Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2010
04/22/2010WO2010044134A1 Process for producing magnetoresistance effect element and program for producing magnetoresistance effect element
04/22/2010WO2010043657A1 Electronic component and method of manufacturing the same
04/22/2010WO2010043517A2 Bonding device, ultrasonic transducer, and bonding method
04/22/2010WO2010043502A1 Stress-reduced ni-p/pd stacks for bondable wafer surfaces
04/22/2010WO2010043291A1 Method for improving the adhesion between silver surfaces and resin materials
04/22/2010WO2010043200A1 Method for producing a (oo1)-textured crystal layer from a photoactive layered semiconductor on a metal conductive layer using a metal promoter
04/22/2010WO2010043196A1 Device for positioning and contacting test contacts
04/22/2010WO2010042981A1 Photo-voltaic device
04/22/2010WO2010025031A3 Method for optical proximity correction, design and manufacturing of a reticle using character projection lithography
04/22/2010WO2010025003A3 Structured abrasive article, method of making the same, and use in wafer planarization
04/22/2010WO2010019003A3 Regular lithography method
04/22/2010WO2010017259A3 Method for ultra-uniform sputter deposition using simultaneous rf and dc power on target
04/22/2010WO2010011578A3 Computer-implemented methods for inspecting and/or classifying a wafer
04/22/2010WO2010011521A3 Workpiece support for a plasma reactor with controlled apportionment of rf power to a process kit ring
04/22/2010WO2010008748A8 Spacer fill structure, method and design structure for reducing device variation
04/22/2010WO2010006279A3 Chamber components for cvd applications
04/22/2010WO2010006080A3 Graphene and hexagonal boron nitride planes and associated methods
04/22/2010WO2010005930A3 Capacitively-coupled electrostatic (cce) probe arrangement for detecting strike step in a plasma processing chamber and methods thereof
04/22/2010WO2010005929A3 Passive capacitively-coupled electrostatic (cce) probe arrangement for detecting in-situ arcing events in a plasma processing chamber
04/22/2010WO2010005573A3 Method and system for producing a solar cell using atmospheric pressure plasma chemical vapor deposition
04/22/2010WO2010005541A3 Clamped showerhead electrode assembly
04/22/2010WO2010005540A3 Clamped monolithic showerhead electrode
04/22/2010WO2010005201A3 Plasma reactor for decomposing waste gas and gas scrubber using same
04/22/2010WO2010002445A3 Micro-posts having improved uniformity and a method of manufacture thereof
04/22/2010WO2010001054A3 Method of preparing an electrical insulation film and application for the metallization of through-vias
04/22/2010WO2009158236A3 Forming ultra low dielectric constant porous dielectric films and structures formed thereby
04/22/2010WO2009155717A3 Device for structuring a solar module
04/22/2010WO2009058248A3 Stress transfer by sequentially providing a highly stressed etch stop material and an interlayer dielectric in a contact layer stack of a semiconductor device
04/22/2010WO2008138737A3 Silicon dioxide dispersion and process for coating substrates
04/22/2010US20100099273 Enhancing the width of polycrystalline grains with mask
04/22/2010US20100099272 Systems and methods for forming metal oxides using metal diketonates and/or ketoimines
04/22/2010US20100099271 Method for improving process control and film conformality of pecvd film
04/22/2010US20100099270 Atomic layer deposition apparatus
04/22/2010US20100099269 Semiconductor devices and methods of forming the same
04/22/2010US20100099268 Rapid Thermal Processing using Energy Transfer Layers
04/22/2010US20100099267 System and method of vapor deposition
04/22/2010US20100099266 Etch reactor suitable for etching high aspect ratio features
04/22/2010US20100099265 Methods for removing an edge polymer from a substrate
04/22/2010US20100099264 Etching high-k materials
04/22/2010US20100099263 Nf3/h2 remote plasma process with high etch selectivity of psg/bpsg over thermal oxide and low density surface defects
04/22/2010US20100099262 Method of manufacturing non-volatile memory cell using self-aligned metal silicide
04/22/2010US20100099261 Method for forming pattern of semiconductor device
04/22/2010US20100099260 Aqueous dispersion for chemical mechanical polishng and chemical mechanical polishing method for semiconductor device
04/22/2010US20100099259 Polishing composition and method for manufacturing semiconductor integrated circuit device
04/22/2010US20100099258 Semiconductor device cleaning method and semiconductor device manufacturing method using the same
04/22/2010US20100099257 Method for thin film vapor deposition of a dialkyl amido dihydroaluminum compound
04/22/2010US20100099256 Semiconductor device manufacturing method and semiconductor device manufacturing apparatus
04/22/2010US20100099255 Method of forming a contact through an insulating layer
04/22/2010US20100099254 Semiconductor manufacturing apparatus, semiconductor device manufacturing method, storage medium and computer program
04/22/2010US20100099253 Method for Structuring a Layered Stack
04/22/2010US20100099252 Methods to completely eliminate or significantly reduce defects in copper metallization in IC manufacturing
04/22/2010US20100099251 Method for nitridation pretreatment
04/22/2010US20100099250 Methods of Forming Integrated Circuit Contact Pads Using Electroless Plating of Diffusion Barrier Layers
04/22/2010US20100099249 Selective silicide formation using resist etch back
04/22/2010US20100099248 Methods of fabricating a semiconductor device
04/22/2010US20100099247 Flash memory with treated charge trap layer
04/22/2010US20100099246 Method of making a split gate memory cell
04/22/2010US20100099245 Methods of Forming Semiconductor Devices
04/22/2010US20100099244 Partial implantation method for semiconductor manufacturing
04/22/2010US20100099243 Method for forming diode in phase change random access memory device
04/22/2010US20100099242 Production Method for a Lateral Electro-Optical Modulator on Silicon With Auto-Aligned Implanted Zones
04/22/2010US20100099241 Method of fabricating semiconductor device
04/22/2010US20100099240 Dicing/die-bonding tape and method for manufacturing semiconductor chip
04/22/2010US20100099239 Laser machining
04/22/2010US20100099238 Laser-assisted chemical singulation of a wafer
04/22/2010US20100099237 Flexible display substrates
04/22/2010US20100099236 Gapfill improvement with low etch rate dielectric liners
04/22/2010US20100099235 Tunnel Dielectric Comprising Nitrogen For Use With A Semiconductor Device And A Process For Forming The Device
04/22/2010US20100099234 Semiconductor device and method of fabrication thereof
04/22/2010US20100099233 Method for producing stacked and self-aligned components on a substrate
04/22/2010US20100099232 Methods Of Forming Capacitors, And Methods Of Utilizing Silicon Dioxide-Containing Masking Structures
04/22/2010US20100099231 Noise reduction in semiconductor device using counter-doping
04/22/2010US20100099230 Method to manufacture split gate with high density plasma oxide layer as inter-polysilicon insulation layer
04/22/2010US20100099229 Method for forming a thin film resistor
04/22/2010US20100099228 Method for reducing poly-depletion in dual gate cmos fabrication process
04/22/2010US20100099227 Semiconductor device and method of manufacturing the same
04/22/2010US20100099226 Manufacturing method of thin film transistor
04/22/2010US20100099225 Method for manufacturing semiconductor device having LDMOS transistor
04/22/2010US20100099224 Method for manufacturing antenna and method for manufacturing semiconductor device
04/22/2010US20100099223 Integrated circuit device and method
04/22/2010US20100099222 Solder Joint Flip Chip Interconnection Having Relief Structure
04/22/2010US20100099221 Stacked device manufacturing method
04/22/2010US20100099220 Electronic device with unique encoding
04/22/2010US20100099219 Mitigation of plating stub resonance by controlling surface roughness
04/22/2010US20100099218 Method of fabricating a resistance based memory device and the memory device
04/22/2010US20100099217 Semiconductor Device, Electronic Device, and Method of Manufacturing Semiconductor Device
04/22/2010US20100099216 Method for manufacturing semiconductor device
04/22/2010US20100099213 Method for blocking dislocation propagation of semiconductor
04/22/2010US20100099212 Method of forming pattern on group iii nitride semiconductor substrate and method of manufacturing group iii nitride semiconductor light emitting device
04/22/2010US20100099211 Method of forming a display panel
04/22/2010US20100099209 Multi-level integrated photonic devices
04/22/2010US20100099208 Semiconductor light emitting device and method of manufacturing the same
04/22/2010US20100099207 LED chip package structure with high-efficiency light-emitting effect and method of packaging the same
04/22/2010US20100099204 Method for repairing thin film transistor array
04/22/2010US20100098922 Apparatus and method for controlled particle beam manufacturing
04/22/2010US20100098862 Method and apparatus for precision surface modification in nano-imprint lithography
04/22/2010US20100098519 Support for a semiconductor wafer in a high temperature environment
04/22/2010US20100098518 In/out door for a vacuum chamber
04/22/2010US20100098517 Processing apparatus and processing method
04/22/2010US20100098127 Method of manufacturing nitride semiconductor light emitting element and nitride semiconductor light emitting element