| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 06/17/2009 | CN101459058A Etching stopping layer, semi-conductor device with through hole and forming method thereof |
| 06/17/2009 | CN101459057A Laser annealing equipment and annealing process for semi-conductor manufacturing |
| 06/17/2009 | CN101459056A Supply mechanism for the chuck of an integrated circuit dicing device |
| 06/17/2009 | CN101459055A Method of manufacturing semiconductor device |
| 06/17/2009 | CN101459054A Plasma processing apparatus |
| 06/17/2009 | CN101459053A Method for preparing titanium dioxide or zirconium dioxide micro pattern on silicon substrate |
| 06/17/2009 | CN101459052A Manufacturing method for silicon coating on insulation layer and construction for coating silicon on the insulation layer |
| 06/17/2009 | CN101459051A Exhaust ring for plasma apparatus |
| 06/17/2009 | CN101459050A Method and apparatus for metallic layer front wafer surface presoaking for electrochemical or chemical deposition |
| 06/17/2009 | CN101459049A Apparatus and method for detecting etching terminal |
| 06/17/2009 | CN101459048A Method for obtaining etching process test chip wire width |
| 06/17/2009 | CN101459047A Method for cleaning semiconductor wafer surface |
| 06/17/2009 | CN101459046A Test construction for light doped drain doping region square resistor and manufacturing method thereof |
| 06/17/2009 | CN101459045A Manufacturing method for transistor protection ring, optimization method and apparatus for ion injection process |
| 06/17/2009 | CN101459044A Dishing phenomenon detection unit in chemical mechanical polishing, manufacturing method and detection method |
| 06/17/2009 | CN101459043A Manufacturing method for semiconductor device |
| 06/17/2009 | CN101459042A Exhaust system and wafer heat treatment apparatus |
| 06/17/2009 | CN101459041A Updating method for fast heat treatment device |
| 06/17/2009 | CN101459040A Method for cleaning wafer surface pollutant particle in CMP process |
| 06/17/2009 | CN101459039A Terminal monitoring method for plasma body etching |
| 06/17/2009 | CN101459038A Semi-conductor substrate cleaning method |
| 06/17/2009 | CN101459037A Substrate rack control device, substrate rack mobility control method and sediment apparatus |
| 06/17/2009 | CN101459036A Method for fast optimizing etching homogeneity |
| 06/17/2009 | CN101457338A Cleaning of native oxide with hydrogen-containing radicals |
| 06/17/2009 | CN101456165A Polishing cloth, polishing cloth processing method, and substrate manufacturing method using same |
| 06/17/2009 | CN101456154A Multiple zone carrier head with flexible membrane |
| 06/17/2009 | CN100502620C Resin distributing device |
| 06/17/2009 | CN100502060C Nitride semiconductor device |
| 06/17/2009 | CN100502057C Photovoltaic cell, photovoltaic cell module, method of fabricating photovoltaic cell and method of repairing photovoltaic cell |
| 06/17/2009 | CN100502048C Thin film transistor (TFT) and flat display panel having the thin film transistor (TFT) |
| 06/17/2009 | CN100502046C Semiconductor device with film transistor |
| 06/17/2009 | CN100502036C Vertical gate semiconductor device and process for fabricating the same |
| 06/17/2009 | CN100502035C Semiconductor device and method for producing it |
| 06/17/2009 | CN100502034C Electronic device, integrated circuit, and method of manufacturing the same |
| 06/17/2009 | CN100502031C Semiconductor device |
| 06/17/2009 | CN100502018C Method for manufacturing thin-film semiconductor circuit, and element substrate |
| 06/17/2009 | CN100502009C SONOS type memory device |
| 06/17/2009 | CN100502005C Well regions of semiconductor devices |
| 06/17/2009 | CN100501999C Semiconductor device and manufacturing method thereof |
| 06/17/2009 | CN100501984C 半导体结构 The semiconductor structure |
| 06/17/2009 | CN100501981C Method for fabricating thin film transistor substrate |
| 06/17/2009 | CN100501980C Semiconductor device and its production method |
| 06/17/2009 | CN100501979C Method for manufacturing the display device and apparatus for manufacturing the same |
| 06/17/2009 | CN100501978C Stacked thin film transistor non-volatile memory devices and methods for fabricating the same |
| 06/17/2009 | CN100501977C Gated diode nonvolatile memory and its manufacturing process |
| 06/17/2009 | CN100501976C NROM device and its manufacturing method |
| 06/17/2009 | CN100501975C Method of fabricating semiconductor device with dual gate structure |
| 06/17/2009 | CN100501974C Semiconductor device |
| 06/17/2009 | CN100501973C Fuse disconnection method fit for semiconductor device |
| 06/17/2009 | CN100501972C Method for forming semiconductor device and semiconductor device |
| 06/17/2009 | CN100501971C Process for promoting high voltage grid oxidation layer uniformity |
| 06/17/2009 | CN100501970C Limited thermal budget formation of PMD layers |
| 06/17/2009 | CN100501969C Methods for forming interconnecting structure and semiconductor devices |
| 06/17/2009 | CN100501968C Robust shallow trench isolation structures and a method for forming shallow trench isolation structures |
| 06/17/2009 | CN100501967C Method for improving STI-CMP terminal detection |
| 06/17/2009 | CN100501966C Shallow ditch isolation cells lateral wall ion injection process |
| 06/17/2009 | CN100501965C Stage for plasma processing apparatus, and plasma processing apparatus |
| 06/17/2009 | CN100501964C Wafer storage container |
| 06/17/2009 | CN100501963C Box for substrate |
| 06/17/2009 | CN100501962C Apparatus and method for wafer box transportation within a semiconductor fabrication facility |
| 06/17/2009 | CN100501961C Method for monitoring disalignment of two-layer polysilicon stacked gate |
| 06/17/2009 | CN100501960C Lead solder indicator and method |
| 06/17/2009 | CN100501959C Method for detecting hetero-epitaxial film crystal lattice orientation by utilizing a diffractometer |
| 06/17/2009 | CN100501958C Wire welding machine and semiconductor device processing method |
| 06/17/2009 | CN100501957C Method of forming solder bump and method of mounting semiconductor device |
| 06/17/2009 | CN100501956C Au bonding wire for semiconductor device |
| 06/17/2009 | CN100501955C Solder composition and method of bump formation therewith |
| 06/17/2009 | CN100501954C Semiconductor device having epitaxial C49 titanium silicide (TiSi2)layer and its manufacturing method |
| 06/17/2009 | CN100501953C Luminous diode color matching method |
| 06/17/2009 | CN100501952C Base plate with buried passive element and its producing method |
| 06/17/2009 | CN100501951C Field-effect transistor, semiconductor device, a method for manufacturing them, and a method of semiconductor crystal growth |
| 06/17/2009 | CN100501950C Thin film transistor and method for manufacturing the same |
| 06/17/2009 | CN100501949C Production method for forming semiconductor device |
| 06/17/2009 | CN100501948C Semiconductor device and method of manufacture |
| 06/17/2009 | CN100501947C Multi-gate transistor formed with active patterns of uniform critical dimension and its making method |
| 06/17/2009 | CN100501946C Method for fabricating contact holes in a semiconductor body and a semiconductor structure |
| 06/17/2009 | CN100501945C Organic thin-film transistor device and method for manufacturing same |
| 06/17/2009 | CN100501944C Method for manufacturing semiconductor device |
| 06/17/2009 | CN100501943C Semiconductor device with trench structure and its manufacture method |
| 06/17/2009 | CN100501942C Method for forming inclined conductive layer |
| 06/17/2009 | CN100501941C Method for reducing metal, multilayer interconnection structure and manufacturing method for the same, and semiconductor device and manufacturing method for the same |
| 06/17/2009 | CN100501940C Microcontamination abatement method in semiconductor processing |
| 06/17/2009 | CN100501939C Plasma film forming method and plasma film forming device |
| 06/17/2009 | CN100501938C Method of protecting plow groove bottom in deep plow groove techniques |
| 06/17/2009 | CN100501937C Method of forming a low k dielectric in a semiconductor manufacturing process |
| 06/17/2009 | CN100501936C Electrochemical processing method for micro-structure of P type silicon surface |
| 06/17/2009 | CN100501935C Method for etching bipolar CMOS device polysilicon |
| 06/17/2009 | CN100501934C Method for field separated etching |
| 06/17/2009 | CN100501933C Thermal control of dielectric components in a plasma discharge device |
| 06/17/2009 | CN100501932C Semiconductor wafer and method for processing same |
| 06/17/2009 | CN100501931C Substrate cleaning method, substrate cleaning equipment |
| 06/17/2009 | CN100501930C Polishing method |
| 06/17/2009 | CN100501929C Method of adjusting deviation of critical dimension of patterns |
| 06/17/2009 | CN100501928C Fabrication process of flash memory cell with self-aligned gates |
| 06/17/2009 | CN100501927C Electricity erasable memorizer tunnel oxide forming method |
| 06/17/2009 | CN100501926C A making method of EEPROM for increasing coupling voltage of float grating |
| 06/17/2009 | CN100501925C Manufacturing method for silicon epitaxial wafer for 6'' VDMOS tube |
| 06/17/2009 | CN100501924C A making method for the radiant energy conversion chip |
| 06/17/2009 | CN100501923C Method of manufacturing passive element |
| 06/17/2009 | CN100501922C Production method for SIMOX substrate |