Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2009
08/05/2009CN100524682C Method for moving chip and electrostatic sucking disc device
08/05/2009CN100524681C Methods and apparatus for a band to band transfer module
08/05/2009CN100524680C Semiconductor wafer including semiconductor chips divided by scribe line and process-monitor electrode pads formed on scribe line
08/05/2009CN100524679C Grain testing apparatus in wet method etching process
08/05/2009CN100524678C Plasma equipment containing plasma measurer
08/05/2009CN100524677C Screen printing apparatus and heave forming method
08/05/2009CN100524676C Blanking type encapsulation constitution without external pin and manufacturing method thereof
08/05/2009CN100524675C Method for forming metal projection
08/05/2009CN100524674C Circuit connection method
08/05/2009CN100524673C Manufacturing method of film substrate and manufacturing method of semiconductor component, display device and electronic device using the substrate
08/05/2009CN100524672C Method for manufacturing display device
08/05/2009CN100524671C Mould part, apparatus and method for encapsulating electronic components
08/05/2009CN100524670C Method for manufacturing organic light emitting display
08/05/2009CN100524669C 半导体器件及其制造方法 Semiconductor device and manufacturing method thereof
08/05/2009CN100524668C Method of preventing damage to porous low-K materials during resist stripping
08/05/2009CN100524667C Sectional field effect transistor making method
08/05/2009CN100524666C Method for manufacturing transistor structure
08/05/2009CN100524665C Method for producing field effect devices
08/05/2009CN100524664C Semiconductor structure and forming method thereof
08/05/2009CN100524663C MOSFET and manufacturing method thereof
08/05/2009CN100524662C Method for producing semiconductor device
08/05/2009CN100524661C Semiconductor device with slot type grid and producing method thereof
08/05/2009CN100524660C A method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode
08/05/2009CN100524659C Semiconductor device
08/05/2009CN100524658C CMOS with only a single implant
08/05/2009CN100524657C Method of forming a nanocluster charge storage device
08/05/2009CN100524656C Production of thin-film transistor
08/05/2009CN100524655C Self aligned damascene gate
08/05/2009CN100524654C Drain/source extension structure of a field effect transistor including doped high-k sidewall spacers
08/05/2009CN100524653C Anisotropic wet etch device and its production method
08/05/2009CN100524652C Substrate treating device and method
08/05/2009CN100524651C Etching apparatus
08/05/2009CN100524650C Formation of silicon nitride film by using atomic layer deposition method
08/05/2009CN100524649C Method of manufacturing ceramic film and ceramic film manufacturing apparatus
08/05/2009CN100524648C An improved method for fabricating an ultralow dielectric constant material as an intralevel or interlevel dielectric in a semiconductor device and electronic device made
08/05/2009CN100524647C Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film
08/05/2009CN100524646C Method for plasma stripping using periodic modulation of gas chemistry and hydrocarbon addition
08/05/2009CN100524645C Method of etching a silicon-containing dielectric material
08/05/2009CN100524644C Dummy structures to reduce metal recess in electropolishing process
08/05/2009CN100524643C Semiconductor device and method for manufacturing the same
08/05/2009CN100524642C Semiconductor device
08/05/2009CN100524641C Plasma processing device
08/05/2009CN100524640C Techniques for the use of amorphous carbon(apf) for various etch and litho integration scheme
08/05/2009CN100524639C Substrate processing method, substrate processing apparatus and control program
08/05/2009CN100524638C Multi-fluid supplying equipment for loading tool of semiconductor wafer polishing system
08/05/2009CN100524637C Method and device for wafer scale packaging of optical devices using a scribe and break process
08/05/2009CN100524636C Pixel electrode, method for forming the same, electrooptical device, and electronic apparatus
08/05/2009CN100524635C Methods of electrochemically treating semiconductor substrates, and methods of forming capacitor constructions
08/05/2009CN100524634C Method for preparing transistor T type nano grid
08/05/2009CN100524633C Method of manufacturing semiconductor device
08/05/2009CN100524632C Method of manufacturing semiconductor device
08/05/2009CN100524631C Method for manufacturing a semiconductor device having silicided regions
08/05/2009CN100524630C Gate electrode dopant activation method for semiconductor manufacturing
08/05/2009CN100524629C Laser irradiating device and laser irradiating method
08/05/2009CN100524628C Ion injection uniformity control system and control method
08/05/2009CN100524627C Semiconductor structure processing using multiple laser beam spots
08/05/2009CN100524626C Etch and deposition control for plasma implantation
08/05/2009CN100524625C Gallium nitride-based semiconductor stacked structure, production method thereof, and compound semiconductor and light-emitting device each using the stacked structure
08/05/2009CN100524624C Group III nitride semiconductor multilayer structure
08/05/2009CN100524623C Preparation of ZnO base thin-magnetic semi-conductor film using electric-magnetic field restricted jigger coupling plasma sputtering sedimentation
08/05/2009CN100524622C Method for making sequential indium arsenic quanta point on semiconductor underlay
08/05/2009CN100524621C Crystalline gallium nitride base compound growth method and semiconductor component containing gallium nitride base compound
08/05/2009CN100524620C Process for transfer of a thin layer formed in a substrate with vacancy clusters
08/05/2009CN100524619C Thin-film semiconductor component and production method for said component
08/05/2009CN100524618C Resistless lithography method for producing fine structures
08/05/2009CN100524617C Development apparatus and development method
08/05/2009CN100524616C Exposure apparatus, exposure method, and device fabricating method
08/05/2009CN100524615C Etching method of radio frequency device thin dielectric substance capacitance
08/05/2009CN100524614C Method of manufacturing an electronic device and electronic device
08/05/2009CN100524613C Metal-insulator-metal (MIM) capacitor structure and methods of fabricating same
08/05/2009CN100524612C Substrate processing system, gas supply unit, method of substrate processing
08/05/2009CN100524611C Curved slit valve door with flexible couplings
08/05/2009CN100524610C Method for manufacturing a narrow structure on an integrated circuit
08/05/2009CN100524609C Substrate processing apparatus, operation and control method thereof
08/05/2009CN100524608C Method and apparatus for monitoring tool performance
08/05/2009CN100524603C Shallow-angle interference process and apparatus for determining real-time etching rate
08/05/2009CN100524602C High voltage automatic discharge device for ion implanter
08/05/2009CN100524579C High-performance semiconductor nanometer silicon field electronic emission material and its preparation method
08/05/2009CN100524556C Film capacitor, film capacitor arry and electronic component
08/05/2009CN100524526C Method for programming a charge-trapping nonvolatile memory cell
08/05/2009CN100524524C Nand type multi-bit charge storage memory array and methods for operating and fabricating the same
08/05/2009CN100524520C Non-volatile dynamic random access memory and operation method thereof
08/05/2009CN100524422C Transistor circuit, display panel and electronic apparatus
08/05/2009CN100524351C Flexible semiconductor device and identification label
08/05/2009CN100524040C Pattern forming method and method of manufacturing semiconductor device
08/05/2009CN100524039C Photo-etching machine exposal image forming apparatus
08/05/2009CN100524035C Lithographic apparatus and device manufacturing method
08/05/2009CN100524034C Lithographic apparatus and device manufacturing method
08/05/2009CN100524033C Lithographic apparatus and device manufacturing method
08/05/2009CN100524032C Method of generating writing pattern, method of forming resist pattern, method of controlling exposure tool
08/05/2009CN100524031C Projection exposure apparatus, device manufacturing method, and sensor unit
08/05/2009CN100524030C Lithographic apparatus and device manufacturing method
08/05/2009CN100524028C Optimized polarization illumination
08/05/2009CN100524027C Device and method for operating and transmitting metrological light beam
08/05/2009CN100524025C System and method for making laser beam expend without expanding space coherence
08/05/2009CN100524024C Exposure method, exposure apparatus and element mfg. method
08/05/2009CN100524023C Photoetching device and method for manufacturing the apparatus
08/05/2009CN100524022C 抗反射膜和曝光方法 Antireflection film and exposure method
08/05/2009CN100523973C Array substrate for liquid crystal display device and method of fabricating the same
08/05/2009CN100523971C Array substrate for in-plane switching mode LCD and method of fabricating of the same
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