Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
06/2010
06/08/2010US7732227 Method and apparatus for wall film monitoring
06/08/2010US7732226 Method of manufacturing flash memory device
06/08/2010US7732225 Method for measuring contamination in liquids at PPQ levels
06/08/2010US7732224 Metal line pattern of semiconductor device and method of forming the same
06/08/2010US7732222 Magnetic memory device and method of fabricating the same
06/08/2010US7732121 Near-field exposure method
06/08/2010US7732110 Method for exposing a substrate and lithographic projection apparatus
06/08/2010US7732107 makes it possible to estimate and correct flare with high accuracy over entire portion not only of single shot region but also of single chip region to thereby realize lithographic process causative of only a small dimensional variation in line width, and to realize highly-reliable semiconductor devices
06/08/2010US7732103 Photomask, focus measurement apparatus and focus measurement method
06/08/2010US7732101 polishing the surfaces of substrates using abrasive grains comprising silica sol and applying pressure to suppress surface projections; phase shifting masks used for producing semiconductors
06/08/2010US7732010 Method for supporting a glass substrate to improve uniform deposition thickness
06/08/2010US7731922 scrubbing, coalescence; for food preparation establishment having open flame cooker which produces carbon monoxide gas and odor, and smoke and airborne grease as particulate contaminants in exhaust flow; hoods
06/08/2010US7731833 Electrodeposition of electroconductive metals on wafers, panels, magnetic heads or substrates having cavities, by applying power and electrolyte solutions to the surfaces; integrated circuits; chemical mechanical polishing
06/08/2010US7731802 Methods for transitioning a fluid meniscus to and from surfaces of a substrate
06/08/2010US7731799 Substrate processing method, substrate processing apparatus and computer-readable memory medium
06/08/2010US7731797 Substrate treating apparatus and semiconductor device manufacturing method
06/08/2010US7731764 Singulation metal mold and method for producing semiconductor device
06/08/2010US7731568 Polishing pad and semiconductor device manufacturing method
06/08/2010US7731566 Substrate polishing metrology using interference signals
06/08/2010US7731470 Clean stocker and method of storing articles
06/08/2010US7731469 Component feeder
06/08/2010US7731162 Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal method
06/08/2010US7731076 Laser trimming problem suppressing semiconductor device manufacturing apparatus and method
06/08/2010US7730834 Printing apparatus and device manufacturing method
06/08/2010US7730611 High capacity pick and place process
06/03/2010WO2010062967A2 Test electronics to device under test interfaces, and methods and apparatus using same
06/03/2010WO2010062963A2 Self cleaning belt conveyor
06/03/2010WO2010062918A2 Confinement of foam delivered by a proximity head
06/03/2010WO2010062910A2 Using optical metrology for feed back and feed forward process control
06/03/2010WO2010062876A1 Glass-ceramic-based semiconductor-on-insulator structures and method for making the same
06/03/2010WO2010062852A1 Method for processing a silicon-on-insulator structure
06/03/2010WO2010062840A2 Improved load cup substrate sensing
06/03/2010WO2010062822A2 Electrodeposition of copper in microelectronics with dipyridyl-based levelers
06/03/2010WO2010062818A2 Two-line mixing of chemical and abrasive particles with endpoint control for chemical mechanical polishing
06/03/2010WO2010062670A2 X-y adjustable optical mount
06/03/2010WO2010062661A2 Monolithic linear polishing sheet
06/03/2010WO2010062644A2 Vertical group iii-v nanowires on si, heterostructures, flexible arrays and fabrication
06/03/2010WO2010062582A2 Vapor deposition method for ternary compounds
06/03/2010WO2010062579A2 Process kit having reduced erosion sensitivity
06/03/2010WO2010062515A1 Method of making pillars using photoresist spacer mask
06/03/2010WO2010062508A1 Gluconic acid containing photoresist cleaning composition for multi-metal device processing
06/03/2010WO2010062497A2 Goodness of fit in spectrographic monitoring of a substrate during processing
06/03/2010WO2010062476A1 Self-centering susceptor ring assembly
06/03/2010WO2010062424A1 Method and system for performing lithography verification for a double-patterning process
06/03/2010WO2010062420A1 Assist feature placement based on a focus-sensitive cost-covariance field
06/03/2010WO2010062387A1 Reduced topography-related irregularities during the patterning of two different stress-inducing layers in the contact level of a semiconductor device
06/03/2010WO2010062385A1 Multiple gate transistor having homogenously silicided fin end portions
06/03/2010WO2010062345A2 Lower electrode assembly of plasma processing chamber
06/03/2010WO2010062289A1 Ionized gas for a wire bonding machine including wire feed system
06/03/2010WO2010062262A1 Apparatus for detecting micro-cracks in wafers and method therefor
06/03/2010WO2010062254A1 Room temperature direct metal-metal bonding
06/03/2010WO2010062100A2 Digital 3d lithography method
06/03/2010WO2010062066A2 Non-contact conveying plate capable of spurting small amount of air with high pressure
06/03/2010WO2010062011A1 Square cutting device for ingot
06/03/2010WO2010062008A1 Measurement pattern structure, processing pattern structure, substrate treatment apparatus, and substrate treatment method
06/03/2010WO2010061955A1 Container containing cobalt carbonyl complex and cobalt carbonyl complex composition
06/03/2010WO2010061911A1 Reconfigurable circuit generation device, method, and program
06/03/2010WO2010061886A1 Composition for forming gate dielectric of thin film transistor
06/03/2010WO2010061883A1 Forming agent for gate dielectric of thin film transistor
06/03/2010WO2010061865A1 Epitaxial substrate for electronic device and manufacturing method thereof
06/03/2010WO2010061828A1 Mask blank substrate
06/03/2010WO2010061823A1 Thin film transistor manufacturing method, thin film transistor, and electronic device
06/03/2010WO2010061782A1 Surface protection tape for dicing and method for peeling and removing surface protection tape for dicing
06/03/2010WO2010061771A1 Observation condition determination support device and observation condition determination support method
06/03/2010WO2010061754A1 Nonvolatile semiconductor memory device and manufacturing method thereof
06/03/2010WO2010061740A1 Wafer heating apparatus, electrostatic chuck, and method for manufacturing wafer heating apparatus
06/03/2010WO2010061725A1 Substrate with multilayer reflection film, reflective mask blank and method for manufacturing reflective mask blank
06/03/2010WO2010061721A1 Thin film transistor and method for manufacturing thin film transistor
06/03/2010WO2010061674A1 Correction unit, illumination optical system, exposure device, and device manufacturing method
06/03/2010WO2010061619A1 Method for producing semiconductor substrate, semiconductor substrate, method for manufacturing electronic device, and reaction apparatus
06/03/2010WO2010061616A1 Semiconductor substrate, electronic device and method for manufacturing semiconductor substrate
06/03/2010WO2010061615A1 Method for producing semiconductor substrate, semiconductor substrate, method for manufacturing electronic device, and reaction apparatus
06/03/2010WO2010061603A1 Film forming apparatus and method of manufacturing electronic device
06/03/2010WO2010061595A1 Organic semiconductor element
06/03/2010WO2010061589A1 Sputtering device
06/03/2010WO2010061555A1 Liquid crystal display device and method for manufacturing liquid crystal display device tft substrate
06/03/2010WO2010061554A1 Transistor and method for manufacturing same
06/03/2010WO2010061552A1 Electronic component package and electronic component package manufacturing method
06/03/2010WO2010061551A1 Semiconductor device and electronic device
06/03/2010WO2010061495A1 Semiconductor device and method for manufacturing same
06/03/2010WO2010061470A1 Wafer and method for manufacturing package product
06/03/2010WO2010061431A1 Wafer storing container
06/03/2010WO2010061428A1 Electronic device manufacturing method, substrate for mounting electronic component and method for manufacturing the substrate
06/03/2010WO2010061151A2 Method for producing infrared-photosensitive matrix cells adhering to an optically transparent substrate by molecular adhesion, and related sensor
06/03/2010WO2010061035A1 Embossing of electronic thin-film components
06/03/2010WO2010061004A1 Bonding method
06/03/2010WO2010060944A1 Method for producing a metal contact on a semiconductor substrate provided with a coating
06/03/2010WO2010060890A1 Methods for selective reverse mask planarization and interconnect structures formed thereby
06/03/2010WO2010060646A1 Method for producing semiconductor layers and coated substrates treated with elemental selenium and/or sulfur, in particular flat substrates
06/03/2010WO2010060639A1 A microstructure device including a metallization structure with air gaps formed commonly with vias
06/03/2010WO2010060337A1 Multifunctional vacuumizing device
06/03/2010WO2010060286A1 Structure of conductive holes of multilayer board and manufacturing method thereof
06/03/2010WO2010060274A1 Detergent for removing photo resist
06/03/2010WO2010060273A1 Rinse solution composition for removing resist
06/03/2010WO2010060272A1 A protection liquid for metal substrate of semiconductor wafer and application method thereof
06/03/2010WO2010060271A1 Fluorine contained composition and application thereof
06/03/2010WO2010039810A3 Solute stabilization of sheets formed from a melt
06/03/2010WO2010039363A3 Methods for forming silicon nitride based film or silicon carbon based film
06/03/2010WO2010036575A3 Methods and systems for preventing feature collapse during microelectronic topography fabrication
06/03/2010WO2010033924A3 Etch reactor suitable for etching high aspect ratio features
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