Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/2010
09/07/2010US7790622 Methods for removing gate sidewall spacers in CMOS semiconductor fabrication processes
09/07/2010US7790621 Ion implantation for increasing etch rate differential between adjacent materials
09/07/2010US7790620 Method for fabricating semiconductor device
09/07/2010US7790619 Method for fabricating semiconductor device having narrow channel
09/07/2010US7790618 comprises by weight percent 0-25 oxidizer; 0.00002 to 5 multi-component surfactant having a hydrophobic tail, a nonionic hydrophilic portion and an anionic hydrophilic portion, tail having 6-30 carbon atoms and nonionic hydrophilic portion having 10-300 carbon atoms, nonferrous metal inhibitor, abrasive
09/07/2010US7790617 Formation of metal silicide layer over copper interconnect for reliability enhancement
09/07/2010US7790616 Encapsulated silicidation for improved SiC processing and device yield
09/07/2010US7790615 Electronic component packaging
09/07/2010US7790614 Semiconductor device and method of manufacturing the same
09/07/2010US7790613 Semiconductor device and method of manufacturing the same
09/07/2010US7790612 Increased grain size in metal wiring structures through flash tube irradiation
09/07/2010US7790611 Method for FEOL and BEOL wiring
09/07/2010US7790610 Methods of manufacturing memory units, and methods of manufacturing semiconductor devices
09/07/2010US7790608 Buried via technology for three dimensional integrated circuits
09/07/2010US7790607 Method for reducing dielectric overetch using a dielectric etch stop at a planar surface
09/07/2010US7790606 Method of forming an interconnect structure
09/07/2010US7790605 Formation of interconnects through lift-off processing
09/07/2010US7790604 Krypton sputtering of thin tungsten layer for integrated circuits
09/07/2010US7790603 Integrated circuit insulators and related methods
09/07/2010US7790602 Method of forming a metal interconnect with capacitive structures that adjust the capacitance of the interconnect
09/07/2010US7790601 Forming interconnects with air gaps
09/07/2010US7790600 Synthesis of zeolite crystals and formation of carbon nanostructures in patterned structures
09/07/2010US7790599 Metal cap for interconnect structures
09/07/2010US7790598 System, apparatus, and method for advanced solder bumping
09/07/2010US7790597 Solder cap application process on copper bump using solder powder film
09/07/2010US7790596 Apparatus and method for semiconductor wafer bumping via injection molded solder
09/07/2010US7790595 Manufacturing method improving the reliability of a bump electrode
09/07/2010US7790593 Method for tuning epitaxial growth by interfacial doping and structure including same
09/07/2010US7790592 Method to fabricate metal gate high-k devices
09/07/2010US7790591 Methods of manufacturing semiconductor devices including metal oxide layers
09/07/2010US7790590 Selective W-CVD method and method for forming multi-layered Cu electrical interconnection
09/07/2010US7790589 Method of providing enhanced breakdown by diluted doping profiles in high-voltage transistors
09/07/2010US7790588 Dual gate of semiconductor device capable of forming a layer doped in high concentration over a recessed portion of substrate for forming dual gate with recess channel structure and method for manufacturing the same
09/07/2010US7790587 Method to reduce junction leakage through partial regrowth with ultrafast anneal and structures formed thereby
09/07/2010US7790586 Plasma doping method
09/07/2010US7790585 Antiferromagnetic half-metallic semiconductor and manufacturing method therefor
09/07/2010US7790584 Method of growing semi-polar nitride single crystal thin film and method of manufacturing nitride semiconductor light emitting diode using the same
09/07/2010US7790583 cleaning an electron beam treatment apparatus that includes generating electron beam that energizes cleaning gas in chamber of electron beam treatment apparatus, monitoring current, adjusting pressure of cleaning gas to maintain electron beam current at constant value
09/07/2010US7790582 Method for fabricating polysilicon liquid crystal display device
09/07/2010US7790581 Semiconductor substrate with multiple crystallographic orientations
09/07/2010US7790580 Metal-induced crystallization of amorphous silicon in thin film transistors
09/07/2010US7790579 Semiconductor storage device, semiconductor device, and manufacturing method therefor
09/07/2010US7790578 Dicing method using volatile protective agent
09/07/2010US7790577 Crackstop structures and methods of making same
09/07/2010US7790576 Semiconductor device and method of forming through hole vias in die extension region around periphery of die
09/07/2010US7790574 boric oxide solution is applied to a surface of the wafer, the wafer is subjected to a fast heat ramp-up associated with a first heating cycle that results in a release of an amount of boron for diffusion into the wafer
09/07/2010US7790573 Process for producing SOI substrate and process for regeneration of layer transferred wafer in the production
09/07/2010US7790572 Method for manufacturing semiconductor substrate
09/07/2010US7790571 SOQ substrate and method of manufacturing SOQ substrate
09/07/2010US7790570 Method of manufacturing a semiconductor device
09/07/2010US7790569 Production of semiconductor substrates with buried layers by joining (bonding) semiconductor wafers
09/07/2010US7790568 Method for fabricating semiconductor device
09/07/2010US7790567 Semiconductor device and method for forming the same
09/07/2010US7790566 Semiconductor surface treatment for epitaxial growth
09/07/2010US7790565 Semiconductor on glass insulator made using improved thinning process
09/07/2010US7790564 Methods for fabricating active devices on a semiconductor-on-insulator substrate utilizing multiple depth shallow trench isolations
09/07/2010US7790563 Semiconductor device, electronic device and method for manufacturing semiconductor device
09/07/2010US7790562 Method for angular doping of source and drain regions for odd and even NAND blocks
09/07/2010US7790561 Gate sidewall spacer and method of manufacture therefor
09/07/2010US7790560 nanoparticles are deposited onto insulating surface over transistor in first distribution of nanoparticles; field is applied to nanoparticles that applies force to particles, rearranging particles on surface to form second distribution of nanoparticles on surface; top conductive layer is applied
09/07/2010US7790559 Semiconductor transistors having high-K gate dielectric layers and metal gate electrodes
09/07/2010US7790558 Method and apparatus for increase strain effect in a transistor channel
09/07/2010US7790557 Method of manufacturing silicon carbide semiconductor device
09/07/2010US7790556 Integration of high k gate dielectric
09/07/2010US7790555 Semiconductor device manufacturing method with spin-coating of photoresist material
09/07/2010US7790554 Method of manufacturing semiconductor integrated circuit device with high and low breakdown-voltage MISFETs
09/07/2010US7790553 Methods for forming high performance gates and structures thereof
09/07/2010US7790552 Method for fabricating semiconductor device with bulb-shaped recess gate
09/07/2010US7790551 Method for fabricating a transistor having a recess gate structure
09/07/2010US7790550 Trench transistor and method for fabricating a trench transistor
09/07/2010US7790549 Configurations and methods for manufacturing charge balanced devices
09/07/2010US7790548 Methods of fabricating field effect transistors including recessed forked gate structures
09/07/2010US7790547 Non-volatile memory device and method for fabricating the same
09/07/2010US7790546 Method for forming storage node of capacitor in semiconductor device
09/07/2010US7790545 Semiconductor device having a polysilicon electrode including amorphizing, recrystallising, and removing part of the polysilicon electrode
09/07/2010US7790544 Method of fabricating different gate oxides for different transistors in an integrated circuit
09/07/2010US7790543 Device structures for a metal-oxide-semiconductor field effect transistor and methods of fabricating such device structures
09/07/2010US7790542 CMOS devices having reduced threshold voltage variations and methods of manufacture thereof
09/07/2010US7790541 Method and structure for forming multiple self-aligned gate stacks for logic devices
09/07/2010US7790540 Structure and method to use low k stress liner to reduce parasitic capacitance
09/07/2010US7790539 Electronic device and method for producing the same
09/07/2010US7790538 Integration of strained Ge into advanced CMOS technology
09/07/2010US7790537 Method for creating tensile strain by repeatedly applied stress memorization techniques
09/07/2010US7790536 Dopant confinement in the delta doped layer using a dopant segregration barrier in quantum well structures
09/07/2010US7790535 Depletion-free MOS using atomic-layer doping
09/07/2010US7790534 Method to form low-defect polycrystalline semiconductor material for use in a transistor
09/07/2010US7790533 Laser irradiation method, laser irradiation apparatus, and method for manufacturing semiconductor device
09/07/2010US7790532 Method of manufacturing thin film transistor substrate
09/07/2010US7790531 Methods for isolating portions of a loop of pitch-multiplied material and related structures
09/07/2010US7790530 Dual port gain cell with side and top gated read transistor
09/07/2010US7790529 Methods of forming memory arrays and semiconductor constructions
09/07/2010US7790528 Dual substrate orientation or bulk on SOI integrations using oxidation for silicon epitaxy spacer formation
09/07/2010US7790527 High-voltage silicon-on-insulator transistors and methods of manufacturing the same
09/07/2010US7790526 System for displaying images and method for fabricating the same
09/07/2010US7790525 Method of achieving dense-pitch interconnect patterning in integrated circuits
09/07/2010US7790524 Device and design structures for memory cells in a non-volatile random access memory and methods of fabricating such device structures
09/07/2010US7790523 Mask for forming a thin-film transistor, thin-film transistor substrate manufactured using the same and method of manufacturing a thin-film transistor substrate using the same
09/07/2010US7790522 Defect-free hybrid orientation technology for semiconductor devices
09/07/2010US7790521 Thin film semiconductor device, method of manufacturing the same and display
09/07/2010US7790520 Process for manufacturing a charge-balance power diode and an edge-termination structure for a charge-balance semiconductor power device