Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/2010
09/21/2010US7800178 Semiconductor device and method for manufacturing the same
09/21/2010US7800172 Methods of forming semiconductor devices having multiple channel MOS transistors and related intermediate structures
09/21/2010US7800171 Integrated circuit including a semiconductor device
09/21/2010US7800168 Power semiconductor device
09/21/2010US7800153 Capacitive electrode having semiconductor layers with an interface of separated grain boundaries
09/21/2010US7800152 Methods for manufacturing a finfet using a conventional wafer and apparatus manufactured therefrom
09/21/2010US7800144 Solid state imaging apparatus and method for fabricating the same
09/21/2010US7800143 Dynamic random access memory with an amplified capacitor
09/21/2010US7800140 Semiconductor integrated circuit
09/21/2010US7800138 Semiconductor device including thermally dissipating dummy pads
09/21/2010US7800135 Power semiconductor device and method of manufacturing a power semiconductor device
09/21/2010US7800131 Field effect transistor
09/21/2010US7800117 Pixel structure for a solid state light emitting device
09/21/2010US7800115 Semiconductor device and method of manufacturing same
09/21/2010US7800114 Semiconductor device and manufacturing method thereof
09/21/2010US7800105 Ga2O3 semiconductor device
09/21/2010US7800099 Light emitting device, electronic equipment, and organic polarizing film
09/21/2010US7800098 Array substrate for liquid crystal display device and method of fabricating the same
09/21/2010US7800097 Semiconductor device including independent active layers and method for fabricating the same
09/21/2010US7800081 Pulse train annealing method and apparatus
09/21/2010US7800080 Laser irradiation apparatus and method of manufacturing semiconductor device
09/21/2010US7799707 Method of forming gated, self-aligned micro-structures and nano structures
09/21/2010US7799706 Neutral beam-assisted atomic layer chemical vapor deposition apparatus and method of processing substrate using the same
09/21/2010US7799705 Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups
09/21/2010US7799704 Gas baffle and distributor for semiconductor processing chamber
09/21/2010US7799703 Processing method and storage medium
09/21/2010US7799702 Method of manufacturing nonvolatile memory device
09/21/2010US7799701 Method of coating substrate
09/21/2010US7799700 Method for applying resin film to face of semiconductor wafer
09/21/2010US7799699 Printable semiconductor structures and related methods of making and assembling
09/21/2010US7799698 Deposition-selective etch-deposition process for dielectric film gapfill
09/21/2010US7799697 Patterning method in semiconductor manufacturing process including an array of rectangular blocks and filling features
09/21/2010US7799696 Method of manufacturing an integrated circuit
09/21/2010US7799695 Device for liquid treatment of wafer-shaped articles
09/21/2010US7799694 Methods of forming semiconductor constructions
09/21/2010US7799693 Method for manufacturing a semiconductor device
09/21/2010US7799692 Method and apparatus for the treatment of a semiconductor wafer
09/21/2010US7799691 System and method for anisotropically etching a recess in a silicon substrate
09/21/2010US7799690 Method for fabricating semiconductor integrated circuit device
09/21/2010US7799689 Method and apparatus for chemical mechanical polishing including first and second polishing
09/21/2010US7799688 Polishing fluid and method of polishing
09/21/2010US7799687 Slurry composition for a chemical mechanical polishing process and method of manufacturing a semiconductor device using the slurry composition
09/21/2010US7799686 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same
09/21/2010US7799685 System and method for removal of photoresist in transistor fabrication for integrated circuit manufacturing
09/21/2010US7799684 Two step process for uniform across wafer deposition and void free filling on ruthenium coated wafers
09/21/2010US7799683 Copper interconnect wiring and method and apparatus for forming thereof
09/21/2010US7799681 Method for forming a ruthenium metal cap layer
09/21/2010US7799680 Surface preparation prior to deposition on germanium
09/21/2010US7799678 Method for forming a through silicon via layout
09/21/2010US7799677 Device comprising multi-layered thin film having excellent adhesive strength and method for fabricating the same
09/21/2010US7799676 Method of manufacturing a contact structure to avoid open issue
09/21/2010US7799675 Bonded semiconductor structure and method of fabricating the same
09/21/2010US7799674 Ruthenium alloy film for copper interconnects
09/21/2010US7799673 Semiconductor device manufacturing method
09/21/2010US7799672 Semiconductor device and method for manufacturing same
09/21/2010US7799671 Interfacial layers for electromigration resistance improvement in damascene interconnects
09/21/2010US7799670 Plasma oxidation of a memory layer to form a blocking layer in non-volatile charge trap memory devices
09/21/2010US7799669 Method of forming a high-k gate dielectric layer
09/21/2010US7799668 Formation of uniform silicate gate dielectrics
09/21/2010US7799667 Method for manufacturing semiconductor device with planer gate electrode and trench gate electrode
09/21/2010US7799666 Method of spatially selective laser-assisted doping of a semiconductor
09/21/2010US7799665 Laser processing apparatus and laser processing process
09/21/2010US7799663 Fabrication of semiconductor metamaterials
09/21/2010US7799662 Power semiconductor device with soft switching characteristic and manufacturing method for same
09/21/2010US7799661 Electrical sensor for real-time feedback control of plasma nitridation
09/21/2010US7799660 Method for manufacturing SOI substrate
09/21/2010US7799659 Singulating semiconductor wafers to form semiconductor chips
09/21/2010US7799658 Method for manufacturing semiconductor substrate and method for manufacturing semiconductor device
09/21/2010US7799657 Method of fabricating a substrate for a planar, double-gated, transistor process
09/21/2010US7799656 Microchannels for BioMEMS devices
09/21/2010US7799655 Method for evaluation of bonded wafer
09/21/2010US7799654 Reduced refractive index and extinction coefficient layer for enhanced photosensitivity
09/21/2010US7799653 Method for forming capacitor in dynamic random access memory
09/21/2010US7799652 Method for producing epitaxial wafer with buried diffusion layer and epitaxial wafer with buried diffusion layer
09/21/2010US7799651 Method of treating interface defects in a substrate
09/21/2010US7799650 Method for making a transistor with a stressor
09/21/2010US7799649 Method for forming multi gate devices using a silicon oxide masking layer
09/21/2010US7799648 Method of forming a MOSFET on a strained silicon layer
09/21/2010US7799647 MOSFET device featuring a superlattice barrier layer and method
09/21/2010US7799646 Integration of a sense FET into a discrete power MOSFET
09/21/2010US7799645 Semiconductor device and method of manufacturing the same
09/21/2010US7799644 Transistor with asymmetry for data storage circuitry
09/21/2010US7799643 Method of fabricating semiconductor device having self-aligned contact plug
09/21/2010US7799642 Trench MOSFET and method of manufacture utilizing two masks
09/21/2010US7799641 Method for forming a semiconductor device having recess channel
09/21/2010US7799640 Method of forming a semiconductor device having trench charge compensation regions
09/21/2010US7799639 Methods of fabricating non-volatile memory devices including a chlorine cured tunnel oxide layer
09/21/2010US7799638 Method for forming a memory array
09/21/2010US7799637 Scaled dielectric enabled by stack sidewall process
09/21/2010US7799636 Power device with trenches having wider upper portion than lower portion
09/21/2010US7799635 Methods of forming nonvolatile memory devices
09/21/2010US7799634 Method of forming nanocrystals
09/21/2010US7799633 Semiconductor device and method of manufacturing the same
09/21/2010US7799632 Method of forming an isolation structure by performing multiple high-density plasma depositions
09/21/2010US7799631 Multiple-layer dielectric layer and method for fabricating capacitor including the same
09/21/2010US7799630 Method for manufacturing a CMOS device having dual metal gate
09/21/2010US7799629 Memory device and method of manufacturing the same
09/21/2010US7799628 Advanced metal gate method and device
09/21/2010US7799627 Multi device and method of manufacturing the same
09/21/2010US7799626 Lateral DMOS device structure and fabrication method therefor