Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2009
03/05/2009US20090057713 Semiconductor device with a semiconductor body
03/05/2009US20090057710 Insulated Gate Bipolar Transistor and Method for Manufacturing the Same
03/05/2009US20090057708 LED Light Source Having Improved Resistance to Thermal Cycling
03/05/2009US20090057705 Semiconductor Element Mounting Substrate, Semiconductor Device Using the Same, and Method for Manufacturing Semiconductor Element Mounting Substrate
03/05/2009US20090057703 Semiconductor light emitting device and method of fabricating thereof
03/05/2009US20090057692 Semiconductor light emitting device and method for manufacturing the same
03/05/2009US20090057691 Semiconductor light emitting device and method of manufacturing the same
03/05/2009US20090057690 Wafer level phosphor coating technique for warm light emitting diodes
03/05/2009US20090057688 Optical semiconductor device and manufacturing method therefor
03/05/2009US20090057687 Light emitting diode module
03/05/2009US20090057686 Semiconductor device and electric power converter, drive inverter, general-purpose inverter and super-power high-frequency communication equipment using the semiconductor device
03/05/2009US20090057684 Nitride semiconductor device and method for producing nitride semiconductor device
03/05/2009US20090057682 Active matrix substrate, display device, television receiver, manufacturing method of active matrix substrate, forming method of gate insulating film
03/05/2009US20090057681 Thin-film device, method for manufacturing thin-film device, and display
03/05/2009US20090057679 Thin film transistor and manufacturing method thereof
03/05/2009US20090057678 Method of Forming an Integrated Circuit and Integrated Circuit
03/05/2009US20090057677 Ferroelectric device and method for fabricating the same
03/05/2009US20090057676 Thin film semiconductor device
03/05/2009US20090057675 Display device and electronic appliance including the display device
03/05/2009US20090057674 Thin film transistor, light-emitting display device having the same and associated methods
03/05/2009US20090057672 Display device and manufacturing method of the same
03/05/2009US20090057671 Thin-film transistor substrate, method of manufacturing same and display apparatus having same
03/05/2009US20090057670 Semiconductor Device and Process for Production Thereof
03/05/2009US20090057668 Display Element and Method of Manufacturing the Same
03/05/2009US20090057667 Display device and method for fabricating the same
03/05/2009US20090057666 Pixel structure and fabricating method thereof
03/05/2009US20090057663 Oxide thin film transistor and method of manufacturing the same
03/05/2009US20090057662 Nanoparticle Semiconductor Device and Method for Fabricating
03/05/2009US20090057661 Method for Chemical Mechanical Planarization of Chalcogenide Materials
03/05/2009US20090057660 Method of fabricating substrateless thin film field-effect devices and an organic thin film transistor obtainable by the method
03/05/2009US20090057658 Organic thin film transistor substrate and method of manufacturing the same
03/05/2009US20090057655 Organic thin film transistor comprising gate electrode of nanocrystalline conductive carbon layer, fabrication method thereof, and organic semiconductor device comprising the same
03/05/2009US20090057653 Methods for site-selective growth of horizontal nanowires, nanowires grown by the methods and nanodevices comprising the nanowires
03/05/2009US20090057651 Gated Quantum Resonant Tunneling Diode Using CMOS Transistor with Modified Pocket and LDD Implants
03/05/2009US20090057649 organic semiconductor layer comprises heterocyclic compound containing nitrogen atom formed by condensation between five member rings each having nitrogen atom at their condensation sites or between five member ring and six member ring each having nitrogen atom at their condensation sites; fast response
03/05/2009US20090057648 High Hole Mobility P-Channel Ge Transistor Structure on Si Substrate
03/05/2009US20090057646 Optical semiconductor device and method for manufacturing the same
03/05/2009US20090057642 Memory Device
03/05/2009US20090057556 Method and apparatus of an inspection system using an electron beam
03/05/2009US20090057414 Method of Producing a Contactless Microelectronic Device, Such as for an Electronic Passport
03/05/2009US20090057266 Line edge roughness control
03/05/2009US20090057143 Film-depositing target and preparation of phase shift mask blank
03/05/2009US20090057142 Hafnium Alloy Target and Process for Producing the Same
03/05/2009US20090056878 Transfer apparatus
03/05/2009US20090056807 Solar cell and fabricating process thereof
03/05/2009US20090056800 Surface Passivation of Silicon Based Wafers
03/05/2009US20090056799 Photovoltaic cells with selectively patterned transparent conductive coatings, and associated methods
03/05/2009US20090056798 Thick Film Pastes For Fire Through Applications In Solar Cells
03/05/2009US20090056626 Apparatus for cyclical depositing of thin films
03/05/2009US20090056513 Cleaving Wafers from Silicon Crystals
03/05/2009US20090056463 Semiconductor Pressure Sensor and Method for Manufacturing Semiconductor Pressure Sensor
03/05/2009US20090056441 Process condition measuring device
03/05/2009US20090056428 Cantilever probe and applications of the same
03/05/2009US20090056113 Strap assembly comprising functional block deposited therein and method of making same
03/05/2009US20090056112 Electrostatic chuck member, method of manufacturing the same, and electrostatic chuck device
03/05/2009US20090056102 Method for fabricating semiconductor device
03/05/2009US20090056092 Method of forming isolation layer in semiconductor device
03/05/2009DE202006020613U1 Einrichtung zum Positionieren und Lageerhalten von dünnen Substraten am geschnittenen Substralblock Means for positioning and location obtaining thin substrates on the cut Substralblock
03/05/2009DE19630150B4 Verfahren zum Entwerfen einer Halbleitervorrichtung A method of designing a semiconductor device
03/05/2009DE112005002428T5 Doppelgate- und Trigate-Transistoren mit unabhängigem Zugriff in demselben Prozeßfluß Doppelgate- and tri-gate transistors with independent access to the same process flow
03/05/2009DE112004002702B4 Verfahren zum Herstellen einer Halbleiterbaugruppe und Matrixbaugruppe A method of manufacturing a semiconductor package and matrix assembly
03/05/2009DE112004002017B4 Verfahren zum epitaktischen Abscheiden von Source/Drain von MOSFETs A method for epitaxial deposition of the source / drain of MOSFET
03/05/2009DE10339283B9 Verfahren zum Entwurf von integrierten Schaltkreisen mit Ersatz-Logikgattern A method of designing integrated circuits with spare logic gates
03/05/2009DE10323013B4 Verfahren zur Herstellung eines Halbleiterbauelementes mit PMOS- und NMOS-Transistor A process for producing a semiconductor device with PMOS and NMOS transistor
03/05/2009DE10234155B4 Preßgespritztes Leistungsbauelement Preßgespritztes power device
03/05/2009DE102008044754A1 Flüssigkeitsbearbeitungsvorrichtung, Flüssigkeitsbearbeitungsverfahren und Speichermedium Liquid processing apparatus, liquid processing method and storage medium
03/05/2009DE102008044753A1 Substratbearbeitungsvorrichtung und Verfahren Substrate processing apparatus and method
03/05/2009DE102008039882A1 LCD-Treiber-IC und Verfahren zu dessen Herstellung LCD driver IC and process for its preparation
03/05/2009DE102008039845A1 Halbleiterbauelement mit einem Halbleiterkörper A semiconductor device comprising a semiconductor body
03/05/2009DE102008039706A1 Halbleiterbauelement Semiconductor device
03/05/2009DE102008039266A1 Halbleiterfabrik Semiconductor factory
03/05/2009DE102008034164A1 Halbleitermodul Semiconductor module
03/05/2009DE102007053600A1 Verfahren zur Herstellung eines Metalls direkt auf einer leitenden Barrierenschicht durch elektrochemische Abscheidung unter Anwendung einer sauerstoffarmen Umgebung A process for the production of a metal directly onto a conductive barrier layer by electrochemical deposition using a low oxygen environment
03/05/2009DE102007041926A1 Method for electrical insulation of unpackaged electronic construction element, particularly high power element or semiconductor high power element, involves fastening or electrical contacting of connection surface on lower surface
03/05/2009DE102007041921A1 Verfahren zur Herstellung und Kontaktierung von elektronischen Bauelementen mittels einer Substratplatte, insbesondere DCB-Keramik-Substratplatte A process for preparing and contacting of electronic components by means of a substrate plate, in particular DCB-ceramic substrate board
03/05/2009DE102007041911A1 Device for replacement of electronic components from film, particularly from un-packed semiconductor chips of cohesive mounting film, has base element, where multiple recesses are formed at front side of base element
03/05/2009DE102007041885A1 Verfahren zum Zerteilen eines Halbleitersubstrats und Verfahren zum Herstellen einer Halbleiterschaltungsanordnung A method for dividing a semiconductor substrate and method for fabricating a semiconductor circuit arrangement
03/05/2009DE102007041407A1 Verfahren zur Herstellung einer Halbleiteranordnung, Verwendung einer Grabenstruktur und Halbleiteranordnung A method of manufacturing a semiconductor device using a semiconductor device structure, and grave
03/05/2009DE102007041332A1 Transferchuck zur Übertragung, insbesondere von Wafern Chuck transfer for transmission, in particular wafers
03/05/2009DE102007041229A1 Schaltungsanordnung und ein Verfahren zum Verkapseln derselben Circuit arrangement and a method for encapsulating the same
03/05/2009DE102007041210A1 Verspannungsübertragung in einem Zwischenschichtdielektrikum durch Vorsehen einer verspannten dielektrischen Schicht über einem verspannungsneutralen dielektrischen Material in einem Halbleiterbauelement Tension transmission in an interlayer by providing a stressed dielectric layer over a stress-neutral dielectric material in a semiconductor device
03/05/2009DE102007041209A1 Polierkopf, der Zonenkontrolle verwendet Polishing head zone control used
03/05/2009DE102007041207A1 CMOS-Bauelement mit Gateisolationsschichten mit unterschiedlicher Art und Dicke und Verfahren zur Herstellung CMOS device with gate insulation layers having different types and thickness, and process for preparing
03/05/2009DE102007041206A1 Verfahren zum selbstjustierten Entfernen eines Gatedielektrikums mit großem ε über einem STI-Gebiet A method of removing a self-aligned gate dielectric with large ε over a STI region
03/05/2009DE102007040851A1 Verfahren zum Reinigen von polykristallinem Silicium Method for cleaning polycrystalline silicon
03/05/2009DE102007040833A1 Elastic contact bump's metallic layer manufacturing method for integrated circuit e.g. LCD display, involves forming elevations on surface, and applying photoresist on surface so that photoresistive structure is formed between elevations
03/05/2009DE102007040385A1 Method for manufacturing silicon wafers, involves cutting rectangular and silicon block with side surface, where side surfaces of silicon block are smoothed and polished parallel to edge of silicon wafer before cutting
03/05/2009DE102007036147A1 Verfahren zum Herstellen eines Halbleiterkörpers mit einer Rekombinationszone, Halbleiterbauelement mit einer Rekombinationszone und Verfahren zum Herstellen eines solchen Halbleiterbauelements A method of manufacturing a semiconductor body with a recombination zone, semiconductor device with a recombination and method for manufacturing such a semiconductor device
03/05/2009DE102007022748B4 Verfahren zur Strukturierung eines Materials und strukturiertes Material Method for structuring a material and structured material
03/05/2009DE102006006561B4 Flip-Chip-Modul und Verfahren zum Austauschen eines Halbleiterchips eines Flip-Chip-Moduls Flip-chip module and method for replacing a semiconductor chip of a flip-chip module
03/05/2009DE102004029436B4 Verfahren zum Herstellen eines Festkörperelektrolytmaterialbereichs A method for producing a solid electrolyte material region
03/05/2009DE102004013626B4 Verfahren und Vorrichtung zur Abscheidung dünner Schichten Method and device for depositing thin layers
03/05/2009DE10196596B4 Verfahren zur Herstellung einer Kristallschicht in einer Verbindungshalbleiter-Mehrschichtsstruktur A process for producing a crystal layer in a compound semiconductor multilayer structure
03/04/2009EP2031654A2 Method for manufacturing a structure for epitaxy with no exclusion zone
03/04/2009EP2031653A2 Semiconductor device having multiple element formation regions and manufacturing method thereof
03/04/2009EP2031652A2 Method for manufacturing a semiconductor assembly, utilisation and semiconductor assembly
03/04/2009EP2031651A2 Container changing system and container changing method
03/04/2009EP2031650A2 Method for inductive measurement of a layer resistance of a dosing layer in a multi-crystalline semiconductor wafer
03/04/2009EP2031649A2 Manufacture method for ZnO-containing compound semiconductor layer
03/04/2009EP2031648A2 Passivation of wide band-gap based semiconductor devices with hydrogen-free sputtered nitrides