Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/2010
09/14/2010US7795650 Method and apparatus for backside illuminated image sensors using capacitively coupled readout integrated circuits
09/14/2010US7795649 Microfeature workpieces having microlenses and methods of forming microlenses on microfeature workpieces
09/14/2010US7795648 Semiconductor device comprising capacitor and method of fabricating the same
09/14/2010US7795647 Curled semiconductor transistor
09/14/2010US7795644 Integrated circuits with stress memory effect and fabrication methods thereof
09/14/2010US7795640 Depletion-less photodiode with suppressed dark current and method for producing the same
09/14/2010US7795630 Semiconductor device with oxidized regions and method for fabricating the same
09/14/2010US7795627 Semiconductor device and method for manufacturing the same
09/14/2010US7795625 Semiconductor light-emitting device
09/14/2010US7795624 Support body for semiconductor element, method for manufacturing the same and semiconductor device
09/14/2010US7795616 Liquid crystal display device and method for manufacturing the same
09/14/2010US7795613 Structure with transistor
09/14/2010US7795612 Organic semiconductor device, process for producing the same, and organic semiconductor apparatus
09/14/2010US7795603 Lithographic apparatus and device manufacturing method
09/14/2010US7795593 Surface contamination analyzer for semiconductor wafers
09/14/2010US7795571 Imaging apparatus and a device for use therewith
09/14/2010US7795325 Adhesive composition, adhesive composition for circuit connection, connected body semiconductor device
09/14/2010US7795198 fluoride salt such as ammonium fluoride, tetramethylainmonium fluoride, tetraethylammonium fluoride, tetrapropylammonium fluoride and tetrabutylammonium fluoride, acid such as sulfuric acid and nitric acid, ammonium sulfate and ammonium nitrate, and aqueous glycol; manufacturing semiconductors
09/14/2010US7795160 ALD of metal silicate films
09/14/2010US7795159 Charge trap layer for a charge trap semiconductor memory device and method of manufacturing the same
09/14/2010US7795158 Oxidation method and apparatus for semiconductor process
09/14/2010US7795157 Substrate treatment device and manufacturing method of semiconductor device
09/14/2010US7795156 Producing method of semiconductor device
09/14/2010US7795155 Method for forming an indium cap layer
09/14/2010US7795154 Method for manufacturing semiconductor device that uses laser ablation, to selectively remove one or more material layers
09/14/2010US7795153 Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of selected chamber parameters
09/14/2010US7795152 Methods of making self-aligned nano-structures
09/14/2010US7795151 Methods of forming a trench having side surfaces including a uniform slope
09/14/2010US7795150 Metal capping of damascene structures to improve reliability using hyper selective chemical-mechanical deposition
09/14/2010US7795149 Masking techniques and contact imprint reticles for dense semiconductor fabrication
09/14/2010US7795148 etching with a process gas comprising HF or NH3 or a combination thereof, in order to chemically alter the surface layer, and thermally treating the chemically altered surface in order to desorb the chemically altered surface layer
09/14/2010US7795147 Semiconductor storage device and method for fabricating the same
09/14/2010US7795146 Etching technique for the fabrication of thin (Al, In, Ga)N layers
09/14/2010US7795145 Patterning crystalline compounds on surfaces
09/14/2010US7795144 Method for forming electrode structure for use in light emitting device and method for forming stacked structure
09/14/2010US7795143 Substrate processing apparatus and manufacturing method of semiconductor device
09/14/2010US7795142 Method for fabricating a semiconductor device
09/14/2010US7795141 Method of manufacturing semiconductor device suitable for forming wiring using damascene method
09/14/2010US7795140 Method of manufacturing substrate
09/14/2010US7795139 Method for manufacturing semiconductor package
09/14/2010US7795138 Method of depositing a metal seed layer over recessed feature surfaces in a semiconductor substrate
09/14/2010US7795137 Manufacturing method of semiconductor device
09/14/2010US7795136 Metal wiring of semiconductor device and forming method thereof
09/14/2010US7795135 Method for producing a layer arrangement
09/14/2010US7795134 Conductive interconnect structures and formation methods using supercritical fluids
09/14/2010US7795133 Semiconductor device and method of manufacturing the same
09/14/2010US7795132 Self-aligned cross-point memory fabrication
09/14/2010US7795131 Method of fabricating metal interconnects and inter-metal dielectric layer thereof
09/14/2010US7795130 Active area bonding compatible high current structures
09/14/2010US7795129 Semiconductor device, method for manufacturing the same, circuit substrate, electro-optical apparatus, and electronic equipment
09/14/2010US7795128 Method of manufacturing a semiconductor device having an enhanced electrode pad structure
09/14/2010US7795127 Electronic device manufacturing method and electronic device
09/14/2010US7795126 Electrical die contact structure and fabrication method
09/14/2010US7795125 System and process for producing nanowire composites and electronic substrates therefrom
09/14/2010US7795124 Methods for contact resistance reduction of advanced CMOS devices
09/14/2010US7795123 Method of forming gate electrode
09/14/2010US7795122 Antimony ion implantation for semiconductor components
09/14/2010US7795121 Method for manufacturing semiconductor device
09/14/2010US7795120 Doping wide band gap semiconductors
09/14/2010US7795119 Flash anneal for a PAI, NiSi process
09/14/2010US7795118 Gallium nitride based compound semiconductor device including compliant substrate and method for manufacturing the same
09/14/2010US7795117 Method of producing semiconductor substrate having an SOI structure
09/14/2010US7795116 Wafer cutting methods and packages using dice derived therefrom
09/14/2010US7795115 Method of manufacturing semiconductor device
09/14/2010US7795114 Manufacturing methods of SOI substrate and semiconductor device
09/14/2010US7795113 Method for bonding a die or substrate to a carrier
09/14/2010US7795112 Method of fabricating self-aligned source and drain contacts in a double gate FET with controlled manufacturing of a thin Si or non-Si channel
09/14/2010US7795111 Manufacturing method of SOI substrate and manufacturing method of semiconductor device
09/14/2010US7795110 Trench isolation type semiconductor device which prevents a recess from being formed in a field region and method of fabricating the same
09/14/2010US7795109 Isolation trenches with conductive plates
09/14/2010US7795108 Resistance-based etch depth determination for SGT technology
09/14/2010US7795107 Method for forming isolation structures
09/14/2010US7795106 Semiconductor device formed on (111) surface of a Si crystal and fabrication process thereof
09/14/2010US7795105 Method for producing an integrated circuit assembly with an auxiliary indentation, particularly with aligning marks, and an integrated circuit arrangement
09/14/2010US7795104 Method for fabricating device structures having a variation in electrical conductivity
09/14/2010US7795103 Bipolar transistors with depleted emitter
09/14/2010US7795102 ESD high frequency diodes
09/14/2010US7795101 Method of forming a MOS transistor
09/14/2010US7795100 Semiconductor device and its manufacturing method
09/14/2010US7795099 Semiconductor devices having Fin-type active areas and methods of manufacturing the same
09/14/2010US7795098 Rotated field effect transistors and method of manufacture
09/14/2010US7795097 Semiconductor device manufactured by removing sidewalls during replacement gate integration scheme
09/14/2010US7795096 Method of forming an integrated circuit with two types of transistors
09/14/2010US7795095 Method of producing semiconductor device
09/14/2010US7795094 Recessed gate dielectric antifuse
09/14/2010US7795093 Front-end processing of nickel plated bond pads
09/14/2010US7795092 Semiconductor device and manufacturing method thereof
09/14/2010US7795091 Method of forming a split gate memory device and apparatus
09/14/2010US7795090 Electrical device and method for fabricating the same
09/14/2010US7795089 Forming a semiconductor device having epitaxially grown source and drain regions
09/14/2010US7795088 Method for manufacturing memory cell
09/14/2010US7795087 Ultra-violet protected tamper resistant embedded EEPROM
09/14/2010US7795086 Method of manufacturing semiconductor device using salicide process
09/14/2010US7795085 Intentional pocket shadowing to compensate for the effects of cross-diffusion in SRAMs
09/14/2010US7795084 Semiconductor device and fabricating method thereof
09/14/2010US7795083 Semiconductor structure and fabrication method thereof
09/14/2010US7795082 Method of fabricating thin film transistor
09/14/2010US7795081 Method for manufacturing thin film transistor
09/14/2010US7795080 Methods of forming integrated circuit devices using composite spacer structures
09/14/2010US7795079 Manufacturing process for a quad flat non-leaded chip package structure
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