Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2011
03/08/2011US7901971 Method for manufacturing a sensor device with a stress relief layer
03/08/2011US7901970 Micro-electromechanical system (MEMS) based current and magnetic field sensor having capacitive sense components
03/08/2011US7901969 Micromirror manufacturing method
03/08/2011US7901968 Heteroepitaxial deposition over an oxidized surface
03/08/2011US7901967 Dicing method for semiconductor substrate
03/08/2011US7901966 Method for manufacturing nitride semiconductor device
03/08/2011US7901965 Thin film transistor substrate and method of manufacturing thereof
03/08/2011US7901963 Surface roughening method for light emitting diode substrate
03/08/2011US7901962 Method for preparing organic light-emitting diode including two light-emitting layers with two solvents
03/08/2011US7901961 Organic light emitting display device
03/08/2011US7901960 Group III nitride substrate, epitaxial layer-provided substrate, methods of manufacturing the same, and method of manufacturing semiconductor device
03/08/2011US7901959 Liquid crystal display and back light having a light emitting diode
03/08/2011US7901958 Fabrication method of semiconductor integrated circuit device
03/08/2011US7901957 Disguising test pads in a semiconductor package
03/08/2011US7901956 Structure for bumped wafer test
03/08/2011US7901955 Method of constructing a stacked-die semiconductor structure
03/08/2011US7901954 Method for detecting a void
03/08/2011US7901953 Methods and apparatus for detecting defects in interconnect structures
03/08/2011US7901952 Plasma reactor control by translating desired values of M plasma parameters to values of N chamber parameters
03/08/2011US7901951 Thin film transistor array substrate and method for fabricating same
03/08/2011US7901871 Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method
03/08/2011US7901864 Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition
03/08/2011US7901853 Pattern prediction method, pattern correction method, semiconductor device, and recording medium
03/08/2011US7901840 Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method
03/08/2011US7901783 Low κ dielectric inorganic/organic hybrid films and method of making
03/08/2011US7901736 Multilayer material and method of preparing same
03/08/2011US7901656 Metal oxide-containing nanoparticles
03/08/2011US7901586 Method of manufacturing self-ordered nanochannel-array and method of manufacturing nanodot using the nanochannel-array
03/08/2011US7901551 Substrate holder and plating apparatus
03/08/2011US7901545 deposition of uniform barrier layers into high aspect ratio nanostructure patterns on semiconductor substrates: radio frequency energy is coupled into the chamber to form a high density plasma, and a biasing voltage can be applied to aid in enhancing surface coverage
03/08/2011US7901539 Apparatus and methods for transporting and processing substrates
03/08/2011US7901510 Bolt and plasma processing apparatus provided with same
03/08/2011US7901509 Heating apparatus with enhanced thermal uniformity and method for making thereof
03/08/2011US7901474 Chemical-mechanical polishing with mixture of methanesulfonic acid, potassium, oxidizing agent (hydrogen peroxide), silica abrasive and water; for inhibiting dishing and erosion of insulating film and barrier film while maintaining flatness; kits
03/08/2011US7901196 Molding apparatus incorporating pressure uniformity adjustment
03/08/2011US7900776 Wafer container with door actuated wafer restraint
03/08/2011US7900677 Sheet sticking apparatus
03/08/2011US7900580 Substrate processing apparatus and reaction container
03/08/2011US7900579 Heat treatment method wherein the substrate holder is composed of two holder constituting bodies that move relative to each other
03/08/2011US7900520 Pressure sensor device
03/08/2011US7900373 Method for conditioning semiconductor wafers and/or hybrids
03/08/2011US7900311 Wafer edge cleaning
03/08/2011CA2422062C Method for selective metal film layer removal using carbon dioxide jet spray
03/03/2011WO2011026129A2 Radio frequency (rf) ground return arrangements
03/03/2011WO2011026127A2 A local plasma confinement and pressure control arrangement and methods thereof
03/03/2011WO2011026126A2 A multi-peripheral ring arrangement for performing plasma confinement
03/03/2011WO2011026064A1 Improved plasma enhanced atomic layer deposition process
03/03/2011WO2011026055A2 Unique mark and method to determine critical dimension uniformity and registration of reticles combined with wafer overlay capability
03/03/2011WO2011026033A1 Light emitting devices with embedded void-gap structures through bonding of structured materials on active devices
03/03/2011WO2011025973A1 Silicon carbide dual-mesa static induction transistor
03/03/2011WO2011025898A1 System and method to manufacture magnetic random access memory
03/03/2011WO2011025894A1 Semiconductor wafer-to-wafer bonding for dissimilar semiconductor dies and/or wafers
03/03/2011WO2011025804A1 Work function adjustment in high-k gates stacks including gate dielectrics of different thickness
03/03/2011WO2011025800A2 Maintaining integrity of a high-k gate stack by passivations using an oxygen plasma
03/03/2011WO2011025770A1 Focused ion beam process for selective and clean etching of copper
03/03/2011WO2011025761A1 Semiconductor on insulator and methods of forming same using temperature gradient in an anodic bonding process
03/03/2011WO2011025718A1 Semiconductor device
03/03/2011WO2011025655A2 Silicon-selective dry etch for carbon-containing films
03/03/2011WO2011025620A1 Chemical mechanical polishing stop layer for fully amorphous phase change memory pore cell
03/03/2011WO2011025577A1 Transistors with a gate insulation layer having a channel depleting interfacial charge and related fabrication methods
03/03/2011WO2011025576A1 Transistors with a dielectric channel depletion layer and related fabrication methods
03/03/2011WO2011025357A1 Wafer container with overlapping wall structure
03/03/2011WO2011025280A2 Wafer carrier
03/03/2011WO2011025256A2 Deposition gas supply apparatus
03/03/2011WO2011025214A2 Gas injection apparatus and substrate processing apparatus using same
03/03/2011WO2011025083A1 High-efficiency jig for transferring wafers
03/03/2011WO2011025070A1 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
03/03/2011WO2011025065A1 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
03/03/2011WO2011024967A1 Cyclic compound, manufacturing method therefor, radiation-sensitive composition, and method for forming a resist pattern
03/03/2011WO2011024957A1 Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern
03/03/2011WO2011024956A1 Recessed gate type silicon carbide field effect transistor and method for manufacturing same
03/03/2011WO2011024953A1 N-acyl-β-lactam derivative, macromolecular compound, and photoresist composition
03/03/2011WO2011024931A1 Sic single crystal wafer and process for production thereof
03/03/2011WO2011024916A1 Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern
03/03/2011WO2011024911A1 Semiconductor device, active matrix substrate, and display device
03/03/2011WO2011024910A1 Silicon wafer for solar cells and production method therefor
03/03/2011WO2011024866A1 Exposure apparatus, exposure method, and device manufacturing method
03/03/2011WO2011024854A1 Silicon carbide epitaxial wafer and manufacturing method therefor
03/03/2011WO2011024851A1 Semiconductor integrated circuit device
03/03/2011WO2011024839A1 Industrial robot
03/03/2011WO2011024836A1 Alkali-soluble resin containing silicone resin, light-sensitive resin composition, and cured object using light-sensitive resin composition
03/03/2011WO2011024820A1 Electronic device and method for manufacturing electronic device
03/03/2011WO2011024819A1 Semiconductor device and method for designing wire bonding structure for semiconductor device
03/03/2011WO2011024813A1 Heating and melting treatment device and heating and melting treatment method
03/03/2011WO2011024804A1 NOVEL ADDUCT COMPOUND, METHODS FOR PURIFICATION AND PREPARATION OF FUSED POLYCYCLIC AROMATIC COMPOUND, SOLUTION FOR FORMATION OF ORGANIC SEMICONDUCTOR FILM, AND NOVEL α-DIKETONE COMPOUND
03/03/2011WO2011024777A1 Vacuum processing apparatus and vacuum processing method
03/03/2011WO2011024770A1 Semiconductor device, liquid crystal display device equipped with semiconductor device, and process for production of semiconductor device
03/03/2011WO2011024762A1 Load lock device and treatment system
03/03/2011WO2011024754A1 Group iii nitride laminated semiconductor wafer and group iii nitride semiconductor device
03/03/2011WO2011024749A1 Vacuum treatment device and vacuum treatment factory
03/03/2011WO2011024734A1 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same
03/03/2011WO2011024704A1 Wiring layer, semiconductor device, liquid crystal display device
03/03/2011WO2011024689A1 Peeling device
03/03/2011WO2011024673A1 High-hardness material for imprint
03/03/2011WO2011024619A1 Method for reprocessing semiconductor substrate, method for manufacturing reprocessed semiconductor substrate, and method for manufacturing soi substrate
03/03/2011WO2011024557A1 Novel compound, process for preparation thereof, radiation -sensitive compositions containing the novel compound, and cured films
03/03/2011WO2011024549A1 Semiconductor device and field effect transistor
03/03/2011WO2011024510A1 Thin-film transistor and method for manufacturing same
03/03/2011WO2011024486A1 Water-soluble cutting fluid for slicing silicon ingots
03/03/2011WO2011024446A1 Plasma processing apparatus and method for manufacturing device