Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
05/2010
05/04/2010US7709363 Method for manufacturing semiconductor device
05/04/2010US7709362 Method for introducing impurities and apparatus for introducing impurities
05/04/2010US7709361 Method for manufacturing a semiconductor device
05/04/2010US7709360 Method for manufacturing a crystalline silicon layer
05/04/2010US7709357 Silicon epitaxial wafer and method for manufacturing the same
05/04/2010US7709356 Methods of forming a pattern and methods of manufacturing a memory device using the same
05/04/2010US7709355 Method of producing electronic component comprising electrodes and ring residues
05/04/2010US7709354 Optical steering element and method
05/04/2010US7709353 Method for producing semiconductor device
05/04/2010US7709352 In-place bonding of microstructures
05/04/2010US7709351 Method of manufacturing semiconductor device and method of manufacturing bonding sheet
05/04/2010US7709350 Method for manufacturing a semiconductor elemental device
05/04/2010US7709349 Semiconductor device manufactured using a gate silicidation involving a disposable chemical/mechanical polishing stop layer
05/04/2010US7709348 Method for manufacturing semiconductor device
05/04/2010US7709347 Semiconductor device and method of fabricating the same
05/04/2010US7709346 Semiconductor device with trench gate type transistor and method of manufacturing the same
05/04/2010US7709345 Trench isolation implantation
05/04/2010US7709344 Integrated circuit fabrication process using gas cluster ion beam etching
05/04/2010US7709343 Use of a plasma source to form a layer during the formation of a semiconductor device
05/04/2010US7709342 Capacitor and method of manufacturing the same
05/04/2010US7709341 Methods of shaping vertical single crystal silicon walls and resulting structures
05/04/2010US7709340 Semiconductor integrated circuit device and method of manufacturing the same
05/04/2010US7709339 Method for producing a planar spacer, an associated bipolar transistor and an associated BiCMOS circuit arrangement
05/04/2010US7709338 BiCMOS devices with a self-aligned emitter and methods of fabricating such BiCMOS devices
05/04/2010US7709337 Method for manufacturing SOI substrate and semiconductor device
05/04/2010US7709336 Metal hard mask method and structure for strained silicon MOS transistors
05/04/2010US7709335 Method of manufacturing semiconductor device including isolation process
05/04/2010US7709334 Stacked non-volatile memory device and methods for fabricating the same
05/04/2010US7709333 Method for reducing overlap capacitance in field effect transistors
05/04/2010US7709332 Process for fabricating a field-effect transistor with self-aligned gates
05/04/2010US7709331 Dual gate oxide device integration
05/04/2010US7709330 High voltage MOSFET having Si/SiGe heterojunction structure and method of manufacturing the same
05/04/2010US7709329 High-voltage variable breakdown voltage (BV) diode for electrostatic discharge (ESD) applications
05/04/2010US7709328 Semiconductor device and method for fabricating same
05/04/2010US7709327 Methods of forming semiconductor-on-insulator substrates, and integrated circuitry
05/04/2010US7709326 Methods of forming layers comprising epitaxial silicon
05/04/2010US7709325 Method of forming ring electrode
05/04/2010US7709324 Method for forming a gate within a trench including the use of a protective film
05/04/2010US7709323 Methods of forming nand-type nonvolatile memory devices
05/04/2010US7709322 Methods for fabricating flash memory devices
05/04/2010US7709321 Flash memory device and fabricating method thereof
05/04/2010US7709320 Method of fabricating trench capacitors and memory cells using trench capacitors
05/04/2010US7709318 Method for fabricating a semiconductor device
05/04/2010US7709317 Method to increase strain enhancement with spacerless FET and dual liner process
05/04/2010US7709316 Method of fabricating gate structure
05/04/2010US7709315 Semiconductor device and method of manufacturing the same
05/04/2010US7709314 Semiconductor switching devices and fabrication methods
05/04/2010US7709313 High performance capacitors in planar back gates CMOS
05/04/2010US7709312 Methods for inducing strain in non-planar transistor structures
05/04/2010US7709311 JFET device with improved off-state leakage current and method of fabrication
05/04/2010US7709310 Semiconductor device with mushroom electrode and manufacture method thereof
05/04/2010US7709309 Semiconductor device and manufacturing method thereof
05/04/2010US7709308 Semiconductor devices and methods of fabricating the same including forming a fin with first and second gates on the sidewalls
05/04/2010US7709307 Printed non-volatile memory
05/04/2010US7709306 Active layer island
05/04/2010US7709305 Method for producing partial SOI structures comprising zones connecting a superficial layer and a substrate
05/04/2010US7709304 Thin film transistor array panel, manufacturing method thereof, and mask therefor
05/04/2010US7709303 Process for forming an electronic device including a fin-type structure
05/04/2010US7709302 Method for manufacturing a semiconductor device
05/04/2010US7709301 Integrated circuit having efficiently packed decoupling capacitors
05/04/2010US7709300 Structure and method for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks
05/04/2010US7709299 Hierarchical 2T-DRAM with self-timed sensing
05/04/2010US7709298 Selectively altering a predetermined portion or an external member in contact with the predetermined portion
05/04/2010US7709297 Microelectronic package with thermal access
05/04/2010US7709296 Coupling metal clad fiber optics for enhanced heat dissipation
05/04/2010US7709295 Method of manufacturing semiconductor device
05/04/2010US7709294 Die attach area cut-on-fly method and apparatus
05/04/2010US7709293 Semiconductor device and manufacturing method of the semiconductor device
05/04/2010US7709292 Processes and packaging for high voltage integrated circuits, electronic devices, and circuits
05/04/2010US7709291 Method of disposing selectively two types of substances on surface of substrate
05/04/2010US7709289 Memory elements having patterned electrodes and method of forming the same
05/04/2010US7709288 Method for manufacturing multi-junction solar cell
05/04/2010US7709287 Method of forming a multijunction solar cell structure with a GaAs/AIGaAs tunnel diode
05/04/2010US7709286 Image sensor and method for manufacturing the same
05/04/2010US7709285 Method of manufacturing a MEMS device and MEMS device
05/04/2010US7709284 Method for deposition of magnesium doped (Al, In, Ga, B)N layers
05/04/2010US7709283 Method of manufacturing a semiconductor device having an insulating protective film covering at least a portion of a tile-shaped element
05/04/2010US7709282 Method for producing a light emitting device
05/04/2010US7709281 Semiconductor laser device and method of manufacturing the same
05/04/2010US7709279 Methods for testing semiconductor devices methods for protecting the same from electrostatic discharge events during testing, and methods for fabricating inserts for use in testing semiconductor devices
05/04/2010US7709277 PAA-based etchant, methods of using same, and resultant structures
05/04/2010US7709276 Manufacturing method of a semiconductor device and substrate processing apparatus
05/04/2010US7709275 Method of forming a pattern for a semiconductor device and method of forming the related MOS transistor
05/04/2010US7709274 Method for forming an RuOx electrode and structure
05/04/2010US7709269 include forming a protective layer having a first opening extending therethrough on a substrate, forming a dielectric layer on the protective layer having a second opening extending therethrough that is wider than the first opening, and forming a gate electrode in the first and second openings
05/04/2010US7709186 Exposing photoresist film of semiconductor wherein wafer is sequentially shifted by predetermined distance so that exposed regions before and after shifts have overlapping region having an area larger than or equal to that of die pattern to prevent defects on exposure mask from being transcribed to film
05/04/2010US7709161 Photomask producing method and photomask blank
05/04/2010US7709159 Mask, mask forming method, pattern forming method, and wiring pattern forming method
05/04/2010US7709099 Bonded body, wafer support member using the same, and wafer treatment method
05/04/2010US7709063 Remote plasma apparatus for processing substrate with two types of gases
05/04/2010US7709062 Scanning ion beams; filling aperture; process control
05/04/2010US7708900 Chemical mechanical polishing slurry compositions, methods of preparing the same and methods of using the same
05/04/2010US7708880 Chemical liquid supply apparatus and a chemical liquid supply method
05/04/2010US7708860 Plasma processing apparatus
05/04/2010US7708859 Gas distribution system having fast gas switching capabilities
05/04/2010US7708856 Hot pressing ceramic distortion control
05/04/2010US7708854 Work carrier and method of processing a workpiece
05/04/2010US7708848 Component bonding method and component bonding device
05/04/2010US7708834 Bolt and plasma processing apparatus provided with same
05/04/2010US7708832 Method for preparing substrate for growing gallium nitride and method for preparing gallium nitride substrate
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