manufactruing the same
07/02/2008CN101211947A CMOS image sensor and method for manufacturing the same
07/02/2008CN101211946A Image sensor and method for manufacturing the same
07/02/2008CN101211945A Semiconductor image element package structure with die receiving through-hole and method of the same
07/02/2008CN101211944A CMOS image sensor and method for manufacturing the same
07/02/2008CN101211943A CMOS image sensor and method for manufacturing the same
07/02/2008CN101211942A CMOS image sensor and method of manufacturing thereof
07/02/2008CN101211941A Image sensor and method of manufacturing the same
07/02/2008CN101211940A CMOS image sensor and method of manufacturing thereof
07/02/2008CN101211939A CMOS-device and manufacture method of the cmos device
07/02/2008CN101211938A Image sensor and method for manufacturing the same
07/02/2008CN101211937A Image sensor and method for manufacturing the same
07/02/2008CN101211936A Image sensor and manufacturing method thereof
07/02/2008CN101211935A Image sensor and fabricating method thereof
07/02/2008CN101211934A Image sensor and fabricating method thereof
07/02/2008CN101211933A Image sensor and fabricating method thereof
07/02/2008CN101211932A Image sensing subassembly wafer-grade packaging structure
07/02/2008CN101211930A Thin film transistor array substrate and method of manufacturing the same
07/02/2008CN101211929A Thin film transistor substrate and its producing method
07/02/2008CN101211928A Nonvolatile memory device and method for fabricating the same
07/02/2008CN101211923A Structure of semiconductor device for decreasing chip area and manufacturing method thereof
07/02/2008CN101211922A Capacitor having tapered cylindrical storage node and method for manufacturing the same
07/02/2008CN101211921A Integrated circuit and method of forming the same
07/02/2008CN101211920A Semiconductor device and its manufacture method
07/02/2008CN101211918A Semiconductor device and its manufacture method
07/02/2008CN101211917A Semiconductor device having a modified recess channel gate and a method for fabricating the same
07/02/2008CN101211915A Semiconductor capacitor and manufacturing method
07/02/2008CN101211913A Semiconductor device and method of fabricating the same
07/02/2008CN101211912A Semiconductor device having recess channel structure and method for manufacturing the same
07/02/2008CN101211908A Discharging unit for enhancing protection circuit over current capability and its manufacture method
07/02/2008CN101211903A RF module package structure and its forming method
07/02/2008CN101211901A Electronic component contained substrate
07/02/2008CN101211899A Stack package having reduced electrical connection length suitable for high speed operations and method of manufacturing the same
07/02/2008CN101211898A Packaging structure for electrostatic protection, electromagnetic isolation and antioxidation and method of manufacture
07/02/2008CN101211897A Multi-chip semiconductor packaging structure and encapsulation method
07/02/2008CN101211895A Structure for supervising memory array unit interval and the method
07/02/2008CN101211894A TEG pattern and semiconductor device test method using same
07/02/2008CN101211893A Semiconductor device and fabrication method thereof
07/02/2008CN101211892A Multi-layer metal wiring of semiconductor device and method for forming the same
07/02/2008CN101211891A Connection structure, electro-optical device, and method for production of electro-optical device
07/02/2008CN101211890A Metal line of semiconductor device and method of manufacturing the same
07/02/2008CN101211888A Wiring substrate, manufacturing method thereof, and semiconductor device
07/02/2008CN101211885A Braze welding joint, electronic component, semiconductor device and method for manufacturing electronic component
07/02/2008CN101211884A Chip packaging structure and method of manufacture
07/02/2008CN101211882A Printed circuit board and element module packaging structure and encapsulation method
07/02/2008CN101211881A Semiconductor chip packaging structure and encapsulation method
07/02/2008CN101211879A Signal transmission structure
07/02/2008CN101211878A Interconnection structure and its forming method
07/02/2008CN101211875A Wafer metal lead wire and its manufacture method
07/02/2008CN101211874A Structure of super thin chip scale package and method of the same
07/02/2008CN101211873A Package for semiconductor device and packaging method thereof
07/02/2008CN101211865A Method for fabricating semiconductor device
07/02/2008CN101211864A Liquid crystal display device and its manufacture method
07/02/2008CN101211863A Liquid crystal display device and its manufacture method
07/02/2008CN101211862A Transflective liquid crystal display device and fabrication method thereof
07/02/2008CN101211861A Integrated micro-sensor preparation method
07/02/2008CN101211860A Methods of forming non-volatile memory device
07/02/2008CN101211859A Method of fabricating flash memory device
07/02/2008CN101211858A Flash memory device
07/02/2008CN101211857A Flash memory device and method for manufacturing thereof
07/02/2008CN101211856A Method of manufacturing semiconductor device
07/02/2008CN101211855A Shallow impurity drain domain logical operation method suitable for active region read only memory
07/02/2008CN101211854A Method for fabricating semiconductor device
07/02/2008CN101211853A Method for manufacturing DRAM capacitor structure and formed structure
07/02/2008CN101211852A High voltage CMOS device and method of fabricating the same
07/02/2008CN101211851A 1.0Micrometre high voltage CMOS fabrication process
07/02/2008CN101211850A 0.80.8 micrometre CMOS process
07/02/2008CN101211849A Semiconductor device capacitor fabrication method
07/02/2008CN101211848A Method of manufacturing semiconductor device
07/02/2008CN101211847A Ion implantation method for high voltage device
07/02/2008CN101211846A On-chip system device thick grating oxide layer preparation method
07/02/2008CN101211845A Semiconductor fabrication process for manufacturing adjacent contact body and semiconductor apparatus
07/02/2008CN101211844A Method for manufacturing semiconductor device
07/02/2008CN101211843A Small size contact hole two polar-type fabrication process
07/02/2008CN101211842A Method of manufacturing CMOS image sensor
07/02/2008CN101211841A CMOS image sensor
07/02/2008CN101211840A CMOS image sensor and fabricating method thereof
07/02/2008CN101211839A Method for fabricating a CMOS image sensor
07/02/2008CN101211838A Fabricating method of image sensor
07/02/2008CN101211837A CMOS image sensor and method of fabricating the same
07/02/2008CN101211836A Method for manufacturing CMOS image sensor
07/02/2008CN101211835A CMOS image sensor and fabricating method thereof
07/02/2008CN101211834A Method of fabricating image sensor and image sensor
07/02/2008CN101211833A CMOS image sensor and method for fabricating the same
07/02/2008CN101211832A Method for fabricating CMOS image sensor
07/02/2008CN101211831A 0.60.6 micrometre silicides protection self-aligning process
07/02/2008CN101211830A 0.350.35 micrometre HV-BICMOS fabrication process
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