| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 09/30/2008 | US7428777 Method of making a heatsink device |
| 09/25/2008 | WO2008116222A2 A modular cluster tool |
| 09/25/2008 | WO2008116079A1 Powdered quantum dots |
| 09/25/2008 | WO2008116035A1 Method of forming a recess in a semiconductor structure |
| 09/25/2008 | WO2008116019A1 Improving the reliability of high-k gate dielectric layers |
| 09/25/2008 | WO2008115983A1 Sealed lighting units |
| 09/25/2008 | WO2008115967A1 Method of integrating mems structures and cmos structures using oxide fusion bonding |
| 09/25/2008 | WO2008115956A1 Methods and apparatus for manufacturing semiconductor devices |
| 09/25/2008 | WO2008115937A1 Doped wge to form dual metal gates |
| 09/25/2008 | WO2008115744A1 Vertical electrical interconnect formed on support prior to die mount |
| 09/25/2008 | WO2008115687A1 High power electrical connector for a laminated heater |
| 09/25/2008 | WO2008115652A1 Method of forming a carbon nanotube-based contact to semiconductor |
| 09/25/2008 | WO2008115600A1 Multi-material hard mask or prepatterned layer for use with multi-patterning photolithography |
| 09/25/2008 | WO2008115542A1 Semiconductor device and method for forming silicide layers |
| 09/25/2008 | WO2008115539A1 Method of making a solar grade silicon wafer |
| 09/25/2008 | WO2008115325A1 Deposition system with electrically isolated pallet and anode assemblies |
| 09/25/2008 | WO2008115266A2 Growth of metallic nanodots using specific precursors |
| 09/25/2008 | WO2008115249A2 Making high jc superconducting films using polymer-nitrate solutions |
| 09/25/2008 | WO2008115135A1 Semiconductor heterostructures and manufacturing thereof |
| 09/25/2008 | WO2008114997A1 Apparatus of measuring pressure of chuck plate, correcting position of chuck plate and method thereof |
| 09/25/2008 | WO2008114973A1 Probe card having planarization means |
| 09/25/2008 | WO2008114958A1 Apparatus for plasma processing and method for plasma processing |
| 09/25/2008 | WO2008114862A1 Plasma processing apparatus |
| 09/25/2008 | WO2008114845A1 Mg-CONTAINING ZnO MIXED SINGLE CRYSTAL, LAMINATE THEREOF AND THEIR PRODUCTION METHODS |
| 09/25/2008 | WO2008114838A1 METHOD FOR FORMING OHMIC ELECTRODE ON P-TYPE 4H-Sic SUBSTRATE |
| 09/25/2008 | WO2008114835A1 Film-forming composition, silica film and method for forming the same |
| 09/25/2008 | WO2008114806A1 Semiconductor device and method for manufacturing the same |
| 09/25/2008 | WO2008114805A1 Chemical-mechanical polishing pad, and chemical-mechanical polishing method |
| 09/25/2008 | WO2008114799A1 Plasma treating apparatus, and plasma treating method |
| 09/25/2008 | WO2008114797A1 Positive type photosensitive polyimide precursor composition |
| 09/25/2008 | WO2008114772A1 Nitride semiconductor substrate |
| 09/25/2008 | WO2008114753A1 Substrate placing table, substrate processing apparatus and method for machining surface of substrate placing table |
| 09/25/2008 | WO2008114719A1 Radical generating apparatus and zno thin film |
| 09/25/2008 | WO2008114718A1 Magnetron sputtering apparatus |
| 09/25/2008 | WO2008114716A1 Sram device |
| 09/25/2008 | WO2008114705A1 Organic insulating material, varnish for resin film using the same, resin film and semiconductor device |
| 09/25/2008 | WO2008114644A1 Resist pattern formation method, and resin composition capable of insolubilizing resist pattern |
| 09/25/2008 | WO2008114616A1 Cleaning composition and process for producing semiconductor device |
| 09/25/2008 | WO2008114609A1 Semiconductor device and method for manufacturing the same |
| 09/25/2008 | WO2008114599A1 Active matrix substrate |
| 09/25/2008 | WO2008114598A1 Active matrix substrate |
| 09/25/2008 | WO2008114564A1 Thin film transistor and method for manufacturing thin film transistor |
| 09/25/2008 | WO2008114563A1 Aqueous dispersion for chemical mechanical polishing and method of chemical mechanical polishing of semiconductor device |
| 09/25/2008 | WO2008114520A1 Chemical mechanical polishing pad and chemical mechanical polishing method |
| 09/25/2008 | WO2008114466A1 Silicon of prismatic shape and process for producing the same |
| 09/25/2008 | WO2008114465A1 Method of forming solder bumps and solder bump-forming assembly |
| 09/25/2008 | WO2008114434A1 Mount substrate, process for producing the same, semiconductor device and process for producing the same |
| 09/25/2008 | WO2008114430A1 Stacked package element, method for forming terminal of stacked package element, stacked package, and method for forming stacked package |
| 09/25/2008 | WO2008114423A1 Semiconductor device and process for producing the same |
| 09/25/2008 | WO2008114422A1 Beam drawing device |
| 09/25/2008 | WO2008114418A1 Semiconductor device and its manufacturing method |
| 09/25/2008 | WO2008114414A1 Semiconductor integrated circuit |
| 09/25/2008 | WO2008114413A1 Process for producing semiconductor device |
| 09/25/2008 | WO2008114412A1 Semiconductor device and method for fabricating the same |
| 09/25/2008 | WO2008114411A1 Material for formation of conductive anti-reflection film, method for formation of conductive anti-reflection film, method for formation of resist pattern, semiconductor device, and magnetic head |
| 09/25/2008 | WO2008114397A1 Design method and design device of semiconductor integrated circuit |
| 09/25/2008 | WO2008114394A1 Method for designing semiconductor device and layout data verification program |
| 09/25/2008 | WO2008114392A1 Semiconductor device and method for fabricating the same |
| 09/25/2008 | WO2008114366A1 Electronic component container |
| 09/25/2008 | WO2008114363A1 Apparatus for producing semiconductor device and process for producing semiconductor device |
| 09/25/2008 | WO2008114354A1 Clock skew measuring device, clock skew adjuster, and integrated circuit |
| 09/25/2008 | WO2008114342A1 Power switch circuit and semiconductor integrated circuit device |
| 09/25/2008 | WO2008114341A1 Semiconductor device and process for manufacturing the same |
| 09/25/2008 | WO2008114337A1 Vacuum bonding method and vacuum bonding device |
| 09/25/2008 | WO2008114336A1 Semiconductor element |
| 09/25/2008 | WO2008114333A1 Container transfer apparatus |
| 09/25/2008 | WO2008114317A1 Semiconductor memory |
| 09/25/2008 | WO2008114309A1 Silicon dielectric treating agent for use after etching, process for producing semiconductor device, and semiconductor device |
| 09/25/2008 | WO2008114252A2 Microneedle structures and corresponding production methods employing a backside wet etch |
| 09/25/2008 | WO2008114108A1 A (110) oriented silicon substrate and a bonded pair of substrates comprising said (110) oriented silicon substrate |
| 09/25/2008 | WO2008114107A2 Method of fabricating a hybrid substrate |
| 09/25/2008 | WO2008114099A1 Patterned thin soi |
| 09/25/2008 | WO2008114094A1 Thin profile packaging with exposed die attach adhesive |
| 09/25/2008 | WO2008113994A1 Electrical connection of components |
| 09/25/2008 | WO2008088994A3 Method and system for improving domain stability in a ferroelectric media |
| 09/25/2008 | WO2008086871A3 Method for applying markings to substrate surfaces by means of a transfer method |
| 09/25/2008 | WO2008083469A8 Light emitting devices with a zinc oxide thin film structure |
| 09/25/2008 | WO2008073529A3 Integrated semiconductor and transition-metal oxide nanostructures and methods for preparing same |
| 09/25/2008 | WO2008057454A8 Growth and manufacture of reduced dislocation density and free-standing aluminum nitride films by hydride vapor phase epitaxy |
| 09/25/2008 | WO2008014136A3 Octagon transfer chamber |
| 09/25/2008 | WO2008001142A3 Transistor array with shared body contact and method of manufacturing |
| 09/25/2008 | WO2007136832A3 Method for expelling gas positioned between a substrate and a mold |
| 09/25/2008 | WO2007131094A3 Method and apparatus for chemical mechanical polishing of large size wafer with capability of polishing individual die |
| 09/25/2008 | WO2007115105A3 Method for making an improved thin film solar cell interconnect using etch and deposition processes |
| 09/25/2008 | WO2007106814A3 Semiconductor device fabricated using a carbon-containing film as a contact etch stop layer |
| 09/25/2008 | WO2007082227A3 Multiple port memory having a plurality of parallel connected trench capacitors in a cell |
| 09/25/2008 | WO2007051142A3 Metal cuboid semiconductor device and method |
| 09/25/2008 | WO2007046853A3 Systems for discretized processing of substrate regions |
| 09/25/2008 | WO2007038514A3 Apparatus and method for substrate edge etching |
| 09/25/2008 | WO2006138628A8 Method for activating nitride surfaces for amine-reactive chemistry |
| 09/25/2008 | US20080235652 Lithography method for forming a circuit pattern |
| 09/25/2008 | US20080235064 Method and apparatus for performing assessments |
| 09/25/2008 | US20080234163 solvent for removing, dissolving, rinsing or peeling polysilazane films coated on an edge or back of semiconductor substrates |
| 09/25/2008 | US20080233844 Retainer ring and polishing machine |
| 09/25/2008 | US20080233842 Dresser and apparatus for chemical mechanical polishing and method of dressing polishing pad |
| 09/25/2008 | US20080233836 Polishing composition and polishing method |
| 09/25/2008 | US20080233766 Ashing method and apparatus therefor |
| 09/25/2008 | US20080233765 Method for enhancing adhesion between layers |
| 09/25/2008 | US20080233764 Formation of Gate Insulation Film |
| 09/25/2008 | US20080233763 Method of achieving uniform length of carbon nanotubes (cnts) and method of manufacturing field emission device (fed) using such cnts |