Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/2009
02/18/2009CN100462319C Chemical polishing method and glass base plate with the method and chemical polishing device
02/17/2009US7493582 Pattern layout and layout data generation method
02/17/2009US7493542 Arrangement for testing integrated circuits
02/17/2009US7493185 Quality prognostics system and method for manufacturing processes
02/17/2009US7492655 Memory device having high speed sense amplifier comprising pull-up circuit and pull-down circuits with drivability for each
02/17/2009US7492569 Capacitor cell, semiconductor device and process for manufacturing the same
02/17/2009US7492530 Metallic nano-optic lenses and beam shaping devices
02/17/2009US7492443 Device manufacturing method, device manufactured thereby and a mask for use in the method
02/17/2009US7492428 Thin film transistor array substrate and fabricating method thereof
02/17/2009US7492361 Image display apparatus using thin-film transistors
02/17/2009US7492343 Liquid crystal display device
02/17/2009US7492192 Logic processing apparatus, semiconductor device and logic circuit
02/17/2009US7492184 Programmable logic device and method for designing the same
02/17/2009US7492147 Wafer probe station having a skirting component
02/17/2009US7492047 Semiconductor device and its manufacture method
02/17/2009US7492038 Semiconductor device
02/17/2009US7492032 Fuse regions of a semiconductor memory device and methods of fabricating the same
02/17/2009US7492030 Techniques to create low K ILD forming voids between metal lines
02/17/2009US7492029 Asymmetric field effect transistors (FETs)
02/17/2009US7492020 Micro structure with interlock configuration
02/17/2009US7492017 Semiconductor transistor having a stressed channel
02/17/2009US7492012 Light emitting device and method of manufacturing the same
02/17/2009US7492009 Semiconductor device having silicon on insulator structure and method of fabricating the same
02/17/2009US7492008 Control of buried oxide in SIMOX
02/17/2009US7492004 Transistors having a channel region between channel-portion holes and methods of forming the same
02/17/2009US7492000 Self-aligned split-gate nonvolatile memory structure and a method of making the same
02/17/2009US7491999 Non-volatile memory cells utilizing substrate trenches
02/17/2009US7491997 Memory device and method of manufacturing the same
02/17/2009US7491991 Method for fabricating CMOS image sensor
02/17/2009US7491988 Transistors with increased mobility in the channel zone and method of fabrication
02/17/2009US7491986 Semiconductor integrated circuit device
02/17/2009US7491984 Method for fabricating group III nitride compound semiconductors and group III nitride compound semiconductor devices
02/17/2009US7491983 Nitride-based semiconductor device of reduced current leakage
02/17/2009US7491972 Polysilicon semiconductor thin film substrate, method for producing the same, semiconductor device, and electronic device
02/17/2009US7491966 Semiconductor substrate and process for producing it
02/17/2009US7491959 Defect inspection apparatus
02/17/2009US7491953 Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions
02/17/2009US7491945 Charged particle beam apparatus, charged particle beam control method, substrate inspection method and method of manufacturing semiconductor device
02/17/2009US7491913 Bake apparatus for use in spin-coating equipment
02/17/2009US7491908 Plasma processing device and ashing method
02/17/2009US7491895 Wiring substrate and method of fabricating the same
02/17/2009US7491893 Mounting substrate and mounting method of electronic part
02/17/2009US7491785 Multi-functional cyclic silicate compound, siloxane-based polymer prepared from the compound and process of producing insulating film using the polymer
02/17/2009US7491662 Substrate processing apparatus
02/17/2009US7491661 Device manufacturing method, top coat material and substrate
02/17/2009US7491660 Method of forming nitride films with high compressive stress for improved PFET device performance
02/17/2009US7491659 APCVD method of forming silicon oxide using an organic silane, oxidizing agent, and catalyst-formed hydrogen radical
02/17/2009US7491658 Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality
02/17/2009US7491657 Method of manufacturing a semiconductor device having a one time programmable (OTP) erasable and programmable read only memory (EPROM) cell
02/17/2009US7491656 Semiconductor device, method for forming silicon oxide film, and apparatus for forming silicon oxide film
02/17/2009US7491655 Semiconductor device and method of fabricating the same
02/17/2009US7491654 Method of forming a ZrO2 thin film using plasma enhanced atomic layer deposition and method of fabricating a capacitor of a semiconductor memory device having the thin film
02/17/2009US7491653 Metal-free catalysts for pulsed deposition layer process for conformal silica laminates
02/17/2009US7491652 In-line processing for forming a silicon nitride film
02/17/2009US7491651 Polymerizing tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane or tetrabutoxysilane with dimethyldimethoxysilane or trimethylmethoxysilane, methanol and oxalic acid forming polysiloxane; applying to a surface, curing; planarization film, an interlayer insulation film, a protective film
02/17/2009US7491650 Exposing a substrate of polysilicon, monocrystalline silicon or amorphous silicon, anda second dielectric material to an etch composition of isopropyl alcohol, NH4F, and tetramethyl ammonium fluoride; semiconductor capacitor electrode
02/17/2009US7491649 Plasma processing apparatus
02/17/2009US7491648 Method of patterning a photoresist film using a lithographic
02/17/2009US7491647 Etch with striation control
02/17/2009US7491646 Electrically conductive feature fabrication process
02/17/2009US7491645 Method for manufacturing a semiconductor device
02/17/2009US7491644 Manufacturing process for a transistor made of thin layers
02/17/2009US7491643 Method and structure for reducing contact resistance between silicide contact and overlying metallization
02/17/2009US7491642 Electrical passivation of silicon-containing surfaces using organic layers
02/17/2009US7491641 Method of forming a conductive line and a method of forming a conductive contact adjacent to and insulated from a conductive line
02/17/2009US7491640 Method of manufacturing semiconductor device
02/17/2009US7491639 Method of manufacturing a semiconductor device and semiconductor obtained by means of such a method
02/17/2009US7491638 Method of forming an insulating capping layer for a copper metallization layer
02/17/2009US7491637 Formation of conductive templates employing indium tin oxide
02/17/2009US7491636 Methods for forming flexible column die interconnects and resulting structures
02/17/2009US7491635 Method for forming a fully silicided gate and devices obtained thereof
02/17/2009US7491634 Methods for forming roughened surfaces and applications thereof
02/17/2009US7491633 High switching speed two mask schottky diode with high field breakdown
02/17/2009US7491632 Buried subcollector for high frequency passive semiconductor devices
02/17/2009US7491631 Method of doping a gate electrode of a field effect transistor
02/17/2009US7491630 Undoped gate poly integration for improved gate patterning and cobalt silicide extendibility
02/17/2009US7491629 Method for producing an n-doped field stop zone in a semiconductor body and semiconductor component having a field stop zone
02/17/2009US7491628 Method for patterning large scale nano-fibrous surfaces using capillography
02/17/2009US7491627 III-nitride device and method with variable epitaxial growth direction
02/17/2009US7491626 Layer growth using metal film and/or islands
02/17/2009US7491625 Gang flipping for IC packaging
02/17/2009US7491624 Method of manufacturing low CTE substrates for use with low-k flip-chip package devices
02/17/2009US7491623 Method of making a semiconductor structure
02/17/2009US7491622 Process of forming an electronic device including a layer formed using an inductively coupled plasma
02/17/2009US7491621 Method of forming isolation structures in a semiconductor manufacturing process
02/17/2009US7491620 Method and structures for indexing dice
02/17/2009US7491619 Methods of fabricating semiconductor devices
02/17/2009US7491618 Methods and semiconductor structures for latch-up suppression using a conductive region
02/17/2009US7491617 Transistor structure with minimized parasitics and method of fabricating the same
02/17/2009US7491616 Method of manufacturing a semiconductor device including dopant introduction
02/17/2009US7491615 Method of fabricating strained-silicon transistors and strained-silicon CMOS transistors
02/17/2009US7491614 Methods for forming channel stop for deep trench isolation prior to deep trench etch
02/17/2009US7491613 Line element and method of manufacturing the line element
02/17/2009US7491612 Field effect transistor with a heterostructure and associated production method
02/17/2009US7491611 Method and apparatus for controlling a circuit with a high voltage sense device
02/17/2009US7491610 Fabrication method
02/17/2009US7491609 Semiconductor device and method for manufacturing the same
02/17/2009US7491608 Vertical transistor with horizontal gate layers
02/17/2009US7491607 Method of fabricating flash memory cell
02/17/2009US7491606 Semiconductor device and method for fabricating the same